• 제목/요약/키워드: dry-etching

검색결과 408건 처리시간 0.048초

40Gbps 진행파형 변조기 집적 레이저 (40Gbps Traveling-wave Electroabsorption Modulator-integrated DFB Lasers)

  • 권용환;최중선;심재식;김성복;윤호경;최광성
    • 한국광학회:학술대회논문집
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    • 한국광학회 2008년도 동계학술발표회 논문집
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    • pp.291-292
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    • 2008
  • We fabricated 40Gbps electroabsorption modulator-integrated DFB lasers (EMLs). Adopting traveling-wave (TW) electrode and tilted facet improved high-frequency characteristics of EMLs. The 3dB bandwidth of E/O response for TW-EML was as large as 34 GHz, as compared with 27 GHz for lumped EML. Tilted facet formed by dry etching processes successfully reduced the optical feedback and the resonance in E/O response decreased to as small as 2.8 dB.

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나노 임프린트 기술을 이용한 폴리머 도파로 기반의 브래그 격자형 파장 필터 (Polymeric Wavelength Filter Based on a Bragg Grating Using Nanoimprint Technique)

  • 안세원;이기동;김도환;진원준;이상신
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제55권5호
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    • pp.267-271
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    • 2006
  • A polymeric waveguide-type wavelength filter based on a Bragg grating has been proposed and fabricated using the simple nanoimpring technique, for the first time to our knowledge. An ultraviolet transparent stamp with the single-mode waveguide pattern incorporating a surface-relief-type Bragg grating was specially designed selective dry-etching process. Using this stamp, the device fabrication was substantially involving just a single-step process of imprint followed by polymer spin-coating. The achieved maximum reflection was higher than 25 dB at the center wavelength of 1569 nm. And the 3-dB bandwidth was 0.8 nm for the device length of 1.5 cm.

Silicon Micro-probe Card Using Porous Silicon Micromachining Technology

  • Kim, Young-Min;Yoon, Ho-Cheol;Lee, Jong-Hyun
    • ETRI Journal
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    • 제27권4호
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    • pp.433-438
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    • 2005
  • We present a new type of silicon micro-probe card using a three-dimensional probe beam of the cantilever type. It was fabricated using KOH and dry etching, a porous silicon micromachining technique, and an Au electroplating process. The cantilever-type probe beam had a thickness of $5 {\mu}m$, and a width of $50{\mu}$ and a length of $800 {\mu}m$. The probe beam for pad contact was formed by the thermal expansion coefficient difference between the films. The maximum height of the curled probe beam was $170 {\mu}m$, and an annealing process was performed for 20 min at $500^{\circ}C$. The contact resistance of the newly fabricated probe card was less than $2{\Omega}$, and its lifetime was more than 20,000 turns.

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반도체 공정 가스에 따른 가스의 초고순도화

  • 진영모;현영철
    • 전자통신동향분석
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    • 제3권2호
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    • pp.56-60
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    • 1988
  • 반도체 가스의 순도에 따라 반도체 박막의 특성이 좌우되기 때문에 현재의 고순도 가스에서 초고순도 가스로 사용하여야 한다. 최근 반도체 공정기술은 화학증착법으로 많은 특수 가스를 사용하는데 이런 가스들은 사전에 가스에 대한 전문 지식과 기술을 충분히 이해한 다음 사용하여야만 고성능화 공정기술이 가능하다. 반도체용 가스는 회로의 집적도가 높아짐에 따라 요구되는 가스의 품질이 점점 고순도화되고 있다. 따라서 현 반도체 공정에 사용되는 가스 순도를 초고순도화 시켜야만 초고집적 소자인 4M DRAM, 16M DRAM, 64M DRAM 제품 개발 및 제조가 가능하다. 다시말해서 공정에 따른 주변조건이 이루어져야 만 반도체 산업이 크게 신장 할 수 있다. 최근 반도체 공정 기술로는 플라즈마(Plasma), 드라이에칭(Dry etching), CVD(Chemical Vapor Deposition), MOCVD(Metal Organic Chemical Vapor Deposition), Ion Implantation, EPI 공정으로 거의 대부분 공정 가스가 가연성, 폭발성, 독성, 부식성 이기 때문에 한번 취급을 잘못하면 막대한 인명 및 재산 피해를 입히므로 취급상 특별한 주의를 요하고 사전에 가스의 전문 지식과 기술을 충분히 이해한 다음 사용하여야 한다.

전자빔 네가티브 레지스트의 건식현상에 관한 연구 (A study on the dry development of Electron beam negative resist)

  • 박종관;박상근;조성욱;우호환;김영봉;이덕출
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1994년도 추계학술대회 논문집 학회본부
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    • pp.278-280
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    • 1994
  • The purpose of this paper is to describe an application of plasma polymerized thin film as an electron beam resist. Plasma polymerized thin film was prepared using an interelectrod inductively coupled gas-flow-type reactor. Styrene was chosen as the monomer to be used. This thin films were also delineated by the electron-beam apparatus and the pattern in the resist was developed with RIE and plasma polymerized apparatus. The effect of charge of pressure on growth rate and etching rate of the thin films were studied. The molecular structure of thin film was investigated by FT-IR and then was discussed in relation to its quality as a resist.

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Numerical Simulation: Effects of Gas Flow and Rf Current Direction on Plasma Uniformity in an ICP Dry Etcher

  • Joo, Junghoon
    • Applied Science and Convergence Technology
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    • 제26권6호
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    • pp.189-194
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    • 2017
  • Effects of gas injection scheme and rf driving current configuration in a dual turn inductively coupled plasma (ICP) system were analyzed by 3D numerical simulation using CFD-ACE+. Injected gases from a tunable gas nozzle system (TGN) having 12 horizontal and 12 vertical nozzles showed different paths to the pumping surface. The maximum velocity from the nozzle reached Mach 2.2 with 2.2 Pa of Ar. More than half of the injected gases from the right side of the TGN were found to go to the pump without touching the wafer surface by massless particle tracing method. Gases from the vertical nozzle with 45 degree slanted angle soared up to the hottest region beneath the ceramic lid between the inner and the outer rf turn of the antenna. Under reversed driving current configuration, the highest rf power absorption region were separated into the two inner islands and the four peaked donut region.

평판형 유도결합 플라즈마를 이용한 GaAs/AlGaAs 및 GaAs/InGaP 의 선택적 및 비선택적 건식식각의 비교 (Comparison of Selective and Non-Selective Dry Etching of GaAs/AlGaAs and GaAs/InGaP using Planar Inductively Coupled Plasmas)

  • 박민영;최충기;류현우;노호섭;문준희;유승열;임완태;이제원;조관식;전민현;송한정;백인규;권민철;박건수;윤진성
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2005년도 춘계학술발표대회 및 제8회 신소재 심포지엄 논문개요집
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    • pp.73-73
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    • 2005
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친수성 마이크로 기둥 구조 표면에서의 표면 지형적 특성에 따른 퍼짐성 현상에 대한 실험적 연구 (Experimental study of spreading phenomena on hydrophilic micro-textured surfaces depending on surface geometrical features)

  • 장문영;박세현;유동인
    • 한국가시화정보학회지
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    • 제16권3호
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    • pp.35-39
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    • 2018
  • In multiphase systems, surface wettability is one of dominant design parameters to enhance system performance. Since surface wettability can be maximized and minimized with micro-textured surfaces, therefore micro-textured surfaces are widely countered in various research and engineering fields. In this study, for better understanding of micrometer scaled surface wettability, spreading phenomena is experimentally investigated on the hydrophilic micro-textured surfaces. By photolithography and conventional dry etching method, there are prepared the surfaces with uniformly arrayed micro-pillars. The interfacial motions of a water droplet on the test sections are visualized by high speed camera in top view. On the basis of visualization data, it is analyzed the relation between dynamic coefficient and geometrical features on micro-textured surfaces.

Double-Side Notched Long-Period Fiber Gratings fabricated by Using an Inductively Coupled Plasma for Force Sensing

  • Fang, Yu-Lin;Huang, Tzu-Hsuan;Chiang, Chia-Chin;Wu, Chao-Wei
    • Journal of the Korean Physical Society
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    • 제73권9호
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    • pp.1399-1404
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    • 2018
  • This study used an inductively coupled plasma (ICP) dry etching process with a metal amplitude mask to fabricate a double-side notched long-period fiber grating (DNLPFG) for loading sensing. The DNLPFG exhibited increasing resonance attenuation loss for a particular wavelength when subjected to loading. When the DNLPFG was subjected to force loading, the transmission spectra were changed, showing a with wavelength shift and resonance attenuation loss. The experimental results showed that the resonant dip of the DNLPFG increased with increasing loading. The maximum resonant dip of the $40-{\mu}m$ DNLPFG sensor was -26.522 dB under 0.049-N loading, and the largest force sensitivity was -436.664 dB/N. The results demonstrate that the proposed DNLPFG has potential for force sensing applications.