• Title/Summary/Keyword: fluence

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Numerical simlation of nanosecond pulsed laser ablation in air (대기중 나노초 펄스레이저 어블레이션의 수치계산)

  • 오부국;김동식
    • Laser Solutions
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    • v.6 no.3
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    • pp.37-45
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    • 2003
  • Pulsed laser ablation is important in a variety of engineering applications involving precise removal of materials in laser micromachining and laser treatment of bio-materials. Particularly, detailed numerical simulation of complex laser ablation phenomena in air, taking the interaction between ablation plume and air into account, is required for many practical applications. In this paper, high-power pulsed laser ablation under atmospheric pressure is studied with emphasis on the vaporization model, especially recondensation ratio over the Knudsen layer. Furthermore, parametric studies are carried out to analyze the effect of laser fluence and background pressure on surface ablation and the dynamics of ablation plume. In the numerical calculation, the temperature, pressure, density, and vaporization flux on a solid substrate are obtained by a heat-transfer computation code based on the enthalpy method. The plume dynamics is calculated considering the effect of mass diffusion into the ambient air and plasma shielding. To verify the computation results, experiments for measuring the propagation of a laser induced shock wave are conducted as well.

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A Study on Sapphire Wafer Scribing Using Picosecond Pulse laser (피코초 펄스 레이저를 이용한 사파이어 웨이퍼 스크라이빙에 관한 연구)

  • Moon, Jae-Won;Kim, To-Hoon
    • Laser Solutions
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    • v.8 no.2
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    • pp.7-12
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    • 2005
  • The material processing of UV nanosecond pulse laser cannot be avoided the material shape change and contamination caused by interaction of base material and laser beam. Nowadays, ultra short pulse laser shorter than nanosecond pulse duration is used to overcome this problem. The advantages of this laser are no heat transfer, no splashing material, no left material to the adjacent material. Because of these characteristics, it is so suitable for micro material processing. The processing of sapphire wafer was done by UV 355nm, green 532nm, IR 1064nm. X-Y motorized stage is installed to investigate the proper laser beam irradiation speed and cycles. Also, laser beam fluence and peak power are calculated.

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A Study on the Ablation of AZ5214 and SU-8 Photoresist Processed by 355nm UV Laser (355nm UV 레이저를 이용한 AZ5214와 SU-8 포토레지스트 어블레이션에 관한 연구)

  • Oh, J.Y.;Shin, B.S.;Kim, H.S.
    • Laser Solutions
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    • v.10 no.2
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    • pp.17-24
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    • 2007
  • We have studied a laser direct writing lithography(LDWL). This is more important to apply to micro patterning using UV laser. We demonstrate the possibility of LDWL and construct the fabrication system. We use Galvano scanner to process quickly micro patterns from computer data. And laser beam is focused with $F-{\theta}$ lens. AZ5214 and SU-8 photoresist are chosen as experimental materials and a kind of well-known positive and negative photoresist respectively. Laser ablation mechanism depends on the optical properties of polymer. In this paper, therefore we investigate the phenomenon of laser ablation according to the laser fluence variation and measure the shape profile of micro patterned holes. From these experimental results, we show that LDWL is very useful to process various micro patterns directly.

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Isotope Selectivity in the CO$_2$Laser Induced Decomposition of Trichloroethylene-H and Trichloroethylene-D

  • Koo Sang Man;Chun Byung Soo;Choo Kwang Yul
    • Bulletin of the Korean Chemical Society
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    • v.10 no.1
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    • pp.96-101
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    • 1989
  • The infrared multiphoton decomposition of trichloroethylene-H(TCE-H) and trichloroehtylene-D(TCE-D) was studied by using the high power $CO_2$ laser. The pressure dependence of TCE-H decomposition showed that the HCl elimination channel to form ClC ≡ CCl was the major step at high pressures, while the HC ≡ CCl formation step became important at low pressures. $Cl_2C$ = CHCl ${\rightarrow}$ (high pressure) ClC ${\equiv}$ CCl + HCl ${\rightarrow}$ (low pressure) HC ${\equiv}$ CCl + 2Cl${\cdot}$($Cl_2$) The IRMPD of TCE-H and TCE-D mixtures with 10P(20) laser line showed that optimum conditions of large isotope selectivity were the low system pressures and high laser powers. The experimentally observed dependence of the branching ratios on the pressure and laser fluence, and the isotope selectivity coefficients were quantitatively explained by using the modified energy grained master equations (EGME) model.

Electron Beam Modification of Dual Phase Filler: Surface Characteristics and its Influence on the Properties of Styrene-Butadiene Rubber Vulcanizates

  • Shanmugharaj A. M.
    • Rubber Technology
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    • v.5 no.2
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    • pp.94-103
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    • 2004
  • The present work describes modification of dual phase filler by electron beam irradiation in presence of multifunctional acrylates like trimethylol propane triacrylate (TMPTA) or silane coupling agent like bis (3-triethoxysilylpropyltetrasulphide) and in-fluence of the modified fillers on the physical properties of styrene-butadiene rubber (SBR) vulcanizates. Modulus at 300 % elongation increases whereas the tensile strength decreases with increase in radiation dose for the dual phase filler loaded styrene-butadiene rubber vulcanizates (SBR). However, modulus and tensile strength significantly increase, which is more, pronounced at higher filler loadings for TMPTA modified dual phase filler loaded SBR. These changes in properties are explained by the equilibrium swelling data and Kraus plot interpreting the polymer-filler interaction. Electron beam modification of the filler results in a reduction of tan ${\delta}$ at $70^{\circ}C$, a parameter for rolling resistance and increase in tan ${\delta}$ at $0^{\circ}C$, a parameter for wet skid resistance of the SBR vulcanizates. Finally, the influence of modified fillers on the properties like abrasion resistance, tear strength and fatigue failure and the improvement in the properties have been explained in terms of polymer-filler interaction.

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Power Density Distribution Calculation of a Pressurized Water Reactor with Fullscope Explicit Modeling by MCNP Code

  • Kim, Jong-Oh;Kim, Jong-Kyung
    • Proceedings of the Korean Nuclear Society Conference
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    • 1996.05a
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    • pp.179-184
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    • 1996
  • Power density distribution and criticality of a pressurized water reactor are calculated with a Monte Carlo calculation using the MCNP code. The MCNP model is based on one-eighth core symmetry. Individual fuel assemblies are modeled with fullscope three dimensional description except grid spacer. The fuel rod is divided into eight axial segments. Core internals above and below the active fuel region is represented as coolant. After 400 cycle calculations, the system converges to a k value of 1.09151$\pm$0.00066. Fission reaction rate in each rod is also calculated to use as the source term in pressure vessel fluence calculation.

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Earthquake response of a core shroud for APR1400

  • Jhung, Myung Jo;Choi, Youngin;Oh, Chang-Sik
    • Nuclear Engineering and Technology
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    • v.53 no.8
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    • pp.2716-2727
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    • 2021
  • The core shroud is one of the most important internal components of the reactor vessel internals because it meets the neutron fluence directly emitted by the nuclear fuel. In particular, dynamic effects for an earthquake should be evaluated with respect to the neutron irradiation flux. As a prerequisite to this study, simplified and detailed finite element models are developed for the core shroud using the ANSYS Design Parametric Language. Using the El Centro earthquake, seismic analyses are performed for the simplified and detailed core shroud models. Modal characteristics are obtained and their results are used for a time history analysis. Response spectrum analyses are also performed to access the degree of seismic excitation. The results of these analyses are compared to investigate the response characteristics between the simplified and detailed core shroud models from the time history and response spectrum analyses.

Direct Writing Lithography Technique for Semiconductor Fabrication Process Using Proton Beam

  • Kim, Kwan Do
    • Journal of the Semiconductor & Display Technology
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    • v.18 no.1
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    • pp.38-41
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    • 2019
  • Proton beam writing is a direct writing lithography technique for semiconductor fabrication process. The advantage of this technique is that the proton beam does not scatter as they travel through the matter and therefore maintain a straight path as they penetrate into the resist. The experiment has been carried out at Accelerator Mass Spectrometry facility. The focused proton beam with the fluence of $100nC/mm^2$ was exposed on the PMMA coated silicon sample to make a pattern on a photo resist. The results show the potential of proton beam writing as an effective way to produce semiconductor fabrication process.

Optical Properties of a Proton-implanted Nd:CNGG Planar Waveguide

  • Zhu, Qian-Lin;Lin, Ming-Fu;Chen, Jing-Yi;Wang, Zhong-Yue;Liu, Chun-Xiao
    • Current Optics and Photonics
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    • v.3 no.2
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    • pp.172-176
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    • 2019
  • The work reports on the fabrication of an optical planar waveguide in the Nd:CNGG crystal by the 0.4-MeV hydrogen ion implantation with a fluence of $8.0{\times}10^{16}ions/cm^2$. The nuclear energy loss of the implanted hydrogen ions was derived by using SRIM 2013 code. The microscope image of the proton-implanted Nd:CNGG crystal cross section was captured by a metallographic microscope. The transmittance spectra were recorded before and after the ion implantation. The light intensity distribution of the planar waveguide at 632.8 nm was experimentally measured to validate its effect on one dimension confinement. The investigation shows that the proton-implanted Nd:CNGG waveguide is a candidate for an optoelectronic integrated device.

Solvent Effects on Action Spectra for The Photodecomposition of N-Acetylphenylalanyl-L-Tryptophan and 3-Methyl Indole

  • Yoon, Min-Joong;Chung, Bong-Sik
    • Bulletin of the Korean Chemical Society
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    • v.5 no.5
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    • pp.194-198
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    • 1984
  • The UV action spectra and quantum yields for photodestruction of tryptophan (Trp) in peptide such as N-acetylphenylalanyl-L-tryptophan (NAPT) and 3-methyl indole (scatole) were determined in aerated aqueous and organic solvents. The photodestruction of aqueous NAPT was shown to be initiated by photoionization without requirement of threshold energy, as demonstrated by the similarity of fluence effect curves obtained for the action at various wavelengths and the wavelength dependence of quantum yield comparable to that reported for the photoionization of L-Trp. N-formylkynurenine (NFK)-type photoproduct, which is a photodynamic sensitizer, was not found to be involved in the photodestruction of Trp in NAPT in aqueous solution. In contrast, the action spectra of NAPT and scatole in organic solvents have revealed evidences for the significant role of internal photosensitization by NFK-type photoproduct in photolysis of Trp in peptide.