Proceedings of the Korean Society Of Semiconductor Equipment Technology (한국반도체및디스플레이장비학회:학술대회논문집)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
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Characteristics of hybrid mask mold for combined nanoimprint and photolithography technique

  • MOON KANSHUN (Division of Materials Science and Engineering, Hanyang University) ;
  • CHOI BANGLIM (Division of Materials Science and Engineering, Hanyang University) ;
  • PARK IN-SUNG (Information Display Research Institute, Hanyang University) ;
  • HONG SUNSHUM (Division Materials Science and Engineering, Koreas University) ;
  • YANG KIHYUN (Division Materials Science and Engineering, Koreas University) ;
  • LEE HEON (Division Materials Science and Engineering, Koreas University) ;
  • AHN JINHO (Division of Materials Science and Engineering, Hanyang University, Information Display Research Institute, Hanyang University)
  • Published : 2005.09.01
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Abstract

We process a novel approach cal led combined nanoimprint and photolithography (CNP) to greatly simplify the fabrication in conventional nanoimprint lithography (NIL). In this study, a novel HMM with anti-sticking $SiO_2$ layer is introduced to improve the quality of transferred pattern. The surface property was investigated using contact angle measurement and spectrophotometer. Replicate pattern with CNP using HMM showed complete pattern transfer without defect.

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