• Journal of Korean Vacuum Science & Technology
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• 제3권2호
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• pp.101-106
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• 1999

The main consideration factor to design a magnetron of the sputtering system for TFT-LCD metallization is high sheet resistance (Rs) uniformity which is provided by the high target erosion and high current efficiency. The present study has developed a rectangular magnetron for TFT-LCD to bve considered full target erosion and high film uniformity. After an aluminum-2 at.% and alloy target was installed in a magnetron source and the film was deposited on the glass of 600${\times}$720 mm, the Rs uniformity of the deposited film was measured as functions of the magnet tilt and magnet scanning configuration. And the target erosion profile was observed with the target voltage. When sputtered at 4mtorr and 10kW, the magnet tilt for the high Rs uniformity of 8.38% was 7mm. The plasma voltage at the dwell home and end for full-face target erosion, when scanned the magnetron was 120% compared to the mean voltage of the other area.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.319-320
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• 2012

Large aperture optical modulator called optical shutter is a key component to realize time-of-flight (TOF) based three dimensional (3D) imaging systems [1-2]. The transmission type electro-absorption modulator (EAM) is a prime candidate for 3D imaging systems due to its advantages such as small size, high modulation performance [3], and ease of forming two dimensional (2D) array over large area [4]. In order to use the EAM for 3D imaging systems, it is crucial to remove GaAs substrate over large area so as to obtain high uniformity modulation performance at 850 nm. In this study, we propose and experimentally demonstrate techniques for backside etching of GaAs substrate over a large area having high uniformity. Various methods such as lapping and polishing, dry etching for anisotropic etching, and wet etching ([20%] C6H8O7 : H2O2 = 5:1) for high selectivity backside etching [5] are employed. A high transmittance of 80% over the large aperture area ($5{\times}5mm^2$) can be obtained with good uniformity through optimized backside etching method. These results reveal that the proposed methods for backside etching can etch the substrate over a large area with high uniformity, and the EAM fabricated by using backside etching method is an excellent candidate as optical shutter for 3D imaging systems.

• 한국초전도ㆍ저온공학회논문지
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• 제25권4호
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• pp.24-27
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• 2023

Until now, many research activities have been conducted to commercialize high-temperature superconducting (HTS) wires for electric applications. Most of all researchers have focused on enhancing the piece length, critical current density, mechanical strength, and throughput of HTS wires. Recently, HTS magnet for generating high magnetic field shows degraded performance due to the deformation of HTS wire by high electro-magnetic force. The deformation can be derived from widthwise thickness non-uniformity of HTS wire mainly caused by wet processes such as electro-polishing of metal substrate and electro-plating of copper. Gradient sputtering process is designed to improve the thickness uniformity of HTS wire along the width direction. Copper stabilizing layer is deposited on HTS wire covered with specially designed mask. In order to evaluate the thickness uniformity of HTS wire after gradient sputtering process, the thickness distribution across the width is measured by using the optical microscope. The results show that the gradient deposition process is an effective method for improving the thickness uniformity of HTS wire.

• 한국수소및신에너지학회논문집
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• 제22권6호
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• pp.878-883
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• 2011

Effect of flow uniformity on the reaction characteristics of a catalytic combustor for high temperature fuel cell system has been experimentally investigated in the present study. One of the most important factor in designing catalytic combustion is to avoid hot spot in catalysts. In this regard, it is very important to secure flow uniformity of combustor inlet. A couple of perforated plates were applied at the front of catalyst region as flow uniformity device with minimal pressure drop. Results show that the velocity and temperature profile became more uniform when applying the flow uniformity device. CO and $CH_4$ emissions at the combustor exit were decreased and the average exit temperature was slightly increased with the flow uniformity device.

• 호남수학학술지
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• 제40권1호
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• pp.27-46
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• 2018

In this paper, (E, L)-preproximity and uniformity spaces in matriod theory as a generalized to a classical proximity and Uniformity spaces introduced by Csaszar [1] is introduced. Recently, Shi [17]-[18] introduced a new approach to the fuzzification of matroids.Here introduce (E, L)-preproximity and uniformity spaces, Uniformity and strong uniformity on (E, L)-fuzzifying matroid space, Not only study the properties of this new notions, but it has been generated (E, L)-fuzzifying matroid Space from (E, L)-preproximity and uniformity spaces. Next to introduced (E, L)-preproximity continuous in (E, L)-fuzzifying matroid space and used it in more properties. Finally we solve combinatorial optimizations problem via (E, L)-fuzzifying matroid space.

• 한국축산시설환경학회지
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• 제6권1호
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• pp.37-44
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• 2000

A new hose slurry spreader with improved spreading uniformity is developed to distribute the slurrynear to the soil surface and to reduce odor problems. The precision of distributed slurry was investigated using 3 types of slurry and found to be dependent on the rotor speed. For the solid matter separated fluid containing 0.1% of dry matter rotor speed of 150 rpm showed best uniformity with CV of 10% In the case of slurry from dairy cattle which contains 8.2% of dry matter high rotor speed of 330 rpm showed best result with CV of 7.2% Also swine slurry which has a 13.6% of dry matter content showed the best result of 8.1% CV at the high rotor speed of 250rpm. A high rotor speed generates enough pressure in the central distributor and as a result uniform distribution of slurry can be achieved. In conclusion it is highly recommended rotor speed of 300 rpm to get the best performance.

• 반도체디스플레이기술학회지
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• 제21권3호
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• pp.50-56
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• 2022

In order to process a vast amount of data, there is demand for a new system with higher processing speed and lower energy consumption. To prevent 'memory wall' in von Neumann architecture, RRAM, which is a neuromorphic device, has been researched. In this paper, we summarize the features of RRAM and propose the device structure for characteristic improvement. RRAM operates as a synapse device using a change of resistance. In general, the resistance characteristics of RRAM are nonlinear and random. As synapse device, linearity and uniformity improvement of RRAM is important to improve learning recognition rate because high linearity and uniformity characteristics can achieve high recognition rate. There are many method, such as TEL, barrier layer, NC, high oxidation properties, to improve linearity and uniformity. We proposed a new device structure of TiN/Al doped TaO_x/AlO_x/Pt that will achieve high recognition rate. Also, with simulation, we prove that the improved properties show a high learning recognition rate.

• Journal of the Optical Society of Korea
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• 제20권5호
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• pp.586-592
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• 2016

This paper proposes a luminance compensation method using optical sensors to achieve high luminance uniformity of active matrix organic light-emitting diode (AMOLED) displays. The proposed method compensates for the non-uniformity of luminance by capturing the luminance of entire pixels and extracting the characteristic parameters. Data modulation using the extracted characteristic parameters is performed to improve luminance uniformity. In addition, memory size is optimized by selecting an optimal bit depth of the extracted characteristic parameters according to the trade-off between the required memory size and luminance uniformity. To verify the proposed compensation method with the optimized memory size, a 40-inch 1920×1080 AMOLED display with a target maximum luminance of 350 cd/m² is used. The proposed compensation method considering a 4σ range of luminance reduces luminance error from ± 38.64%, ± 36.32%, and ± 43.12% to ± 2.68%, ± 2.64%, and ± 2.76% for red, green, and blue colors, respectively. The optimal bit depth of each characteristic parameter is 6-bit and the total required memory size to achieve high luminance uniformity is 74.6 Mbits.

• 항공우주기술
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• 제8권2호
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• pp.92-97
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• 2009

인공위성 반작용휠의 속도측정은 크게 펄스 개수 측정 방법과 펄스 간 시간 측정 방법으로 나뉠 수 있다. 본 연구에서는 반작용휠의 타코 펄스에 불균일성이 존재할 때 두 가지 방법들에 대한 오차 분석이 이루어졌다. 펄스 간 시간 측정 방법은 고속에서는 시간 측정에 사용되는 고주파 클럭에, 저속에서는 시간 측정에 사용되는 펄스 개수에 크게 영향을 받지만 이 값들을 잘 선택함으로써 분해능 및 정밀도가 펄스개수 측정 방법보다 항상 더 좋도록 설계할 수 있다. 그러나 반작용휠의 타코 펄스 간격에 불균일성이 존재할 때에는 측정 정확도가 저하된다. 본 연구에서 저하되는 측정 정확도를 정량적으로 분석하였으며 그 결과 시간 측정에 사용되는 펄스 개수를 늘림으로써 저하 되는 성능을 향상시킬 수 있음을 해석적으로 검증하였다.

• 한국산학기술학회논문지
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• 제15권11호
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• pp.6702-6709
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• 2014

본 연구는 3차원 자화강조영상 획득 시 재구성되는 위상영상의 겹쳐진 위상과 현격한 자화율 차이에 의한 영상의 불균일성을, 낮은 주파수 대역폭을 제한하는 High Pass Filter(HPF)를 적용함으로써 개선하고자 하였다. 연구방법은 2013년 11월부터 2014년 3월까지 3차원 자화강조영상 검사를 받은 환자를 대상으로 high pass filter의 적용 전후 영상 간 차이를 확인하기 위하여 기존의 위상영상과 HPF를 적용한 새로운 위상영상의 최대, 최소 신호강도 차이 및 불균일도를 비교 분석하였다. 연구결과, HPF 적용 전후에 따른 최대, 최소 신호강도의 차이는 274.16%(498.98), 불균일도는 439.55%(19.83) 감소하였다. 이는 HPF를 적용하여 낮은 주파수를 차단한 새로운 위상영상이 기존의 위상영상에 비해 겹쳐진 위상신호를 효과적으로 제거하여 영상의 균일도가 높아졌음을 의미한다. 결론적으로 3차원 자화강조영상 획득 시 재구성되는 위상영상에 HPF를 적용하면 겹쳐진 위상과 현격한 자화율 차이에 의한 영상의 불균일성을 효과적으로 개선할 수 있어 영상의 질을 크게 개선할 수 있다.