• Korean Journal of Materials Research
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• v.23 no.9
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• pp.517-524
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• 2013

The electrical and optical properties of fluorine-doped tin oxide films grown on polyethylene terephthalate film with a hardness of 3 using electron cyclotron resonance plasma with linear microwave of 2.45 GHz of high ionization energy were investigated. Fluorine-doped tin oxide films with a magnetic field of 875 Gauss and the highest resistance uniformity were obtained. In particular, the magnetic field could be controlled by varying the distribution in electron cyclotron deposition positions. The films were deposited at various gas flow rates of hydrogen and carrier gas of an organometallic source. The surface morphology, electrical resistivity, transmittance, and color in the visible range of the deposited film were examined using SEM, a four-point probe instrument, and a spectrophotometer. The electromagnetic field for electron cyclotron resonance condition was uniformly formed in at a position 16 cm from the center along the Z-axis. The plasma spatial distribution of magnetic current on the roll substrate surface in the film was considerably affected by the electron cyclotron systems. The relative resistance uniformity of electrical properties was obtained in film prepared with a magnetic field in the current range of 180~200A. SEM images showing the surface morphologies of a film deposited on PET with a width of 50 cm revealed that the grains were uniformly distributed with sizes in the range of 2~7 nm. In our experimental range, the electrical resistivity of film was able to observe from $1.0{\times}10^{-2}$ to $1.0{\times}10^{-1}{\Omega}cm$ where optical transmittance at 550 nm was 87~89 %. These properties were depended on the flow rate of the gas, hydrogen and carrier gas of the organometallic source, respectively.

• The Journal of the Institute of Internet, Broadcasting and Communication
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• v.11 no.6
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• pp.9-14
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• 2011

We have investigated the electrical properties of $AlO_x$ thin film device. The device has been fabricated top-bottom electrode structure and its transport properties are measured in order to study the resistance change. Electrical properties with linear voltage sweep on a electrodes are used to show the variation of resistance of $AlO_x$ thin film device. Fabricated $AlO_x$ thin film device with MIM structure is changed from a high conductive On-state to a low conductive Off-state by the external linear voltage sweep. It is found that the initial resistance of the $AlO_x$ thin film is low-resistance On state and reversible switching occurs. Consequently, we believe $AlO_x$ thin film is a promising material for a next-generation nonvolatile memory and other electrical applications.

• Proceedings of the Korean Magnestics Society Conference
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• 2000.09a
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• pp.363-364
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• 2000

• KOREAN JOURNAL OF PACKAGING SCIENCE & TECHNOLOGY
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• v.15 no.3
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• pp.99-104
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• 2009

Soy protein isolate (SPI)-based nanocomposite films with three different types of nanoclays, such as Cloisite $Na^+$, Cloisite 20A, and Cloisite 30B, were prepared using a solution casting method, and their optical, tensile, and water vapor barrier properties were determined to investigate the effect of nano-clay type on film properties. Among the tested nanoclays, Cloisite $Na^+$, a hydrophilic montmorillonite (MMT), exhibited the highest transparency with least opaqueness, the highest tensile strength, and the highest water vapor barrier properties, indicating Cloisite $Na^+$ is the most compatible with SPI polymer matrix to form nanocomposite films. The film properties of SPI/Cloisite $Na^+$ nanocomposite films were strongly dependent on the concentration of the clay. Film properties such as optical, tensile, and water vapor barrier properties improved significantly (p<0.05) as the concentration of clay increased. However, the effectiveness of addition of the clay reduced above a certain level (i.e., 5wt%), indicating that there is an optimum amount of clay addition to exploit the full advantage of nanocmposite films.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 2002.05a
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• pp.226-234
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• 2002

A systematic study of the role of transfer films on friction properties was performed with various temperatures in the brake system. An NAO friction material specimens containing 9 ingredients were tested using a pad-on-disk type friction tester A new method of measuring the transfer film thickness was developed by considering the electrical resistance of the transfer film using a 4-point probe technique. The properties of transfer film such as surface morphology and film distribution vaied according to the relative amount of graphite and magnesium oxide. By using SEM, it was possible to obtain information about the chemical composition of the transfer film. Results showed that there detected a threshold value of the relative amount of a two active materials to maintain a certiain thickness of a transfer film. Results also showed that formation of friction layer generated on the friction surface was strongly affected by chemical action of two ingredients during sliding due to chemical reaction of solid lubricants at different interface temperature. The results suggested that no apparent relationship between transfer film thickness and the average friction coefficient was founded and friction characteristics were affected more by the property of the solid lubricant and abrasive in the material.

• Journal of the Korean Ceramic Society
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• v.31 no.2
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• pp.206-212
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• 1994

Effects of the film deposition process parameters on the properties such as deposition rate, etch rate, refractive index, stress and step coverage of plasma enhanced chemical vapor deposited (PECVD) tetraethylorthosilicate glass (TEOS) SiO2 film were investigated and analysed using SEM, FTIR and SIMS techniques. Increasing TEOS flow or decreasing O2 flow increased the deposition rate and the compressive stress of the oxide film but produced a less denser film. The deposition rate decreased owing to the decrease in the sticking coefficient of the TEOS and the O2 molecules onto the substrate Si with increasing the substrate temperature. Increasing the substrate temperature produced a denser film with a lower etch rate and the higher refractive index by lowering SiOH and moisture contents. Increasing the rf power increases the ion bombardment energy. This increase in energy, in turn, increases the deposition rate and tends to make the film denser. No appreciable changes were found in the deposition rate but the refractive index and the stress of the film decreased with increasing the deposition pressure. The carbon content in the plasma TEOS CVD oxide film prepared under our standard deposition conditions were very low according to the SIMS analysis results.

• Journal of the Korean Applied Science and Technology
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• v.19 no.2
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• pp.131-136
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• 2002

As model waterborne acrylic coatings, mono-dispersed poly(butyl acrylate-methyl methacrylate) copolymer latexes of random copolymer and core/shell type graft copolymer were prepared by seeded multi-staged emulsion polymerization with particle size of $180{\sim}200$ nm using semi-batch type process. Sodium lauryl sulfate and potassium persulfate were used as an emulsifier and an initiator, respectively. The effect of particle texture including core/shell phase ratio, glass transition temperature and crosslinking density, and film forming temperature on the film formation and final properties of film was investigated using SEM, AFM, and UV in this study. The film formation behavior of model latex was traced simultaneously by the weight loss measurement and by the change of tensile properties and UV transmittance during the entire course of film formation. It was found that the increased glass transition temperature and higher crosslinking degree of latex resulted in the delay of the onset of coalescence of particles by interdiffusion during film forming process. This can be explained qualitatively in terms of diffusion rate of polymer chains. However, the change of weight loss during film formation was insensitive to discern each film forming stages-I, II and III.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.196.1-196.1
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• 2016

TCO(Transparent Conducting Oxide) on flat glass is used in thin-film photovoltaic cell, flat-panel display. Nowadays, Corning(R) Willow Glass(R), known as flexible substrate, has attracted much attention due to its many advantages such as reliable roll-to-roll glass processing, high-quality flexible electronic devices, high temperature process. Also, it can be an alternative to flexible polymer substrates which have their poor stability and degradation of electrical and optical qualities. For application on willow glass, the flexibility, electrical, optical properties can be greatly influenced by the TCO thin film thickness due to the inherent characterization of thin film in nanoscale. It can be expected that while thick TCO layer causes poor transparency, its sheet resistance become low. Also, rarely reports were focusing on the influence of flexible properties by varying TCO thickness on flexible glass. Therefore, it is very important to optimize TCO thickness on flexible Willow glass. In this study, Ti-ZnO thin films, with different thickness varied from 0 nm to 50 nm, were deposited on the flexible willow glass by atomic layer deposition (ALD). The flexible, electrical and optical properties were investigated, respectively. Also, these properties of Ti-doped ZnO thin films were compared with un-doped ZnO thin film. Based on the results, when Ti-ZnO thin films thickness increased, resistivity decreased and then saturated; transmittance decreased. The Figure of Merit (FoM) and flexibility was the highest when Ti-ZnO thickness was 40nm. The flexible, electrical and optical properties of Ti-ZnO thin films were better than ZnO thin film at the same thickness.

• Korean Journal of Materials Research
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• v.17 no.7
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• pp.386-389
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• 2007

The dielectric properties of $(Ba_{0.5}Sr_{0.5})TiO_3$ ferroelectric thin films have been investigated according to the substrates in order to optimize the their properties. MgO, r-plane sapphire, and poly-crystalline sapphire (Alumina) substrates have been used to deposite $(Ba_{0.5}Sr_{0.5})TiO_3$ ferroelectric thin films by RF magnetron sputtering. The BST thin films deposited on the single crystal (100)MgO substrates have high tunability and low dielectric loss. These results are caused by a low misfit between the lattice parameters of the BST films and the substrate. The BST films deposited on r-plane sapphire have relatively high misfit, and the tunability of 17% and dielectric loss of 0.0007. To improve the dielectric properties of the BST films, the post-annealing methods has been introduced. The BST films deposited on (100)MgO, (1102)r-plane sapphire, and poly-crystalline sapphire substrates have best properties in post-annealing conditions of $1050^{\circ}C$, $1100^{\circ}C$, and $1150^{\circ}C$, respectively. The different optimal post-annealing conditions have been found according to the different misfits between the films and substrates, and thermal expansion coefficients. Moreover, the films deposited on alumina substrate which is relatively cheap have a good tunability properties of 23% by the post-annealing.

• Journal of Information Display
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• v.9 no.1
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• pp.26-32
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• 2008

The dependence of optical performances of collimating films such as prism films and pyramid films on the reflecting properties of reflection films were investigated by using a ray tracing technique. The angular distribution of the luminance and the on-axis luminance gain were obtained by using a simple backlight model composed of a reflection film, a virtual flat light source, and a collimating film. Three kinds of reflecting properties were used, which were a perfect Lambertian reflector, a perfect mirror reflector, and a reflector having both diffuse and specular properties. It was found that the on-axis luminance gain was the highest in the simulation where a mirror reflector was used, while the viewing angle was the widest where the Lambertian reflector was used. This result indicates that it is necessary to optimize the simulation condition such as the reflecting properties in order to predict the optical performances of collimating films accurately. Quantitative correlation between the optical characteristics of collimating films and the reflecting properties of reflection films can be used to improve simulation technique for the development and the optimization of collimating films for LCD backlight applications.