• 한국표면공학회지
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• 제27권2호
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• pp.109-117
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• 1994

Effect of ultrasonic agitation on the contact properties was studied in Ni electroless plating and Pd activation. P-type Si bare wafers were used as substrate and DMAB was used as reducing agent due to its good electrical properties, solderability and compatibility to substrate. In activation, high density Pd nuclei of small size were formed during ultra-sonic agitation compared to that of no stirring. In electroless plating, the plating rate was enhanced by 30∼90% by using ultrasonic agitation. In elecrtoless plating, inhibitor is the most effective additives in ultrasonic agitation. In this experi-ment, thiourea was used as inhibitor. The less the amount of the inhibitor, the more ultrasonic agitation efficiency. It is confirmed by SEM that Ni-B films formed by ultrasonic were coarser, less porous, and denser than those of no stirring. In ultrasonic agitation, boron content of the films was more than those of no stirring. In this case, the more DMAB concentration, the higher the temperature, the less pH, the more boron content. Resistivity of the films formed by ultrasonic agitation was higher than that of no strirring. As the content of boron was increased, the resistivity of the films was increased exponentially.

• Journal of the Optical Society of Korea
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• 제19권3호
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• pp.217-221
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• 2015

Developing a metallization that has low cost and high efficiency is essential in solar-cell industries, to replace expensive silver-based metallization. Ni/Cu two-step metallization is one way to reduce the cost of solar cells, because the price of copper is about 100 times less than that of silver. Alkaline electroless plating was used for depositing nickel seed layers on the front electrode area. Prior to the nickel deposition process, 2% HF solution was used to remove native oxide, which disturbs uniform nickel plating. In the subsequent step, a nickel sintering process was carried out in $N_2$ gas atmosphere; however, copper was plated by light-induced plating (LIP). Plated nickel has different properties under different bath conditions because nickel electroless plating is a completely chemical process. In this paper, plating bath conditions such as pH and temperature were varied, and the metal layer's structure was analyzed to investigate the adhesion of Ni/Cu metallization. Average adhesion values in the range of 0.2-0.49 N/mm were achieved for samples with no nickel sintering process.

• 수산해양기술연구
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• 제39권3호
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• pp.211-217
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• 2003

해양환경의 비저항 변화에 따른 모재, Ni도금 및 Cr도금의 분극저항, 부식전류밀도, 부식억제율 및 분극지배기구에 관하여 연구한 결과 다음과 같은 결론을 얻었다. 1) Cr도금 및 Ni도금의 분극저항은 모재의 분극저항보다 더 높게 나타나고, 이들 재료의 분극저항은 비저항이 감소함에 따라 낮아진다. 2) 비저항이 낮아질수록 Cr도금 및 Ni도금의 부식전류밀도는 모재의 부식전류보다 더 억제됨에 따라 Ni 및 Cr도금의 부식억제율은 더 높게 된다. 3) 해양환경의 비정항에 따른 모재, Ni도금 및 Cr 도금의 부식반응은 음극지배로 판단된다.(이 논문의 결론부분임)

• 한국표면공학회지
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• 제22권4호
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• pp.197-206
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• 1989

The Composition and throwing power-of Pb-Sn alloy deposits are investigated in tems of the pulse parameters in pulse plating. Microhardness and intermal srress of alloy deposots are measured. The current efficiency of pulse plating is lower than that of D.C.plating while cathode overpotential and macro-throwing power noticebly increase with increasing peak current density. The Pb content of P.C. plated alloy deposits with increasing average current density, is relatively lower than of D.C. plated deposits at the same average current density. The internal stress of Pb-Sn alloy is not detected and the microhardness are 9.0kg/mm2 and 11kg/mm2 for D.C. plated P.C. plated deposits, respectively.

• 대한환경공학회지
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• 제38권11호
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• pp.627-634
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• 2016

본 연구에서는 탄소폼 흡착소재를 이용하여 산업도금폐수로부터 중금속을 흡착 제거한 후 탈착용액을 이용하여 제거된 중금속을 용출하고 회수하는 과정의 특성을 평가해 보고자 하였다. 용액의 조성에 따른 복합 중금속의 탈착 특성을 살펴본 결과 증류수 조건에서는 용출이 관측되지 않았으며, 탈착용액으로 HCl과 $H_2SO_4 $를 이용한 경우 높은 중금속 농도를 나타내었다. 탈착 용액을 이용함과 더불어 물리적 기술인 초음파 처리를 이용한 경우 중금속의 용출이 증진되는 것을 확인하였으며, 초음파 장치의 출력이 높고 반응 시간이 길수록 효율도 증가하는 것으로 나타났다. 탄소폼 흡착소재를 구리도금 세척수 처리에 적용시켜본 결과 200 반응기부피(Bed volume) 동안 안정적인 제거 성능을 나타내었으며, 흡착된 구리는 탈착용액을 이용하여 용출시킨 후 직류 전원 장치를 이용하여 회수할 수 있었다. 또한 구리가 회수된 탈착용액은 재이용 효율은 84.2%로 나타났다.

• Journal of Plant Biotechnology
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• 제34권3호
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• pp.237-242
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• 2007

Barley anther culture is hard working to plating picking out anther from the glume and demand long time comparing to be short available development stage for effective culture. Also, it has been treatment massive materials due to low plantlet comparing to get desirable plants intensively. Consequently, this experiment was carried out trying to be more high barley anther culture effectively in terms of save plating effort. Plating materials and culture temperature affected anther culture efficiency are among the inoculation tissues or organs such as anthers, spikelets and whole panicles, culture efficiency was higher with spikelets in two-rowed than six-rowed barley due primarily to a lower contamination, and calli were induced within 30 to 50 days. Callus induction and plant regeneration rates were higher in cultures at $25^{\circ}C$ than at $15^{\circ}C$ and $20^{\circ}C$. Days to callus induction were 25 to 50 days at $25^{\circ}C$ and 50 to 60 days at $20^{\circ}C$.

• 한국표면공학회지
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• 제25권5호
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• pp.263-269
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• 1992

To enhancing efficiency of hard chrome plating solution more highly, cathode current efficiency were surveyed connected with hardness of deposits, surface morphology, TEM analysis and corrosion test of anode materials. Efficiency war increased up to 26% values by adding catalyst and two kind of additives. With given bath composition and 6$0^{\circ}C$, 60A/d$\m^2$ electrolosis conditionss bright and micro cracked deposits were well obtained, which showed HV 1000 values. From corrosion tests, anode materials such as Pb-Te (0.02%) and Pb-Ag(1%) showed most anti-corrosive results. Through SEM micrograph observations, ef-fects of additives on levelling, brightness and micro crack properties of hard chrome deposits could be con-firmed. Also, through TEM analysis the fact that deposits from crack free solution or high speed solution were more fine than from sargent solution could be confirmed.

• Carbon letters
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• 제5권4호
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• pp.186-190
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• 2004

In this work, a nickel metal (Ni) electroplating on the activated carbon fiber (Ni/ACFs) surfaces was carried out to remove the toxic hydrogen chloride (HCl) gas. The surface properties of the treated ACFs were determined by using nitrogen adsorption isotherms at 77 K, SEM, and X-ray diffraction (XRD) measurements. HCl removal efficiency was confirmed by a gas-detecting tube technique. As a result, the nickel metal contents on the ACF surfaces were increased with increasing the plating time. And, it was found that the specific surface area or the micropore volume of the ACFs studied was slightly decreased as increasing the plating time. Whereas, it was revealed that the HCl removal efficiency containing nickel metal showed higher efficiency values than that of untreated ACFs. These results indicated that the presence of nickel metal on the ACF surfaces played an important role in improving the HCl removal over the Ni/ACFs, due to the catalytic reactions between nickel and chlorine.

• Membrane and Water Treatment
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• 제11권3호
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• pp.179-187
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• 2020

Electrodialysis has been applied for treatment of industrial wastewater including metal electroplating. The wastewater from metal plating industries contains high concentrations of inorganics such as copper, nickel, and sodium. The ions in the feed were separated due to the electrical forces in the electrodialysis. The concentrate compartment is exposed to the elevated concentrations of the ions and yielded inorganic precipitations on the cation exchange membranes. The presence of organic matter in the metal plating wastewater affects complex interfacial reactions, which determines characteristics of inorganic scale fouling. The wastewater from a metal plating industry in practice was collected and the inorganic and organic compositions of the wastewater were analyzed. The performance of electrodialysis of the raw wastewater was evaluated and the effects of adjusting pH of the raw water were also measured. The integrated processes with neutralization and electrodialysis showed great removal of heavy metals sufficient to discharge to aquatic ecosystem. The organic matter in the raw water was also reduced by the neutralization, which might enhance removal performance and alleviate organic fouling in the integrated system.

• 한국전기전자재료학회논문지
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• 제24권4호
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• pp.328-332
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• 2011

The formation of front metal contact silicon solar cells is required for low cost, low contact resistance to silicon surface. One of the front metal contacts is Ni/Cu plating that it is available to simply and inexpensive production to apply mass production. Ni is shown to be a suitable barrier to Cu diffusion into the silicon. The process of Ni electroless plating on front silicon surface is performed using a chemical bath. Additives and buffer agents such as ammonium chloride is added to maintain the stability and pH control of the bath. Ni deposition rate is found to vary with temperature, time, utilization of bath. The experimental result shown that Ni layer by SEM (scanning electron microscopy) and EDX analysis. Finally, plated Ni/Cu contact solar cell result in an efficiency of 17.69% on $2{\times}2\;cm^2$, Cz wafer.