• Title/Summary/Keyword: e-beam

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A Study on the Etching Effect and the Capacitance of Aluminum Oxide Thin Film by Oxygen Ion Beam (산소 이온 빔에 의한 산화 알루미늄 박막의 식각 효과 및 정전 용량 특성에 관한 연구)

  • Cho, E.S.;Kwon, S.J.
    • Journal of the Korean Vacuum Society
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    • v.22 no.1
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    • pp.26-30
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    • 2013
  • For the realization of high-k insulator, aluminum oxide ($Al_2O_3$) was deposited by using an oxygen ion beam assisted deposition (IBAD) during e-beam evaporation. From the thickness of the $Al_2O_3$ layer evaporated with IBAD process, it was possible to investigate the etching effect of ion beam at higher energies during e-beam evaporation. It was also possible to obtain a higher capacitance as a result of IBAD in spite of the reduced thickness of $Al_2O_3$.

Electron Temperature, Plasma Density and Luminous Efficiency in accordance with Discharge Time in coplanar AC PDPs

  • Jeong, S.H.;Moon, M.W.;Oh, P.Y.;Jeong, J.M.;Ko, B.D.;Park, W.B.;Lee, J.H.;Lim, J.E.;Lee, H.J.;Han, Y.G.;Son, C.G.;Lee, S.B.;Yoo, N.L.;Choi, E.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1203-1206
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    • 2005
  • Electron temperature and plasma density in coplanar alternating-current plasma display panels (AC-PDP's) have been experimentally investigated in accordance with discharge time by a micro-probe in this experiment. The resolution of a step mortor to move in micro-Langmuir probe is 10um.[1-3] The used gas in this experiment is He-Ne-Xe (4%) mixure gas. And sustain voltage is 320V which is above of firing voltage for degradation. The electron temperature and plasma density can be obtained from current-voltage (I-V) characteristics of micro Langmuir probe, in which negative to positive bias voltage was applied to the probe. And Efficiency is calculated by formula related discharge power and light emission. Those experiments operated as various discharge time ($0{\sim}72$ Hours). As a result of this experiment, Electron Temperature was increased from 2eV to 5eV after discharge running time of 20 hours and saturates beyond 20 hours. The plasma density is inversely proportional to the square root of electron temperature. So the plasma density was decreased from $1.8{\times}10^{12}cm^{-3}$ to $8{\times}10^{11}cm^{-3}$ at above discharge running time. And the Efficiency was reduced to 70% at 60hours of discharge running time.

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Effects of Electron Beam Irradiation on Functional and Other Associated Properties of Pork Myofibrillar Salt-Soluble Proteins

  • Koh, Kwang-Hwan;Lee, Sam-Pin;Whang, Key
    • Preventive Nutrition and Food Science
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    • v.11 no.1
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    • pp.73-77
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    • 2006
  • Ground pork was irradiated with an electron beam (e-beam) at a dose of 0, 1.5, 3, 5 and 10 kGy and the changes in various functional and other associated properties of salt-soluble proteins extracted from the pork were evaluated. Irradiation did not affect turbidity and the disulfide content of pork salt-soluble protein, but the content of sulfhydryls and the hydrophobocity of salt-soluble protein increased. This indicates that protein degradation occurred when the pork was e-beam irradiated and that the sulfhydryls and hydrophobic moieties buried inside the proteins were exposed to the outside environment. However, these degraded protein molecules did not form large protein aggregates through disulfide bridges. The emulsifying capacity of the pork increased with irradiation, which could be the result from increased hydrophobicity of pork salt-soluble protein. Water holding capacity of pork was not affected bye-beam irradiation.

Alignment Effect of a Nematic Liquid Crystal on Deposited SiOx Thin-Film Surface with e-beam Evaporation

  • Oh, Yong-Cheul;Lee, Dong-Gyu
    • Transactions on Electrical and Electronic Materials
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    • v.7 no.6
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    • pp.305-308
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    • 2006
  • We have studied liquid crystal (LC) aligning capabilities for homeotropic alignment and the control of tilt angles on the $SiO_{x}$ thin film by electron beam evaporation method. A high tilt angle of about $86.5^{\circ}$ was obtained, and also the suitable tilt angle of the NLC on the $SiO_{x}$ thin film at $20{\sim}50\;nm$ thickness with e-beam evaporation can be achieved. The uniform LC alignment on the $SiO_{x}$ thin film surfaces with electron beam evaporation can be achieved. It is considerated that the LC alignment on the $SiO_{x}$ thin film by electron beam evaporation is attributed to elastic interaction between LC molecules and micro-grooves at the $SiO_{x}$ thin film surface created by evaporation.

Amplitude Filter와 Phase Filter가 결합된 광학계의 결상특성

  • 박성종;이종진;정창섭
    • Korean Journal of Optics and Photonics
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    • v.4 no.1
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    • pp.9-14
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    • 1993
  • We chose Bessel beamu[$J_o(ar)}$)l in order to investigate image forming property of the optical system with combined filter of amplitude and phase(CFAP). This paper investigated numerically the influence of number of nodes of these beams on the PSF, encircled energy(E), transmission ratio(TR), gain((;) for an aberrated(1aberration-free) optical system. These results showed that the property of PSF differ considerably from the one of the existing amplitude filter and that Bessel beam has super compensating effect for an optical system with spherical aberration. Particularly, the Bessel beam has less the size of central spot than the radius of Airy disk, this result can therefore be applied to the fabrication of semiconductor device.

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A Study on the Influence of Pure Iron Purity of Electric Lens on the Electron Beam Control (전자빔 가공기의 전자렌즈 순철순도가 빔 제어에 미치는 영향)

  • Lee Chan-Hong;Ro Seung-Kook
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.10a
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    • pp.149-153
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    • 2005
  • The electron beam machining provides very high resolution up to nanometer scale, hence the E-beam writing technology is rapidly growing in MEMS and nano-engineering areas. In the optical column of the e-beam writer, there are several lenses condensing and focusing electron beams from electron gun with fringing magnetic fields. The polepieces of these lenses are usually made with high purity iron which is hard to fabricate and very expensive. In this paper, the possibility of using polepiece of object lens composed with pure iron and low carbon steel was examined to reduce cost. The magnetic field at object lens was calculated with finite element method, and practical focusing qualities of SEM pictures were observed comparing for the object lens polepieces with pure iron and two type of composed with low carbon steel.

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The stable e-beam deposition of metal layer and patterning on the PDMS substrate (PDMS 기판상에 금속층의 안정적 증착 및 패터닝)

  • Baek, Ju-Yeoul;Kwon, Gu-Han;Lee, Sang-Hoon
    • Journal of Sensor Science and Technology
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    • v.14 no.6
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    • pp.423-429
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    • 2005
  • In this paper, we proposed the fabrication process of the stable e-beam evaporation and the patterning of metals layer on the polydimethylsiloxane (PDMS) substrate. The metal layer was deposited under the various deposition rate, and its effect to the electrical and mechanical properties (e.g.: adhesion-strength of metal layer) was investigated. The influence of surface roughness to the adhesion-strength was also examined via the tape test. Here, we varied the roughness by changing the reactive ion etching (RIE) duration. The electrode patterning was performed through the conventional photolithography and chemical etching process after e-beam deposition of $200{\AA}$ Ti and $1000{\AA}$ Au. As a result, the adhesion strength of metal layer on the PDMS surface was greatly improved by the oxygen plasma treatment. The e-beam evaporation on the PDMS surface is known to create the wavy topography. Here, we found that such wavy patterns do not effect to the electrical and mechanical properties. In conclusion, the metal patterns with minimum $20{\mu}m$ line width was produced well via the our fabrication process, and its electrical conductance was almost similar to the that of metal patterns on the silicon or glass substrates.

Decay Process of Charge Distribution in E-Beam Irradiated Polymers (E-빔 조사된 폴리머의 전하 분포의 축퇴 과정)

  • Yun, Ju-Ho;Choi, Yong-Sung;Lee, Kyung-Sup
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.329-330
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    • 2007
  • Decay processes of accumulated charge in e-beam irradiated polymers during elevating temperature are observed using pulsed electro-acoustic measurement system. Since the polymeric materials have many superior properties such as light-weight, good mechanical strength, high flexibility and low cost, they are inevitable materials for spacecrafts. In space environment, however, the polymers sometimes have serious damage by irradiation of high energy charged particles. When the polymers of the spacecraft are irradiated by high energy charged particles, some of injected charges accumulate and remain for long time in the bulk of the polymers. Since the bulk charges sometimes cause the degradation or breakdown of the materials, the investigation of the charging and the decay processes in polymeric materials under change of temperature is important to decide an adequate material for the spacecrafts. By measuring the charge behavior in e-beam irradiated polymer, such as polyimide or polystyrene, it is found that the various accumulation and decay patterns are observed in each material. The results seem to be useful and be helpful to progress in the reliability of the polymers for the spacecraft.

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Superconducting properties and microstructure of electron beam irradiated MgB2 superconductors

  • Kim, C.J.;Lee, Y.J.;Cho, I.H.;Jun, B.H.
    • Progress in Superconductivity and Cryogenics
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    • v.24 no.1
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    • pp.18-22
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    • 2022
  • The effect of electron beam (EB) irradiation on superconducting properties and microstructures of MgB2 bulk superconductors were investigated. At E-beam doses of 1×1016 e/cm2 and 1×1017 e/cm2, the effect of irradiation on a superconducting transition temperature (Tc) of MgB2 was weak. As a dose increases to 5×1017 e/cm2, Tc decreases by 0.5 K. The critical current density (Jc) measured at 4.2 K and 20 K, and 0 T - 5 T increases slightly as exposure time increases. X-ray diffraction for the irradiation surface of MgB2 shows that the diffraction intensity of (hkl) peaks decreases proportionally as the exposure time increases. This indicates that the crystallinity of MgB2 was degraded by irradiation. TEM investigation for the irradiated sample showed distorted lattice structure, which is consistent with the XRD results. The Jc increase and Tc reduction of MgB2 by irradiation are believed to be caused by the lattice distortion.

Study on 40 nm Electron Beam Patterning by Optimization of Digitizing Method and Post Exposure Bake (전자선 석판 기술에서 디지타이징과 노광후굽기 최적화를 통한 40 nm 급 패턴 제작에 관한 연구)

  • Han, Sang-Yeon;Shin, Hyung-Cheol;Lee, Kwy-Ro
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.36D no.10
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    • pp.23-30
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    • 1999
  • We experimented on the sub 50nm patterning using E-beam lithography system. SAL601 negative E-beam resist was used for this experiment. In order to utilize the maximum ability of E-beam system, firstly, we reduced the PR thickness to 100nm, and the field size to 200 ${um}m$. Then PEB (Post Expose Bake) time/temperature, which is one of the very important factors when SAL601 is used, were reduced for minimum line width. In addition, digitizing is optimized for better results. Quantum wire and quantum dot which can be used for nanoscale memory device, such as single electron memory device, are fabricated using these developed lithography techniques.

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