• Title/Summary/Keyword: effective diffusion

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An Experimental Study on the Flame Appearance and Heat Transfer Characteristics of Acoustically Excited Impinging Inverse Diffusion Flames (음향 가진된 충돌 역 확산화염의 화염형상과 열전달 특성에 관한 실험적 연구)

  • Kang, Ki-Joong;Lee, Kee-Man
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.11 no.10
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    • pp.3647-3653
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    • 2010
  • An experimental investigation of the flame appearance and heat transfer characteristics in both unexcited and excited impinging inverse diffusion flames with a loud speaker has been performed. The flame is found to become broader and shorter (in length) with acoustic excitation. The heat flux at the stagnation point is increased with the acoustic excitation. The acoustic excitation is more effective in lean conditions than in rich conditions. The reasons for these behaviors are that acoustic excitation improves the entrainment of surrounding air into the jet. From this study, it is found that the maximum increase of 57% in the total heat flux is obtained at the stagnation point of $\Phi$=0.8. Therefore, it is ascertained that the excitation combustion can be adopted with effective instruments as a method for improving heat transfer in impinging jet flames.

Study on the Effective Focal Volume Change due to Light Intensity Using Fluorescence Correlation Spectroscopy (형광상관분광법을 이용한 광세기에 따른 유효 초점 부피 변화에 대한 연구)

  • Jeong, Chanbae;Lee, Jaeran;Kim, Sok Won
    • Korean Journal of Optics and Photonics
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    • v.24 no.2
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    • pp.71-76
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    • 2013
  • Using fluorescence correlation spectroscopy, we analyzed the change of effective focal volume of a confocal system with light intensity. The fluorescence correlation spectroscopy system was home-built in accordance with the He-Ne laser with a wavelength of 632.8 nm, and two kinds of samples (AlexaFluor657 and Quantum dot655) suitable for the wavelength of the laser beam were used. For each sample, we analyzed and compared the correlation functions obtained while changing the intensity of the light source in a range of 1~50 ${\mu}W$. The result shows that the radius of the focal area increases linearly through the increase of particle number and diffusion time in response to an intensity change in weak light below 10 ${\mu}W$. In the higher intensity region (>10~15 ${\mu}W$), the increasing rate of particle number and diffusion time keep increasing but at a much slower rate. Through this result, it was also found that the radius increasing rate of the focal area was reduced however, the radius still increased slightly.

Modified Shrinking Core Model for Atomic Layer Deposition of TiO2 on Porous Alumina with Ultrahigh Aspect Ratio

  • Park, Inhye;Leem, Jina;Lee, Hoo-Yong;Min, Yo-Sep
    • Bulletin of the Korean Chemical Society
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    • v.34 no.2
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    • pp.519-523
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    • 2013
  • When atomic layer deposition (ALD) is performed on a porous material by using an organometallic precursor, minimum exposure time of the precursor for complete coverage becomes much longer since the ALD is limited by Knudsen diffusion in the pores. In the previous report by Min et al. (Ref. 23), shrinking core model (SCM) was proposed to predict the minimum exposure time of diethylzinc for ZnO ALD on a porous cylindrical alumina monolith. According to the SCM, the minimum exposure time of the precursor is influenced by volumetric density of adsorption sites, effective diffusion coefficient, precursor concentration in gas phase and size of the porous monolith. Here we modify the SCM in order to consider undesirable adsorption of byproduct molecules. $TiO_2$ ALD was performed on the cylindrical alumina monolith by using titanium tetrachloride ($TiCl_4$) and water. We observed that the byproduct (i.e., HCl) of $TiO_2$ ALD can chemically adsorb on adsorption sites, unlike the behavior of the byproduct (i.e., ethane) of ZnO ALD. Consequently, the minimum exposure time of $TiCl_4$ (~16 min) was significantly much shorter than that (~71 min) of DEZ. The predicted minimum exposure time by the modified SCM well agrees with the observed time. In addition, the modified SCM gives an effective diffusion coefficient of $TiCl_4$ of ${\sim}1.78{\times}10^{-2}\;cm^2/s$ in the porous alumina monolith.

The Effects of Temperature and Pressure on the Diffusion of Phenol in Apples (사과 내에서 페놀의 확산에 대한 온도와 증기압의 영향)

  • Park, Hyeon-Ju;Lee, Ki-Won;Chung, Kyong-Hwan;Song, Yo-Soon;Seo, Gon
    • Korean Journal of Environmental Agriculture
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    • v.26 no.1
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    • pp.69-76
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    • 2007
  • The accumulation curves of phenol in the flesh of apples were measured at $5^{\circ}C$, $25^{\circ}C$ and $40^{\circ}C$ when they were exposed to phenol vapor, The effective diffusivities of phenol at the rind and flesh were determined by comparing its experimentally obtained accumulation curves with simulated ones. The simulation was carried out by the non-steady state diffusion rate equation. The diffusion model assumed the consecutive diffusion of phenol at the rind and flesh of apples. The detection time of phenol in the flesh of apples was shortened with increasing temperature, and it accumulated amount also increased rapidly. The estimated effective diffusivity of phenol at the rind of apples increased with temperature as like $1.1{\times}10^{-13}\;m^2/s$ at $5^{\circ}C$, $1.4{\times}10^{-13}\;m^2/s$ at $25^{\circ}C$ and $2.2{\times}10^{-13}\;m^2/s$ at $40^{\circ}C$, but those at the flesh of apples were invariant as $1.5{\times}10^{-10}\;m^2/s$ at this temperature range. The effect of temperature on the diffusivity of phenol was small, but the increase of the vapor pressure of phenol with temperature accelerated the penetration of phenol at the rind, resulting in the rapid accumulation at the flesh of apple.

Antimicrobial Activity of Houttuynia cordata Ethanol Extract against Major Clinical Resistant Microorganisms (주요 임상 내성균에 대한 어성초 에탄올 추출물의 항균효과)

  • Hong, Seung Bok;Lee, Chun Hee
    • Korean Journal of Clinical Laboratory Science
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    • v.47 no.3
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    • pp.140-146
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    • 2015
  • The increase in resistance by pathogenic bacteria to multiple antimicrobial agents has become a significant treat, as the effective antimicrobial agents available for the patients infected by such resistant bacteria are reduced, or even eliminated. Several natural plant extracts have exhibited antibacterial and synergistic activity against various resistant microorganisms. Houttuynia cordata is frequently used by many traditional medicine practicioners for its antimicrobial, antiviral, and anti-inflammatory properties. This study investigated the antibacterial effects of H. cordata extract against clinical multi-resistant bacteria, and compared the two methods used for the antimicrobial susceptibility testing. Thirty isolates of Methicillin-resistant Staphylococcus aureus (MRSA, 10), Vancomycin-resistant Enterococcus faecium (VRE, 10), Carbapenem-resistant Acinetobacter baumannii (CRAB, 10) were included in this study. The antibacterial effect of H. cordata was tested by disk diffusion and microbroth dilution methods as per CLSI guidelines. In disk diffusion, all isolates (30) showed no inhibition to 30,000 ug/mL of H. cordata. But in the microbroth dilution method, $MIC_{90}$ of H. cordata was 4,096 ug/mL, 8,192 ug/mL and 4,096 ug/mL in MRSA, VRE and CRAB, respectively. These results demonstrate that H. cordata exhibits antibacterial activity against MRSA, VRE and CRAB. Moreover, the microbroth dilution method is a more effective method than disk diffusion to evaluate the antibacterial activity of natural products. The Disk diffusion method used to evaluate the antibacterial activity of natural products required new standard guidelines including inoculum concentration of bacteria.

A bilayer diffusion barrier of atomic layer deposited (ALD)-Ru/ALD-TaCN for direct plating of Cu

  • Kim, Soo-Hyun;Yim, Sung-Soo;Lee, Do-Joong;Kim, Ki-Su;Kim, Hyun-Mi;Kim, Ki-Bum;Sohn, Hyun-Chul
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.239-240
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    • 2008
  • As semiconductor devices are scaled down for better performance and more functionality, the Cu-based interconnects suffer from the increase of the resistivity of the Cu wires. The resistivity increase, which is attributed to the electron scattering from grain boundaries and interfaces, needs to be addressed in order to further scale down semiconductor devices [1]. The increase in the resistivity of the interconnect can be alleviated by increasing the grain size of electroplating (EP)-Cu or by modifying the Cu surface [1]. Another possible solution is to maximize the portion of the EP-Cu volume in the vias or damascene structures with the conformal diffusion barrier and seed layer by optimizing their deposition processes during Cu interconnect fabrication, which are currently ionized physical vapor deposition (IPVD)-based Ta/TaN bilayer and IPVD-Cu, respectively. The use of in-situ etching, during IPVD of the barrier or the seed layer, has been effective in enlarging the trench volume where the Cu is filled, resulting in improved reliability and performance of the Cu-based interconnect. However, the application of IPVD technology is expected to be limited eventually because of poor sidewall step coverage and the narrow top part of the damascene structures. Recently, Ru has been suggested as a diffusion barrier that is compatible with the direct plating of Cu [2-3]. A single-layer diffusion barrier for the direct plating of Cu is desirable to optimize the resistance of the Cu interconnects because it eliminates the Cu-seed layer. However, previous studies have shown that the Ru by itself is not a suitable diffusion barrier for Cu metallization [4-6]. Thus, the diffusion barrier performance of the Ru film should be improved in order for it to be successfully incorporated as a seed layer/barrier layer for the direct plating of Cu. The improvement of its barrier performance, by modifying the Ru microstructure from columnar to amorphous (by incorporating the N into Ru during PVD), has been previously reported [7]. Another approach for improving the barrier performance of the Ru film is to use Ru as a just seed layer and combine it with superior materials to function as a diffusion barrier against the Cu. A RulTaN bilayer prepared by PVD has recently been suggested as a seed layer/diffusion barrier for Cu. This bilayer was stable between the Cu and Si after annealing at $700^{\circ}C$ for I min [8]. Although these reports dealt with the possible applications of Ru for Cu metallization, cases where the Ru film was prepared by atomic layer deposition (ALD) have not been identified. These are important because of ALD's excellent conformality. In this study, a bilayer diffusion barrier of Ru/TaCN prepared by ALD was investigated. As the addition of the third element into the transition metal nitride disrupts the crystal lattice and leads to the formation of a stable ternary amorphous material, as indicated by Nicolet [9], ALD-TaCN is expected to improve the diffusion barrier performance of the ALD-Ru against Cu. Ru was deposited by a sequential supply of bis(ethylcyclopentadienyl)ruthenium [Ru$(EtCp)_2$] and $NH_3$plasma and TaCN by a sequential supply of $(NEt_2)_3Ta=Nbu^t$ (tert-butylimido-trisdiethylamido-tantalum, TBTDET) and $H_2$ plasma. Sheet resistance measurements, X-ray diffractometry (XRD), and Auger electron spectroscopy (AES) analysis showed that the bilayer diffusion barriers of ALD-Ru (12 nm)/ALD-TaCN (2 nm) and ALD-Ru (4nm)/ALD-TaCN (2 nm) prevented the Cu diffusion up to annealing temperatures of 600 and $550^{\circ}C$ for 30 min, respectively. This is found to be due to the excellent diffusion barrier performance of the ALD-TaCN film against the Cu, due to it having an amorphous structure. A 5-nm-thick ALD-TaCN film was even stable up to annealing at $650^{\circ}C$ between Cu and Si. Transmission electron microscopy (TEM) investigation combined with energy dispersive spectroscopy (EDS) analysis revealed that the ALD-Ru/ALD-TaCN diffusion barrier failed by the Cu diffusion through the bilayer into the Si substrate. This is due to the ALD-TaCN interlayer preventing the interfacial reaction between the Ru and Si.

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Simulation of the Migration of 3H and 14C Radionuclides on the 2nd Phase Facility at the Wolsong LILW Disposal Center

  • Ha, Jaechul;Son, Yuhwa;Cho, Chunhyung
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.18 no.4
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    • pp.439-455
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    • 2020
  • Numerical model was developed that simulates radionuclide (3H and 14C) transport modeling at the 2nd phase facility at the Wolsong LILW Disposal Center. Four scenarios were simulated with different assumptions about the integrity of the components of the barrier system. For the design case, the multi-barrier system was shown to be effective in diverting infiltration water around the vaults containing radioactive waste. Nevertheless, the volatile radionuclide 14C migrates outside the containment system and through the unsaturated zone, driven by gas diffusion. 3H is largely contained within the vaults where it decays, with small amounts being flushed out in the liquid state. Various scenarios were examined in which the integrity of the cover barrier system or that of the concrete were compromised. In the absence of any engineered barriers, 3H is washed out to the water table within the first 20 years. The release of 14C by gas diffusion is suppressed if percolation fluxes through the facility are high after a cover failure. However, the high fluxes lead to advective transport of 14C dissolved in the liquid state. The concrete container is an effective barrier, with approximately the same effectiveness as the cover.

A Study on Evaluation of Adsorption Performance of Humic Acid on Granular Activated Carbon (Humic acid 제거를 위한 국산 입상활성탄의 흡착성능 평가에 관한 연구)

  • Shin, Sung-Gyo;Kim, Jong-Gu;Park, Cheong-Gil
    • Journal of Environmental Science International
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    • v.2 no.1
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    • pp.73-81
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    • 1993
  • Adsorption process using granular activated carbon(GAC) has been considered as one of the most effective water treatment technologies to remove humic acid which is recon- niEed as trihalomethane(THM) precursor in chlorination. To design the most effective GAC process, it is necessary to conduct the test of adsor- ption performance by means of isothem, batch rate and column studies and to select the most effective activated carbon according to raw materials of GAC - lignite and coconut shell. The objective of this study is to investigate the adsorption performance of humid acid on two activated carbons - lignite activated carbon(LAC) and coconut shell activated car- bon(CAC) made in Korea. It is available to represent UV-abs and trihalomethane formation potential(THMFP) as concentration of humic acid due to good relationship. The adsorption capacity of humid acid is not concerned with surface area of activated carbon but with pore size related to about $100{\AA}$, and then LAC forming at the extent of mesopore is found to be eight times more effective in adsorption capacity than CAC forming at micropore. The adsorption capacity of LAC and CAC is better at pH 5.5 than at pH 7. Pore and surface diffusion coefficients calculated from the diffusion model are $7.61\times10^{-13}m^2/sec$, $3.52\times10^{-15}m^2/sec$ for CAC, and $3.38\times10^{-12}m^2$/sec and $Ds=1.48{\times}10^{-15}m^2/sec$ for GAC respectively. From the results of column test it shows that the performance of LAC is also better than CAC and the optimal EBCT(Empty Bed Contact Time) is 4.52min. and activated carbon removes selectively the components of humic acid to be easily formed to THM.

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Development of Process Technology for Low Pressure Vaccum Carburizing (저압식 진공 침탄(LPC) 열처리 공정 기술 개발)

  • Dong, Sang-Keun;Yang, Jae-Bok
    • 한국연소학회:학술대회논문집
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    • 2004.11a
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    • pp.231-237
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    • 2004
  • Vacuum carburizing continues to gain acceptance as an alternative to atmosphere carburizing particularly in the car industry. The advantages of low-pressure carburization over atmospheric gas carburization is not only the creation of a surface entirely free of oxide and the environmentally friendly nature of these methods but also an improvement in deformation behaviour achieved by combining carburization with gas quenching, a reduction in batch times by increasing the carburization temperature, low gas and energy consumption and the prevention of soot to a large extent. In present study, an improved vacuum carburizing method is provided which is effective to deposit carbon in the surface of materials and to reduce cycle time. Also LPC process simulator was made to optimize to process controls parameters such as pulse/pause cycles of pressure pattern, temperature, carburizing time, diffusion time. The carburizing process was simulated by a diffusion calculation program, where as the model parameters are proposed with help the experimental results and allows the control of the carburizing process with good accordance to the practical results. Thus it can be concluded that LPC process control method based on the theoretical simulation and experimental datas appears to provide a reasonable tool for prototype LPC system.

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The Study on Characterization of Current-limiting with Diffusion Thickness of High-Tc Superconductor Thick Film (고온초전도후막의 확산두께에 따른 전류제한 특성연구)

  • Im, Seong-Hun;Gang, Hyeong-Gon;Han, Tae-Hui;Mo, Chang-Ho;Im, Seok-Jin;Han, Byeong-Seong
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.49 no.4
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    • pp.210-218
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    • 2000
  • For the fabrication of $YBa_2Cu_3O_x$ thick film, a substrate of $Y_2BaCuO_5$ was fabricated by adding $CeO_2$ into $Y_2BaCuO_5$ and two types of doping materials added with binder material were prepared. Each doping material was patterned on $Y_2BaCuO_5$substrate by the screen printing method and then was annealed at the temperature with a few step. It could be observed by X-ray diffraction patterns and SEM photographs that through the diffusion process of the $Y_2BaCuO_5$ and each doping material, the $YBa_2Cu_3O_x$ phase was formed. And with n additive of $CeO_2$ the thickness of formed $YBa_2Cu_3O_x$decreased. From the experiment of current limiting on thick film, the sample with thiner thickness of $YBa_2Cu_3O_x$ showed the more effective characteristics of current limiting.

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