• 제목/요약/키워드: high uniformity

검색결과 987건 처리시간 0.042초

피에조 필름을 이용한 축중감지기 개발 (Development of a Weight in Motion sensor using Piezo Film)

  • 양희선;박연규;강대임;김엄기
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2000년도 추계학술대회논문집A
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    • pp.262-267
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    • 2000
  • This paper describes a weight in motion(WIM) sensor to measure the weight of a vehicle in motion. The main sensing element of the WIM sensor is the PVDF(Polyvinylidene fluoride) film that shows rapid response to an external excitation. Due to the property of rapid response, it is possible to measure the weight of a vehicle in motion with high speed. In the development of the WIM sensor, the dominant target value was the uniformity of the sensor. To increase the uniformity, We employed shrinkable tube made of rubber to enhance the uniformity, and performed the rolling of the brass tube repeatedly. The uniformity of the sensor was examined experimentally. It was comparable to that of a WIM sensor of the MSI which was the benchmark of this development. This paper also describes the mechanical modeling of the sensor and the suitable charge amplifier for the sensor.

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점적관개 시설의 관개균일도 및 성능 평가 (Discharge Uniformity and Performance Assessment of Drip Irrigation System)

  • 남원호;최진용;최순군;홍은미;전상호;허승오
    • 한국농공학회논문집
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    • 제54권4호
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    • pp.29-38
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    • 2012
  • Drip irrigation is a affordable irrigation under structured cultivation. Drip irrigation system with high uniformity can be achieved through effective design, maintenance and management of irrigation systems. Nevertheless the design guidelines have not been established for the drip irrigation system products in domestic and imported considering cultivation method and greenhouse environment in Korea. The objectives of this study were to evaluate the performance of drip irrigation system with uniformity through an experiment. The experiment was conducted to study with nine different types of emitters produced in domestic and imported. Hazen-Williams coefficients were also estimated for the drip emitter through hydraulic simulation for design use. It was found that approximately 91.5 % for 10 cm emitter spacing and 96.2 % for 30 cm emitter spacing of statistical uniformity were observed in respectively. Average emission uniformity was decreased as the reduction of emitter spacing. The results would be used in the drip irrigation system design and guideline construction.

입구 및 출구 형상 변화에 따른 촉매 삽입형 머플러 내부의 유동 해석 (A Numerical Study on the Flow Characteristics in the Catalytic Muffler with Different Inlet and Outlet Configurations)

  • 안태현;이승엽;박윤범;김만영
    • 한국자동차공학회논문집
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    • 제21권5호
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    • pp.59-66
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    • 2013
  • Lack of the space in many diesel vehicles make it difficult to design and install the catalytic muffler to reduce emissions. For this reason, inlet part of the catalytic muffler is made of L-type which has lower flow uniformity than conventional I-type, and catalytic muffler has complex internal structure by various insertions, which affect the flow uniformity and pressure drop of the systems. In this work, the flow characteristics such as flow uniformity and pressure drop have been numerically investigated by changing such various geometries as inlet shape, porosity, and outlet shape inside the muffler with the three-dimensional turbulent incompressible flow solver. Total 4 different cases are considered in order to find optimal configurations of the catalytic muffler in view of high flow uniformity and low pressure drop. The results show that Case 2 which has no induction cone and outlet perforated pipe has higher uniformity index and lower pressure drop than others considered in this work.

점적관개에 따른 토양수분 재분배 균일성 평가 (Uniformity Assessment of Soil Moisture Redistribution for Drip Irrigation)

  • 최순군;최진용;남원호;허승오;김학진;정선옥;한경화
    • 한국농공학회논문집
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    • 제54권3호
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    • pp.19-28
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    • 2012
  • Greenhouse cultivation has been increasing for high quality and four season crop production in South Korea. For the cultivation in a greenhouse, maintaining adequate soil moisture at each crop growth stage is quite important for yield stability and quality while the behavior of moisture movement in the soil has complexity and adequate moisture conditions for crops are vary. Drip irrigation systems have been disseminated in the greenhouse cultivation due to advantages including irrigation convenience and efficiency without savvy consideration of the soil moisture redistribution. This study aims to evaluate soil moisture movement of drip irrigation according to the soil moisture uniformity assessment. Richards equation and finite difference scheme were adapted to simulate soil moisture behavior in soil. Soil container experiment was conducted and the model was validated using the data from the experiment. Two discharge rate (1 ${\ell}/hr$ and 2 ${\ell}/hr$) and three spaces between the emitters (10 cm, 20 cm, and 30 cm) were used for irrigation system evaluation. Christiansen uniformity coefficient was also calculated to assess soil moisture redistribution uniformity. The results would propose design guidelines for drip irrigation system installation in the greenhouse cultivation.

온도 균일도 향상을 위한 대면적 서셉터의 설계 및 성능 시험 (Design and Performance Test of Large-Area Susceptor for the Improvement of Temperature Uniformity)

  • 양학진;김성근;조중근
    • 한국산학기술학회논문지
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    • 제16권6호
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    • pp.3714-3721
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    • 2015
  • 서셉터 히터에서 쉬스 열선을 사용하는 방법이 일반화되어 있지만, 대면적 초고온 조건에서는 서셉터의 온도 균일도 성능 저하의 문제가 있다. 본 연구에서는 온도균일도 성능을 향상시킬 수 있도록 판형 형태의 열선을 기본으로 새로운 서셉터를 설계하여 프로토타입을 개발하였다. 표면 온도 $450^{\circ}C$의 고온에서 1.4% 이내로 온도 균일도가 시제작된 서셉터에서 검증될 수 있었다. 또한 온도 학습 데이터를 이용하여 측정 온도 데이터를 예측할 수 있는 커널 회귀 알고리즘을 개발하고, 이러한 예측 데이터와 측정 데이터의 비교 분석으로 균일도 측정 온도의 신뢰성을 확인할 수 있었다.

The Study on the Uniformity, Deposition Rate of PECVD SiO2 Deposition

  • Eun Hyeong Kim;Yoon Hee Choi;Hyeon Ji Jeon;Woo Hyeok Jang;Garam Kim
    • 반도체디스플레이기술학회지
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    • 제23권2호
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    • pp.87-91
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    • 2024
  • SiO2, renowned for its excellent insulating properties, has been used in the semiconductor industry as a valuable dielectric material. High-quality SiO2 films find applications in gate spacers and interlayer insulation gap-fill oxides, among other uses. One of the prevalent methods for depositing these SiO2 films is plasma enhanced chemical vapor deposition (PECVD) favored for its relatively low processing costs and ability to operate at low temperatures. However, compared to the increasingly utilized atomic layer deposition (ALD) method, PECVD exhibits inferior film characteristics such as uniformity. This study aims to produce SiO2 films with uniformity as close as possible to those achieved by ALD through the adjustment of PECVD process parameters. we conducted a total of nine PECVD processes, varying the process time and gas flow rates, which were identified as the most influential factors on the PECVD process. Furthermore, ellipsometry analysis was employed to examine the uniformity variations of each process. The experimental results enabled us to elucidate the relationship between uniformity and deposition rate, as well as the impact of gas flow rate and deposition time on the process outcomes. Additionally, thickness measurements obtained through ellipsometer facilitate the identification of optimal process parameters for PECVD.

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입자추적 유동해석을 이용한 초음파분무화학기상증착 균일도 예측 연구 (Uniformity Prediction of Mist-CVD Ga2O3 Thin Film using Particle Tracking Methodology)

  • 하주환;박소담;이학지;신석윤;변창우
    • 반도체디스플레이기술학회지
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    • 제21권3호
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    • pp.101-104
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    • 2022
  • Mist-CVD is known to have advantages of low cost and high productivity compared to ALD and PECVD methods. It is capable of reacting to the substrate by misting an aqueous solution using ultrasonic waves under vacuum-free conditions of atmospheric pressure. In particular, Ga2O3 is regarded as advanced power semiconductor material because of its high quality of transmittance, and excellent electrical conductivity through N-type doping. In this study, Computational Fluid Dynamics were used to predict the uniformity of the thin film on a large-area substrate. And also the deposition pattern and uniformity were analyzed using the flow velocity and particle tracking method. The uniformity was confirmed by quantifying the deposition cross section with an FIB-SEM, and the consistency of the uniformity prediction was secured through the analysis of the CFD distribution. With the analysis and experimental results, the match rate of deposition area was 80.14% and the match rate of deposition thickness was 55.32%. As the experimental and analysis results were consistent, it was confirmed that it is possible to predict the deposition thickness uniformity of Mist-CVD.

고농도 도공과 원지의 흡수특성이 인쇄모틀에 미치는 영향 - PEA Module를 이용한 인쇄모틀 평가 - (Effect of High Solid Coating and Water Absorption Uniformity of Base Paper on Print Mottle - Evaluation of print mottle with PEA module -)

  • 유성종;조병욱;김용식;이용규;이세현
    • 펄프종이기술
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    • 제39권2호
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    • pp.17-24
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    • 2007
  • PEA(Print Evenness Analyzer) Module can be utilized as a tool to evaluate print mottle. The tester is de-signed to measure the uniformity of liquid penetration into paper at very short contact time. To evaluate effects of base paper properties on print mottle, the experiments were performed with 3 types of base pa-per whose sizing degree, roughness and porosity were varied. Coated papers were produced with high solid coating color (70%) and low solid coating color (67%). Uniformity of water absorption into base paper and coated paper was measured with PEA. It was found that, in order to minimize print mottle, base paper shall be produced with a high sizing degree and low roughness and the concentration of coating color shall be kept as high as possible, providing that it has proper rheology properties for coating process.

Characteristics of Carbon Nanotube FED

  • Uemura, Sashiro;Yotani, Junko;Nagasako, Takeshi;Kurachi, Hiroyuki;Yamada, Hiromu;Ezaki, Tomotaka;Maesoba, Tsuyoshi;Nakao, Takehiro;Ito, Masaaki;Saito, Yahachi;Yumura, Motoo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.860-865
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    • 2004
  • Field emission display(FED) using carbon nanotubes (CNT) as field emitters is expected to large-area panels with high luminance and low power consumption. In order to perform the uniform luminance with low driving voltage, we introduced a new electrode to apply higher electric potential over the CNT cathode in 2003.[1] In the study, we described the luminance uniformity of the panel and the improvement of emission uniformity by increasing the emission-site density. The luminance uniformity of the several ideal dots which were selected over the display area in the panel was 2.8%. [2] The CNT cathode was irradiated by excimer-laser, which was effective to improve emission uniformity and lower driving voltage. A prototype of CNT-FED character display was performed for middle size message displays. The prototype panel had 48 x 480-dots and the resolution was 1-mm. The panel realized high luminance at low power consumption. It will be important characteristics for legible and ubiquitous displays. [3]

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히트 파이프를 이용한 열경화성 나노임프린트 장비용 열판의 온도 균일도 향상 (Improvement of Temperature Uniformity in a Hot Plate for Thermal Nanoimprint Lithography by Installing Heat Pipes)

  • 박규진;양진오;이재종;곽호상
    • 반도체디스플레이기술학회지
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    • 제15권2호
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    • pp.74-80
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    • 2016
  • This study presents a thermal device specially designed for thermal nanoimprint lithography equipments, which requires the capability of rapid heating and cooling, high temperature uniformity and the material strength to endure high stamping pressure. The proposal to meet these requirements is a planar-type hot plate extensible to a large area, in which long circular cartridge heaters and heat pipes are installed inside in parallel. The heat pipes are connected to the outside water cooling chamber. A hot plate made of stainless steel is fabricated with a dimension $240mm{\times}240mm{\times}20mm$. Laboratory experiments are conducted to examine the thermal performance of the hot plate. The results illustrate that the employment of heat pipes leads to a notable enhancement of temperature uniformity in the device and provides an efficient heat delivery from the hot plate to outside. It is verified that the suggested hot plate could be a feasible thermal tool for thermal nanoimprint lithography, satisfying the major design requirements.