• Journal of Korean Vacuum Science & Technology
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• v.3 no.2
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• pp.101-106
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• 1999

The main consideration factor to design a magnetron of the sputtering system for TFT-LCD metallization is high sheet resistance (Rs) uniformity which is provided by the high target erosion and high current efficiency. The present study has developed a rectangular magnetron for TFT-LCD to bve considered full target erosion and high film uniformity. After an aluminum-2 at.% and alloy target was installed in a magnetron source and the film was deposited on the glass of 600${\times}$720 mm, the Rs uniformity of the deposited film was measured as functions of the magnet tilt and magnet scanning configuration. And the target erosion profile was observed with the target voltage. When sputtered at 4mtorr and 10kW, the magnet tilt for the high Rs uniformity of 8.38% was 7mm. The plasma voltage at the dwell home and end for full-face target erosion, when scanned the magnetron was 120% compared to the mean voltage of the other area.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.319-320
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• 2012

Large aperture optical modulator called optical shutter is a key component to realize time-of-flight (TOF) based three dimensional (3D) imaging systems [1-2]. The transmission type electro-absorption modulator (EAM) is a prime candidate for 3D imaging systems due to its advantages such as small size, high modulation performance [3], and ease of forming two dimensional (2D) array over large area [4]. In order to use the EAM for 3D imaging systems, it is crucial to remove GaAs substrate over large area so as to obtain high uniformity modulation performance at 850 nm. In this study, we propose and experimentally demonstrate techniques for backside etching of GaAs substrate over a large area having high uniformity. Various methods such as lapping and polishing, dry etching for anisotropic etching, and wet etching ([20%] C6H8O7 : H2O2 = 5:1) for high selectivity backside etching [5] are employed. A high transmittance of 80% over the large aperture area ($5{\times}5mm^2$) can be obtained with good uniformity through optimized backside etching method. These results reveal that the proposed methods for backside etching can etch the substrate over a large area with high uniformity, and the EAM fabricated by using backside etching method is an excellent candidate as optical shutter for 3D imaging systems.

• Progress in Superconductivity and Cryogenics
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• v.25 no.4
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• pp.24-27
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• 2023

Until now, many research activities have been conducted to commercialize high-temperature superconducting (HTS) wires for electric applications. Most of all researchers have focused on enhancing the piece length, critical current density, mechanical strength, and throughput of HTS wires. Recently, HTS magnet for generating high magnetic field shows degraded performance due to the deformation of HTS wire by high electro-magnetic force. The deformation can be derived from widthwise thickness non-uniformity of HTS wire mainly caused by wet processes such as electro-polishing of metal substrate and electro-plating of copper. Gradient sputtering process is designed to improve the thickness uniformity of HTS wire along the width direction. Copper stabilizing layer is deposited on HTS wire covered with specially designed mask. In order to evaluate the thickness uniformity of HTS wire after gradient sputtering process, the thickness distribution across the width is measured by using the optical microscope. The results show that the gradient deposition process is an effective method for improving the thickness uniformity of HTS wire.

• Journal of Hydrogen and New Energy
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• v.22 no.6
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• pp.878-883
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• 2011

Effect of flow uniformity on the reaction characteristics of a catalytic combustor for high temperature fuel cell system has been experimentally investigated in the present study. One of the most important factor in designing catalytic combustion is to avoid hot spot in catalysts. In this regard, it is very important to secure flow uniformity of combustor inlet. A couple of perforated plates were applied at the front of catalyst region as flow uniformity device with minimal pressure drop. Results show that the velocity and temperature profile became more uniform when applying the flow uniformity device. CO and $CH_4$ emissions at the combustor exit were decreased and the average exit temperature was slightly increased with the flow uniformity device.

• Honam Mathematical Journal
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• v.40 no.1
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• pp.27-46
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• 2018

In this paper, (E, L)-preproximity and uniformity spaces in matriod theory as a generalized to a classical proximity and Uniformity spaces introduced by Csaszar [1] is introduced. Recently, Shi [17]-[18] introduced a new approach to the fuzzification of matroids.Here introduce (E, L)-preproximity and uniformity spaces, Uniformity and strong uniformity on (E, L)-fuzzifying matroid space, Not only study the properties of this new notions, but it has been generated (E, L)-fuzzifying matroid Space from (E, L)-preproximity and uniformity spaces. Next to introduced (E, L)-preproximity continuous in (E, L)-fuzzifying matroid space and used it in more properties. Finally we solve combinatorial optimizations problem via (E, L)-fuzzifying matroid space.

• Journal of Animal Environmental Science
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• v.6 no.1
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• pp.37-44
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• 2000

A new hose slurry spreader with improved spreading uniformity is developed to distribute the slurrynear to the soil surface and to reduce odor problems. The precision of distributed slurry was investigated using 3 types of slurry and found to be dependent on the rotor speed. For the solid matter separated fluid containing 0.1% of dry matter rotor speed of 150 rpm showed best uniformity with CV of 10% In the case of slurry from dairy cattle which contains 8.2% of dry matter high rotor speed of 330 rpm showed best result with CV of 7.2% Also swine slurry which has a 13.6% of dry matter content showed the best result of 8.1% CV at the high rotor speed of 250rpm. A high rotor speed generates enough pressure in the central distributor and as a result uniform distribution of slurry can be achieved. In conclusion it is highly recommended rotor speed of 300 rpm to get the best performance.

• Journal of the Semiconductor & Display Technology
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• v.21 no.3
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• pp.50-56
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• 2022

In order to process a vast amount of data, there is demand for a new system with higher processing speed and lower energy consumption. To prevent 'memory wall' in von Neumann architecture, RRAM, which is a neuromorphic device, has been researched. In this paper, we summarize the features of RRAM and propose the device structure for characteristic improvement. RRAM operates as a synapse device using a change of resistance. In general, the resistance characteristics of RRAM are nonlinear and random. As synapse device, linearity and uniformity improvement of RRAM is important to improve learning recognition rate because high linearity and uniformity characteristics can achieve high recognition rate. There are many method, such as TEL, barrier layer, NC, high oxidation properties, to improve linearity and uniformity. We proposed a new device structure of TiN/Al doped TaO_x/AlO_x/Pt that will achieve high recognition rate. Also, with simulation, we prove that the improved properties show a high learning recognition rate.

• Journal of the Optical Society of Korea
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• v.20 no.5
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• pp.586-592
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• 2016

This paper proposes a luminance compensation method using optical sensors to achieve high luminance uniformity of active matrix organic light-emitting diode (AMOLED) displays. The proposed method compensates for the non-uniformity of luminance by capturing the luminance of entire pixels and extracting the characteristic parameters. Data modulation using the extracted characteristic parameters is performed to improve luminance uniformity. In addition, memory size is optimized by selecting an optimal bit depth of the extracted characteristic parameters according to the trade-off between the required memory size and luminance uniformity. To verify the proposed compensation method with the optimized memory size, a 40-inch 1920×1080 AMOLED display with a target maximum luminance of 350 cd/m² is used. The proposed compensation method considering a 4σ range of luminance reduces luminance error from ± 38.64%, ± 36.32%, and ± 43.12% to ± 2.68%, ± 2.64%, and ± 2.76% for red, green, and blue colors, respectively. The optimal bit depth of each characteristic parameter is 6-bit and the total required memory size to achieve high luminance uniformity is 74.6 Mbits.

• Aerospace Engineering and Technology
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• v.8 no.2
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• pp.92-97
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• 2009

Two conventional speed detection methods (Elapsed-time method and Pulse-count method) are analyzed and compared for a high speed motor with digital tacho pulse with non-uniformity. In general, the elapsed-time method usually has better performance than a pulse-count method in case sufficiently high speed clock is used to measure the time difference. But if a tacho pulse non-uniformity exists in the reaction wheel - most of reaction wheel has a certain amount of non-uniformity - the accuracy of the elapsed-time method is degraded significantly. Thus the performance degradation is analyzed with respect to the level of non-uniformity of tacho pulse distribution and an allowable bound is suggested.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.15 no.11
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• pp.6702-6709
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• 2014

In this study, a susceptibility weighted image (SWI) showed a wrapped phase and a non-uniformity of the rapid susceptibility difference. Consequently, the bandwidth limits at low frequency were improved by applying HPF. From November 2013 to March 2014, a three-dimensional SWI was obtained from patients and compared with the existing images and HPF phase images. The maximum and minimum signal intensity differences and non-uniformity were analyzed. As a result, a high pass filter before and after applying the maximum and minimum of the signal intensity difference was decreased by 274.16% (498.98), and the non-uniformity was decreased by 439.55% (19.83). After applying the HPF, a comparison with the existing phase images revealed the HPF phase images to have high signal and image uniformity of the SWI image. A high pass filter method can effectively remove the non-uniformity and improve the overall image quality.