• Title/Summary/Keyword: imprinting technique

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Novel Method for Urinary 1-Hydroxypyrene Measurement Using Molecular Imprinting (분자주형을 이용한 요중 1-hydroxypyrene의 측정 방법 개발)

  • Yim, Dong-Hyuk;Moon, Sun-In;Choi, Young-Sook;Park, Hee-Jin;Kim, Dae-Seon;Yu, Seung-Do;Lee, Chul-Ho;Kim, Yong-Dae;Kim, Heon
    • Journal of Life Science
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    • v.21 no.4
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    • pp.549-553
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    • 2011
  • This study was performed to determine whether or not urinary 1-hydroxypyrene (1-OHP) levels can be accurately detected by our 1-OHP-detecting $TiO_2$-Bead-HPLC assay that we developed based on the molecular imprinting method. Our method showed a variation coefficient of 4.97% and a between-day variation coefficient of 4.43%, suggesting that this may be a very stable method. In addition, the recovery rate of 1-OHP from a mixture of 1-OHP and similar substances using our $TiO_2$-Bead-HPLC method was estimated to be 105.6%. The correlation coefficient between the conventional enzyme-HPLC method and this new method was 0.74 (p<0.01) when the urine samples were tested. Based on this result, it is conceivable that our method could be a useful technique for measuring urinary 1-OHP levels. Moreover, our method has some advantages of being easier and less expensive than the conventional method. The results of this study suggest that our method can facilitate the development of a urine 1-OHP sensor using $TiO_2$-coating beads and that development of beads by molecular imprinting can be applied to analysis of chemicals other than 1-OHP.

Focused-Infrared-Light Assisted Roll-to-Roll Hot Embossing (Focused Infrared Light를 이용한 롤투롤 핫엠보싱)

  • Jo, Jeongdai;Kim, Wooseop;Kim, Kwang-Young;Choi, Young-Man
    • Journal of the Korean Society for Precision Engineering
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    • v.34 no.3
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    • pp.199-203
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    • 2017
  • Hot embossing techniques are used to engrave patterns on plastic substrates. Roll based hot embossing uses a heated roll for a continuous process. A heated roll with relief patterns is impressed on a preheated plastic substrate. Then, the substrate is cooled down quickly to prevent thermal shrinkage. The roll speed is normally very slow to ensure substrate temperature increase up to the glass transition temperature. In this paper, we propose a noncontact preheating technique using focused infrared light. The infrared light is focused as a line beam on a plastic substrate using an elliptical mirror just before entering the hot embossing roll. The mid range infrared light efficiently raises the substrate temperature. For preliminary tests, substrate deformation and temperature changes were monitored according to substrate speed. The experiments show that the proposed technique is a good possibility for high speed hot embossing.

Fabrication of Silicon Nanotemplate for Polymer Nanolens Array

  • Cho, Si-Hyeong;Kim, Hyuk-Min;Lee, Jung-Hwan;Venkatesh, R. Prasanna;Rizwan, Muhammad;Park, Jin-Goo
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.05a
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    • pp.37.1-37.1
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    • 2011
  • Miniaturization of lenses has been widely researched by various scientific and engineering techniques. As a result, micro scaled lens structure could be easily achieved from various fabrication techniques; nevertheless it is still challenging to make nano scaled lenses. This paper reports a novel fabrication method of silicon nanotemplate for nanolens array. The inverse structure of nanolens array was fabricated on silicon substrate by reactive ion etching (RIE) process. This technique has a flexibility to produce different tip shapes using different pattern masks. Once the silicon nano-tip array structure is well-defined using an optimized recipe, it is followed by polymer molding to duplicate nanolens array from the template. Finally, the nanostructures formed on silicon nanotemplate and polymer replica were investigated using FE-SEM and AFM measurements. The nano scaled lens can be manufactured from the same template, also using other replication techniques such as imprinting, injection molding and so on.

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A Study on Stamp Process Life Time in Thermal NIL (Thermal NIL 용 스탬프 공정 수명에 관한 연구)

  • Cho, Cheon-Soo;Lee, Moon-Jae;Oh, Ji-In;Lim, O-Kaung;Jeong, Myung-Yung
    • Journal of the Korean Society for Precision Engineering
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    • v.28 no.2
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    • pp.239-244
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    • 2011
  • Nano Imprint Lithography(NIL) is technique for copying a pattern from stamp with nano size pattern in order to replicated the materials. It is very important to demold in order to make NIL process effectively. Self Assembled Monolayers(SAM) coater is manufactured by means of decreasing surface energy with the stamp surface treatment to improve release characteristics. Manufactured device contains tilting and rotation option for increasing process life time by coating on the sidewall of the pattern in stamp. The stamp coated with optimized tilting angle $30^{\circ}$ and rotation speed of 10rpm has more imprinting cycles than the stamping coated without tilting and rotation. Effective SAM coating on the sidewall of the pattern in stamp will improve by 50% of process life time.

PDMS Stamp Fabrication for Photonic Crystal Waveguides (광자결정 도파로 성형용 PDMS 스탬프 제작)

  • Oh, Seung-Hun;Choi, Du-Seon;Kim, Chang-Seok;Jeong, Myung-Yung
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.4 s.193
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    • pp.153-158
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    • 2007
  • Recently nano imprint lithography to fabricate photonic crystal on polymer is preferred because of its simplicity and short process time and ease of precise manufacturing. But, the technique requires the precise mold as an imprinting tool for good replication. These molds are made of the silicon, nickel and quartz. But this is not desirable due to complex fabrication process, high cost. So, we describe a simple, precise and low cost method of fabricating PDMS stamp to make the photonic crystals. In order to fabricate the PDMS mold, we make the original pattern with designed hole array by finding the optimal electron beam writing condition. And then, we have tried to fabricate PDMS mold by the replica molding with ultrasonic vibration and pressure system. We have used the cleaning process to solve the detaching problem on the interface. Using these methods, we acquired the PDMS mold for photonic crystals with characteristics of a good replication. And the accuracy of replication shows below 1% in 440nm at diameter and in 610nm at lattice constant by dimensional analysis by SEM and AFM.

Contact block copolymer technique을 이용한 실리콘 나노-필라 구조체 제작방법

  • Kim, Du-San;Kim, Hwa-Seong;Park, Jin-U;Yun, Deok-Hyeon;Yeom, Geun-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.189-189
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    • 2015
  • Plasmonics, sensor, field effect transistors, solar cells 등 다양한 적용분야를 가지는 실리콘 구조체는 제작공정에 의해 전기적 및 광학적 특성이 달라지기 때문에 적합한 나노구조 제작방법이 요구되고 있다. 나노구조체 제작방법으로는 Photo lithography, Extreme ultraviolet lithography (EUV), Nano imprinting lithography (NIL), Block copolymer (BCP) 방식의 방법들이 연구되고 있으며, 특히 BCP는 direct self-assembly 특성을 가지고 있으며 가격적인 면에서도 큰 장점을 가진다. 하지만 BCP를 mask로 사용하여 식각공정을 진행할 경우 BCP가 버티지 못하고 변형되어 mask로서의 역할을 하지 못한다. 이러한 문제를 해결하기 위하여 본 논문에서는 BCP와 질화막을 이용한 double mask 방법을 사용하였다. 기판 위에 BCP를 self-assembly 시키고 mask로 사용하여 hole 부분으로 노출된 기판을 Ion gun을 통해 질화 시킨 후에 BCP를 제거한다. 기판 위에 hole 모양의 질화막 표면은 BCP와 다르게 etching 공정 중 변형되지 않는다. 이러한 질화막 표면을 mask로 사용하여 pillar pattern의 실리콘 나노구조체를 제작하였다. 질화막 mask로 사용되는 template은 PS와 PMMA로 구성된 BCP를 사용하였다. 140kg/mol의 polystyrene과 65kg/mol의 PMMA를 톨루엔으로 용해시키고 실리콘 표면 위에 spin coating으로 도포하였다. Spin coat 후 230도에서 40시간 동안 열처리를 진행하여 40nm의 직경을 가진 PS-b-PMMA self-assembled hole morphology를 형성하였다. 질화막 형성 및 etching을 위한 장비로 low-energy Ion beam system을 사용하였다. Reactive Ion beam은 ICP와 3-grid system으로 구성된 Ion gun으로부터 형성된다. Ion gun에 13.56 MHz의 frequency를 갖는 200W 전력을 인가하였다. Plasma로부터 나오는 Ion은 $2{\Phi}$의 직경의 hole을 가지는 3-grid hole로 추출된다. 10~70 voltage 범위의 전위를 plasma source 바로 아래의 1st gird에 인가하고, 플럭스 조절을 위해 -150V의 전위를 2nd grid에 인가한다. 그리고 3rd grid는 접지를 시켰다. chamber내의 질화 및 식각가스 공급은 2mTorr로 유지시켰다. 그리고 기판의 온도는 냉각칠러를 이용하여 -20도로 냉각을 진행하였다. 이와 같은 공정 결과로 100 nm 이상의 높이를 갖는 40 nm직경의 균일한 Silicon pillar pattern을 형성 할 수 있었다.

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A Study on the application of landscape material in commercial space design (상업공간디자인에 있어 자연경관 요소의 적용에 관한 연구)

  • Woo, Ji-Yeon
    • Korean Institute of Interior Design Journal
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    • v.17 no.3
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    • pp.43-50
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    • 2008
  • Commercial space, the types of which have been increasingly various and changing rapidly, has been generating new marketing concepts for space. Especially as the environmentally friendly lifestyle spreads around, the component of natural landscape such as plant, stone, or water has been used as an important part in space design, freshly imprinting the brand image beyond the idea of simple interior property. By combining commercial space design with 'the component of the natural landscape', we can improve the brand image, create the newness in the space, lead customers to stay longer in the space, and reinforce the decorative effect. The parts of the commercial space to which we can apply the element of natural landscape are facades, walls, floors, and show windows. Various examples of real application are found according to the areas of business and goods displayed. This thesis attempts to maximize the effect of commercial space by examining and analyzing various instances of space and provide the ways of applying the space that contains an aesthetic value. For the research, 60 articles, theses, reports that have the keyword related to interior landscape and marketing strategy in commercial space were used as references. From the references, 70 cases were selected and analyzed to find landscape application patterns. Also, 4 store cases that landscape application have been the key to their success were selected for the survey. In doing this, I presented the readers with the packaging technique which improves brand image, the effect of stage direction which helps sensitive communication with users, the application as interior structure and the effect of an object that is useful to aesthetic effect in the commercial space. Finally, I endeavored to provide possible problems to be produced when applying the natural element in the commercial space and matters to be attended to in the management.

Fabrication and Characterization of Silver Copper(I) Oxide Nanoparticles for a Conductive Paste (은이 코팅된 Copper(I) Oxide 나노 입자 및 도전성 페이스트의 제조 특성)

  • Park, Seung Woo;Son, Jae Hong;Sim, Sang Bo;Choi, Yeon Bin;Bae, Dong Sik
    • Korean Journal of Materials Research
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    • v.29 no.1
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    • pp.37-42
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    • 2019
  • This study investigates Ag coated $Cu_2O$ nanoparticles that are produced with a changing molar ratio of Ag and $Cu_2O$. The results of XRD analysis reveal that each nanoparticle has a diffraction pattern peculiar to Ag and $Cu_2O$ determination, and SEM image analysis confirms that Ag is partially coated on the surface of $Cu_2O$ nanoparticles. The conductive paste with Ag coated $Cu_2O$ nanoparticles approaches the specific resistance of $6.4{\Omega}{\cdot}cm$ for silver paste(SP) as $(Ag)/(Cu_2O)$ the molar ratio increases. The paste(containing 70 % content and average a 100 nm particle size for the silver nanoparticles) for commercial use for mounting with a fine line width of $100{\mu}m$ or less has a surface resistance of 5 to $20{\mu}{\Omega}{\cdot}cm$, while in this research an Ag coated $Cu_2O$ paste has a larger surface resistance, which is disadvantageous. Its performance deteriorates as a material required for application of a fine line width electrode for a touch panel. A touch panel module that utilizes a nano imprinting technique of $10{\mu}m$ or less is expected to be used as an electrode material for electric and electronic parts where large precision(mounting with fine line width) is not required.

The Surface Treatment Effect for Nanoimprint Lithography using Vapor Deposition of Silane Coupling Agent (나노임프린트 공정에서 실란커플링제 기상증착을 이용한 표면처리 효과)

  • Lee, Dong-Il;kim, Ki-Don;Jeong, Jun-Ho;Lee, Eung-Sug;Choi, Dae-Geun
    • Korean Chemical Engineering Research
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    • v.45 no.2
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    • pp.149-154
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    • 2007
  • Nanoimprint lithography (NIL) is useful technique because of its low cost and high throughput capability for the fabrication of sub-micrometer patterns which has potential applications in micro-optics, magnetic memory devices, bio sensors, and photonic crystals. Usually, a chemical surface treatment of the stamp is needed to ensure a clean release after imprinting and to protect the expensive original master against contamination. Meanwhile, adhesion promoter between resin and substrate is also important in the nanoscale pattern. In this work, we have investigated the effect of surface treatment using silane coupling agent as release layer and adhesion promoter for UV-Nanoimprint lithography. Uniform SAM (self-assembled monolayer) could be fabricated by vapor deposition method. Vapor phase process eliminates the use of organic solvents and greatly simplifies the handling of the sample. It was also proven that 3-acryloxypropyl methyl dichlorosilane (APMDS) could strongly improve the adhesion force between resin and substrate compared with common planarization layer such as DUV-30J or oxygen plasma treatment.