• 제목/요약/키워드: high aperture ratio

검색결과 89건 처리시간 0.025초

무인 항공기 탑재용 Ku대역 안테나에 관한 연구 (A Study on Ku-band Antenna for Mounting on UAV)

  • 박진우;류지호
    • 한국군사과학기술학회지
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    • 제17권1호
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    • pp.50-56
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    • 2014
  • In this paper, we proposed a Ku-band antenna that can be mounted on UAV. A proposed antenna structure has small size and light weight. It is considered long distance communication environment(LOS) and equipped UAV. Proposed antenna is designed $16{\times}2$ aperture coupled microstrip patch array antenna for high gain characteristics. In the measurement results, VSWR is less than 1.5 and the gain is over 21dBi in the bandwidth. Mechanical specifications of antenna assembly are ${\phi}250{\times}200mm$ of size and 3kg of weight.

2.22-inch qVGA ${\alpha}$-Si TFT-LCD Using a 2.5 um Fine-Patterning Technology by Wet Etch Process

  • Lee, J.B.;Park, S.;Heo, S.K.;You, C.K.;Min, H.K.;Kim, C.W.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.1649-1652
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    • 2006
  • 2.22-inch qVGA $(240{\times}320)$ amorphous silicon thin film transistor liquid active matrix crystal display (${\alpha}$- Si TFT-AMLCD) panel has been successfully demonstrated employing a 2.5 um fine-patterning technology by a wet etch process. Higher resolution 2.22-inch qVGA LCD panel with an aperture ratio of 58% can be fabricated because the 2.5 um fine pattern formation technique is combined with high thermal photo-resist (PR) development. In addition, a novel concept of unique ${\alpha}$-Si TFT process architecture, which is advantageous in terms of reliability, was proposed in the fabrication of 2.22-inch qVGA LCD panel. Overall results show that the 2.5 um finepatterning is a considerably significant technology to obtain higher aperture ratio for higher resolution ${\alpha}$-Si TFT-LCD panel realization.

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Magnitude Modulation for VSAT's Low Back-Off Transmission

  • Gomes, Marco;Cercas, Francisco;Silva, Vitor;Tomlinson, Martin
    • Journal of Communications and Networks
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    • 제12권6호
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    • pp.544-557
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    • 2010
  • This paper addresses the problem of controlling the envelope's power peak of single carrier modulated signals, band limited by root-raised cosine (RRC) pulse shaping filters, in order to reduce power amplifier back-off for very small aperture terminals ground stations. Magnitude modulation (MM) is presented as a very efficient solution to the peak-to-average power ratio problem. This paper gives a detailed description of the MM concept and its recent evolutions. It starts by extending the look-up-table (LUT) based approach of the MM concept to M-ary constellations with M ${\leq}$ 16. The constellation and RRC symmetries are explored, allowing considerable reduction on LUT computation complexity and storage requirements. An effective multistage polyphase (MPMM) approach for the MM concept is then proposed. As opposed to traditional LUT-MM solutions, MM coefficients are computed in real-time by a low complexity multirate filter system. The back-off from high-power amplifier saturation is almost eliminated (reduction is greater than 95%) with just a 2-stage MPMM system even for very demanding roll-off cases (e.g., ${\alpha}$ = 0,1). Also, the MPMM is independent of modulation in use, allowing its easy application to constellations with M > 16.

Super-RENS Disc의 Random 신호 특성 (Random Signal Characteristics of Super-RENS Disc)

  • 배재철;김주호;김현기;황인오;박창민;박현수;정문일;노명도
    • 정보저장시스템학회:학술대회논문집
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    • 정보저장시스템학회 2005년도 추계학술대회 논문집
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    • pp.119-123
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    • 2005
  • We report the random pattern characteristics of the super resolution near field structure(Super-RENS) write once read-many(WORM) disc at a blue laser optical system(laser wavelength 405nm, numerical aperture 0.85) and the Super-RENS read only memory(ROM) disc at a blue laser optical system(laser wavelength 659nm, numerical aperture 0.65). We used the WORM disc of which carrier-to-noise ratio (CNR) of 75nm is 47dB and ROM disc of which carrier-to-noise ratio (CNR) of 173nm is 45dB. We controlled the equalization (EQ) characteristics and used advanced partial-response maximum likelihood (PRML) technique. We obtained bit error rate (bER) of 10-3 level at 50GB WORM disc and bite error rate of 10-4 level at 50GB level ROM disc. This result shows high feasibility of Super-RENS technology for practical use.

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Super-RENS Disc의 Random 신호 특성 (Random Signal Characteristics of Super-RENS Disc)

  • 배재철;김주호;김현기;황인오;박창민;박현수;정문일;노명도
    • 정보저장시스템학회논문집
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    • 제2권1호
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    • pp.38-42
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    • 2006
  • We report the random pattern characteristics of the super resolution near field structure(Super-RENS) write once read-many(WORM) disc at a blue laser optical system(laser wavelength 405nm, numerical aperture 0.85) and the Super-RENS read only memory(ROM) disc at a blue laser optical system(laser wavelength 659nm, numerical aperture 0.65). We used the WORM disc of which carrier-to-noise ratio(CNR) of 75nm is 47dB and ROM disc of which carrier-to-noise ratio(CNR) of 173nm is 45dB. We controlled the equalization(EQ) characteristics and used advanced partial-response maximum likelihood(PRML) technique. We obtained bit error rate(bER) of 10-3 level at 50GB WORM disc and bite error rate of 10-4 level at 50GB level ROM disc. This result shows high feasibility of Super-RENS technology for practical use.

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다중대역 SweepSAR 운용 모드의 시스템 성능 분석 (System Performance Analysis for Multi-Band SweepSAR Operating Mode)

  • 윤성식;이재욱;이택경;유상범;이현철;강은수;이상규
    • 한국전자파학회논문지
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    • 제28권3호
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    • pp.186-194
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    • 2017
  • 본 논문에서는 고해상도 광역관측을 위한 위성 영상레이다(Synthetic Aperture Radar)의 시스템 주요 성능을 분석하였다. 배열 급전을 이용하는 반사판 안테나의 패턴을 활용하였으며, 기존의 광역관측 모드인 ScanSAR 모드와 SweepSAR 모드에 대해서 비교 분석하였다. SweepSAR 모드는 넓은 범위에 빔을 송신하고, SCORE(SCan On REceive)를 기반으로 순차적으로 빔포밍을 통해 반향신호를 수신하는 고해상도 광역관측 모드이다. 본 논문에서는 SweepSAR 모드로 동작하는 위성의 동작원리 및 특징을 분석하고, 시스템 성능 파라미터를 시뮬레이션 해석하였다. 또한, 영상의 활용도를 증대시키기 위해서 다중 주파수 대역(C-band, X-band)에 대하여 성능 분석을 수행하였다.

Mechanical behavior of Beishan granite samples with different slenderness ratios at high temperature

  • Zhang, Qiang;Li, Yanjing;Min, Ming;Jiang, Binsong
    • Geomechanics and Engineering
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    • 제24권2호
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    • pp.157-166
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    • 2021
  • This paper aims at the temperature and slenderness ratio effects on physical and mechanical properties of Beishan granite. A series of uniaxial compression tests with various slenderness ratios and temperatures were carried out, and the acoustic emission signal was also collected. As the temperature increases, the fracture aperture of intercrystalline cracks gradually increases, and obvious transcrystalline cracks occurs when T > 600℃. The failure patterns change from tensile failure mode to ductile failure mode with the increasing temperature. The elastic modulus decreases with the temperature and increases with slenderness ratio, then tends to be a constant value when T = 1000℃. However, the peak strain has the opposite evolution as the elastic modulus under the effects of temperature and slenderness ratio. The uniaxial compression strength (UCS) changes a little for the low-temperature specimens of T < 400℃, but a significant decrease happens when T = 400℃ and 800℃ due to phase transitions of mineral. The evolution denotes that the critical brittle-ductile transition temperature increases with slenderness ratio, and the critical slenderness ratio corresponding to the characteristic mechanical behavior tends to be smaller with the increasing temperature. Additionally, the AE quantity also increases with temperature in an exponential function.

나노 스테레오리소그래피 공정을 이용한 무(無)마스크 나노 패턴제작에 관한 연구 (Investigation into direct fabrication of nano-patterns using nano-stereolithography (NSL) process)

  • 박상후;임태우;양동열
    • 한국정밀공학회지
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    • 제23권3호
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    • pp.156-162
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    • 2006
  • Direct fabrication of nano patterns has been studied employing a nano-stereolithography (NSL) process. The needs of nano patterning techniques have been intensively increased for diverse applications for nano/micro-devices; micro-fluidic channels, micro-molds. and other novel micro-objects. For fabrication of high-aspect-ratio (HAR) patterns, a thick spin coating of SU-8 process is generally used in the conventional photolithography, however, additional processes such as pre- and post-baking processes and expansive precise photomasks are inevitably required. In this work, direct fabrication of HAR patterns with a high spatial resolution is tried employing two-photon polymerization in the NSL process. The precision and aspect ratio of patterns can be controlled using process parameters of laser power, exposure time, and numerical aperture of objective lens. It is also feasible to control the aspect ratio of patterns by truncation amounts of patterns, and a layer-by-layer piling up technique is attempted to achieve HAR patterns. Through the fabrication of several patterns using the NSL process, the possibility of effective patterning technique fer various N/MEMS applications has been demonstrated.

광대역 첩 신호 발생기를 위한 RF 불균형 연구 (Study of RF Impairments in Wideband Chirp Signal Generator)

  • 유상범;김중표;양정환;원영진;이상곤
    • 한국전자파학회논문지
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    • 제24권12호
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    • pp.1205-1214
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    • 2013
  • 최근 우주에서의 SAR(synthetic aperture radar) 시스템은 영상 해상도와 주파수가 높아지고 있다. 높은 품질의 영상 해상도 일수록 높은 대역폭이 요구되고 RF 구성을 사용하는 광대역 신호 발생기는 매우 복잡해지고 RF 소자의 불균형 성분이 증가한다. 그러므로 이러한 에러를 줄이고 성능을 개선하는것은 매우 중요하다. 본 연구에서, 광대역 신호 발생기의 송신 신호는 위상 잡음, 직교불균형, 비선형 증폭기의 에러 모델이 적용된다. 그리고 광대역 파형 발생기의 가능한 구조들을 정의하고 평가 방법으로 PSLR(peak side lobe ratio)과 ISLR(integrated side lobe ratio)을 측정하였다. 또한, 파형으로부터 진폭과 위상 에러를 추출하고 이차 다항식을 사용하여 비선형 소자에 따른 성능 변화를 검토 하였다. 마지막으로 고출력 증폭기의 비선형 에러를 보상하기 위한 사전왜곡방식을 적용하여 혼변조 성분에 의한 증폭기 출력의 왜곡이 15 dB 감소됨을 확인하였다.

나노 X-선 쉐도우 마스크를 이용한 고폭비의 나노 구조물 제작 (A Novel Fabrication Method of the High-Aspect-Ratio Nano Structure (HAR-Nano Structure) Using a Nano X-Ray Shadow Mask)

  • 김종현;이승섭;김용철
    • 대한기계학회논문집A
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    • 제30권10호
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    • pp.1314-1319
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    • 2006
  • This paper describes the novel fabrication method of the high-aspect-ratio nano structure which is impossible by conventional method using a shadow mask and a Deep X-ray Lithography (DXRL). The shadow mask with $1{\mu}m-sized$ apertures is fabricated on the silicon membrane using a conventional UV-lithography. The size of aperture is reduced to 200nm by accumulated low stress silicon nitride using a LPCVD (low pressure chemical vapor deposition) process. The X-ray mask is fabricated by depositing absorber layer (Au, $3{\mu}m$) on the back side of nano shadow mask. The thickness of an absorber layer must deposit dozens micrometers to obtain contrast more than 100 for a conventional DXRL process. The thickness of $3{\mu}m-absorber$ layer can get sufficient contrast using a central beam stop method, blocking high energy X-rays. The nano circle and nano line, 200nm in diameter in width, respectively, were demonstrated 700nm in height with a negative photoresist of SU-8.