• Current Optics and Photonics
• /
• 제6권4호
• /
• pp.375-380
• /
• 2022

We demonstrate two types of light field displays based on waveguide grating coupler arrays: a line beam type and a point source type. Ultra violet imprinting of an array of diffractive nanograting cells on the top surface of a 50-㎛-thin slab waveguide can deliver a line beam or a point beam to a multidirectional light field out of the waveguide slab. By controlling the grating vectors of the nanograting cells, the waveguide modes are externally coupled to specific viewing angles to create a multidirectional light field display. Nanograting cells with periods of 300 nm-518 nm and slanted angles of -8.5°~+8.5° are fabricated by two-beam interference lithography on a 40 mm × 40 mm slab waveguide for seven different viewpoints. It is expected that it will be possible to realize a very thin and flexible panel that shows multidirectional light field images through the waveguide-type diffraction display.

• Asian-Australasian Journal of Animal Sciences
• /
• 제26권12호
• /
• pp.1680-1688
• /
• 2013

Many different approaches have been developed to improve the efficiency of animal cloning by somatic cell nuclear transfer (SCNT), one of which is to modify histone acetylation levels using histone deacetylase inhibitors (HDACi) such as trichostatin A (TSA). In the present study, we examined the effect of TSA on in vitro development of porcine embryos derived from SCNT. We found that TSA treatment (50 nM) for 24 h following oocyte activation improved blastocyst formation rates (to 22.0%) compared with 8.9% in the non-treatment group and total cell number of the blastocysts for determining embryo quality also increased significantly ($88.9{\rightarrow}114.4$). Changes in histone acetylation levels as a result of TSA treatment were examined using indirect immunofluorescence and confocal microscopy scanning. Results showed that the histone acetylation level in TSA-treated embryos was higher than that in controls at both acetylated histone H3 lysine 9 (AcH3K9) and acetylated histone H4 lysine 12 (AcH4K12). Next, we compared the expression patterns of seven genes (OCT4, ID1; the pluripotent genes, H19, NNAT, PEG1; the imprinting genes, cytokeratin 8 and 18; the trophoblast marker genes). The SCNT blastocysts both with and without TSA treatment showed lower levels of OCT4, ID1, cytokeratin 8 and 18 than those of the in vivo blastocysts. In the case of the imprinting genes H19 and NNAT, except PEG1, the SCNT blastocysts both with and without TSA treatment showed higher levels than those of the in vivo blastocysts. Although the gene expression patterns between cloned blastocysts and their in vivo counterparts were different regardless of TSA treatment, it appears that several genes in NT blastocysts after TSA treatment showed a slight tendency toward expression patterns of in vivo blastocysts. Our results suggest that TSA treatment may improve preimplantation porcine embryo development following SCNT.

• 한국기계가공학회지
• /
• 제16권1호
• /
• pp.96-101
• /
• 2017

We have developed a compact desktop-sized nanopatterning system driven by the Roll-to-Roll (R2R) nanoimprinting (NIL) principle. The system realizes the continuous and high-speed stamping of various nanoscale patterns on a large-area flexible substrate without resorting to ponderous and complicated instruments. We first lay out the process principle based on continuous NIL on a UV-curable resin layer using a flexible nanopatterned mold. We then create conceptual and specific designs for the system by focusing on two key processes, imprinting and UV curing, which are performed in a continuous R2R fashion. We build a system with essential components and optimized modules for imprinting, UV curing, and R2R conveying to enable simple but effective nanopatterning within the desktop volume. Finally, we demonstrate several nanopatterning results such as nanolines and nanodots, which are obtained by operating the built desktop R2R NIL system on transparent and flexible substrates. Our system may be further utilized in the scalable fabrication of diverse flexible nanopatterns for many functional applications in optics, photonics, sensors, and energy harvesters.

• 한국재료학회지
• /
• 제16권4호
• /
• pp.225-230
• /
• 2006

Nanoimprint lithography (NIL) is a novel method of fabricating nanometer scale patterns. It is a simple process with low cost, high throughput and resolution. NIL creates patterns by mechanical deformation of an imprint resist and physical contact process. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting process. Stiction between the resist and the stamp is resulted from this physical contact process. Stiction issue is more important in the stamps including narrow pattern size and wide area. Therefore, the antistiction layer coating is very effective to prevent this problem and ensure successful NIL. In this paper, an antistiction layer was deposited and characterized by PECVD (plasma enhanced chemical vapor deposition) method for metal stamps. Deposition rates of an antistiction layer on Si and Ni substrates were in proportion to deposited time and 3.4 nm/min and 2.5 nm/min, respectively. A 50 nm thick antistiction layer showed 90% relative transmittance at 365 nm wavelength. Contact angle result showed good hydrophobicity over 105 degree. $CF_2$ and $CF_3$ peaks were founded in ATR-FTIR analysis. The thicknesses and the contact angle of a 50 nm thick antistiction film were slightly changed during chemical resistance test using acetone and sulfuric acid. To evaluate the deposited antistiction layer, a 50 nm thick film was coated on a stainless steel stamp made by wet etching process. A PMMA substrate was successfully imprinting without pattern degradations by the stainless steel stamp with an antistiction layer. The test result shows that antistiction layer coating is very effective for NIL.

• Reproductive and Developmental Biology
• /
• 제36권1호
• /
• pp.33-37
• /
• 2012

Differential capacity of the parthenogenetic embryonic stem cells (PESCs) is still under controversy and the mechanisms of its neural induction are yet poorly understood. Here we demonstrated neural lineage induction of PESCs by addition of insulin-like growth factor-2 (Igf2), which is an important factor for embryo organ development and a paternally expressed imprinting gene. Murine PESCs were aggregated to embryoid bodies (EBs) by suspension culture under the leukemia inhibitory factor-free condition for 4 days. To test the effect of exogenous Igf2, 30 ng/ml of Igf2 was supplemented to EBs induction medium. Then neural induction was carried out with serum-free medium containing insulin, transferrin, selenium, and fibronectin complex (ITSFn) for 12 days. Normal murine embryonic stem cells derived from fertilized embryos (ESCs) were used as the control group. Neural potential of differentiated PESCs and ESCs were analyzed by immunofluorescent labeling and real-time PCR assay (Nestin, neural progenitor marker; Tuj1, neuronal cell marker; GFAP, glial cell marker). The differentiated cells from both ESC and PESC showed heterogeneous population of Nestin, Tuj1, and GFAP positive cells. In terms of the level of gene expression, PESC showed 4 times higher level of GFAP expression than ESCs. After exposure to Igf2, the expression level of GFAP decreased both in derivatives of PESCs and ESCs. Interestingly, the expression level of $Tuj1$ increased only in ESCs, not in PESCs. The results show that IGF2 is a positive effector for suppressing over-expressed glial differentiation during neural induction of PESCs and for promoting neuronal differentiation of ESCs, while exogenous Igf2 could not accelerate the neuronal differentiation of PESCs. Although exogenous Igf2 promotes neuronal differentiation of normal ESCs, expression of endogenous $Igf2$ may be critical for initiating neuronal differentiation of pluripotent stem cells. The findings may contribute to understanding of the relationship between imprinting mechanism and neural differentiation and its application to neural tissue repair in the future.

• 생물환경조절학회지
• /
• 제6권2호
• /
• pp.71-79
• /
• 1997

바이오 그린 기능수는 지하수 순수화$\longrightarrow$처리 촉매제 첨가$\longrightarrow$에너지 imprinting$\longrightarrow$여과 과정을 거쳐 제조되는 미약 에너지 발생 신소재로서 10년생 사과 쓰가루/M26 품종의 수관하부에 1995년 4월 20일, 5월 20일 및 6월 20일 ‘바이오 그린’ 기능수를 주당 0, 5, l0$\ell$씩 관주 처리하여 얻어진 결과는 다음과 같다. 사과원 토양의 화학적 특성에 있어서 무처리구의 pH 5.73에 비하여 기능수 처리구는 pH 6.31-6.43이었고, 기능수 처리에 의하여 치환성 Ca 및 Mg 함량이 증가되었다. 한편 P$_2$ $O_{5}$, K 및 B 함량은 차이가 인정되지 않았다. 기능수 처리에 의하여 수확기 사과 과실의 당함량과 과피의 안토시아닌 함량이 증가되었고, Ca 함량이 현저히 증가되었다. 그러나 N, K, Mg는 처리간에 차이가 없었다. 기능수가 처리된 사과의 수체특성에 있어서 뿌리활력과 잎의 광합성 능력이 향상되었다. 과실 저장중 (4$^{\circ}C$) 기능수 처리구의 과실은 고두병 발생이 현저히 감소되었고, 호흡과 에틸렌 발생량이 상대적으로 적었으며, 높은 과실 경도를 나타냄으로써 과실 저장력이 향상되었다.

• Journal of Genetic Medicine
• /
• 제7권2호
• /
• pp.133-137
• /
• 2010

목 적: Beckwith-Wiedemann 증후군(BWS)은 11p15 부위의 메칠화 양상의 이상으로 인한 overgrowth malformation symdrome이다. 11p15 부위에는 두 가지 imprinting center, 즉BWSIC1 (IGF2, H19)와 BWSIC2 (LIT1,KvDMR)가 존재한다. 본 연구에서는 methylation-specific (MS) PCR RFLP 방법을 이용한 BWS의 유전적 진단을 보고하고자 한다. 대상 및 방법: 임상 소견을 바탕으로 12명의 BWS 환자가 포함되었다. 환자의 말초혈액으로부터 염색체 핵형을 조사하였다. 분리한 DNA에 bisulfite를 처리한 후, LIT1, H19, IGF2 DMR부위는 각각의 MS primer를 이용하여 증폭하였다. 적절한 제한효소를 이용하여 절단 여부를 PAGE로 확인함으로써 각각의 DMR 부위에 대한 메칠화 이상 여부를 확인하였다. 결 과: 12명의 환자는 모두 정상 핵형을 보였다. MS-PCR RFLP 상 총 7명(53.8%)의 환자가 이상 소견을 보였으며, 모두 BWSIC2 (LIT1)에 비정상적 메칠화를 보였고 모두 부계 유래의 비메칠화된 allele만이 발견되었다. 결 론: 본 연구를통해MS-PCR RFLP 검사로BWS 환자의 약 50-60% 정도에서 유전적 진단이 가능함을 알 수 있었으며, 이는 BWSIC2 부위의 메칠화 이상을 발견하는데 손쉽게 이용될 수 있을 것으로 판단된다. 그러나, BWSIC1 부위의 메칠화 이상은 발견이 어려우며, 이 부위의 이상을 발견하기 위해서는 메칠화를 정량적으로 분석할 수 있는 방법이 필요하다.

• 청정기술
• /
• 제28권4호
• /
• pp.323-330
• /
• 2022

미세유체 종이-기반 분석 장치는 최근 현장 진단 및 환경 물질 감지를 포함한 다양한 적용가능성으로 주목을 받고 있다. 본 연구는 적은 비용과 간단한 검출 방법으로 중금속을 빠르게 검출할 수 있는 3D-μPAD를 제작하기 위해 PDMS 양면 인쇄 방법을 제안하였다. 3D-μPAD 디자인은 레이저 커팅으로 아크릴 스탬프에 적용할 수 있으며, 제작된 스탬프에 PDMS 고분자를 스핀 코팅 후 양면접촉인쇄 방식 도입을 통해 3차원 형태의 소수성 장벽 형성에 필요한 조건을 확인하였다. 구체적으로 소수성 장벽 형성 조건인 고분자 농도, 스핀 코팅 속도 및 접촉 시간에 따라 PDMS 소수성 장벽 면적과 친수성 채널의 면적 변화를 분석함으로써 3D-μPAD 제작 공정 조건 최적화를 수행하였다. 최적화된 μPAD로 니켈, 구리, 수은 이온, pH를 다양한 농도에서 검출하였고 이를 ImageJ 프로그램으로 분석하여 grayscale 값으로 정량화 하였다. 이를 통해 3D-μPAD를 제작함으로써 특별한 분석 기기 없이 다양한 중금속 비색 검출을 수행함으로써 조기진단 바이오 센서로의 응용 가능성을 증명하였다. 이 3D-μPAD는 휴대가 간편한 다중 금속이온 검출 바이오센서로서, 신속한 현장 모니터링이 가능하므로 개발도상국 같은 자원이 제한된 지역에서 유용하게 사용 가능하다.

• 한국정밀공학회지
• /
• 제34권3호
• /
• pp.199-203
• /
• 2017

Hot embossing techniques are used to engrave patterns on plastic substrates. Roll based hot embossing uses a heated roll for a continuous process. A heated roll with relief patterns is impressed on a preheated plastic substrate. Then, the substrate is cooled down quickly to prevent thermal shrinkage. The roll speed is normally very slow to ensure substrate temperature increase up to the glass transition temperature. In this paper, we propose a noncontact preheating technique using focused infrared light. The infrared light is focused as a line beam on a plastic substrate using an elliptical mirror just before entering the hot embossing roll. The mid range infrared light efficiently raises the substrate temperature. For preliminary tests, substrate deformation and temperature changes were monitored according to substrate speed. The experiments show that the proposed technique is a good possibility for high speed hot embossing.

• 한국재료학회:학술대회논문집
• /
• 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
• /
• pp.71-71
• /
• 2003

Hot embossing has been widely accepted as an alternative to photolithography in generating patterns on polymeric substrates. The optimization of embossing process should be accomplished based on polymer substrate materials. In this paper, the effect of polymer substrates on nano scale hot embossing process was studied. Silicon molds with nano size patterns were fabricated by e-beam direct writing. Molds were coated with self-assembled monolayer (SAM) of (1, 1, 2.2H -perfluorooctyl)-trichlorosilane to reduce the stiction between mold and substrates. For an embossing, pressure of 55, 75 bur, embossing time of 5 min and temperature of above transition temperature were peformed. Polymethylmethacrylates (PMMA) with different molecular weights of 450,000 and 950,000, MR-I 8010 polymer (Micro Resist Technology) and polyaliphatic imide copolymer were applied for hot embossing process development in nano size. These polymers were spun coated on the Si wafer with the thickness between 150 and 200 nm. The nano size patterns obtained after hot embossing were observed and compared based on the polymer properties by scanning electron microscopy (SEM). The imprinting uniformity dependent on the Pattern density and size was investigated. Four polymers have been evaluated for the nanoimprint By optimizing the process parameters, the four polymers lead to uniform imprint and good pattern profiles. A reduction in the friction for smooth surfaces during demoulding is possible by polymer selection.