• Title/Summary/Keyword: dielectric barrier

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Characteristics of Collection Efficiency for Electrostatic Precipitator Using Dielectric Barrier Discharge Reactor (DBD(Dielectric Barrier Discharge) 반응기를 사용한 전기 집진기에서의 집진 효율 특성)

  • 강석훈;변정훈;지준호;황정호
    • Proceedings of the Korea Air Pollution Research Association Conference
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    • 2002.11a
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    • pp.449-450
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    • 2002
  • DBD (Dielectric Barrier Discharge)를 사용한 저온 플라즈마 기술은 오래 전부터 효과적인 오조나이저로서 연구되고 있으며 현재에는 반응기를 이용한 NOx와 SOx, VOCs 와 같은 유해 가스를 분해, 제거에 관한 많은 연구가 진행되고 있다. 그러나 DBD 반응기내의 높은 전자 밀도와 에너지를 이용하여 입자를 대전시켜 전기 집진기 등을 이용하여 제거하는, 입자상 물질 처리에 관한 연구는 아직까지 미흡하다. (중략)

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Characteristics of Discharges and Plasma Generation in Micro-Air gaps and Micro-Dielectric Barriers (마이크로 유전체장벽 및 마이크로 공격의 방전 및 플라즈마 발생특성)

  • Shon, Si-Ho;Tae, Heung-Sik;Hoon, Jae-Duk
    • Proceedings of the KIEE Conference
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    • 1996.07c
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    • pp.1835-1837
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    • 1996
  • Characteristics of Discharge and nonthermal plasma generation in a micro-air gap spacing between a micro-dielectric barrier and a electrode have been investigated experimentally to chert the potential to be used as a micro-scale nonthermal plasma generator. It is found that the output ozone concentration, as a nonthermal plasma intensity parameter, of the micro-air gnp nonthermal plasma generator depended greatly upon the air gap spacing and thickness of the dielectric barrier. As a result, there is a optimal air gap sparing in the same micro dielectric barrier to generate ozone effectively. And the higher ozone concentration was generated from the thinner micro-barrier.

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An Analysis of Vacuum Plasma Phenomena in DBD(Dielectric Barrier Discharges) (DBD(Dielectric Barrier Discharges)에서 전공 플라즈마 발생에 대한 해석적 연구)

  • Shin, Myoung-Soo;Cha, Sung-Hoon;Kim, Jong-Bong;Kim, Jong-Ho;Kim, Seong-Young;Lee, Hye-Jin
    • Journal of the Korean Society for Precision Engineering
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    • v.26 no.3
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    • pp.122-128
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    • 2009
  • DBD(Dielectric Barrier Discharges) plasma is often used to clean the surface of semiconductor. The cleaning performance is affected mainly by plasma density and duration time. In this study, the plasma density is predicted by coupled simulation of flow, chemistry mixing and reaction, plasma, and electric field. 13.56 MHz of RF source is used to generate plasma. The effect of dielectric thickness, gap distance, and flow velocity on plasma density is investigated. It is shown that the plasma density increases as the dielectric thickness decreases and the gap distance increases.

Corona Discharge and Ozone Generation Characteristics of a Slit Dielectric Barrier Discharge Type Plasma Reactor with a Third Electrode (3전극이 부설된 틈새 장벽방전형 플라즈마장치의 코로나 방전 및 오존발생 특성)

  • Moon, Jae-Duk;Jung, Jae-Seung
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.56 no.3
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    • pp.583-587
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    • 2007
  • Corona discharge and ozone generation characteristics of a slit dielectric barrier discharge type wire-plate plasma reactor with a third electrode have been investigated. When a third electrode is installed on a slit of the slit barrier, where an intense corona discharge occurs, it is found that a significantly increased ozone output could be obtained. This, however, indicates that the third electrode can activate the corona discharges both of the discharge wire and the slit of the slit barrier in the plasma reactor. As a result, a thin stainless wire, used as the third electrode has a strong effect to influence the corona discharge of the slit and corona wire, especially to the negative corona discharge. Higher amounts of the output ozone and ozone yield, about 1.27 and 1.29 times for the negative corona discharge, can be obtained with the third electrode, which reveals the effectiveness of the third electrode.

($TruNano^{TM}$ processing of dielectric layers and barrier-rib on soda-lime glass substrate for PDP panel

  • Lee, Michael M.S.;Kim, Nam-Hoon;Cheon, Chae-Il;Cho, Guang-Sup;Kim, Jeong-Seog
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.125-125
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    • 2006
  • We present a low temperature thermal process for the transparent dielectric layer, barrier rib, and white back dielectric layer on the soda-lime glass substrate of the PDP by the $TruNano^{TM}$ processor in combination with a compositional modification to the conventional dielectric pastes. By this method the firing temperature can be lowered by more than $100^{\circ}C$.

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The relationship between addressing time and dielectric layer, barrier rib hight (AC PDP의 addressing time과 유전체 및 Barrier Rib 높이와의 상관관계)

  • Park, J.T.;Park, C.S.;Song, K.D.;Park, C.H.;Cho, J.S.
    • Proceedings of the KIEE Conference
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    • 2000.07c
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    • pp.1824-1826
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    • 2000
  • Up to date, the dual scanning method has been adopted to decrease address-ing period in AC PDP. In this case, addressing period can be reduced, but the driving circuit cost should be increased. In this study, to increase addressing speed we have studied the relationship between addressing speed and cell structure. That is to say, we varied the thickness of dielectric layer on the front glass, the thickness of white back and the height of barrier rib on the rear glass. So, we found that the addressing time was decreased 4% with decreasing 5um thickness of dielectric layer on the front glass and 2um thickness of white back on the rear glass. Also in case of decreasing the height of barrier rib, addressing time was decreased about 4% per 10um.

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Particle Formation and Growth in Dielectric Barrier Discharge - Photocatalysts Hybrid Process for SO2 Removal (SO2 제거를 위한 유전체 장벽 방전 - 광촉매 복합 공정에서의 입자 형성과 성장)

  • Nasonova, Anna;Kim, Dong-Joo;Kim, Kyo-Seon
    • Journal of Industrial Technology
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    • v.30 no.A
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    • pp.127-132
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    • 2010
  • We analyzed the effects of several process variables on the $SO_2$ removal and particle growth by the dielectric barrier discharge - photocatalysts hybrid process. In this process, $SO_2$ was converted into the ammonium sulfate ($(NH_4)_2SO_4$) particles. The size and crystallinity of ammonium sulfate particles were examined by using TEM and XRD analysis. The dielectric barrier discharge reactor consisted of two zones: the first is for plasma generation and the second is for ammonium sulfate particles formation and growth. The first zone of reactor was filled with glass beads as a dielectric material. To enhance $SO_2$ removal process, the $TiO_2$ photocatalysts were coated on glass beads by dip-coating method. As the voltage applied to the plasma reactor or the pulse frequency of applied voltage increases, the $SO_2$ removal efficiency increases. Also as the initial concentration of $SO_2$ decreases or as the residence time increases, the $SO_2$ removal efficiency increases. $(NH_4)_2SO_4$ particles continue to grow by particle coagulation and surface reaction, moving inside the reactor. Larger particles in site are produced according to the increase of residence time or $SO_2$ concentrations.

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Dielectric Characteristics of Magnetic Tunnel Junction

  • Kim, Hong-Seog
    • The Journal of Engineering Research
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    • v.6 no.2
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    • pp.33-38
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    • 2004
  • To investigate the reliability of the MTJs on the roughness of insulating tunnel barrier, we prepared two MTJs with the different uniformity of barrier thickness. Namely, the one has uniform insulating barrier thickness; the other has non-uniform insulating barrier thickness as compared to different thing. As to depositing amorphous layer CoZrNb under the pinning layer IrMn, we achieved MTJ with uniform barrier thickness. Toinvestigate the reliability of the MTJs dependent on the bottom electrode, time-dependent dielectric breakdown (TDDB) measurements were carried out under constant voltage stress. The Weibull fit of out data shows clearly that $t_{BD}$ scales with the thickness uniformity of MTJs tunnel barrier. Assuming a linear dependence of log($t_{BD}$) on stress voltages, we obtained the lifetime of $10^4$years at a operating voltage of 0.4 V at MTJs comprising CoNbZr layers. This study shows that the reliabilityof new MTJs structure was improved due to the ultra smooth barrier, because the surface roughness of the bottom electrode influenced the uniformity of tunnel barrier.

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The estimation of dielectric constant of thick film using Vickers indentation

  • Kim, Hyeong-Jun;Kim, Kibum;Kim, Jongcheol;Yoon, Kyung-Han;Shin, Dongwook
    • Journal of Ceramic Processing Research
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    • v.13 no.spc2
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    • pp.241-245
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    • 2012
  • The barrier rib on plasma display panel (PDP) is a typical 3D-patterned thick film with thickness of 120 ㎛ and it is hard to measure its dielectric constant in this state of the product. Because the porosity of ceramic thick film influenced the mechanical and dielectric characteristics, it was expected that there was the relationship between two properties. Therefore, the correlation analysis between porosity, hardness and dielectric constant of the barrier rib was studied and the exponential curve between porosity and hardness, and the quadratic curve between porosity and dielectric constant were drawn. The dielectric constant was well related to hardness by K400kHz = 0.5672 + 5.695 ln(Hv). The hardness was measured at five points on two real panels which sintered by two types of profiles and then dielectric constants and deviation were estimated by the above equation.

NO and $SO_2$ Removal by Dielectric Barrier Discharge-Photocatalysts Hybrid Process (유전체 장벽 방전-광촉매 복합공정에 의한 NO와 $SO_2$ 제거)

  • Kim, Dong-Joo;Nasonova, Anna;Kim, Kyo-Seon
    • Clean Technology
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    • v.13 no.2
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    • pp.115-121
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    • 2007
  • In this study, we analyzed experimently the NO and $SO_2$ removal by the dielectric barrier discharge-photocatalysts hybrid process. The glass spheres were used as a dielectric material for dielectric barrier discharge and the $TiO_2$ photocatalysts were coated onto those spheres by the dip-coating method. The $TiO_2$ particles were coated in the sponge-shape, which has the larger surface area. As the voltage applied to the plasma reactor, the pulse frequency of applied voltage, or the residence time increases, the NO and $SO_2$ removal efficiencies increase. The increase in the supplied concentrations of NO and $SO_2$ leads to the higher energy for NO and $SO_2$ removal and the NO and $SO_2$ removal efficiencies decrease. These experimental results can be used as a basis to design the dielectric barrier discharge-photocatalysts hybrid process to remove NO and $SO_2$.

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