• Archives of Metallurgy and Materials
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• v.64 no.2
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• pp.507-512
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• 2019

Ag and Cu powders were mechanically alloyed using high-energy planetary milling to evaluate the sinter-bonding characteristics of a die-attach paste containing particles of these two representative conductive metals mixed at atomic scale. This resulted in the formation of completely alloyed Ag-40Cu particles of 9.5 ㎛ average size after 3 h. The alloyed particles exhibited antioxidation properties during heating to 225℃ in air; the combination of high pressure and long bonding time at 225℃ enhanced the shear strength of the chip bonded using the particles. Consequently, the chips sinter-bonded at 225℃ and 10 MPa for 10 min exhibited a sufficient strength of 15.3 MPa. However, an increase in bonding temperature to 250℃ was detrimental to the strength, due to excessive oxidation of the alloyed particles. The mechanically alloyed phase in the particle began to decompose into nanoscale Ag and Cu phases above a bonding temperature of 225℃ during heating.

• Design & Manufacturing
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• v.18 no.3
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• pp.54-63
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• 2024

This study applied the insert molding technology which is a metal and resin joining method, to secondary battery prismatic cap assembly component and investigated the improvement comparing with standard PHEV2 Type of prismatic battery under the goal of enhancing the global market competitiveness by reducing the number of cap assembly sub-component and simplifying its manufacturing processes. Insert molding replaced the rivet terminal which is composed of 6 parts to which led significant decreasing of product cost, weight and resistance and increasing tensile strength. The angle of current collector to cap plate is a key of leakage defect which is determined by temperature of product and mold, injection temperature, pressure and time and these data can be used for bigger size of insert cap assembly as the demand of high capacity battery is getting high

• Electrical & Electronic Materials
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• v.10 no.5
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• pp.425-433
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• 1997

BSCCO thin films have been fabricated by co-deposition at an ultralow growth rate using ion beam sputtering(IBS) method. The growth rates of the films was set in the region from 0.17 to 0.27 nm/min. MgO(100) was used as a substrate. In order to appreciate stable existing region of Bi 2212 phase with temperature and ozone pressure, the substrate temperature was varied between 655 and 82$0^{\circ}C$ and the highly condensed ozone gas pressure(PO$_3$) in vacuum chamber was varied between 2.0$\times$10$^{-6}$ and 2.3$\times$10$^{-5}$ Torr. Bi 2212 phase appeared in the temperature range of 750 and 795$^{\circ}C$ and single phase of Bi 2201 existed in the lower region than 785$^{\circ}C$. Whereas, PO$_3$dependance on structural formation was scarcely observed regardless of the pressure variation. And high quality of c-axis oriented Bi 2212 thin film with T$_{c}$(onset) of about 90 K and T$_{c}$(zero) of about 45 K is obtained. Only a small amount of CuO in some films was observed as impurity, and no impurity phase such as CaCuO$_2$was observed in all of the obtained films.lms.

• International Journal of Aeronautical and Space Sciences
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• v.18 no.1
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• pp.70-81
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• 2017

Various components of an engine nozzle are modeled as flexible multi-body components that are operated under high temperature and pressure. In this paper, in order to predict complex behavior of an engine nozzle, thermo-fluid-flexible multi-body dynamics coupled analysis framework was developed. Temperature and pressure on the nozzle wall were obtained by the steady-state flow analysis for a two-dimensional nozzle. The pressure and temperature-dependent material properties were delivered to the flexible multi-body dynamics analysis. Then the deflection and strain distribution for a nozzle configuration was obtained. Heat conduction and thermal analyses were done using MSC.NASTRAN. The present framework was validated for a simple nozzle configuration by using a one-way coupled analysis. A two-way coupled analysis was also performed for the simple nozzle with an arbitrary joint clearance, and an asymmetric flow was observed. Finally, the total strain result for a realistic nozzle configuration was obtained using the one-way and two-way coupled analyses.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07b
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• pp.1071-1074
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• 2002

This paper presents Bi thin films have been fabricated by atomic layer-by-layer deposition and co-deposition at an IBS method. The growth rates of the films was set in the region from 0.17 to 0.27 nm/min. MgO(100) was used as a substrate. In order to appreciate stable existing region of Bi 2212 phase with temperature and ozone pressure, the substrate temperature was varied between 655 and $820^{\circ}C$ and the highly condensed ozone gas pressure$(PO_3)$ in vacuum chamber was varied between $2.0{\times}10^{-6}$ and $2.3{\times}10^{-5}Torr$. Bi 2212 phase appeared in the temperature range of 750 and $795^{\circ}C$: and single phase of Bi 2201 existed in the lower region than $785^{\circ}C$. Whereas, $PO_3$ dependance on structural formation was scarcely observed regardless of the pressure variation. And high quality of c-axis oriented Bi 2212 thin film with $T_c$(onset) of about 90 K and $T_c$(zero) of about 45 K is obtained. Only a small amount of CuO in some films was observed as impurity, and no impurity phase such as $CaCuO_2$ was observed in all of the obtained films.

• Progress in Superconductivity and Cryogenics
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• v.17 no.3
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• pp.57-61
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• 2015

A Superconducting Fault Current Limiter is an electric power device which limits the fault current immediately in a power grid. The SFCL must be cooled to below the critical temperature of high temperature superconductor modules. In general, they are submerged in sub-cooled liquid nitrogen for their stable thermal characteristics. To cool and maintain the target temperature and pressure of the sub-cooled liquid nitrogen, the cryogenic cooling system should be designed well with a cryocooler and coolant circulation devices. The pressure of the cryostat for the SFCL should be pressurized to suppress the generation of nitrogen bubbles in quench mode of the SFCL. In this study, we tested the performance of the cooling system for the prototype 154 kV SFCL, which consist of a Stirling cryocooler, a subcooling cryostat, a pressure builder and a main cryostat for the SFCL module, to verify the design of the cooling system and the electric performance of the SFCL. The normal operation condition of the main cryostat is 71 K and 500 kPa. This paper presents tests results of the overall cooling system.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.11a
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• pp.671-674
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• 2004

BSCCO thin films have been fabricated by epitaxy growth at an ultra-low growth rate. The growth rates of the films was set in the region from 0.17 to 0.27 nm/min. MgO(100) was used as a substrate. In order to appreciate stable existing region of Bi 2212 phase with temperature and ozone pressure, the substrate temperature was varied between 655 and 820 $^{\circ}C$ and the highly condensed ozone gas pressure(PO3) in vacuum chamber was varied between $2.0{\times}10^{-6}$ and $2.3{\times}10^{-5}$ Torr. Bi 2212 phase appeared in the temperature range of 750 and 795 $^{\circ}C$ and single phase of Bi 2201 existed in the lower region than $785\;^{\circ}C$. Whereas, $PO_3$ dependance on structural formation was scarcely observed regardless of the pressure variation. And high quality of c-axis oriented Bi 2212 thin film with $T_c$(onset) of about 90 K and $T_c$(zero) of about 45 K is obtained. Only a small amount of CuO in some films was observed as impurity, and no impurity phase such as $CaCuO_2$ was observed in all of the obtained films.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1869-1873
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• 2008

In this work, to make it possible to generate glow discharge in atmospheric pressure condition with relatively high and wide electric field, micro channel reactor is proposed. Si DRIE and Cr deposition by Ebeam evaporation is used to make channel and bottom electrode layer. Upper electrode is made from ITO glass to visualize discharge within micro channel. Fabricated reactor is verified by generating uniform glow plasma with N2 / He gases each as working fluid. The range of gas electric field to generate glow plasma is from about 200 V/cm and upper limit is not observed in tested condition of up to 150 kV/cm. This data shows that micro channel plasma reactor is more versatile. Indirect estimation of electron temperature in this reactor can be inferred that the electron temperature within glow discharge in micro reactor lies $0{\sim}2eV$. This research demonstrates that the reactor is appropriate in application that needs to maintain low temperature condition during chemical process.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.24 no.12
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• pp.1608-1614
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• 2000

For the purpose of obtaining fundamental data which is needed to develope combustion system of LPG engine, we made constant volume chamber and analyzed flame propagation characteristics under different intial temperature, initial pressure and equivalence ratio which affect combustion of LPG. We investigated flame propagation speed of each fuel using laser deflection method and compared with the investigated flame propagation speed of each fuel using laser deflection method and compared with the results of image processing of flame. As a result, the maximum flame propagation speed was found at equivalence ratio 1.0 and 1.1 for LPG and gasoline, respectively. In the lean region, we can see that flame propagation speed of LPG surpasses that of gasoline. On the contrary, flame propagation speed of gasoline surpasses LPG in the rich region. As initial temperature and initial pressure were higher, flame propagation speed was faster. And, as equivalence ratio was larger and initial temperature was higher, combustion duration was shorter and maximum combustion pressure was higher.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.11b
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• pp.278-280
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• 2001

BSCCO thin films have been fabricated by co-deposition at an ultralow growth rate using ion beam sputtering(IBS) method. The growth rates of the films was set in the region from 0.17 to 0.27 nm/min. MgO(100) was used as a substrate. In order to appreciate stable existing region of Bi 2212 phase with temperature and ozone pressure, the substrate temperature was varied between 655 and $820^{\circ}C$ and the highly condensed ozone gas pressure($PO_3$) in vacuum chamber was varied between $2.0{\times}10^{-6}$ and $2.3{\times}10^{-5}$ Torr. Bi 2212 phase appeared in the temperature range of 750 and $795^{\circ}C$ and single phase of Bi 2201 existed in the lower region than $785^{\circ}C$. Whereas, $PO_3$ dependance on structural formation was scarcely observed regardless of the pressure variation. And high quality of c-axis oriented Bi 2212 thin film with $T_c$(onset) of about 90 K and $T_c$(zero) of about 45 K is obtained. Only a small amount of CuO in some films was observed as impurity, and no impurity phase such as $CaCuO_2$ was observed in all of the obtained films.