• 제목/요약/키워드: electro/UV process

검색결과 38건 처리시간 0.02초

전기분해와 UV 조사에 의한 수중의 Rhodamine B의 제거(I) (Removal of Rhodamine B in Water by Ultraviolet Radiation Combined with Electrolysis(I))

  • 박영식
    • 한국환경보건학회지
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    • 제34권6호
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    • pp.439-445
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    • 2008
  • The feasibility study for the application of the removal and mineralization of Rhodamine B (RhB) was performed in a batch electrochemical reactor. The electro/UV process was consisted of DSA (dimensionally stable anode) electrode and UV-C or ozone lamp. The experimental results showed that RhB removal by the ozone lamp was higher than that of the UV-C lamp. Optimum current of the electro/UV process was 1 A. The electrochemical, UV and electro/UV process could completely degrade RhB, while a prolonged treatment was necessary to reach a high level RhB mineralization. It was observed that RhB removal in electro/UV process is similar to the sum of the UV and electrolytic decolorization. However, it was found that the COD of RhB could be degraded more efficiently by the electro/UV process (90.2 %) than the sum of the two individual oxidation processes [UV (19.7%) and electrolytic process (50.8%)]. A synergetic effect was demonstrated between the UV and electrolysis.

고급산화공정을 이용한 아세트아미노펜 분해 성능 비교 (Comparison of Acetaminophen Degradation Performance using Advanced Oxidation Process)

  • 김동석;박영식
    • 한국환경과학회지
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    • 제31권4호
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    • pp.319-328
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    • 2022
  • This study investigated the treatment of acetaminophen in municipal wastewater by conventional ozonation, ozone-based advanced oxidation, ozone/UV, and the electro-peroxone process. The ozone/UV process and electro-peroxone process of electric power consumption increased 1.25 and 2.04 times, respectively, compared to the ozone process. The pseudo-steady OH radical concentration was the greatest in the electro-peroxone process and lowest in the ozone process. The specific energy consumption for TOC decomposition of the ozone/UV process and electro-peroxone process were 22.8% and 15.5% of the ozone process, respectively. Results suggest that it is advantageous in terms of degradation performance and energy consumption to use a combination of processes in municipal wastewater treatment, rather than an ozone process alone. In combination with the ozone process, the electrolysis process was found to be more advantageous than the UV process.

E. coli 불활성화와 산화제 생성에 미치는 소독 공정 결합의 영향 (Effect of Disinfection Process Combination on E. coli Deactivation and Oxidants Generation)

  • 김동석;박영식
    • 한국환경과학회지
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    • 제20권7호
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    • pp.891-898
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    • 2011
  • The aim of this research was to evaluate the effect of combination of disinfection process (electrolysis, UV process) on Escherichia coli (E. coli) disinfection and oxidants (OH radical, $ClO_2$, HOCl, $H_2O_2$ and $O_3$) generation. The effect of electrolyte type (NaCl, KCl and $Na_2SO_4$) on the E. coli disinfection and oxidants generation were evaluated. The experimental results showed that performance of E. coli disinfection of electrolysis and UV single process was similar. Combination of electrolysis and UV process enhanced the E. coli disinfection and 4-carboxybenzaldehyde (4-CBA, indicator of the generation of OH radical) degradation. It is clearly showed synergy effect on disinfection and OH radical formation. However chlorine ($ClO_2$, HOCl) and oxygen type ($H_2O_2$, $O_3$) oxidants were decreased with the combination of two process. In electrolysis + UV complex process, electro-generated $H_2O_2$ and $O_3$ were reacted with UV light of UV-C lamp and increased 4-CBA degradation(increase OH radical). Disinfection of electrolyte of chlorine type was higher than that of the sulfate type electrolyte due to the higher generation of OH radical and oxidants.

Box-Behnken법을 이용한 E. coli 소독에서 전기-UV-초음파 복합 공정의 최적화 (Optimization of Electro-UV-Ultrasonic Complex Process for E. coli Disinfection using Box-Behnken Experiment)

  • 김동석;박영식
    • 대한환경공학회지
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    • 제33권3호
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    • pp.149-156
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    • 2011
  • 수중에서 E. coli 소독을 위한 전기-UV-초음파 복합 공정에 대해 실험계획법과 반응표면분석법(RSM)을 적용하였다. 2차반응표면 모형식을 추정할 수 있는 Box-Behnken법을 이용하여 전기-UV-초음파 복합 공정의 소독 반응에서 전기분해($X_1$), UV ($X_2$), 및 초음파 공정($X_3$)의 전력을 독립변수로 선정하여 수학적으로 모형화하였다. 소독 후 잔류 E. coli 수와 독립변수 사이의 실험에서 독립변수에 대해 다음의 모형식이 얻어졌다. 잔류 E. coli number (Ln CFU) = 23.69 - 3.75 Electrolysis - 0.67 UV - 0.26 Ultrasonic - 0.16 Electrolysis UV + 0.05 Electrolysis Ultrasonic + 0.27 $Electrolysis^2$ + 0.14 $UV^2$ - 0.01 $Ultrasonic^2$). 예측된 모형식은 실험 자료와 잘 일치하였다($R^2$ = 0.983). 2차원 등고선도와 3차원 반응표면도가 잔류 E. coli 수에 대한 최적 범위를 구하기 위하여 사용되었다. Design-Expert 소프트웨어의 '수치 최적화'를 이용하여 잔류 E. coli 수에 대한 최적 값을 찾은 결과 1.47 Ln CFU/L이었고, 최적 조건은 전기분해 6.94 W, UV 6.72 W 및 초음파 공정 14.23 W로 나타났다. 본 연구는 반응표면분석법이 복합 소독 공정에서 잔류 E. coli 수를 최소화하고 운전 조건을 최적화하기 위한 적절한 방법 중의 하나라는 것을 보여주었다.

Camera Imaging Lens Fabrication using Wafer-Scale UV Embossing Process

  • Jeong, Ho-Seop;Kim, Sung-Hwa;Shin, Dong-Ik;Lee, Seok-Cheon;Jin, Young-Su;Noh, Jung-Eun;Oh, Hye-Ran;Lee, Ki-Un;Song, Seok-Ho;Park, Woo-Je
    • Journal of the Optical Society of Korea
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    • 제10권3호
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    • pp.124-129
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    • 2006
  • We have developed a compact and cost-effective camera module on the basis of wafer-scale-replica processing. A multiple-layered structure of several aspheric lenses in a mobile-phone camera module is first assembled by bonding multiple glass-wafers on which 2-dimensional replica arrays of identical aspheric lenses are UV-embossed, followed by dicing the stacked wafers and packaging them with image sensor chips. This wafer-scale processing leads to at least 95% yield in mass-production, and potentially to a very slim phone with camera-module less than 2 mm in thickness. We have demonstrated a VGA camera module fabricated by the wafer-scale-replica processing with various UV-curable polymers having refractive indices between 1.4 and 1.6, and with three different glass-wafers of which both surfaces are embossed as aspheric lenses having $230{\mu}m$ sag-height and aspheric-coefficients of lens polynomials up to tenth-order. We have found that precise compensation in material shrinkage of the polymer materials is one of the most technical challenges, in orderto achieve a higher resolution in wafer-scaled lenses for mobile-phone camera modules.

전기-UV 복합 공정을 이용한 E. coli 소독 : 실험계획법중 박스-벤켄법을 이용한 소독 특성 및 최적화 (Disinfection of E. coli Using Electro-UV Complex Process: Disinfection Characteristics and Optimization by the Design of Experiment Based on the Box-Behnken Technique)

  • 김동석;박영식
    • 한국환경과학회지
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    • 제19권7호
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    • pp.889-900
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    • 2010
  • The experimental design and response surface methodology (RSM) have been applied to the investigation of the electro-UV complex process for the disinfection of E. coli in the water. The disinfection reactions of electro-UV process were mathematically described as a function of parameters power ($X_1$), NaCl dosage ($X_2$), initial pH ($X_3$) and disinfection time ($X_4$) being modeled by use of the Box-Behnken technique. The application of RSM using the Box-Behnken technique yielded the following regression equation, which is an empirical relationship between the residual E. coli number and test variables in actual variables: Ln (CFU) = 23.57 - 0.87 power - 1.87 NaCl dosage - 2.13 pH - 2.84 time - 0.09 power time - 0.07 NaCl dosage pH + 0.14 pH time + 0.03 $power^2$ + 0.47 NaCl $dosage^2$ + 0.20 $pH^2$+ 0.33 $time^2$. The model predictions agreed well with the experimentally observed result ($R^2$ = 0.9987). Graphical response surface and contour plots were used to locate the optimum point. The estimated ridge of maximum response and optimal conditions for the E. coli disinfection using canonical analysis was Ln 1.06 CFU (power, 15.40 W; NaCl dosage, 1.95 g/L, pH, 5.94 and time, 4.67 min). To confirm this optimum condition, the obtained number of the residual E. coli after three additional experiments were Ln 1.05, 1.10 and Ln 1.12. These values were within range of 0.62 (95% PI low)~1.50 (95% PI high), which indicated that conforming the reproducibility of the model.

수지의 하전 입자빔 전처리 공정의 최적화 (Optimization for Electro Deposition Process of PC/ABS Resin Surface Treatment)

  • 박영식;심하몽;나명환;송호천;윤상후;장근삼
    • 응용통계연구
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    • 제27권4호
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    • pp.543-552
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    • 2014
  • 최근 휴대단말기 시장에서는 블루투스, GPRS, EDGE, 3GSM, HSDPA 등과 같은 높은 대역폭의 RF를 사용하고 있다. 높은 대역폭의 RF 영역에서는 높은 면저항(Sheet resistance)을 갖는 무전도 금속박막 코팅 방법이 사용되고 있는데, 기존의 무전도 금속증착은 사출물 세정, UV 하도 코팅, 금속증착, UV 중도 코팅, 상도 코팅 등 다수의 복합 공정으로 이루어져 있다. 특히 하도공정은 금속 증착(Sputtering)과 일괄 처리가 어려워 생산성이 낮고 생산원가 상승의 원인이기도 하다. 따라서 이를 극복하기 위하여 최근 Na 등 (2014)은 무전도 금속코팅에서 Primer 대체를 위한 전자빔의 표면처리의 가능성을 가능함을 보였다. In this paper, 플라즈마 생성 전자빔 소스(Plasma generated electron beam source)를 활용하여 PC/ABS 수지 사출물의 공정을 실험계획법에 의한 전자빔 조사 조건을 탐색하여, 즉, 수지 표면처리공정 조건을 탐색하여, 그 실험 결과를 분석하여, 진공전처리공정 개발 및 양산공정라인의 처리의 최적 조건을 찾고자 한다.

전기광학 폴리머를 이용한 Y 분기형 위상 변조기의 제작 (Fabrication of a Y-branch Phase Modulator Using an Electro-Optic Polymer)

  • 오영훈;신상영
    • 한국광학회:학술대회논문집
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    • 한국광학회 2000년도 하계학술발표회
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    • pp.34-35
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    • 2000
  • A Y-branch phase modulator made of an electro-optic(EO) polymer has been designed and fabricated. An EO polymer, PMMA-DR1, is used for the core layer, and UV-curable polymers, UV-15 and UV-15 LV, for the cladding layers. The rib type polymeric waveguides are fabricated by the reactive ion etching method and their EO effects are obtained by the poling process. The optical properties of the fabricated phase modulator are as follows: the halfwave voltage, $V_{\pi}$, is 25 V, the insertion loss of TM mode is 13.8 dB, and the intensity modulation is 0.17 % (V).

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저온 공정의 Si을 이용한 PI 배향 막의 전기광학 특성 향상에 대한 연구 (Si Induced Polymer Based Alignment Layer for Liquid Crystal Orientations with High Electro-Optic Properties at Low Temperature)

  • 김대현
    • 한국전기전자재료학회논문지
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    • 제26권9호
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    • pp.677-681
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    • 2013
  • Apart from the deposition of alignment layer, alignment process needs to be involved for alignment of liquid crystal (LC) molecules. To simplify manufacturing process, several method were used such as rubbing, ion-beam irradiation, UV irradiation, and lithography. But, eventually it needs another treatment for LC alignment. Here, we suggested Si induced polyimide (PI) alignment layer at low temperature. Using this method, we are able to eliminate the alignment process and found that the alignment and electro-optic performance are much better than that of the rubbed PI LC cells. Compared to the rubbed PI cells, the response time was decreased by 70% and C-V characteristics have hysteresis-free.

용액성장법에서 자외선 조사를 이용한 CdS의 산소함량 제어 (Oxygen Control in CdS Thin Film by UV Illumination in Chemical Bath Deposition)

  • 백현지;오지아;서영은;신혜진;조성욱;전찬욱
    • Current Photovoltaic Research
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    • 제7권2호
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    • pp.33-37
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    • 2019
  • In this paper, we compared the performance of $Cu(In,Ga)(S,Se)_2$ (CIGSSe) thin film solar cell with CdS buffer layer deposited by irradiating 365 nm UV light with 8 W power in Chemcial Bath Deposition (CBD) process. The effects of UV light irradiation on the thin film deposition mechanism during CBD-CdS thin film deposition were investigated through chemical and electro-optical studies. If the UV light is irradiated during the solution process, the hydrolysis of Thiourea is promoted even during the same time, thereby inhibiting the formation of the intermediate products developed in the reaction pathway and decreasing the pH of the solution. As a result, it is suggested that the efficiency of the CdS/CIGSSe solar cell is increased because the ratio of the S element in the CdS thin film increases and the proportion of the O element decreases. This is a very simple and effective approach to control the S/O ratio of the CdS thin film by the CBD process without artificially controlling the process temperature, solution pH or concentration.