• Journal of Magnetics
• /
• v.15 no.1
• /
• pp.12-16
• /
• 2010

Combined study of in-situ stress measurements and atomic force microscopy (AFM) revealed drastic stress relaxation in the CoCrPt and PS(styrene)-PVP(vinyl pyridine) polymer hybrid structure that was closely related to the growth structure of the film. We have observed not only no large initial growth stress at the initial stages of film growth but also twice smaller stress in magnitude with opposite sign in the CoCrPt/PS-PVP/Si sample. The microstructural studies using AFM at the various film growth stages revealed that the film growth structure plays an important role in the stress relaxation mechanism of CoCrPt films on a corrugated polymer surface.

• Journal of Bio-Environment Control
• /
• v.5 no.1
• /
• pp.71-78
• /
• 1996

This experiments were conducted using color films for investigation of suitable light environment on the growth of Allium senescens var. minor. The results obtained were as follows ; In characteristics of light transmittance of the color films tested, it shows that glass and transparent film passed nearly all visible rays, but the other films were reduced and filtered certain wavelength of light. On the tested films, the light transmittance amount of transparent film and green film were the greatest, 75.5% and smallest, 13.2% based on the glass 100%, respectively. The growth of Allium senescens var. minor increased at transparent, yellow and pink film, but decreased at blue and green film. It shows that the greatest chlorophyll content was founded in the blue film, 0.27mg/g, the smallest founded in the yellow film, 0.16mg/g. The content of mineral elements was founded that the green film was the highest at N, P, K, Ca, Mg, but the orange and pink film were the lowest at P, K and N, Ca, Mg, respectively.

• Journal of the Korean Crystal Growth and Crystal Technology
• /
• v.8 no.2
• /
• pp.240-248
• /
• 1998

The plasma chemical vapor deposition is one of the most utilized techniques for the diamond growth. As the applications of diamond thin films prepared by plasma chemical vapor deposition(CVD) techniques become more demanding, improved fine-tuning and control of the process are required. The important parameters in diamond film deposition include the substrate temperature, $CH_4/H_2$ gas flow ratio, total, gas pressure, and gas excitation power. With the spectroscopic ellipsometry, the substrate temperature as well as the various parameters of the film can be determined without the physical contact and the destructiveness under the extreme environment associated with the diamond film deposition. It is introduced how the real-time spectroscopic ellipsometry is used and the data are analyzed with the view of getting the growth condition and the accompanied features for a good quality of diamond films. And it is determined the important parameters during the diamond film growth, which include the final sample will be measured with Raman spectroscopy to confirm the diamond component included in the film.

• Journal of the Korean Crystal Growth and Crystal Technology
• /
• v.6 no.2
• /
• pp.286-292
• /
• 1996

The research activities on the thin film crystal growth presented in the Journal of the Korean Association of Crystal Growth form 1991 to 1995 have been reviewed.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2016.02a
• /
• pp.421.1-421.1
• /
• 2016

We studied indium-doped zinc oxide (IZO) film grown by atomic layer deposition (ALD) as transparent conductive oxide (TCO). A variety of TCO layer, such as ZnO:Al (AZO), InSnO2(ITO), Zn (O,S) etc, has been grown by various method, such as ALD, chemical vapor deposition (CVD), sputtering, laser ablation, sol-gel technique, etc. Among many deposition methods, ALD has various advantages such as uniformity of film thickness, film composition, conformality, and low temperature deposition, as compared with other techniques. In this study, we deposited indium-doped zinc oxide thin films using diethyl[bis(trimethylsilyl)amido]indium [Et2InN(TMS)2] as indium precursor, DEZn as zinc precursor and H2O as oxidant for ALD and investigated the optical and electrical properties of IZO films. As an alternative, this liquid In precursor would has several advantages in indium oxide thin-film processes by ALD, especially for low resistance indium oxide thin film and high deposition rate as compared to InCp, InCl3, TMIn precursors etc. We found out that Indium oxide films grown by Et2InN(TMS)2 and H2O precursor show ALD growth mode and ALD growth window. We also found out the different growth rate of Indium oxide as the substrate and investigated the effect of the substrate on Indium oxide growth.

• Journal of the Korean Crystal Growth and Crystal Technology
• /
• v.9 no.3
• /
• pp.295-298
• /
• 1999

High quality of $Er_{2}O_{3}$ doped $LiNbO_{3}$ single crystal thin films were grown by the liquid phase epitaxial (LPE) method using $Er_{2}O_{3}$ doped at concentrations of 1,3, and 5 mol% respectively. After the growth of single crystal thin film, the crystallinity and the lattice mismatch along the c-axis between the film and the substrate was examined as a function of the variations of{{{{{Er}_{2}{O}_{3}}}}} dopant concentration using a X-ray double crystal technique. There was no lattice mismatch along the c-axis for the undoped film and those doped with 1 and 3 mol% of $Er_{2}O_{3}$. For 5 mol% of $Er_{2}O_{3}$ doped film, the lattice mismatch was $7.86{\times}10^{-4}$nm along the c-axis.

• Journal of the Korean Crystal Growth and Crystal Technology
• /
• v.9 no.5
• /
• pp.504-509
• /
• 1999

In-situ cleaning and subsequent silicon epitaxial film growth were performed in a load-locked reactor equipped with Hg-grid UV lamp and PBN heater to obtain the smooth and contaminant-free underlying surface and develop low-temperature epitaxial film growth process. The removals of organic and native oxide were investigated using UV-excited $O_2$ and $NF_{3}/H_{2}$, and the effect of the surface condition was examined on the quality of silicon epitaxial film grown at temperature as low as $750^{\circ}C$. UV-excited gas phase cleaning was found to be effective in removing the organic and native oxide successfully providing a smooth surface with RMS roughness of 0.5$\AA$ at optimal condition. Crystalline quality of epitaxial film was determined by smoothness of cleaned surface and the presence of native oxide and impurity. Crystalline defects such as dislocation loops or voids due to the surface roughness were observed by XTEM.

• Journal of the Korean Magnetics Society
• /
• v.22 no.4
• /
• pp.147-156
• /
• 2012

Recently, there have been considerable interests in various thin film growth techniques with atomically controllable thickness. Among them, atomically controlled pulsed laser deposition (PLD) technique is quite popular. We have developed advanced thin film growth technique using PLD and Reflection high energy electron diffraction (RHEED). Using the technique, the growth of oxide thin films with the precisely controllable thickness has been demonstrated. In addition, our technique can be applied to high quality thin film growth with minimal defect and bulk chemical composition. In this paper, our recent progresses as well as the current research trend on oxide thin films will be summarized.

• Journal of the Korean institute of surface engineering
• /
• v.52 no.1
• /
• pp.6-15
• /
• 2019

Metal-halide perovskite (MHP) solar cell is a promising candidate for next-generation flexible devices and the BIPV (Building-integrated photovoltaics) because it can exhibit high power conversion efficiencies over 23%, good bendability and low processing cost. However, MHP solar cells are commonly fabricated by the spin coating that is not a reliable method to produce large-scale commercial solar cells. A shear coating can be one of the potential candidates for the large-scale deposition method of MHP films. In this work, the influences of the process parameters such as solvents of precursor solution, substrate temperature, concentrations of precursor solution, and annealing time on the thin film growth of MHP were investigated for the shear coating process. This study presents the possibility of the shear coating process for large-scaled perovskite film fabrication and reveals the role of process condition in the thin film growth of perovskites.

• Journal of the East Asian Society of Dietary Life
• /
• v.10 no.4
• /
• pp.288-297
• /
• 2000

To understand the effect of radish on growth of food born microorganisms, mashedflesh radishes were extracted by using acetone and distilled water. Their effect was assayed by measuring the optical density of cultural broth of food born microorganisms. In the experiment, seven strains of yeast were used as the test organism. Acetone extract inhibited growth of the cells of L. plantarum, L. sake and Danmuji film yeast. Growth of the film yeast was drastically inhibited in the concomitant presence of 0.03% extract, while other microbes such as L. faecalis, P. pentosaceus, B/ subtilis and E. coli grew by succeeding cultivation for 4 to 8 hour after addition of the extract. Water extract, on contrast to acetone extract, at he concentrations of 0.1∼1.5% stimulated the growth of lactic acid bacteria. Culture of L. faecalis and L. sake showed an optical density higher than that of control by 40∼50 times. The effect was not so apparent against E. coli, S. aureus and Danmuji film yeast.