• Proceedings of the Korean Society of Precision Engineering Conference
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• 2013.05a
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• pp.633-634
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• 2013

• Journal of the Microelectronics and Packaging Society
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• v.12 no.4 s.37
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• pp.275-280
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• 2005

We propose a new approach to greatly simplify the fabrication of conventional nanoimprint lithography (NIL) by combined nanoimprint and photolithography (CNP). We introduce a hybrid mask mold (HMM) made from UV transparent material with a UV-blocking Cr metal layer placed on top of the mold protrusions. We used a negative tone photo resist (PR) with higher selectivity to substrate the CNP process instead of the UV curable monomer and thermal plastic polymer that has been commonly used in NIL. Self-assembled monolayer (SAM) on HMM plays a reliable role for pattern transfer when the HMM is separated from the transfer layer. Hydrophilic $SiO_2$ thin film was deposited on all parts of the HMM, which improved the formation of SAM. This $SiO_2$ film made a sub-10nm formation without any pattern damage. In the CNP technique with HMM, the 'residual layer' of the PR was chemically removed by the conventional developing process. Thus, it was possible to simplify the process by eliminating the dry etching process, which was essential in the conventional NIL method.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.39 no.1
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• pp.71-77
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• 2015

Ultrasonic imprinting is a micropattern replication technology for a thermoplastic polymer surface that uses ultrasonic vibration energy; it has the advantages of a short cycle time and low energy consumption. Recently, ultrasonic imprinting has been further developed to extend its functionality: (i) selective ultrasonic imprinting using mask films and (ii) repetitive ultrasonic imprinting for composite pattern development. In this study, selective ultrasonic imprinting was combined with repetitive imprinting in order to replicate versatile micropatterns. For this purpose, a repetitive imprinting technology was further extended to utilize mask films, which enabled versatile micropatterns to be replicated using a single mold with micro-prism patterns. The replicated hybrid micropatterns were optically evaluated through laser light images, which showed that versatile optical diffusion characteristics can be obtained from the hybrid micropatterns.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2005.09a
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• pp.147-150
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• 2005

We process a novel approach cal led combined nanoimprint and photolithography (CNP) to greatly simplify the fabrication in conventional nanoimprint lithography (NIL). In this study, a novel HMM with anti-sticking $SiO_2$ layer is introduced to improve the quality of transferred pattern. The surface property was investigated using contact angle measurement and spectrophotometer. Replicate pattern with CNP using HMM showed complete pattern transfer without defect.