• The Korean Journal of Ceramics
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• v.3 no.1
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• pp.18-20
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• 1997

The fabrication process of silicon-diamond(SOD) structure wafer were studied. Microwave plasma chemical vapor deposition (MWPCVD) and annealing technology were used to synthesize diamond film with high resistivity and thermal conductivity. Bonding and etchback silicon-on-diamond (BESOD) were utilized to form supporting substrate and single silicon thin layer of SOD wafer. At last, a SOD structure wafer with 0.3~1$\mu\textrm{m}$ silicon film and 2$\mu\textrm{m}$ diamond film was prepared. The characteristics of radiation for a CMOS integrated circuit (IC) fabricated by SOD wafer were studied.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.11 no.7
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• pp.552-556
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• 1998

Diamond thin films were deposited on Si substrate using $CH_4 and H_2$mixed gas by RF plasma CVD. Prior to deposition, the substrate surface was mechanically scratched with the diamond paste of $3{\mu}m$ to improve the density of nucleation sites. The microstructure of diamond films deposited with methane(0.5%~2%) at the reaction pressure ranging from 20 torr to 50torrr were studied by a scanning electron microscope. It was observed in the deposited diamond films that the nucleation density decreased and crystallinity increased with decreasing the methane concentration. However, the nucleation density and crystallinity were decreased with decreasing the process pressure.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.11 no.10
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• pp.809-814
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• 1998

In this study, the metastable state diamond thin films have been deposited on Si substrates from methand-hydrogen and oxygen mixture usin gMicrowave Plasma Enhanced Chemical Vapor Deposition (MWPCVD) method. effects experimental parameters MWPCVD including methan concentrations, oxygen additions, operating pressure, deposition time on the growth rate and crystallinity were investigated. diamond thin film was synthesized under the following conditions: methane concentration of 0.5%(0.5sccm)∼5%(5sccm). oxygen concentration of 0∼80%(2.4sccm). operating pressure of 30Torr∼ 70Torr, deposition time of 1∼32hr. SEM, WRD, and Raman spectroscopy were employed to analyse the growth rate and morphology, crystallinity and prefered growth direction, and relative amounts of diamond and non=diamond phases respectively.

• Journal of Powder Materials
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• v.11 no.3
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• pp.224-232
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• 2004

Ni-diamond composite powders with nickel layer of round-top type on the surface of synthetic diamond (140/170 mesh) were prepared by the electroless plating method (EN) with semi-batch reactor. The effects of nickel concentration, feeding rates of reductant, temperature, reaction time and stirring speeds on the weight percentage and morphology of deposited Ni, mean particle size and specific surface area of the composite powders were investigated by Atomic Adsortion Spectrometer, SEM-EDX, PSA and BET. It was found that nucleated Ni-P islands, acted as catalytic sites for further deposition and grown into these relatively thick layers with nodule-type on the surface of diamond by a lateral growth mechanism. The weight percentage of Ni in the composite powder increased with reaction time, feeding rate of reductant and temperature, but decreased with stirring speed. The weight percentage of Ni in Ni-diamond composite powder was 55% at 150 min., 200 rpm and 7$0^{\circ}C$ .

• The Transactions of the Korean Institute of Electrical Engineers P
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• v.51 no.1
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• pp.33-38
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• 2002

In this study, the metastable state diamond thin films have been deposited on Si substrates from methane-hydrogen and oxygen mixture using microwave plasma enhanced chemical vapor deposition (MPCVD) method. Effects in experimental parameters of MPCVD including methane concentrations, oxygen additions, operating pressure, deposition time on the growth rate and crystallinity were investigated. Diamond thin film was synthesized under the following conditions: methane concentration of 0.5%(0.5sccm)~5%(5sccm), oxygen concentration of 0~80%(2.4sccm), operating pressure of 30Torr~70Torr, deposition time of 1~32hr. SEM, XRD, and Raman spectroscopy were employed to analyze the growth rate and morphology, crystallinity and prefered growth direction, and relative amounts of diamond and non-diamond phases, respectively.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.11a
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• pp.611-614
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• 2003

The electrochemical oxidation of ascorbic acid(AA), serotonin(SE) and epinephrine(EP) have been performed at poly N,N-dimethylaniline(PDMA) film coated diamond electrode. This cationic polymer film is electrochemically deposited on boron-doped diamond electrode surface. Unlike the bard electrode, the polymer film-coated diamond electrode can well separate the oxidation potential of AA by 200mV. Thus this electrode can be successfully used for the simultaneoud detection of both species. Increases in the concentration of AA do not affect the reponse of EP and SE.

• Journal of the Korean Society for Precision Engineering
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• v.8 no.2
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• pp.106-113
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• 1991

A diamond grinding wheel is generally used to grind hard and brittle materials, such as advanced ceramics. It is, however, quite difficult to dress a diamond grinding wheel efficiently because of its high degree of hardness. In this study, some investigations are carried out to increase dressing efficiecy of resinoid bonded diamond grinding wheel. Dressing forces are measured over a wide range of dressing conditions, and SEM observation of a grinding wheel is carried out. Special attention is paid to comparison between stick method and rotary brake method. Results obtained in this study provide useful information determining reguired dressing time, and for choosing efficient dressing condition for diamond grinding wheel.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07b
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• pp.930-933
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• 2003

The electrochemical oxidation of ascorbic acid(AA), serotonin(StT) and epinephrine(EP) have been performed ae poly N,N-dimethylanliline(PDMA) film coated diamond electrode. This cationic polymer film is electrochemically deposited on boron-doped diamond electrode surface. Unlike the bard electrode, the polyaer film-coated diamond electrode can well separate the oxidation potential of AA by 330mV. Thus this electrode can be successfully used for the simultaneoud detection of both species. Increases in the concentration of AA donot affect the reponse of EP and ST.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.21 no.5
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• pp.77-83
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• 2022

A high-hardness tool material is required to reduce extreme abrasive wear when drilling carbon fiber reinforced plastic (CFRP). Single-crystal diamond is the hardest material in the world, but it is very expensive to be used as a cutting tool. Polycrystalline diamond (PCD) is a diamond grit fused at a high temperature and pressure, and diamond-like carbon (DLC) is an amorphous carbon with high hardness. This study compares DLC coatings and PCD inserts to conventional TiAlN-coated tungsten carbide drills. In fiberglass and carbon fiber reinforced polymer drilling, the tool wear of DLC-coated carbide was approximately half that of TiAlN-coated tools, and slight tool wear occurred in the case of PCD insert end drills.

• Journal of Korean Vacuum Science & Technology
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• v.4 no.1
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• pp.18-22
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• 2000

For the enhancement of the nucleation density of the diamond film, we introduced the cyclic process. The cyclic process was carried out by the on/off control of CH$_4$ flow rate for a relatively short time (10 min), compared with the total reaction time (6 h). Prior to depositing the diamond film, we made the pretreated glass substrate via the unidirectional scratch using ∼l $\mu\textrm{m}$ size diamond powders. Diamond films were deposited on the pretreated glass substrate in a microwave plasma enhanced chemical vapor deposition (MPECVD) system. We observed the enhancement of the nucleation density of the diamond films caused by the cyclic process. Detailed surface morphologies of the substrate were investigated after the cyclic process. Based on these results, we discussed the cause for the enhancement of the nucleation density on the pretreated glass substrate by the cyclic process.