• 한국군사과학기술학회지
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• 제1권1호
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• pp.114-127
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• 1998

A user friendly computer code(EMCOMST; Electro-Magnetic response for COMposite STructures) was developed which provides with computations of the response characteristics such as reflectance and transmittance to the incident wave angles, frequencies, composite thicknesses, ply orientations, and types of backplate as the linearly polarized transverse electro-magnetic wave is emitted to the advanced composite structures. In this investigation were reviewed the electromagnetic characteristics of the continuous orthotropic fiber-reinforced organic matrix composites with or without ferrite fillers, which are actively applied to low-weight and high-strength aircraft structures. Also were calculated the response of the three layered compound structures which have appropriately stacked above-mentioned materials as transmitting layer, absorbing layer, reflection layer, respectively under the specific thickness constraints for mechanical strength design requirements. For the composite structures presented in this study, minimum reflectance value less than -5㏈ can be obtained in the frequency range of 4 to 12 ㎓. In addition, analysis of structures attached isotropic radar absorbing materials(RAM) is facilitated by putting the material properties in the material input card entries adequately.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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• pp.785-787
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• 2002

Conductivity and transmittancy of ZnO is very excellent and the price is low. So the study of transparent electrode materials and electromagnetic wave shielding wall is actively in progress. We add $Al_2O_3$(0.0, 2.0, 3.0, 5.0wt%) to ZnO and observe microscopic structure and conductivity. For XRD observation, Al peak of AZO is increased by increasing the amount of $Al_2O_3$. We observe that the size of grain is reduced by increasing the liquid phase of grain boundary to SEM observation. Conductivity of AZO is increased by increasing the amount of $Al_2O_3$. We confirm the application possibility of the materials for electromagnetic wave reflection materials.

• 한국재료학회지
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• 제29권9호
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• pp.532-541
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• 2019

Information and communication technologies are developing rapidly as IC chip size becomes smaller and information processing becomes faster. With this development, digital circuit technology is being widely applied to mobile phones, wireless LANs, mobile terminals, and digital communications, in which high frequency range of GHz is used. In high-density electronic circuits, issues of noise and EMC(Electro-Magnetic Compatibility) arising from cross talk between interconnects or devices should be solved. In this study, sheet-type electromagnetic wave absorbers that cause electromagnetic wave attenuation are fabricated using composites based on soft magnetic metal powder and silicon rubber to solve the problem of electromagnetic waves generated in wireless communication products operating at the frequency range of 2.4 GHz. Sendust(Fe-Si-Al) and carbonyl iron(Fe-C) were used as soft magnetic metals, and their concentrations and sheet thicknesses were varied. Using soft magnetic metal powder, a sheet is fabricated to exhibit maximum electromagnetic attenuation in the target frequency band, and a value of 34.2dB(99.9 % absorption) is achieved at the target frequency.

• 한국재료학회지
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• 제29권6호
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• pp.363-370
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• 2019

The recent development of information and communication technologies brings new changes to automobile traffic systems. The most typical example is the advancement of dedicated short range communication(DSRC). DSRC mainly consists of an intelligent transportation system(ITS), an electronic toll collection system(ETCS) and an advanced traveler information system(ATIS). These wireless communications often cause unnecessary electromagnetic waves, and these electromagnetic waves, in turn, cause frequent system malfunction. To solve this problem, an absorber of electromagnetic waves is suggested. In this research, various materials, such as powdered metal and iron oxides, are used to test the possibility for an effective absorption of the unnecessary electromagnetic waves. The various metal powders are made into a thin sheet form by compositing through processing. The electromagnetic characteristics(complex permittivity, complex permeability) of the fabricated sheet are measured. As a result, we achieve -6.5 dB at 940 MHz(77.6 % absorption rate) with a 1.0 mm-thickness electromagnet wave absorber, and -9.5 dB at 940 MHz(88.8 % absorption rate) with a 2.0 mm-thickness absorber.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.100-101
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• 2012

The plasma damage free and room temperature processedthin film deposition technology is essential for realization of various next generation organic microelectronic devices such as flexible AMOLED display, flexible OLED lighting, and organic photovoltaic cells because characteristics of fragile organic materials in the plasma process and low glass transition temperatures (Tg) of polymer substrate. In case of directly deposition of metal oxide thin films (including transparent conductive oxide (TCO) and amorphous oxide semiconductor (AOS)) on the organic layers, plasma damages against to the organic materials is fatal. This damage is believed to be originated mainly from high energy energetic particles during the sputtering process such as negative oxygen ions, reflected neutrals by reflection of plasma background gas at the target surface, sputtered atoms, bulk plasma ions, and secondary electrons. To solve this problem, we developed the NBAS (Neutral Beam Assisted Sputtering) process as a plasma damage free and room temperature processed sputtering technology. As a result, electro-optical properties of NBAS processed ITO thin film showed resistivity of $4.0{\times}10^{-4}{\Omega}{\cdot}m$ and high transmittance (>90% at 550 nm) with nano- crystalline structure at room temperature process. Furthermore, in the experiment result of directly deposition of TCO top anode on the inverted structure OLED cell, it is verified that NBAS TCO deposition process does not damages to the underlying organic layers. In case of deposition of transparent conductive oxide (TCO) thin film on the plastic polymer substrate, the room temperature processed sputtering coating of high quality TCO thin film is required. During the sputtering process with higher density plasma, the energetic particles contribute self supplying of activation & crystallization energy without any additional heating and post-annealing and forminga high quality TCO thin film. However, negative oxygen ions which generated from sputteringtarget surface by electron attachment are accelerated to high energy by induced cathode self-bias. Thus the high energy negative oxygen ions can lead to critical physical bombardment damages to forming oxide thin film and this effect does not recover in room temperature process without post thermal annealing. To salve the inherent limitation of plasma sputtering, we have been developed the Magnetic Field Shielded Sputtering (MFSS) process as the high quality oxide thin film deposition process at room temperature. The MFSS process is effectively eliminate or suppress the negative oxygen ions bombardment damage by the plasma limiter which composed permanent magnet array. As a result, electro-optical properties of MFSS processed ITO thin film (resistivity $3.9{\times}10^{-4}{\Omega}{\cdot}cm$, transmittance 95% at 550 nm) have approachedthose of a high temperature DC magnetron sputtering (DMS) ITO thin film were. Also, AOS (a-IGZO) TFTs fabricated by MFSS process without higher temperature post annealing showed very comparable electrical performance with those by DMS process with $400^{\circ}C$ post annealing. They are important to note that the bombardment of a negative oxygen ion which is accelerated by dc self-bias during rf sputtering could degrade the electrical performance of ITO electrodes and a-IGZO TFTs. Finally, we found that reduction of damage from the high energy negative oxygen ions bombardment drives improvement of crystalline structure in the ITO thin film and suppression of the sub-gab states in a-IGZO semiconductor thin film. For realization of organic flexible electronic devices based on plastic substrates, gas barrier coatings are required to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency flexible AMOLEDs needs an extremely low water vapor transition rate (WVTR) of $1{\times}10^{-6}gm^{-2}day^{-1}$. The key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required (under ${\sim}10^{-6}gm^{-2}day^{-1}$) is the suppression of nano-sized defect sites and gas diffusion pathways among the grain boundaries. For formation of high quality single inorganic gas barrier layer, we developed high density nano-structured Al2O3 single gas barrier layer usinga NBAS process. The NBAS process can continuously change crystalline structures from an amorphous phase to a nano- crystalline phase with various grain sizes in a single inorganic thin film. As a result, the water vapor transmission rates (WVTR) of the NBAS processed $Al_2O_3$ gas barrier film have improved order of magnitude compared with that of conventional $Al_2O_3$ layers made by the RF magnetron sputteringprocess under the same sputtering conditions; the WVTR of the NBAS processed $Al_2O_3$ gas barrier film was about $5{\times}10^{-6}g/m^2/day$ by just single layer.