• 분석과학
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• 제26권4호
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• pp.235-244
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• 2013

할로겐족 원소들의 강한 원자 방출선들은 진공자외선 영역에 존재하여, 공기 중에서 레이저 펄스를 시료에 집속하여 플라즈마 방출 스펙트럼을 얻어 원소 분석을 수행하기 매우 어렵다. 또한 근적외선 영역에 할로겐족 원소들의 들뜬 전자 상태들 사이의 전이에 의한 원자 방출선들이 존재하는데, 이들은 스타크 효과에 의한 선폭 넓어짐 현상이 매우 커서, 공기 중에서 원소 분석에 충분한 신호 대 잡음비를 얻기 어렵다. 헬륨 가스 플로우를 이용하여 근적외선 영역의 할로겐족 원소들의 원자 방출선들은 레이저유도 플라즈마로부터 관측하였다. 특히, 804.374 nm와 905.833 nm의 아이오딘 원자 방출선들은 레이저유도 플라즈마에서 처음으로 관찰된 것이다. 헬륨 분위기에서 스타크 효과에 의한 선폭 넓어짐 현상과 연속 배경복사의 세기는 현저히 억제되었다. 헬륨 가스 플로우의 유량에 따른 원자 방출선의 세기, 플라즈마 온도, 전자 밀도의 변화를 조사하였다. 이 방법을 이용하여 고무의 난연제 성분에 포함된 염소와 불소를 레이저유도 플라즈마 분광법을 이용하여 검출하였다. 마지막으로 레이저유도 플라즈마 분광법을 이용하여 할로젠 원소들을 검출하는데 헬륨 가스 소모량을 줄일 수 있는 가스 펄스 젯 장치를 제안한다.

• 대한화학회지
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• 제7권2호
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• pp.179-181
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• 1963

The partition function of liquid halogens is developed applying the significant liquid structure theory proposed by H. Eyring and co-workers. The parameters in the partition function are determined by triple point technique which was proposed by the authors in the previous paper, and also the thermodynamic properties and the surface tension are calculated by the method therein.

• 한국진공학회:학술대회논문집
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• 한국진공학회 1994년도 제6회 학술발표회 논문개요집
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• pp.4-4
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• 1994

• Bulletin of the Korean Chemical Society
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• 제3권4호
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• pp.133-139
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• 1982

It has been presumed that the molten sulfur above $159^{\circ}C$ consists of an equilibrium mixture of $S_8$ rings and $S_x$ polymers where the number average degree of polymerization, P, is large. But it is known that admixture of halogens with liquid sulfur greatly reduce the viscosity. Constructing a new equilibrium equation, it is possible to evaluate the viscosity when halogens are added to liquid sulfur. Calculated viscosity is in good agreement with experimental values. Using the proposed model, the thermodynamic properties of liquid sulfur are also calculated over a wide range of temperature which the sulfur exists as the polymer.

• 대한화학회지
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• 제9권4호
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• pp.169-173
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• 1965

클로로벤젠과 요오드, 염소 또는 일브롬화요오드와의 각 系를 사염화탄소 용액에서 分光光度法에 의하여 연구한 결과 $C_6H_5CI{\cdot}I_2,\;C_6H_5CI{\cdot}CI_2$ 및 $C_6H_5CI{\cdot}IBr$ 의 錯物이 형성됨을 알았다. 이들 錯物의 생성에 대한 $25^{\circ}$에서의 평형상수는 각각 0.106, 0.0400 및 0.109$lmole^{-1}$었다. 이 결과와 文獻에 있는 실험결과를 綜合하면 芳香族化合物과 할로겐 또는 할로겐間化合物과의 錯物의 상대적 안정도가 다음 순서로 감소함을 알 수 있다. $ICl>IBr>I_2>Br_2>Cl_2\;C_6H_6>C_6H_5CI$

• 한국진공학회:학술대회논문집
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• 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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• pp.146-146
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• 2000

We have studied the etching of Si(100)-2xl by Cl and Br, using scanning tunneling microscopy to obtain morphological information that can be related to reaction and desorption pathways. Clean surfaces were exposed to molecular halogens at room temperature to produce well-defined chemisorption structures for coverages in the range 0.2-1.0 ML. Heating to 750-750 K induced etching by thermal desorpton. Analysis of the halogen concentration before and after heating indicated that the rates of desorption for SICl2 or SiBr2 were greatest for intermediate coverages and that etching was suppressed as saturation was reached. Hence, desorption is not simply proportional to the concentration of species that can form adsorbed precursors SiX2(a). Instead, it is directly coupled to the creation of monomer vacancies adjacent to the SiX2 (a) unit because this increases the lifetime of the excited state and increases the likelihood of its desorption. Increasing the surface concentration of halogens reduces the rate of vacancy formation. We show that these rates are also affected by a re-dimerization process in the high temperature Br-stabilized Si(100)-3xl reconstruction that increases the likelihood of siBr2(a) formation and enhances its desorption. I will also discuss recent result for F etching on Si(100)-2xl.

• 한국대기환경학회:학술대회논문집
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• 한국대기환경학회 2000년도 춘계학술대회 논문집
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• pp.323-324
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• 2000

최근 대기 중에 부유하는 입자상 물질의 농도와 인간의 질병 및 사망률에 관한 역학적 조사가 진행되면서 대기 중 입자상 물질 측정에 많은 관심이 집중되고 있다. 이러한 입자상 물질 중 $Cl^{-}$, $Br^{-}$ 등, 할로겐족의 분석은 일반적으로 이온크로마토그래피법(IC)으로 수행되고 있으나, 최근에는 금속원소 분석에 사용되는 ICP-AES(Inductively Coupled Plasma Atomic Emission Spectrometry)를 이용하여 분석하기도 하는 것으로 알려져 있다. (중략)

• 생약학회지
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• 제7권3호
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• pp.159-169
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• 1976

The present review records the known structures of more than 80 organic compounds containing halogens, which may be considered naturally occurring. The format of the review is based on the viewpoint of biochemists. Compounds containing one type of halogen atom have been placed in one of four major division, i.e., structures possessing fluorine, chlorine, bromine or iodine covalently bonded to carbon. Within each major division molecular structures are given along with the species from which the compounds have been isolated, The biological significance, if any, is also mentioned.

• Bulletin of the Korean Chemical Society
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• 제16권4호
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• pp.349-355
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• 1995

Bromo-and chlorotrimethylsilane react with selenium dioxide in halocarbon solvents and generate selenium oxybromide and oxychloride, respectively. These in-situ generated oxyhalides turned out to be very efficient for selective bromination and chlorination of aldehydes and ketones. Under carefully controlled reaction conditions, second and third introduction of halogens into carbonyl compounds can be greatly suppressed, and high yields of monohalo compounds were obtained. The product ratios of this halogenation reactions can be best explained if the reactions are assumed to involve intermediate β-ketoselenenyl chlorides.

• Environmental Engineering Research
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• 제11권2호
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• pp.84-90
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• 2006

UV-catalytic oxidation technique was applied for the treatment of bio-refractory character of the leachate, which is generally present in the form of adsorbable organic halogens (AOX). Destruction of AOX was likely to be governed by pH adjustment, quantitative measurement of oxidants, and the selection of oxidation model type. Peroxide induced degradation ($UV/H_2O_2$) facilitated the chemical oxidation of organic halides in acidic medium, however, the system showed least AOX removal efficiency than the other two systems. Increased dosage of hydrogen peroxide (from 0.5 time to 1.0 time concentration) even did not contribute to a significant increase in the removal rate of AOX. In ozone induced degradation system ($UV/O_3$), alkaline medium (pH 10) favored the removal of AOX and the removal rate was found 11% higher than the rate at pH 3. Since efficiency of the $UV/O_3$ increases with the increase of pH, therefore, more OH-radicals were available for the destruction of organic halides. UV-light with the combination of both ozone and hydrogen peroxide ($UV/H_2O_2$ 0.5 time/$O_3$ 25 mg/min) showed the highest removal rate of AOX and the removal efficiency was found 26% higher than the removal efficiency of $UV/O_3$. The system $UV/H2O_2/O_3$ got the economic preference over the other two systems since lower dose of hydrogen peroxide and relatively shorter reaction time were found enough to get the highest AOX removal rate.