• Title/Summary/Keyword: gel mobility

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High-Performance Flexible Graphene Field Effect Transistors with Ion Gel Gate Dielectrics

  • Jo, Jeong-Ho
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2012.05a
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    • pp.69.3-69.3
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    • 2012
  • A high-performance low-voltage graphene field-effect transistor (FED array was fabricated on a flexible polymer substrate using solution-processable, high-capacitance ion gel gate dielectrics. The high capacitance of the ion gel, which originated from the formation of an electric double layer under the application of a gate voltage, yielded a high on-current and low voltage operation below 3 V. The graphene FETs fabricated on the plastic substrates showed a hole and electron mobility of 203 and 91 $cm^2/Vs$, respectively, at a drain bias of - I V. Moreover, ion gel gated graphene FETs on the plastic substrates exhibited remarkably good mechanical flexibility. This method represents a significant step in the application of graphene to flexible and stretchable electronics.

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Identification of Nuclear Factors that UV-crosslink to Rev-responsive Element RNA (UV조사에 의해 Rev-responsive element RNA와 결합하는 핵단백질인자의 확인)

  • 박희성;남용석
    • Journal of Life Science
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    • v.7 no.3
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    • pp.161-166
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    • 1997
  • HIV-1 Rev protein plays an important role in regulating the expression of viral structural proteins. It allows the nuclear export and accumulation of unspliced and partially spliced viral mRNA in the cytoplasm. The Rev-responsive element RNA, present in the env gene, forms a higly ordered RNA secondary structure and is required for the Rev-mediated mRNA export. For this process to complete factor(s) are strongly suggested. From our experiments of electrophoretic mobility shift, UV-crosslinking and SDS/PAGE, RRE RNA was found to be recognized to several nuclear factors such as 36/37, 56, 41. 76, 150 kD proteins in the order of reactivity. Among them, 36/37 and 56 kD proteins are more reactive upon a brief UV treatment (5 min) and more persistent in the presence of high amount of nonspecific competitor, heparin. Certain nuclear protein9s) seemed to recognize the RRE RNA structure in competition with Rev to gel mobility shift assay.

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Fabrication of Thin Film Transistors based on Sol-Gel Derived Oxide Semiconductor Layers by Ink-Jet Printing Technology

  • Mun, Ju-Ho;Kim, Dong-Jo;Song, Geun-Gyu;Jeong, Yeong-Min;Gu, Chang-Yeong
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2009.05a
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    • pp.16.1-16.1
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    • 2009
  • We have fabricated solution processed oxide semiconductor active layer for thin film transistors (TFTs). The oxide semiconductor layers were prepared by ink-jet printing the sol-gel precursor solution based on doped-ZnO. Inorganic ZnO-based thin films have drawn significant attention as an active channel layer for TFTs applications alternative to conventional Si-based materials and organic semiconducting materials, due to their wide energy band gap, optical transparency, high mobility, and better stability. However, in spite of such excellent device performances, the fabrication methods of ZnO related oxide active layer involve high cost vacuum processes such as sputtering and pulsed laser deposition. Herein we introduced the ink-jet printing technology to prepare the active layers of oxide semiconductor. Stable sol-gel precursor solutions were obtained by controlling the composition of precursor as well as solvents and stabilizers, and their influences on electrical performance of the transistors were demonstrated by measuring electrical parameters such as off-current, on-current, mobility, and threshold voltage. Microstructure and thermal behavior of the doped ZnO films were investigated by SEM, XRD, and TG/DTA. Furthermore, we studied the influence of the ink-jet printing conditions such as substrate temperature and surface treatment on the microstructure of the ink-jet printed active layers and electrical performance. The mobility value of the device with optimized condition was about 0.1-1.0 $cm^2/Vs$ and the on/off current ratio was about $10^6$. Our investigations demonstrate the feasibility of the ink-jet printed oxide TFTs toward successful application to cost-effective and mass-producible displays.

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Subcellular Distribution of Arginase in Leaves of Canavalia lineata (해녀콩(Canavalia lineata) 잎에서 Arginase 활성의 세포내 분포)

  • 유경희
    • Journal of Plant Biology
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    • v.33 no.1
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    • pp.73-80
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    • 1990
  • Subcellular distribution of arginase activity was measured in leaves of Canavalia lineata. Both mitochondrial and cytosolic fraction were found to contain the arginase activity. It was noticible that cytosolic fraction contained a substantial amount of arginase activity. Different mobility of arginase from these two fractions was showed on DEAE-Sephacel chromatography and polyacrylamide gel electrophoresis. Also different pI value was showed 6.3 in cytosolic and 6.7, 7.1 in mitochondiral fraction on IEF gel electrophoresis. However, canavaine-dependent-activity (CDA) of arginase in these two fractions were not different. These results indicate that heterogenity of arginase occurs in leaves of C. lineata.

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Effective Positive Bias Recovery for Negative Bias Stressed sol-gel IGZO Thin-film Transistors (음 바이어스 스트레스를 받은 졸-겔 IGZO 박막 트랜지스터를 위한 효과적 양 바이어스 회복)

  • Kim, Do-Kyung;Bae, Jin-Hyuk
    • Journal of Sensor Science and Technology
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    • v.28 no.5
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    • pp.329-333
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    • 2019
  • Solution-processed oxide thin-film transistors (TFTs) have garnered great attention, owing to their many advantages, such as low-cost, large area available for fabrication, mechanical flexibility, and optical transparency. Negative bias stress (NBS)-induced instability of sol-gel IGZO TFTs is one of the biggest concerns arising in practical applications. Thus, understanding the bias stress effect on the electrical properties of sol-gel IGZO TFTs and proposing an effective recovery method for negative bias stressed TFTs is required. In this study, we investigated the variation of transfer characteristics and the corresponding electrical parameters of sol-gel IGZO TFTs caused by NBS and positive bias recovery (PBR). Furthermore, we proposed an effective PBR method for the recovery of negative bias stressed sol-gel IGZO TFTs. The threshold voltage and field-effect mobility were affected by NBS and PBR, while current on/off ratio and sub-threshold swing were not significantly affected. The transfer characteristic of negative bias stressed IGZO TFTs increased in the positive direction after applying PBR with a negative drain voltage, compared to PBR with a positive drain voltage or a drain voltage of 0 V. These results are expected to contribute to the reduction of recovery time of negative bias stressed sol-gel IGZO TFTs.

Transparent Conducting Ga-doped ZnO Thin Film for Flat-Panel Displays with a Sol-gel Spin Coating

  • Nam, Gil-Mo;Kwon, Myoung-Seok
    • Journal of Information Display
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    • v.9 no.3
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    • pp.8-11
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    • 2008
  • A novel non-alkoxide sol-gel process for synthesizing Ga-doped ZnO thin film on glass was derived for possible use as a transparent electrode in flat-panel displays, using zinc acetate dehydrate as the starting material. The structural and electrical properties of thin films have been characterized as functions of Ga addition and post-heat-treatments. Their carrier density, Hall mobility, and optical transmittance were measured and discussed herein to explain the characteristics of the sol-gel-derived Ga-doped ZnO thin film on glass.

Low Temperature Annealed Sol-Gel Aluminum Indium Oxide Thin Film Transistors

  • Hwang, Young-Hwan;Jeon, Jun-Hyuck;Seo, Seok-Jun;Bae, Byeong-Soo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.396-399
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    • 2009
  • Thin-film transistors (TFTs) with an aluminum indium oxide (AIO) channel layer were fabricated via a simple and low-cost sol-gel process. Effects of annealing temperature and time were investigated for better TFT performance. The sol-gel AIO TFTs were annealed as low as $350^{\circ}C$. They exhibit n-type semiconductor behavior, a mobility higher than 19 $cm^2/V{\cdot}s$ and an onto-off current ratio greater than $10^8$.

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Aging Effects on Electrical Characteristics of Sol-gel Processed CuO Thin Film Transistors (Aging 효과가 Sol-gel 공정 기반 CuO 박막 트랜지스터의 전기적 특성에 미치는 영향)

  • Jang, Jaewon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.29 no.9
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    • pp.527-531
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    • 2016
  • In this study, p-type thin film transistors consisting of CuO channels were fabricated by sol-gel process, with copper (II) acetate monohydrate precursors. At $500^{\circ}C$, the deposited films were fully converted into monoclinic phase CuO. The fabricated CuO thin film transistors deliver field effect mobility in saturation regime of $0.015cm^2/Vs$, and $I_{on}/I_{off}$ of ${\sim}10^3$. The degradation of the performance of the fabricated CuO thin film transistor caused by the exposure to air has been studied.

Enhancing Electrical Properties of Sol-Gel Processed IGZO Thin-Film Transistors through Nitrogen Atmosphere Electron Beam Irradiation (질소분위기 전자빔 조사에 의한 졸-겔 IGZO 박막 트랜지스터의 전기적 특성 향상)

  • Jeeho Park;Young-Seok Song;Sukang Bae;Tae-Wook Kim
    • Journal of the Microelectronics and Packaging Society
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    • v.30 no.3
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    • pp.56-63
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    • 2023
  • In this paper, we studied the effect of electron beam irradiation on sol-gel indium-gallium-zinc oxide (IGZO) thin films under air and nitrogen atmosphere and carried out the electrical characterization of the s ol-gel IGZO thin film transistors (TFTs). To investigate the optical properties, crystalline structure and chemical state of the sol-gel IGZO thin films after electron beam irradiation, UV-Visible spectroscopy, X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS) were carried out. The sol-gel IGZO thin films exhibited over 80% transmittance in the visible range. The XRD analysis confirmed the amorphous nature of the sol-gel IGZO films regardless of electron beam irradiation. When electron beam irradiation was conducted in a nitrogen (N2) atmosphere, we observed an increased proportion of peaks related to M-O bonding contributed to the improved quality of the thin films. Sol-gel IGZO TFTs subjected to electron beam exposure in a nitrogen atmosphere exhibited enhanced electrical characteristics in terms of on/off ratio and electron mobility. In addition, the electrical parameters of the transistor (on/off ratio, threshold voltage, electron mobility, subthreshold swing) remained relatively stable over time, indicating that the electron beam exposure process in a nitrogen atmosphere could enhance the reliability of IGZO-based thin-film transistors in the fabrication of sol-gel processed TFTs.

Transcriptional regulation of soybean ${\beta}-conglycinin$ gene expression: -(II) Developmental change of soybean embryo factor 3 activity- (대두 ${\beta}-conglycinin$ 유전자 발현의 전사 조절에 관한 연구 -(II) 대두 발달과정 중의 대두 배 인자 3의 역가 변화-)

  • Lee, Kyung-Hoon;Chung, Dong-Hyo;Kim, Woo-Yeon
    • Applied Biological Chemistry
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    • v.36 no.6
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    • pp.553-556
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    • 1993
  • Soybean nuclear extracts were prepared to examine the expression of SEF3 (soybean embryo factors 3), which binds to the upstream region of soybean ${\beta}-conglycinin$ ${\alpha}'$ subunit gene and is presumed to be a trans-acting factor for the expression of the gene. The relative levels of SEF3 binding activity in nuclear extracts of maturing soybean embryos were determined using the SE3 DNA probe containing two AACCCA hexanucleotides for gel mobility shift assay. The SEF3 activity increased in developing embryos from 16 to 32 days after pollination, whereas the mobility of the SE3-SE3-SEF3 complex decreased. The mobility of the complex was increased by the treatment of nuclear extracts with alkaline phosphatese, which could be inhibited by phosphate. Formation of the SE3-SEF3 complex was not affected by the binding buffer pH between 6.8 and 8.5.

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