• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.15 no.7
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• pp.591-596
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• 2002

In this work, epitaxial GaN is grown on sapphire substrate in AlGaN/GaN heterostructures. Deliberate oxygen doping of GaN grown by MOVPE has been studied. The electron concentration increased as a function of the square root of the oxygen partial Pressure. Oxygen is a shallow donor with a thermal ionization energy of $27\pm2 meV$ measured by temperature dependent Hall effects. A compensation ratio of $\theta$=0.3~0.4 was determined from Hall effect measurements. The formation energy of $O_N$ of $E^F$ =1.3eV determined from the experimental data, is lower than the theoretically predicted vague.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.32A no.1
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• pp.159-165
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• 1995

A double-heterostructure mesa-stripe-geometry laser diode integrated with thermoelectric Peltier cooler has been designed and fabricated. Epi-layers have been grown by metal organic chemical vapor deposition(MOCVD) method. Peltier cooling effect has been measured for devices with a mesa width of 14$\mu$m and a cavity length of 380$\mu$m. The effects of thermoelectric cooling could be shown by measuring the optical output of the laser with the increase of the current in the thermoelectric cooler. While the input courrent of the laser was maintained at 250mA, the optical output was decreased from 4.8mW to 3.8mW due to heating, but with the thermoelectric cooler on the optical output power was recovered by more than 40%. The results show that the complicated cooling device is not needed since the cooling can be achevied by the developement of the fabrication processing.

• Journal of the Institute of Electronics Engineers of Korea TE
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• v.37 no.5
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• pp.17-27
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• 2000

In a SCH(separate confinement heterostructure) QW(quantum well) laser, we calculated the optical gain, the differential gain and recombination current in the QW and derived the bulk carrier density in the SCH region as a function of the QW current by using the analytical capture escape model. Based upon above relations, we found the optical gain and the differential gain correspond to the ratios of carrier and current injected into the QW.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.12 no.3
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• pp.161-164
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• 2002

Polycrystalline and epitaxial heterostructure films of $La_{0.5}Sr_{0.5}CoO_{3}/Pb(Nb_{0.04}Zr_{0.28}Ti_{0.68})O_{3}/La_{0.5}Sr_{0.5}CoO_{3}$ (LSCO/PNZT/LSCO) capacitors were evaluated in terms of low voltage and high speed operation in high density memory, using TiN/Pt conducting barrier combination. Structural studies for a high density ferroelectric memory process flow, which requires the integration of conducting barrier layers to connect the drain of the pass-gate transistor to the bottom electrode of the ferroelectric stack, indicate complete phase purity (i.e. fully perovskite) in both epitaxial and polycrystalline materials. The polycrystalline capacitors show lower remnant polarization and coercive voltages. However, the retention, and high-speed characteristics are similar, indicating minimal influence of crystalline quality on the ferroelectric properties.

• Proceedings of the KIEE Conference
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• 2005.11a
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• pp.3-5
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• 2005

Ni/Au 쇼트키 접합의 산화를 통해 항복전압이 증가하고 누설 전류가 감소한 수평방향 GaN 쇼트키 장벽 다이오드를 제작하였다. 산화 과정 후, 턴-온 전압이 미세하게 증가하였으며 높은 애노드 전압하에서 애노드 전류가 증가하였다. 5분과 10분의 산화 과정 후, 누설 전류는 1nA 이하 수준으로 현저히 감소하였다. Edge Termination 방법으로 Floating Metal Ring을 사용하고, 산화 과정을 적용하여 제안된 GaN 쇼트키 장벽 다이오드의 항복전압은 750볼트의 큰 값을 얻을 수 있었다. 상온과 $125^{\circ}C$ 에서 제작한 GaN 쇼트키 장벽 다이오드의 역방향 회복 파형도 측정하였으며, 제작한 소자는 매우 빠른 역방향 회복 특성을 보였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.459.1-459.1
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• 2014

Because both $TiO_2$ and ZnO has superior characteristic optically and electrically, there are various of research for these materials. However, they have large band gap energy which correspond with not visible light, but UV light. To make up for this disadvantage, Quantum dots (CdS, CdSe) which can absorb the visible light could be deposited on $ZnO/TiO_2$ nanostructure so that the the photoelectrochecmical cell can absorb the light that has larger region of wavelength. Both $TiO_2$ and ZnO can be grown to one-dimensional nanowire structure at low temperature through solutional method. Three-dimensional hierarcical $ZnO/TiO_2$ nanostructure is fabricated by applying these process. Large surface area of this structure make the light absorbed more efficiently. Through type 2 like-cascade energy band structure of nanostructure, the efficient separation of electron-hole pairs is expected. Photoelectrochemical charateristics are found by using these nanostructure to photoelectrode.

• Korean Journal of Optics and Photonics
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• v.7 no.2
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• pp.112-119
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• 1996

TM polarized photon tunneling time and the position where TM photons appear after two-dimensional tunneling in a frustrated total internal reflection (FTIR) structure are calculated. This is done by converting the FTIR tunneling problem of TM photons to an electron tunneling problem with a position-dependent effective mass for a heterostructure potential barrier. Derived results are compared with TE photon cases.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.609-609
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• 2013

나노선은 대표적인 일차원 나노구조로 높은 부피-표면적 비율과, 조절 가능한 밴드갭 에너지, 뛰어난 광학적/전기적 특성으로 인해 다양한 잠재적 응용처를 가지며, 많이 연구되고 있다. 특히 ZnO 나노선은 대표적인 광촉매로, 높은 감광성과 높은 부피-표면적 비율 등의 특징을 가지지만, 상대적으로 넓은 밴드갭 에너지 때문에 가시광선 영역을 사용하지 못하는 단점이 있다. 본 연구에서는 CuS 나노입자/ZnO 나노선 이종구조를 간단한 두 가지의 방법으로 합성하였다. ZnO 나노선은 간단한 수열합성 방법으로 합성하였고, 그 위에 CuS 나노입자를 successive ionic layer adsorption and reaction (SILAR) 방법으로 증착하였다. 합성된 나노 구조는 기존의 ZnO 구조와는 달리 가시광 영역에서도 향상된 광촉매 특성을 보였으며, 이는 ZnO와 CuS사이의 interfacial charge transfer (IFCT)에서 기인한 것이다. SEM, TEM, XRD를 통해 CuS/ZnO 이종구조의 형태와 결정구조, 구성성분을 분석할 수 있었고, Acid Orange 7의 광분해 실험을 통해 향상된 광촉매 특성을 확인 할 수 있었다.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2006.09b
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• pp.1209-1210
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• 2006

A novel sintering process is proposed for bonding of $BaTiO_3$ and $Al_2O_3$ layers. Common commercial glass was used and infilterated among filler particles. As the kind of commercial glass, the phenomenon of the infilteration is different. Although Sud-1140 glass forms a glass/filler composite, it is not completely infilterated into the filler particles at $900^{\circ}C$. However as the increase of sintering temperature the infilteration of glass was improved. In this study, GA-1 and GA-12 glasses were infilterated the more than Sud-1140 glass. However, they are reacted by $BaTiO_3$ layer. The results of the experiment show that constrained sintering and the co-firing of the different materials were possible for glass infilteration using Sud-1140 glass at $1000^{\circ}C$.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.10 no.1
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• pp.13-16
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• 2000

Progress in Si crystal and wafer technologies is discussed on single crystal growth, wafer fabrication, epitaxial growth, gettering, 300 mm and SOI. As for bulk crystal growth, the mechanism of grown-in defects (voids) formation, the succes of grown-in defect free crystal growth technology and nitrogen doped crystal are shown. New wafer fabrication technologies such as both-side mirror polishing and etchingless process have been developed. The epitaxial growth of SiGe/Si heterostructure for high speed bipolar device is treated. Gettering technology under low temperature process such as RTP is important, and also it is shown that IG effect for Ni could be predicted using computer simulation of precipitate density and size. The development of 300 mm wafer and SOI has made progress steadily.