• Title/Summary/Keyword: grain boundary frequency

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Development of Laser-Based Resonant Ultrasound Spectroscopy(Laser-RUS) System for the Detection of Micro Crack in Materials (재료의 미세결함 검출을 위한 레이저 공명 초음파 분광(Laser-RUS)시스템 개발)

  • Kang, Young-June;Kim, Jin-Soo;Park, Seung-Kyu;Baik, Sung-Hoon;Choi, Nag-Jung
    • Journal of the Korean Society for Precision Engineering
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    • v.27 no.1
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    • pp.41-48
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    • 2010
  • Non-contacting, laser-based resonant ultrasound spectroscopy (L-RUS) was applied to characterize the microstructure of a material. L-RUS is widely used by virtue of its many features. Firstly, L-RUS can be used to measure mechanical damping which related to the microstructural variations (grain boundary, grain size, precipitation, defects, dislocations etc). Secondly, L-RUS technology can be applied to various areas, such as the noncontact and nondestructive quality test for precision components as well as noncontact and nondestructive materials characterization. In addition, L-RUS technology can measure the whole field resonant frequency at once. In this paper, we evaluated material characteristics such as resonant frequency, nonlinear propagation characteristic through the development of Laser-Based Resonant Ultrasound spectroscopy (Laser-RUS) System for the detection of Micro Crack in Materials.

Measurement of Elastic Modulus of Structural Ceramics by Acoustic Resonance Method (공진법을 이용한 구조용 세라믹의 탄성계수 측정)

  • An, Bong-Yeong;Kim, Yeong-Gil;Lee, Seung-Seok
    • Korean Journal of Materials Research
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    • v.5 no.3
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    • pp.268-274
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    • 1995
  • 세라믹재료의 동탄성계수 측정을 위한 공진주파수 측정장치를 구성하였다. 구조용 세라믹 재료로 이용되는 $Al_{2}$O_{3}$, SiC, $Si_{3}$N_{4}$의 온도를 120$0^{\circ}C$까지 5$0^{\circ}C$의 온도간격으로 올리면서 torsional resonant frequency와 flexural resonant frequency를 측정하고, 측정된 공진주파수로부터 각 재료의 탄성계수를 구하였다. SiC의 경우는 120$0^{\circ}C$의 온도까지 탄성계수가 선형적으로 감소하였으나, $Al_{2}$O_{3}$와 $Si_{3}$N_{4}$의 경우에는 각각 100$0^{\circ}C$와 80$0^{\circ}C$까지는 선형적으로 감소하나, 그 이상의 온도에서는 탄성게수의 감소폭이 증가하는 현상을 보였다. 이러한 현상은 다결정재료에서의 grain boundary sliding에 의한 것으로 알려져 있다. 상온에서 공진법으로 측정된 동탄성계수의 측정결과는 초음파법으로 측정한 결과와 비교하였는데, 4% 내에서 서로 일치하는 결과를 보였다.

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Microstructure Evolution and Dielectric Characteristics of CaCu3Ti4O12 Ceramics with Sn-Substitution

  • Kim, Cheong-Han;Oh, Kyung-Sik;Paek, Yeong-Kyeun
    • Journal of the Korean Ceramic Society
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    • v.50 no.1
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    • pp.87-91
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    • 2013
  • The doping effect of Sn on the microstructure evolution and dielectric properties was studied in $CaCu_3Ti_{4-x}Sn_xO_{12}$ polycrystals. Samples were produced by a conventional solid-state reaction method. Sintering was carried out at $1115^{\circ}C$ for 2-16 h in air. The dielectric constant and loss were examined at room temperature over a frequency range between $10^2$ and $10^6$ Hz. The microstructure was found to evolve into three stages. Addition of $SnO_2$ led to an increase in density and advanced formation of abnormal grains. The formation of coarse grains with a reduced thickness of the boundary brought about an enhanced dielectric constant and a lower dielectric loss below ~1 kHz. EDS data showed the Cu-rich phase along the grain boundary, which should contribute to the improved dielectric constant according to the internal barrier layer capacitor model. After all, $SnO_2$ was an effective dopant to elevate the dielectric characteristics of $CaCu_3Ti_{4-x}Sn_xO_{12}$ polycrystals as a promoter for abnormal grain growth.

Analysis of An Anomalous Hump Phenomenon in Low-temperature Poly-Si Thin Film Transistors (저온 다결정 실리콘 박막 트랜지스터의 비정상적인 Hump 현상 분석)

  • Kim, Yu-Mi;Jeong, Kwang-Seok;Yun, Ho-Jin;Yang, Seung-Dong;Lee, Sang-Youl;Lee, Hi-Deok;Lee, Ga-Won
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.11
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    • pp.900-904
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    • 2011
  • In this paper, we investigated an anomalous hump phenomenon under the positive bias stress in p-type LTPS TFTs. The devices with inferior electrical performance also show larger hump phenomenon. which can be explained by the sub-channel induced from trapped electrons under thinner gate oxide region. We can confirm that the devices with larger hump have larger interface trap density ($D_{it}$) and grain boundary trap density ($N_{trap}$) extracted by low-high frequency capacitance method and Levinson-Proano method, respectively. From the C-V with I-V transfer characteristics, the trapped electrons causing hump seem to be generated particularly from the S/D and gate overlapped region. Based on these analysis, the major cause of an anomalous hump phenomenon under the positive bias stress in p-type poly-Si TFTs is explained by the GIDL occurring in the S/D and gate overlapped region and the traps existing in the channel edge region where the gate oxide becomes thinner, which can be inferred by the fact that the magnitude of the hump is dependent on the average trap densities.

Analysis of Grain Boundary Phenomena in ZnO Varistor Using Dielectric Functions (유전함수를 이용한 ZnO 바리스터의 입계 특성 분석)

  • Hong, Youn-Woo;Shin, Hyo-Soon;Yeo, Dong-Hun;Kim, Jong-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.178-178
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    • 2008
  • ZnO 바리스터는 인가되는 전압에 따라 저항이 변하는 전압 의존형 저항체이며 각종 전기 전자 정보통신용 제품에 정전기(ESD) 대책용 소자로 폭 넓게 사용되는 전자 세라믹스 부품이다. 특별히 Bi-based ZnO 바리스터는 다양한 상(phase)으로 구성되어 있으며 그 입계의 전기적 특성은 소량 첨가되는 dopant의 종류에 따라 다양하게 변하는 것으로 알려져 있다. 본 연구에서는 Bi-based ZnO 바리스터 (ZnO-$Bi_2O_3$, ZnO-$Bi_2O_3-Mn_3O_4$)에서 각종 유전함수$(Z^*,M^*,\varepsilon^*,Y^*,tan{\delta})$를 이용하여 입계의 주파수-온도에 대한 특성을 살펴 보았다. 일반적인 ZnO 바리스터 제조법으로 시편을 제작하여 78K~800K 온도 범위에서 각종 유전함수를 이용하여 복소 평면도(complex plane plot)와 주파수 응답도(frequency explicit plot)의 방법으로 defect level과 입계 특성(활성화 에너지, 정전용량, 저항, 입계 안정성 등)에 대하여 고찰하였다. ZnO-$Bi_2O_3$(ZB)계와 ZnO-$Bi_2O_3-Mn_3O_4$(ZBM)계 모두 상온 이하의 온도에서 $Zn_i$$V_o$의 결함이 나타났으며, 이들의 결함 준위는 각 유전함수에 따라 다소 차이가 났다. 입계 특성으로 ZB계는 이상구간(560~660K)을 전후로 1.15 eV $\rightarrow$ 1.49 eV의 활성화 에너지의 변화가 나타났지만, ZBM계는 이러한 현상이 나타나지 않았다. 또한 입계 전위 장벽의 온도 안정성에 대해서는 Cole-Cole model을 적용하여 분포 파라미터 (distribution parameter; $\alpha$)를 구하여 고찰하였다. ZB계의 입계 안정성은 온도에 따라 불안정해 졌지만, ZBM계는 안정하였다.

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Effect of M2O3 on the Sinterbility and Electrical Conductivity of ZrO2(Y2O3) System(III) : Ceramics of the ZrO2-Y2O3-Ln2O3 System (ZrO2(Y2O3)계 세라믹스의 소결성과 전기전도도에 대한 M2O3의 영향(III) : ZrO2-Y2O3-Ln2O3계 세라믹스)

  • 오영제;정형진;이희수
    • Journal of the Korean Ceramic Society
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    • v.24 no.2
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    • pp.123-132
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    • 1987
  • Yttria-stabilized zirconia with erbia-lanthana were investigated with respect to the amount of Ln2O3 (Ln; Er, La) addition in the range of 0.5∼5 mol% to the base composition of 8 mol% yttriazirconia. Following analysis and measurement were adopted for the characterization of synthesizes of solid electrolyte; phase transformation, lattice parameter, crystallite size, relative density, chemical composition and SEM/EDS. Electrical conductivity by two-probe method versus temperature from 350$^{\circ}C$ to 800$^{\circ}C$ and frequency in the range of 5Hz∼13MHz by complex impedance method was also conducted together with the determination of oxygen ion transference number by EMF method for the evaluation of their electrical properties. The results were as followsing; Electrical conductivity were decreased with increase in Ln2O3 content, but their activation energies increased. In the case of La2O3 addition, espicially, its electrical conductivity was decreased owing to the segregation of second phases at the grain-boundary. Grain-boundary conductivity of the specimen contained 0.5 mol% Er2O3 exhibited a maximum conductivity among thecompositions experimented. However, their bulk conductivities decreased in both case. Oxygen ion transference number was also reduced with decrease in oxygen partial pressure. For example, in the case of Er2O3 addition it retained value in the range of 0.97∼0.94 abvove 4.74${\times}$10-2in oxygen partial pressure. With the increase in the quantities of the evaporation of additive components, the crystallite size of stabilized zirconia decreased, and their relative density also reduced owing to the formation of porosity in their matrices. In the case of La2O3 the sinterbility was improved in the limited amount of addition up to 0.5 mol%, in the same range of addition the strength of sintered bodies were improved perhaps owing to the precipitation of metastable tetragonal phase in the fully stabilized zirconia.

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A Study on the High Frequency Properties of Mn-Zn ferrite with Re2O3(R=Dy, Gd, Ho) Addition (Re2O3(R=Dy, Gd, Ho)첨가에 따른 Mn-Zn ferrite의 고주파 특성에 관한 연구)

  • 최우성
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.6
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    • pp.538-548
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    • 2003
  • We studied effects by Re$_2$O$_3$(R=Dy, Gd, Ho) addition on the properties of Mn-Zn ferrite. The doping concentration range from 0.05 wt% to 0.25 wt%. All samples were prepared by standard fabrication of ceramics. With increasing the rare earth oxides, specific density and initial permeability increased on the whole. But, the tendencies such as upper result had the measured value on limitation and characteristics saturated or decreased properties after that. In case of excessive addition of additive beyond some level, initial permeability properties of ferrite have gone down in spite of anomalous grain. With increasing the content of additive, both the real and imaginary component of complex permeability and the magnetic loss (tan$\delta$) increased. Because the increased rate of real component had higher than imaginary component, magnetic loss increased none the less for increasing the real component related with magnetic permeability. But, the magnetic loss of ferrite doped with the rare earth oxides was lower than that of Mn-Zn ferrite at any rate. The small amount of present rare earth oxides in Mn-Zn ferrite composition led to enhancement of resistivity in bulk, and more so in the grain boundary. It was seem to be due to the formation of mutual reaction such as between iron ions and rare earth element ions.

A Study on the Photon Energy Characteristics of ZnO Thin Film According to Coating Thickness (ZnO 박막의 증착 두께에 따른 Photon Energy 특성에 관한 연구)

  • Lee, Jung-Il;Seo, Jang-Soo;Jung, Sung-Gyo;Kim, Byung-In
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.05b
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    • pp.75-81
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    • 2003
  • This study evaporates ZnO layer thickness differently with RF sputtering method on Si Wafer(n-100). This study is performed to examine the characteristics of photon energy and dielectric loss according to the thickness of ZnO and increase the reliability and reproduction of ZnO thin film. It is confirmed that the variation of electric Permittivity by frequency is resulted from the formation of particles within thin film, the particle size and the polarization on grain boundary. Peak of electric Permittivity value of thin film has slower and less value in early low wavelength by the coulomb force involved in carrier combination according to the increase of frequency. Reversal of electric Permittivity values is induced by dipole polarization shown in the dielectric of thin film. Complex electric constant $({\varepsilon}_1{\varepsilon}_2)$ has larger peak values as it’s thickness is thinner and then it is larger according to the increase of frequency. Electric Permittivity by photon energy has large value in imaginary number and is reduced exponentially by the increase of carrier density according to that of photon energy.

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The Photon Energy Characteristics of ZnO Thin Film Fabricated by RF Sputtering (RF Sputtering으로 제작한 ZnO 박막의 Photon Energy 특성)

  • Kim, Byung-In;Kim, Won-Bae;Chung, Seong-Gyo;Kim, Duck-Tae;Choi, Young-Il;Kim, Hyung-Gon;Song, Chan-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.08a
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    • pp.73-79
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    • 2002
  • This study evaporates ZnO layer thickness' differently with RF sputtering method on Si Wafer(n-100). This study is performed to examine the characteristics of photon energy and dielectric loss according to the thickness of ZnO and increase the reliability and reproduction of ZnO thin film. It is confirmed that the variation of electric Permittivity by frequency is resulted from the formation of particles within thin film, the particle size and the polarization on grain boundary. Peak of electric Permittivity value of thin film has slower and less value in early low wavelength by the coulomb force involved in carrier combination according to the increase of frequency. Reversal of electric Permittivity values is induced by dipole polarization shown in the dielectric of thin film. Complex electric constant $({\varepsilon}_1,{\varepsilon}_2)$ has larger peak values as it's thickness is thinner and then it is larger according to the increase of frequency. Electric Permittivity by photon energy has large value in imaginary number and is reduced exponentially by the increase of carrier density according to that of photon energy.

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The preparation and characteristics of (Ba,Sr,Mg) $TiO_3$ ceramic for BL capacitor ((Ba,Sr,Mg)$TiO_3$를 이용한 입계층 캐패시터의 제작 및 유전특성에 관한 연구)

  • 오재유;오의균;강도원;김범진;박태곤
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1998.11a
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    • pp.251-254
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    • 1998
  • The ($0.8BaTiO_3-0.1SrTiO_3-0.1MgTiO_3$)+$0.006Nb_2O_5$ ceramics were fabricated by conventional ceramic process. The dielectric property of specimen was investigated that the specimen was sintering temperature at 1,300C for 3hours and then annealed at $1,100^{\circ}C$ for 3hours in a atmosphere (air) to be painted on the surface with CuO paste. The results of the temperature and frequency are varied, the dielectric constant and loss tangent are unsuitable for BL capacitor. The dielectric constants were varied to be negative temperature coefficient(2.000-3,000) in the temperature range between -10 and $140^{\circ}C$, the dissipation factors (tan $\delta$) were some high(0.1-0.3). It was not grain insulation, in cause of the some difficult to be annealed temperature with CuO paste and fired atmosphere. But, we have some different annealing temperature and fired atmosphere, it will be suitable BL(Boundary Layer)capacitor.

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