• Title/Summary/Keyword: exposure pattern

Search Result 453, Processing Time 0.019 seconds

Very Fine Photoresist Pattern Formation using Double Exposure of Optical Wafer Stepper (Optical Stepper의 이중노광에 의한 미세한 포토레지스트 패턴의 형성)

  • 양전욱;김봉렬;박철순;박형무
    • Journal of the Korean Institute of Telematics and Electronics A
    • /
    • v.31A no.7
    • /
    • pp.69-75
    • /
    • 1994
  • A very fine pattern formation process using double exposure is investigated, which can overcome the resolution limit of optical wafer stepper. The very fine pattern can be obtained by moving the edge profile of large pattern by means of moving the stepper stage. The simulation results show that the light transmittance decrease bellow 9%, and the contrast increase to 16.6% for the 0.3$\mu$m photoresist pattern exposeed by the double exposure using i-line wafer stepper. And the experimental results show that fine photoresist pattern as short as 0.2$\mu$m can be obtained without a loss of photoresist thickness. Also, it proves that the depth of focus for 0.3$\mu$m pattern is longer than $1.5\mu$m. And, the very fine negative photoresist pattern was formmed by using the double exposure technique and the image reversal process.

  • PDF

Development of Micro-Optical Patterned LCD-LGP using UV Inclined-Exposure Process (UV 경사노광에 의한 미세광학패턴 LCD-도광판)

  • Hwang C. J.;Kim J. S.;Ko Y. B.;Heo Y. M.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
    • /
    • 2005.05a
    • /
    • pp.51-54
    • /
    • 2005
  • Light Guide Plate (LGP) of LCD-BLU(Back Light Unit) is manufactured by forming optical pattern with $5\~100um$ in diameter on the LGP by means of sand blasting or etching method. However, in order to improve the luminance of LCD-LGP, the design of optical pattern has introduced UV inclined-exposure process in this study. This micro-optical pattern, which has asymmetric elliptical column shaped pattern, can change low viewing-angle to high viewing-angle, as well as it contribute to diffusion of light. As a result, this type of micro-optical pattern can introduce the highly luminance. The PR structure obtained in the stage of lithography has asymmetric elliptical column shape and it is processed into a micro-optical pattern. Optical design with this kind of micro-optical pattern, mold fabrication by electroplating and LGP molding with injection molding are under way.

  • PDF

Assessment of Time Activity Pattern for Workers (직장인의 시간활동 양상 평가)

  • Lee, Hyun-Soo;Shuai, Jianfei;Woo, Byung-Lyul;Hwang, Moon-Young;Park, Choong-Hee;Yu, Seung-Do;Yang, Won-Ho
    • Journal of Korean Society of Occupational and Environmental Hygiene
    • /
    • v.20 no.2
    • /
    • pp.102-110
    • /
    • 2010
  • Personal exposure relies on characteristics of time activity patterns of the population of concern as human activities impact the timing, location, and level of personal exposure. The information about time spent in microenvironments plays a critical role for personal exposure to air pollutants. It is useful to determine the precise times of the day that the subjects are in certain locations or engaging in specific activities because exposure to some air pollutants can depend on temporal trends. This study investigated time activity pattern for workers of Korean population over 19 years old with 8,778 workers in weekday. The residential indoor times were 12 hours. Time activity was different by gender and the mean times stayed at home in weekday were 12.9 hours in female and 11.42 hours in male, respectively. The major factors on residential indoor time and workplace time were age, monthly income, occupation and industry type, work position, education, and gender. Considering shorter than those in other countries, Korean workers spent less time at home after the working hours. Determinants of time activity pattern need to be taken into account in exposure assessment, epidemiological analyses, exposure simulations, as well as in the development of preventive strategies. Since there are substantial difference of Korean worker activity pattern, this information can be critical for exposure assessment in Korea.

Affecting Factors of Personal Exposure to Toluene according to Sociodemographic Characterization and Time-activity Pattern (사회·인구학적 요인과 시간활동양상에 따른 톨루엔 개인노출의 영향요인 분석)

  • Jung, Soon-Won;Lee, Seok-Yong;Kim, Hyun jeong;Choi, Wookhee;Kim, Suejin;Yu, Seungdo;Yang, Wonho
    • Journal of Environmental Health Sciences
    • /
    • v.43 no.2
    • /
    • pp.157-166
    • /
    • 2017
  • Objectives: Exposure to hazardous air pollutants could be affected by sociodemographic factors such as age, gender and more. Information on time spent in microenvironments has a critical role in exposure assessment. The purpose of this study was to analyze the exposure pathways which influence personal exposure through time-activity patterns and sociodemographic factors. Methods: A total of 379 subjects were collected from the second term of the Korean National Environmental Health Survey. A questionnaire survey in relation to sociodemographic factors and a time-activity diary were carried out for personal exposure to toluene. Focusing on personal exposure to toluene, factors affecting personal exposure were analyzed using multiple regression analysis. Results: Participants spent their time in an indoor house for $16.8{\pm}4.0hr$, workplace or school $2.3{\pm}3.5hr$, and other indoor $2.1{\pm}2.2hr$. Sociodemographic factors were significantly different among each personal exposure and microenvironment. Time of staying at an office turned out to be a main factor from point of exposure in exposure pathway using multiple regression analysis. As a result, this means that exposure may be different according to the time of staying in each microenvironment. Conclusions: Personal exposure to air pollutants might be decided by time-activity pattern indicating when, where, and which activities people pursue, as well as individual sociodemographic factors.

Estimating Personal Exposures to Air Pollutants in University Students Using Exposure Scenario (노출 시나리오를 이용한 대학생들의 유해 공기오염물질 노출 추정)

  • Kim, Sun-Shin;Hong, Ga-Yeon;Kim, Dong-Keon;Kim, Sung-Sam;Yang, Won-Ho
    • Journal of Environmental Science International
    • /
    • v.22 no.1
    • /
    • pp.47-57
    • /
    • 2013
  • Studies evaluating the health effects of hazardous air pollutants assume that people's exposure to typical pollutant level is the same as specific regional pollutant level. However, depending on social and demographic factors, time-activity pattern of people can vary widely. Since most people live in indoor environments over 88% of the day, evaluating exposure to hazardous air pollutants is hard to characterize. Objective of this study was to estimate the exposure levels of university students of $NO_2$, VOCs(BTEX) and $PM_{10}$ using the scenarios with time-activity pattern and indoor concentrations. Using data from time-use survey of National Statistical Office in 2009, we investigated time-activity pattern of university students and hourly major action. A total of 1,057 university students on weekday and 640 on weekend spent their times at indoor house 13.04 hr(54.32%), other indoors 7.70 hr(32.06%), and transportation 2.36 hr(9.83%). Indoor environments in which university students spent their times were mainly house and school. Air pollutants concentrations of other indoor environments except house and school such as bar, internet cafe and billiard hall were higher than outdoors, indicating that indoor to outdoor ratios were above 1. According to three types of exposure scenarios, exposure to air pollutants could be reduced by going home after school.

Double Exposure Laser Interference Lithography for Pattern Diversity using Ultraviolet Continuous-Wave Laser

  • Ma, Yong-Won;Park, Jun Han;Yun, Dan Hee;Gwak, Cheongyeol;Shin, Bo Sung
    • Journal of the Microelectronics and Packaging Society
    • /
    • v.26 no.2
    • /
    • pp.9-14
    • /
    • 2019
  • The newly discovered properties of periodic nanoscale patterns have increasingly sparked research interests in various fields. Along this direction, it is worth mentioning that there had been rare studies conducted on interference exposure, a method of creating periodic patterns. Additionally, these few studies seemed to validate the existence of only exact quadrangle shapes and dot patterns. This study asserted the formation of wavy patterns associated to using multiple exposures of the ratio of the first exposure intensity to the second exposure intensity. Such patterns were designed and constructed herein via overlapping of two Gaussian beams relative to certain rotation angles, and with a submicron structure fabricated based on a 360-nm continuous-wave laser. Results confirmed that the proposed double exposure laser interference lithography is able to create circular, elliptical and wavy patterns with no need for complex optical components.

Estimation of Total Exposure to Benzene, Toluene and Xylene by Microenvironmental Measurements for Iron Mill Workers (제철소 근로자의 벤젠/톨루엔/크실렌 국소환경 측정을 이용한 총 노출 예측)

  • Kim, Young-Hee;Yang, Won-Ho;Son, Bu-Soon
    • Journal of Environmental Health Sciences
    • /
    • v.33 no.5
    • /
    • pp.359-364
    • /
    • 2007
  • The aim of this study were to assess the personal exposure to volatile organic compounds (VOCs) and to estimate the personal exposure using time-weighted average model. Three target VOCs (benzene, toluene, xylene) were analyzed in personal exposure samples and residential indoor, residential outdoor and workplace indoor microenvironments samples in the iron mill 30 workers during working 5 days. Personal exposure to VOCs significantly correlated with workplace concentration p<0.05), suggesting workplace had strong source and major contribution to personal exposure. Personal exposure could be estimated with time activity pattern and time weighted average (TWA) model of residential indoor and workplace concentrations measured. Time weighted mean microenvironments concentrations were close approximately of personal exposure concentrations. Total exposure for participants can be estimated by TWA with microenvironments measurements and time activity pattern.

Unit-Rectangle Exposure Method for Advanced Through-put in Electron-Beam Direct Writing Lithography (전자선 직접묘사에서 Through-put이 향상된 단위 矩形묘사방법)

  • Park, Sun-Woo;Kim, Chul-Ju
    • Journal of the Korean Institute of Telematics and Electronics
    • /
    • v.26 no.2
    • /
    • pp.112-117
    • /
    • 1989
  • This paper describes to the unit rectangle EB direct writing lithography method using SEM. This method has the constant exposure time to any rectangle pattern. In order to change the EB current according to various rectangle size for the constant exposure time, the supply current of condenser lens in controlled by BITMAP-IV CAD system. By this method, the resizing procedure of density pattern area is not needed to pattern data conversion, and the through-put ofr exposure is increased about 172 times compared with the unit scan exposure method.

  • PDF

Application of Probabilistic Health Risk Analysis in Life Cycle Assessment -Part I : Life Cycle Assessment for Environmental Load of Chemical Products using Probabilistic Health Risk Analysis : A Case Study (전과정평가에 있어 확률론적 건강영향분석기법 적용 -Part II : 화학제품의 환경부하 전과정평가에 있어 건강영향분석 모의사례연구)

  • Park, Jae-Sung;Choi, Kwang-Soo
    • Journal of Environmental Impact Assessment
    • /
    • v.9 no.3
    • /
    • pp.203-214
    • /
    • 2000
  • Health risk assessment is applied to streamlining LCA(Life Cycle Assessment) using Monte carlo simulation for probabilistic/stochastic exposure and risk distribution analysis caused by data variability and uncertainty. A case study was carried out to find benefits of this application. BTC(Benzene, Trichloroethylene, Carbon tetrachloride mixture alias) personal exposure cases were assumed as production worker(in workplace), manager(in office) and business man(outdoor). These cases were different from occupational retention time and exposure concentration for BTC consumption pattern. The result of cancer risk in these 3 scenario cases were estimated as $1.72E-4{\pm}1.2E+0$(production worker; case A), $9.62E-5{\pm}1.44E-5$(manger; case B), $6.90E-5{\pm}1.16E+0$(business man; case C), respectively. Portions of over acceptable risk 1.00E-4(assumed standard) were 99.85%, 38.89% and 0.61%, respectively. Estimated BTC risk was log-normal pattern, but some of distributions did not have any formal patterns. Except first impact factor(BTC emission quantity), sensitivity analysis showed that main effective factor was retention time in their occupational exposure sites. This case study is a good example to cover that LCA with probabilistic risk analysis tool can supply various significant information such as statistical distribution including personal/environmental exposure level, daily time activity pattern and individual susceptibility. Further research is needed for investigating real data of these input variables and personal exposure concentration and application of this study methodology.

  • PDF

A study on processing characteristics of plasma etching using photo lithography (Photo lithography을 이용한 플라즈마 에칭 가공특성에 관한 연구)

  • Baek, Seung-Yub
    • Design & Manufacturing
    • /
    • v.12 no.1
    • /
    • pp.47-51
    • /
    • 2018
  • As the IT industry rapidly progresses, the functions of electronic devices and display devices are integrated with high density, and the model is changed in a short period of time. To implement the integration technology, a uniform micro-pattern implementation technique to drive and control the product is required. The most important technology for the micro pattern generation is the exposure processing technology. Failure to implement the basic pattern in this process cannot satisfy the demands in the manufacturing field. In addition, the conventional exposure method of the mask method cannot cope with the small-scale production of various types of products, and it is not possible to implement a micro-pattern, so an alternative technology must be secured. In this study, the technology to implement the required micro-pattern in semiconductor processing is presented through the photolithography process and plasma etching.