• 대한환경공학회지
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• 제22권12호
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• pp.2125-2134
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• 2000

본 연구는 매립지에서 발생되는 침출수를 배출허용기준 이내로 처리함은 물론 경제적인 처리 공정을 개발하기 위한 것이다. 이를 위해 현장 pilot test 이전에 최적 공정 선정과 장치 설계인자를 도출하기 위해 실험실에서 기초실험을 수행하였다. 본 연구에서 개발하고자하는 처리공정은 역삼투시스템을 이용하는 공정인데 전처리로서 침지형분리막 생물반응기를 이용하였으며, 역삼투시스템에서 발생되는 농축수는 매립가스를 열원으로 하는 직화식 증발기를 이용하여 처리하는 공정이다. 실험결과 침지형분리막 생물반응기에서 SS, $BOD_5$, $COD_{cr}$, $NH_4{^+}-N$은 각각 99.0%, 43.0%, 12.9%, 48.5%, 18.7%의 제거효율을 보였다. 역삼투시스템온 $BOD_5$, $COD_{cr}$, $NH_4{^+}-N$, T-N을 각각 97.5%, 97.6%, 79.7%, 85.4% 제거할 수 있었다. 증발기는 $COD_{cr}$, $NH_4{^+}-N$, T-N을 각각 90.5%, 50.6%, 63.3% 제거할 수 있었으나 배출허용기준 이내로 처리하기는 어려운 것으로 나타나 응축수는 역삼투시스템 전단으로 보내서 전처리수와 함께 처리되어야할 것으로 나타났다.

• 폴리머
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• 제36권3호
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• pp.357-363
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• 2012

Poly(L-lactic acid)(PLLA) 고분자 필름 및 지지체의 세포 친화성을 향상시키기 위하여 산소 플라즈마 처리후 카복실기를 함유한 아크릴산(AA)을 $in$ $situ$ 그래프트시켰다. Stimulated body fluid(SBF) 용액에 15일간 담지시킨 후 hydroxyapatite(HA)를 형성시킨 시료와 phosphate-buffered saline(PBS), fetal bovine serum(FBS), 식염수 및 세포 배양용 배지에 담지시킨 다음 PLLA 시료 표면의 접촉각을 비교해 본 결과, HA 표면이 가장 낮은 접촉각을 나타내었다. 또한 연골세포와 조골세포는 HA 표면 위에서 높은 점착과 성장을 보였으며 연골세포가 HA에 많은 영향을 받는 것으로 확인되었다. 조골세포의 경우 HA 표면 이외에도 FBS나 세포 배양배지에 담지된 표면에서도 높은 세포 증식을 보였다. 더욱이 필름형태보다는 3차원 입체 구조의 다공성 지지체에서 연골세포와 조골세포의 점착과 세포 증식이 향상됨도 확인할 수 있었다. 이러한 표면개질된 PLLA는 조직공학적으로 연골이나 뼈 재생을 위한 유-무기 하이브리드 지지체로 응용될 수 있을 것으로 기대된다.

• 대한임상독성학회지
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• 제13권2호
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• pp.78-86
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• 2015

Purpose: The purpose of this study is to understand what kinds of chemical substances have been used annually and to investigate incidents that occurred due to chemical hazard release and to analyze statistically clinically chemical injury patients who visited one regional emergency medical center in Gumi city with documented references review. Methods: Annual chemical waste emission quantity (Kg/Year) (Cwep) was reproduced using national web site data governed by the Ministry of Environment and 5 years (from 1 .Jan. 2010 to 31. Dec. 2014) of medical records of chemical injury patients who visited our emergency department were reviewed retrospectively. By applying exclusion criteria, 446 patients of 460 patients were selected. Results: Dichloromethane, Toluene, Trichloroethylene, and Xylene were always included within Top 5 of Cweq. Six cases of chemical incidents were reported and in 3 of 6 cases involving Hydrogen fluoride were included during the study period. Male gender and twenties were the most prevalent group. Injury evoking chemicals were Hydrogen fluoride, unknown, complex chemicals (over 2 substances) in sequence. The most frequent site of wounds and injuries was the respiratory tract. Gas among status, intoxication among diagnosis, and discharge among disposition was most numerous in each group. Conclusion: There have been no uniform clinical protocols for chemical wounds and injuries due to various kinds of chemicophysical properties and ignorance of antidotes. Therefore conduct of a multicenter cohort study and experiments for ruling out chemicals according to chemicophysical priority as well as development of antidotes and clinical protocols for chemical injury patients is needed.

• 전기화학회지
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• 제11권4호
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• pp.289-296
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• 2008

산업용 밀폐형 니켈수소전지에 사용되는 수산화니켈 및 수소저장합금 전극에 대해 반쪽전지 시험에 의한 전기화학적 특성을 조사하고, 대용량 밀폐형 니켈수소전지를 제작하여 전지의 충전 효율 및 내압 특성에 대해 평가하였다. 전기화학적 특성 실험은 전지의 충방전 사이클에 따른 전지 내압 상승 억제를 목표로 수산화니켈 전극 및 수소저장합금 전극에 대해 전위주사법을 이용하여 수행하였다. 전위주사법 실험 결과, 수산화니켈 전극의 프로톤 산화 환원 반응 양태, 산소발생 거동, 그리고 수소저장합금 전극의 수소화 반응 특성을 명확히 파악할 수 있었다. 또한 산소 과전압이 높은 수산화니켈 분말과 수소 활성화 특성이 우수한 수소저장합금 분말을 사용하여 제작한 130 Ah 니켈수소전지의 충전 효율은 1 C 전류로 충전 시 98% 수준이 얻어 졌으며 과충전 시 전지 내압이 4 atm 이하로 유지됨을 확인하였다. 그리고 충방전 사이클에 의한 전지 보존 용량도 약 400 사이클에서 약 95% 수준으로 그 특성이 우수함을 알 수 있었다.

• Journal of Advanced Marine Engineering and Technology
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• 제41권3호
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• pp.238-244
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• 2017

플라즈마 이온질화 기술은 특히 스테인리스강의 표면경도 향상을 통한 기계적 성질 개선을 위해 산업 전반에서 널리 사용되고 있다. 또한 저온처리가 가능할 뿐만 아니라 담금질 강, 가스 질화 또는 침탄에 비해 변형이 적으며, 높은 표면 경도와 부식 저항성을 향상시키는 이점이 있다. 많은 연구자들에 의해 $450^{\circ}C$ 이하의 온도에서 플라즈마 이온질화 처리 시 expanded austenite(S-상)에 의해 부식 저항성이 향상되는 것으로 나타났다. 이때 대부분의 실험은 HCl 또는 NaCl과 같은 염화물 용액에서 실시되었다. 그러나 전기화학적인 요인으로서 염화물 용액과 천연해수 사이에는 차이가 있다. 따라서 본 연구에서는 304 스테인리스강에 대하여 다양한 온도에서 플라즈마 이온질화 처리 후 천연해수 용액에서 전기화학적 특성 분석을 통해 결과적으로 내식성이 가장 우수한 최적의 플라즈마 이온질화 처리 온도 조건을 규명하였다.

• 한국의학물리학회지:의학물리
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• 제27권3호
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• pp.156-161
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• 2016

When air discharged from a radioisotope production facility is contaminated with radiation, the public may be exposed to radiation. The objective of this study is to manage such radiation exposure. We measured the airborne radioactivity concentration at a 30 MeV cyclotron radioisotope production facility to assess whether the exhaust gas was contaminated. Additionally, we investigted the radioactive contamination of the air filter for efficient air purification and radiation safety control. To measure the airborne radiation concentration, specimens were collected weekly for 4 h after the beginning of the radioisotope production. Regarding the air purifier, five specimens were collected at different positions of each filter-pre-filter, high-efficiency particulate air filter, and charcoal filter-installed in the cyclotron production room. The concentrations of F-18, I-123, I-131, and Tl-201 generated in the radioiodine production room were $13.5Bq/m^3$, $27.0Bq/m^3$, $0.10Bq/m^3$, and $11.5Bq/m^3$, respectively; the concentrations of F-18, I-123, and I-131 produced in the radioisotope production room were $0.05Bq/m^3$, $16.1Bq/m^3$, and $0.45Bq/m^3$, correspondingly; and those of F-18, I-123, I-131, and Tl-201 generated in the accelerator room were $2.07Bq/m^3$, $53.0Bq/m^3$, $0.37Bq/m^3$, and $0.15Bq/m^3$, respectively. The maximum radiation concentration of I-123 generated in the radioiodine production room was 1,820 Bq/g, which can be disposed after 2 days. The maximum radiation concentration of Tl-202 generated in the radioisotope production room was 205 Bq/g, and this isotope must be stored for 53 days. The I-123 generated in the radioiodine production room had a maximum concentration of 1,530 Bq/g and must be stored for 2 days. The maximum radiation concentration of Na-22 generated in the radioisotope production room was 0.18 Bq/g and this isotope must be disposed after 827 days. To manage the exhaust, the efficiency of air purification must be enhanced by selecting an air purifier with a long life and determining the appropriate replacement time by examining the differential pressure through systematic measurements of the airborne radiation contamination level.

• 분석과학
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• 제25권4호
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• pp.236-241
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• 2012

낙동강 수계는 중 상류 지역에 대규모 공단이 입지하고 있어 그동안 phenol, 1,4-dioxane, perchlorate 등 유해물질에 의한 수질오염사고가 많이 발생하였다. 본 연구에서는 낙동강 수계에 유출 가능성이 있는 미규제 유해물질 중 반휘발성유기화합물질(semi-volatile organic compoumsds, SVOCs) 10종(dichlorvos, toluene-2,4-diisocyanate, 4,4'-methylenedianiline, 4,4'-methylenebis(2-chloroaniline), diethyl phthalate, di-n-butyl phthalate, butyl benzyl phthaltate, bis(2-ethylhexyl)adipate, benzophenone, 4,4'-bisphenol A)에 대하여 디스크형 고상 추출법과 GC/MS를 이용하여 분석하였으며, 정확도 75.6~110.5%, 정밀도 4.6~12.7%, 회수율 72.4~127.9%의 결과를 얻을 수 있었다. 낙동강 수계에 위치한 하 폐수처리장 및 폐수배출업소 등 공장폐수 시료를 분석한 결과 bis (2-ethylhexyl)adipate, benzophenone, 4,4'-bisphenol A 등 3개 물질이 검출되었다.

• 한국진공학회지
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• 제22권2호
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• pp.66-78
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• 2013

80 kW RF 플라즈마 토치 시스템을 개발하기 위하여, 토치 시스템에 대한 온도, 유체 거동 분석 등의 보다 많은 정보의 추출을 위하여 3차원 시뮬레이션을 진행했다. 파우더 주입관 위치, 입력 전류 변화에 따른 플라즈마 생성 특성, 세라믹 원통관 길이에 따른 플라즈마 방전 특성, 및 공정가스 유량에 따른 플라즈마 온도특성 등을 시뮬레이션 했다. 시뮬레이션을 통해 설계 제작된 RF 열 플라즈마 토치의 경우, 최대 89.3 kW까지 파워 인가가 측정되었다. 개발된 80 kW급 RF 열 플라즈마 토치 시스템의 양산성 평가로 Si 나노분말을 제조하고 특성을 고찰하였다. Si 나노분말의 생산량이 평균 539 g/hr의 양산 수준과 71.6%의 높은 수율을 달성했으며, 제조된 나노 분말은 $D_{99}/D_{50}$가 1.98의 좋은 입경 균일 분포도를 나타내었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.146-147
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• 2011

Processing a large area substrate for liquid crystal display (LCD) or solar panel applications in a capacitively coupled plasma (CCP) reactor is becoming increasingly challenging because of the size of the substrate size is no longer negligible compared to the wavelength of the applied radio frequency (RF) power. The situation is even worse when the driving frequency is increased to the Very High Frequency (VHF) range. When the substrate size is still smaller than 1/8 of the wavelength, one can obtain reasonably uniform process results by utilizing with methods such as tailoring the precursor gas distribution by adjustingthrough shower head hole distribution or hole size modification, locally adjusting the distance between the substrate and the electrode, and shaping shower head holes to modulate the hollow cathode effect modifying theand plasma density distribution by shaping shower head holes to adjust the follow cathode effect. At higher frequencies, such as 40 MHz for Gen 8.5 (2.2 m${\times}$2.6 m substrate), these methods are not effective, because the substrate is large enough that first node of the standing wave appears within the substrate. In such a case, the plasma discharge cannot be sustained at the node and results in an extremely non-uniform process. At Applied Materials, we have studied several methods of modifying the standing wave pattern to adjusting improve process non-uniformity for a Gen 8.5 size CCP reactor operating in the VHF range. First, we used magnetic materials (ferrite) to modify wave propagation. We placed ferrite blocks along two opposing edges of the powered electrode. This changes the boundary condition for electro-magnetic waves, and as a result, the standing wave pattern is significantly stretched towards the ferrite lined edges. In conjunction with a phase modulation technique, we have seen improvement in process uniformity. Another method involves feeding 40 MHz from four feed points near the four corners of the electrode. The phase between each feed points are dynamically adjusted to modify the resulting interference pattern, which in turn modulate the plasma distribution in time and affect the process uniformity. We achieved process uniformity of <20% with this method. A third method involves using two frequencies. In this case 40 MHz is used in a supplementary manner to improve the performance of 13 MHz process. Even at 13 MHz, the RF electric field falls off around the corners and edges on a Gen 8.5 substrate. Although, the conventional methods mentioned above improve the uniformity, they have limitations, and they cannot compensate especially as the applied power is increased, which causes the wavelength becomes shorter. 40 MHz is used to overcome such limitations. 13 MHz is applied at the center, and 40 MHz at the four corners. By modulating the interference between the signals from the four feed points, we found that 40 MHz power is preferentially channeled towards the edges and corners. We will discuss an innovative method of controlling 40 MHz to achieve this effect.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.478-478
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• 2012

Recently, there are many researches in order to increase the deposition rate (D/R) and improve film uniformity and quality in the deposition of microcrystalline silicon thin film. These two factors are the most important issues in the fabrication of the thin film solar cell, and for the purpose of that, several process conditions, including the large area electrode (more than 1.1 X 1.3 (m2)), higher pressure (1 ~ 10 (Torr)), and very high frequency regime (VHF, 40 ~ 100 (MHz)), have been needed. But, in the case of large-area capacitively coupled discharges (CCP) driven at frequencies higher than the usual RF (13.56 (MHz)) frequency, the standing wave and skin effects should be the critical problems for obtaining the good plasma uniformity, and the ion damage on the thin film layer due to the high voltage between the substrate and the bulk plasma might cause the defects which degrade the film quality. In this study, we will propose the new concept of the large-area multi-electrode (a new multi-electrode concept for the large-area plasma source), which consists of a series of electrodes and grounds arranged by turns. The experimental results with this new electrode showed the processing performances of high D/R (1 ~ 2 (nm/sec)), controllable crystallinity (~70% and controllable), and good uniformity (less than 10%) at the conditions of the relatively high frequency of 40 MHz in the large-area electrode of 280 X 540 mm2. And, we also observed the SEM images of the deposited thin film at the conditions of peeling, normal microcrystalline, and powder formation, and discussed the mechanisms of the crystal formation and voids generation in the film in order to try the enhancement of the film quality compared to the cases of normal VHF capacitive discharges. Also, we will discuss the relation between the processing parameters (including gap length between electrode and substrate, operating pressure) and the processing results (D/R and crystallinity) with the process condition map for ${\mu}c$-Si:H formation at a fixed input power and gas flow rate. Finally, we will discuss the potential of the multi-electrode of the 3.5G-class large-area plasma processing (650 X 550 (mm2) to the possibility of the expansion of the new electrode concept to 8G class large-area plasma processing and the additional issues in order to improve the process efficiency.