• Transactions on Electrical and Electronic Materials
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• v.12 no.5
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• pp.200-203
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• 2011

In this research, nitrogen (N)-doped zinc oxide (ZnO) thin films have been grown on a sapphire substrate by dielectric barrier discharge (DBD) in pulsed laser deposition (PLD). DBD has been used as an effective way for massive in-situ generation of N-plasma under conventional PLD process conditions. Low-temperature photoluminescence spectra of N-doped ZnO thin films provided near-band-edge emission after a thermal annealing process. The emission peak was resolved by Gaussian fitting and showed a dominant acceptor-bound excitation peak ($A^{\circ}X$) that indicated acceptor doping of ZnO with N. The acceptor binding energy of the N acceptor was estimated to be approximately 145 MeV based on the results of temperature-dependent photoluminescence (PL) measurements.

• JSTS:Journal of Semiconductor Technology and Science
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• v.3 no.2
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• pp.96-101
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• 2003

Direct evidence on the incorporation of high concentration of oxygen into undoped AlGaN layers for the AlGaN/GaN heterostuctures is provided by scanning photoemission microscopy using synchrotron radiation. In-situ annealing at $1000^{\circ}C$ resulted in a significant increase in the oxygen concentration at the AlGaN surface due to the predominant formation of Al-O bonds. The oxygen incorporation into the AlGaN layers resulting from the high reactivity of Al to oxygen can enhance the tunneling-assisted transport of electrons at the metal/AlGaN interface, leading to the reduction of the Schottky barrier height and the increase of the sheet carrier concentration near the AlGaN/GaN interface.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.84-84
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• 2010

We present an in-situ study of the interaction of a bimetallic Rh50Pd50 bulk crystal with O2, CO, and NO using ambient pressure x-ray photoelectron spectroscopy and compare it to results for 10 nm nanoparticles with the same overall composition. The surface of the bulk crystal has less Rh present under both oxidizing and reducing conditions than the nanoparticles under identical conditions. Segregation and oxidation/reduction proceeds quicker and at lower temperature for nanoparticles than for the bulk crystal. The near surface of the Rh50Pd50 bulk crystal after high temperature vacuum annealing is ca. 9% Rh measured by XPS. Heating in 0.1 Torr O2 to $350^{\circ}C$ increases the Rh surface composition to ca. 40%. The surface can then be reduced by heating in H2 at $150^{\circ}C$, leading to a reduced surface of 30% Rh. Titration of CO from this Rh-rich surface proceeds at a much lower pressure than on the Rh-deficient starting surface.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.131-131
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• 2013

A single-layer graphene has been uniformly grown on a Cu surface at elevated temperatures by thermally processing a poly(methyl methacrylate) (PMMA) film in a rapid thermal annealing (RTA) system under vacuum. The detailed chemistry of the transition from solid-state carbon to graphene on the catalytic Cu surface was investigated by performing in-situ residual gas analysis while PMMA/Cu-foil samples being heated, in conjunction with interrupted growth studies to reconstruct ex-situ the heating process. The data clearly show that the formation of graphene occurs with hydrocarbon molecules vaporized from PMMA, such as methane and/or methyl radicals, as precursors rather than by the direct graphitization of solid-state carbon. We also found that the temperature for vaporizing hydrocarbon molecules from PMMA and the length of time the gaseous hydrocarbon atmosphere is maintained, which are dependent on both the heating temperature profile and the amount of a solid carbon feedstock are the dominant factors to determine the crystalline quality of the resulting graphene film. Under optimal growth conditions, the PMMA-derived graphene was found to have a carrier (hole) mobility as high as ~2,700 cm2V-1s-1 at room temperature, superior to common graphene converted from solid carbon.

• Electrical & Electronic Materials
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• v.10 no.10
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• pp.1029-1033
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• 1997

A prototype MFSFET using ferroelectric fluoride BaMgF$_4$as a gate insulator has been successfully fabricated with the help of 2 sheets of metal mask. The fluoride film was deposited in an ultrai-high vacuum system at a substrate temperature of below 30$0^{\circ}C$ and an in-situ post-deposition annealing was conducted for 20 seconds at $650^{\circ}C$ in the same chamber. The interface state density of the BaMgF$_4$/Si(100) interface calculated by a MFS capacitor fabricated on the same wafer was about 8$\times$10$^{10}$ /cm$^2$.eV. The I$_{D}$-V$_{G}$ characteristics of the MFSFET show a hysteresis loop due to the ferroelectric nature of the BaMgF$_4$film. It is also demonstrated that the I$_{D}$ can be controlled by the “write” plus which was applied before the measurements even at the same “read”gate voltage.ltage.

• The Korean Journal of Ceramics
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• v.6 no.2
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• pp.91-95
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• 2000

Powder mixtures of $\beta$-SiC-TiC in a weight ratio of 2:1 containing 5-20 wt% additives ($Al_2O_3$-$Y_2O_3$) were liquid-phase sintered at $1830^{\circ}C$ for 1h by hot-pressing and subsequently annealed at $1950^{\circ}C$ for 6h to enhance grain growth. The annealed specimens revealed a microstructure of \"in situ-toughened composite\" as a result of the $\beta$longrightarrow$\alpha$ phase transformation of SiC during annealing. The increase of the content of additives accelerated the growth of elongated $\alpha$-SiC grains with higher aspect ratio and improved fracture toughness. The fracture toughness of SiC-TiC composite containing 20 wt% additive was 6.2 MPa.$m^{1/2}$.2}$.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.15 no.7
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• pp.576-582
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• 2002

Nonvolatile semiconductor memory devices with reoxidized nitrided oxide(RONO) gate dielectrics were fabricated, and nitrogen distribution and bonding species which contribute to memory characteristics were analyzed. Also, memory characteristics of devices depending on the anneal temperatures were investigated. The devices were fabricated by retrograde twin well CMOS processes with $0.35\mu m$ design rule. The processes could be simple by in-situ process in growing dielectric. The nitrogen distribution and bonding states of gate dielectrics were investigated by Dynamic Secondary Ion Mass Spectrometry(D-SIMS), Time-of-Flight Secondary Ion Mass Spectrometry(ToF-SIMS), and X-ray Photoelectron Spectroscopy(XPS). As the nitridation temperature increased, nitrogen concentration increased linearly, and more time was required to form the same reoxidized layer thickness. ToF-SIMS results showed that SiON species were detected at the initial oxide interface which had formed after NO annealing and $Si_2NO$ species within the reoxidized layer formed after reoxidation. As the anneal temperatures increased, the device showed worse retention and degradation properties. It could be said that nitrogen concentration near initial interface is limited to a certain quantity, so the excess nitrogen is redistributed within reoxidized layer and contribute to electron trap generation.

• Journal of Korean Ophthalmic Optics Society
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• v.5 no.2
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• pp.207-210
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• 2000

The SiC-TiC composites materials for glasses lens cutting were fabricated by hot-pressing and annealing. The amount of TiC was 0, 10, 20, 30wt% in the mixture of ${\beta}-SiC$. The microstructure of materials for glasses lens cutting was very dependent on the TiC amount. The introduction of larger amount of TiC improved fracture toughness, optical microscope and XRD analysis of the surface of samples were carried out. An in situ-toughened microstructure, consisted of distributed elongated SiC, matrix like TiC grains was developed by using ${\beta}-SiC$. Typical hardness and fracture toughness of materials for spectacle lens cutting were 14.9 GPa and $5.7MPa{\cdot}m^{1/2}$, respectively.

• Journal of the Korean institute of surface engineering
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• v.29 no.5
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• pp.415-423
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• 1996

Thin film technologies for fabricating SQUIDs involve etching and deposition procedures with the proper substrate materials and $YBa_2Cu_3O_{7-d}$ (YBCO) as the high $T_c$ superconductor. YBCO were prepared on various substrates of MgO, $SrTiO_3$, and $LaAlO_3$ by using off-axis magnetron sputtering methods and annealing in-situ. The parameters of film fabrication processes had been optimized to yield good quality films in terms of the critical temperature $T_c$ and the critical current density $J_c$. The optimized processes yielded $T_C$>90K along with $J_c$>$10_6A$$extrm{cm}^2$ at 77K and>$2\times10_7A/Cm^2$ at 5K. We fabricated step-edge type dc-SQUIDs and directly coupled magnetometers, producing step edges on MgO(100) substrates by etching with Ar-ion beam, depositing YBCO material on them, then patterning them by using ion-milling technique. Circuitizing washer-shape SQUIDs to possess a pair of step-edge junctions of 2-5$\mu$ line width with a high angle>$50^{\circ}C$ , we examined their I-V characteristics thoroughly and Shapiro steps clearly as we irradiate microwaves of 8-20 GHz frequency.

• Journal of the Korean Magnetics Society
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• v.14 no.3
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• pp.89-94
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• 2004

We have investigated magnetic properties of monolayer (ML)-thickness Co film deposited on InP(2${\times}$4) reconstruction surface using in situ Surface Magneto-Optical Kerr Effects (SMOKE) measurement system. InP(2${\times}$4) reconstruction surface, obtained by repeated sputtering and annealing, was confirmed by reflection hish energy electron diffraction (RHEED) and scanning tunneling microscope (STM) measurements. From both longitudinal and polar SMOKE measurements, we have observed three distinguishable regions showing different magnetic properties depending on the Co thickness. In the Co film thickness smaller than 7 $m\ell$, no SMOKE signal was detected. In the following thickness between 8 $m\ell$ and 15 $m\ell$, both longitudinal and polar Kerr hysteresis loops were observed, which implies a metastable phase coexisted of in-plane and perpendicular anisotropies. In the film thickness larger than 16 $m\ell$, only longitudinal MOKE signal without polar signal was detected, which implies existence of in-plane anisotropy in this thickness region.