• Title/Summary/Keyword: electron beam method

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Heat Source Modeling and Study on the Effect of Thickness on Residual Stress Distribution in Electron Beam Welding

  • Rajabi, Leila;Ghoreishi, Majid
    • Journal of Welding and Joining
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    • v.35 no.1
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    • pp.49-54
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    • 2017
  • In this study, the volumetric heat source in electron beam welding (EBW) is modeled through finite element method taking advantage of ABAQUS software package. Since this welding method is being applied in plates with different thicknesses and also considering that residual stresses reduce the strength of these weldments, the effect of thickness in the distribution and magnitude of residual stresses after welding is studied. Regarding the vast application of Inconel 706 super-alloy in aerospace industries, this material was selected in the current research. In order to validate the finite element model, the obtained results were compared to those of other researchers in this area, and good agreement was observed. The simulation results revealed that increase in the plate thickness leads to increase in the residual stresses. In addition heat treatment in the base metal (before welding) increases the residual stresses significantly.

Development of Auto-hydrolysis Method for Preparing Cotton Linter Regenerated Fibers of Textile Fabrics (방직용 재생펄프 제조를 위한 면 린터의 자기가수분해 공정 개발)

  • Sohn, Ha Neul;Park, Hee Jung;Seo, Yung Bum
    • Journal of Korea Technical Association of The Pulp and Paper Industry
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    • v.47 no.6
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    • pp.81-88
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    • 2015
  • The molecular weight (MW) and crystallinity of cotton linter need to be controlled to be dissolved well in N-methylmorpholine N-oxide (NMMO) solvent for manufacturing regenerated fibers of clothing fabrics. Electron beam irradiation or sulfuric acid pre-treatment followed by alkaline peroxide bleaching has been used to control MW effectively and to improve brightness of cotton linter. Auto-hydrolysis of cotton linter without electron beam irradiation or chemical pre-treatment was found to be effective as an alternative pre-treatment method. Removal of metal ions, that hampered dissolution of cotton linter by NMMO, was also investigated when the auto-hydrolysis was accompanied with ionic polymers and chelating agent.

Comparative study on the specimen thickness measurement using EELS and CBED methods

  • Yoon-Uk Heo
    • Applied Microscopy
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    • v.50
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    • pp.8.1-8.7
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    • 2020
  • Two thickness measurement methods using an electron energy loss spectroscopy (EELS) and 10a convergent beam electron diffraction (CBED) were compared in an Fe-18Mn-0.7C alloy. The thin foil specimen was firstly tilted to satisfy 10a two-beam condition. Low loss spectra of EELS and CBED patterns were acquired in scanning transmission electron microscopy (STEM) and TEM-CBED modes under the two-beam condition. The log-ratio method was used for measuring the thin foil thickness. Kossel-Möllenstedt (K-M) fringe of the $13{\ba{1}}$ diffracted disk of austenite was analyzed to evaluate the thickness. The results prove the good coherency between both methods in the thickness range of 72 ~ 113 nm with a difference of less than 5%.

Electro - Optical Characteristics of MgO Double Layer prepared by E-beam and Sputtering Method (E-beam과 R.F. 마그네트론 스퍼터링을 사용한 double MgO박막의 전기-광학적 특성)

  • Ok, J.W.;Kim, H.J.;Choi, J.H.;Choi, J.Y.;Kim, D.H.;Lee, H.J.;Yoo, S.B.;Park, J.H.
    • Proceedings of the KIEE Conference
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    • 2005.07c
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    • pp.2172-2174
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    • 2005
  • MgO has been used as the material of the protecting layer for AC PDP. AC PDP is influenced by characteristics of the surface glow discharge on the MgO thin film. Because MgO thin film is practically discharge electrodes, the discharge characteristics of MgO thin film should be varied with the method of deposition. In this study, changing order and time of deposition, we use electron beam evaporation system and R.F reactive magnetron sputtering system in the MgO deposition. Particularly, after using electron beam evaporation system, we use R.F. reactive magnetron sputtering system in the MgO deposition, then we could get lower amount of charge and higher luminance efficiency than only using electron beam evaporation system.

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Effects of electron reflection for the tungsten oxide film coated on shadow mask in CRT (CRT Shadow mask 위에 도포된 산화텅스텐 피막의 전자반사 효과)

  • 김상문;배준호
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1998.11a
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    • pp.129-132
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    • 1998
  • In this paper, we have studied the effect of electron reflection on shadow mask on which tungsten oxide film is coated and have studied the variation of beam mislanding with coating thickness in CRT. We found the method to be able to control coating thicknessed and optimum coating thickness of tungsten oxide film was 1∼2$\mu\textrm{m}$. Mislanding of electron beam was reduced about 20∼48% with increasing coating thickness in CRT

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Novel reforming of pyrolized fuel oil by electron beam radiation for pitch production

  • Jung, Jin-Young;Park, Mi-Seon;Kim, Min Il;Lee, Young-Seak
    • Carbon letters
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    • v.15 no.4
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    • pp.262-267
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    • 2014
  • Pyrolized fuel oil (PFO) was reformed by novel electron beam (E-beam) radiation, and the elemental composition, chemical bonds, average molecular weight, solubility, softening point, yields, and density of the modified patches were characterized. These properties of modified pitch were dependent on the reforming method (heat or E-beam radiation treatment) and absorbed dose. Aromaticity ($F_a$), average molecular weight, solubility, softening point, and density increased in proportion to the absorbed dose of E-beam radiation, with the exception of the highest absorbed dose, due to modification by free radical polymerization and the powerful energy intensity of E-beam treatment. The H/C ratio and yield exhibited the opposite trend for the same reason. These results indicate that novel E-beam radiation reforming is suitable for the preparation of aromatic pitch with a high ${\beta}$-resin content.

Study on the Optical Thin Film Coating of Glass Lenses Prepared by Electron Beam Deposition (전자 빔 증착에 의한 안경렌즈의 박막 코팅에 관한 연구)

  • 김종태;김지홍;김원호
    • Journal of the Korean Graphic Arts Communication Society
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    • v.18 no.1
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    • pp.47-58
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    • 2000
  • Transmittances of SiO2 and ZrO2 thin films, made by the electron beam evaporation method, were measured with a spectrophotometer to be used in determining their optical constants and thicknesses in the envelop method. New color glass lenses with high transmittance, which now can be manufactured in the industry, was successfully designed by using these constants. Also the vacuum evaporator could be mechanically corrected with these constants as correction factors.

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Fabrication of a Graphene Nanoribbon with Electron Beam Lithography Using a XR-1541/PMMA Lift-Off Process

  • Jeon, Sang-Chul;Kim, Young-Su;Lee, Dong-Kyu
    • Transactions on Electrical and Electronic Materials
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    • v.11 no.4
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    • pp.190-193
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    • 2010
  • This report covers an effective fabrication method of graphene nanoribbon for top-gated field effect transistors (FETs) utilizing electron beam lithography with a bi-layer resists (XR-1541/poly methtyl methacrylate) process. To improve the variation of the gating properties of FETs, the residues of an e beam resist on the graphene channel are successfully taken off through the combination of reactive ion etching and a lift-off process for the XR-1541 bi-layer. In order to identify the presence of graphene structures, atomic force microscopy measurement and Raman spectrum analysis are performed. We believe that the lift-off process with bi-layer resists could be a good solution to increase gate dielectric properties toward the high quality of graphene FETs.

Liquid Crystal Aligning Capabilities for Nematic Liquid Crystal on the ZrOx Thin Film Layer with E-beam Evaporation

  • Kim, Mi-Jung;Han, Jin-Woo;Kim, Young-Hwan;Kim, Byoung-Yong;Han, Jeong-Min;Moon, Hyun-Chan;Park, Kwang-Bum;Seo, Dae-Shik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.378-378
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    • 2007
  • In this study, liquid crystal (LC) aligning capabilities for homeotropic alignment on the $ZrO_x$ thin film by electron beam evaporation method were investigated. Also, the control of pretilt angles and thermal stabilities of the NLC treated on $ZrO_x$ thin film were investigated. The uniform LC alignment on the $ZrO_x$ thin film surfaces and good thermal stabilities with electron beam evaporation can be achieved. It is considerated that the LC alignment on the $ZrO_x$ thin film by electron beam evaporation is attributed to elastic interaction between LC molecules and micro-grooves at the $ZrO_x$ thin film surface created by evaporation. In addition, it can be achieved the good electro-optical (EO) properties of the VA-LCD on $ZrO_x$ thin film layer with. oblique electron beam evaporation.

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Shielding Design of Electron Beam Accelerators Using Supercomputer (슈퍼컴을 이용한 전자빔가속기의 차폐설계)

  • Kang, Won Gu;Kim, In Soo;Kuk, Sung Han;Kim, Jin Kyu;Han, Bum Soo;Jeong, Kwang Young;Kang, Chang Mu
    • Journal of Radiation Industry
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    • v.4 no.1
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    • pp.33-38
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    • 2010
  • The MCNP5 neutron, electron, photon Monte Carlo transport program was installed on the KISTI's SUN Tachyon computer using the parallel programming. Electron beam accelerators were modeled and shielding calculations were performed in order to investigate the reduction of computation time in the supercomputer environment. It was observed that a speedup of 40 to 80 of computation time can be obtained using 64 CPUs compared to an IBM PC.