A Study on Stamp Process Life Time in Thermal NIL

Thermal NIL 용 스탬프 공정 수명에 관한 연구

  • Cho, Cheon-Soo (Department of Intelligent Machinery System, Pusan Nat'l Univ.) ;
  • Lee, Moon-Jae (Department of Cogno-Mechatronics Engineering, Pusan Nat'l Univ.) ;
  • Oh, Ji-In (Department of Cogno-Mechatronics Engineering, Pusan Nat'l Univ.) ;
  • Lim, O-Kaung (Department of Intelligent Machinery System, Pusan Nat'l Univ.) ;
  • Jeong, Myung-Yung (Department of Cogno-Mechatronics Engineering, Pusan Nat'l Univ.)
  • 조천수 (부산대학교 지능기계시스템공학과) ;
  • 이문재 (부산대학교 인지메카트로닉스공학과) ;
  • 오지인 (부산대학교 인지메카트로닉스공학과) ;
  • 임오강 (부산대학교 지능기계시스템공학과) ;
  • 정명영 (부산대학교 인지메카트로닉스공학과)
  • Received : 2010.08.02
  • Accepted : 2010.11.25
  • Published : 2011.02.01

Abstract

Nano Imprint Lithography(NIL) is technique for copying a pattern from stamp with nano size pattern in order to replicated the materials. It is very important to demold in order to make NIL process effectively. Self Assembled Monolayers(SAM) coater is manufactured by means of decreasing surface energy with the stamp surface treatment to improve release characteristics. Manufactured device contains tilting and rotation option for increasing process life time by coating on the sidewall of the pattern in stamp. The stamp coated with optimized tilting angle $30^{\circ}$ and rotation speed of 10rpm has more imprinting cycles than the stamping coated without tilting and rotation. Effective SAM coating on the sidewall of the pattern in stamp will improve by 50% of process life time.

Keywords

References

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