• 제목/요약/키워드: deposition textures

검색결과 26건 처리시간 0.02초

스퍼터링 방법에 의한 Fe-Ni 합금 박막의 집합조직 (Textures of Fe-Ni Alloy Thin Films Fabricated by Sputtering Method)

  • 박용범;임태흥
    • 한국진공학회지
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    • 제10권2호
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    • pp.201-206
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    • 2001
  • 본 연구에서는 RF 마그네트론 스퍼터링 방법을 이용하여 저탄소강 기판에 증착시킨 Fe-Ni계 합금 박막의 집합조직 발달을 조사하였다. Fe-Ni 합금 조성은 산업적 응용을 고려하여 인바합금(Invar alloy, Fe-36.5 wt%Ni)과 퍼멀로이(Permalloy, Fe-81 wt%Ni) 두 종류로 선택하였고, 증착시간을 변수로 제작하였다. 이들 합금 박막의 집합조직은 박막에서 전형적으로 나타나는 섬유집합조직(fibre texture)의 형태로 발달하였다. 인바합금 박막에서는 증착 초기에 <110>//ND 섬유집합조직이 발달하지만 증착시간이 증가함에따라 <210>//ND 섬유집합조직으로 변화하였다. 퍼멀로이 박막은 증착초기에 <221>//ND+<311>//ND의 혼합 집합조직을 나타내며 증착시간의 증가와 함께 <210>//ND 섬유집합조직으로 변화하였다. 이러한 집합조직의 변화를 박막의 미세조직의 진화와의 연관성이란 측면에서 고찰하였다.

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구리 도금층의 기계적 성질에 미치는 집합조직의 융합연구 (Convergent Study of Texture on the Mechanical Properties of Electrodeposits)

  • 강수영
    • 한국융합학회논문지
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    • 제7권6호
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    • pp.193-198
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    • 2016
  • 전기 도금한 도금 층의 집합조직은 전해조건에 의해 변화하는 것으로 알려져 있다. 도금층의 집합조직은 도금층의 미세조직과 표면 형상과 관계가 있으며 도금층의 기계적인 성질에 영향을 미친다. 그러므로 도금층의 집합조직의 변화양상의 이해는 매우 중요하다. 또한 전기도금 층은 열처리 됐을 때 재결정이 일어난다. 그 재결정 집합조직은 도금 층의 초기 성장 집합조직과 다르게 된다. 전기 도금한 도금 층의 그 미세조직, 표면 형상, 집합조직과 기계적인 성질은 용액조성, 과전압, pH, 전류밀도와 용액온도 등의 전해조건에 의해 변화한다. (111)과 (110)집합조직을 갖는 구리도금 층을 융합연구를 통해 황산 욕으로부터 얻을 수 있었다. 이 연구에서는 (110) 또는 (111)집합조직을 갖는 구리도금 층을 황산 욕에서 얻고, 그 (110) 또는 (111)집합조직으로의 변화와 기계적 성질을 설명할 수 있는 모델을 제시하였다.

2축 정렬된 Ni 위에 MOCVD법에 의한 NiO의 증착조건 (Deposition condition of NiO deposited on biaxially textured Ni by a MOCVD process)

  • 선종원;김형섭;지봉기;박해웅;홍계원;박순동;정충환;전병혁;김찬중
    • 한국초전도ㆍ저온공학회논문지
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    • 제4권2호
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    • pp.5-10
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    • 2002
  • Deposition condition of NiO that is one of Possible buffer layers for YBCO coated conductors was studied. NiO was deposited on textured Ni substrates by a MOCVD (metal-organic chemical vapor deposition) method. The degree of texture, and the surface roughness were analyzed by X-ray Pole figure, atomic force microscope and scanning electron microscope. The (111) and (200) textures were competitively developed , depending on an oxygen partial Pressure(PO2) and deposition temperature (Tp). The (200) textured NiO layer was deposited at Tp=450~47$0^{\circ}C$ and PO2= 1.67 Torr Out-of-Plane ($\omega$-scan) and in-plane ($\Phi$-scan) textures of the (200) NiO films were as good as 10.34$^{\circ}$ and 10.00$^{\circ}$ respectively The AFM surface roughness of NiO was in the range of 3~4.5 nm at PO2=0.91~3.34 Torr and at Tp=47$0^{\circ}C$ , and in the range of 3~13 nm at TP=450~53$0^{\circ}C$ and at PO2=1.67 Torr.

도금층의 재결정 집합조직에 관한 연구 (A Study on the Recrystallization Texture of Electrodeposits)

  • 홍상철
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 1999년도 춘계학술대회논문집
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    • pp.184-187
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    • 1999
  • The texture of electrodeposits is related to microstructure surface morphology and mechanical properties. When the electrodeposits annealed the recrystallization texture many be different from the original deposition texture. the <100> and <110> textures of nickel electrodeposits changed to the <100> and <{{{{ SQRT {310 } }}}}> textures when recrystallized The <100> and <{{{{ SQRT {310 } }}}}> mixed texture is changed to the <100> texture. The <002> texture of Zn electrodeposits didn't changed even after recrystallization.

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TEXTURE AND RELATED PHENOMENA OF ELECTRODEPOSITS

  • Lee, D.N.
    • 한국표면공학회지
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    • 제32권3호
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    • pp.317-330
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    • 1999
  • The texture of electrodeposits changes from the orientation that places the lowest energy crystal facets parallel to the substrate under a condition of low ion concentration adjacent to the deposit, to the orientation that places the higher energy crystal facets parallel to the substrate as the ion concentration adjacent to the deposit increases. The electrodeposits have peculiar surface morphologies and microstructures depending on their textures, which in turn may affect their mechanical properties even when they are obtained in a similar electrolysis condition. The electrodeposits undergo recrystallization, when annealed. The recrystallization texture may be different from the deposition texture. These phenomena have been discussed.

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MOCVD 공정을 이용한 $Yb_2O_3$ 박막 제조 (Preparation of $Yb_2O_3$ Film by MOCVD Method)

  • 정우영;전병혁;박해웅;홍계원;김찬중
    • Progress in Superconductivity
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    • 제8권1호
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    • pp.75-80
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    • 2006
  • [ $Yb_2O_3$ ] films were successfully deposited on a cube-textured Ni and(100) $SrTiO_3$(STO) single crystal substrates by metal organic chemical vapor deposition(MOCVD) method using $H_2O$ vapor as an oxidant. $H_2O$ vapor was used in order to avoid the oxidation of Ni substrate. The working pressure and Ar flow rate were 10 Ton and 600 sccm, respectively. $Yb_2O_3$ films on STO were formed at high temperatures above $900^{\circ}C$. While XRD peaks from $Yb_2O_3$ were hardly detected at $900^{\circ}C$, the $Yb_2O_3$(400) texture was developed fur the films grown at deposition temperatures above $950^{\circ}C$. The AEM surface roughness of $Yb_2O_3$ film, grown on STO, was in the range of $6{\sim}10nm$ for the film deposited at $950^{\circ}C$ with a $H_2O$ vapor partial pressure of 5.5 Ton and deposition times of 3 and 5 mins. For cube-textured Ni substrate, both $Yb_2O_3$(222) and $Yb_2O_3$ (400) textures were developed textures at deposition temperatures above $850^{\circ}C$.

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YBCO Coated Conductor용 버퍼총의 제조 및 특성 (Preparation of buffer layers for YBCO coated conductors and the properties)

  • 김찬중;홍계원;박해웅;김호진;지봉기
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
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    • pp.98-104
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    • 2002
  • CeO$_2$ and NiO buffers for YBCO coated conductors were deposited on biaxially textured Ni substrate by metalorganic chemical vapor deposition(MOCVD) and the deposition behavior were investigated. The degree of texture of deposited CeO$_2$ and NiO films was strongly dependent on the deposition temperature(T$\sub$d/) and oxygen partial pressure(P$\sub$O$_2$/). ($\ell$00) textured films were well deposited at specific deposition temperatures and oxygen partial pressures. The in-plane and out of plane textures estimated form the full width half maximum of the pole figure peaks were less than 10$^{\circ}$. The surface morphology showed that the CeO$_2$ films consisted of columnar grains grown normal to the Ni substrates, while NiO films were slate and clean like a mirror. The surface roughness of both films estimated by atomic force microscopy(AFM) were as smooth as 3-10 m. The growth rate of the films is much faster than that of other physical deposition methods.

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마이크로파 플라즈마 화학기상성장법에 의해 (110)면으로 배향된 다이아몬드막의 합성 (Synthesis of (110) Oriented Diamond Films by Microwave Plasma Enhanced Chemical Vapor Deposition)

  • 박재철;박상현
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1995년도 추계학술대회 논문집
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    • pp.269-272
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    • 1995
  • As methane concentration was varietal, the textures of diamond films deposited on Si(100)substrate could be observed by XRD, SEM and Raman spectroscope. As a result, O$_2$plasma etching has been useful to observe microscopic structure of diamond films by SEM. The cross section of diamond films deposited on Si(100) substrate with 4% concentration of methane to hydrogen was a polycrystal like a pillar. The diamond crystal like a pillar has been oriented to (110) surface and the high quality diamond with FWHM of Raman spectra being 3.8cm$\^$-1/ has been grown. As time goes by deposition time, the preferred orientation increases.

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마이크로파 플라즈마 화학기상성장법에 의해 (110)면으로 배향된 다이아몬드막의 합성 (Synthesis of (110) oriented diamond films by microwave plasma enhanced chemical vapor deposition)

  • 박재철;박상현
    • E2M - 전기 전자와 첨단 소재
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    • 제9권3호
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    • pp.270-276
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    • 1996
  • As methane concentration was varied, the textures of diamond films deposited on Si(100)substrate were observed by XRD,SEM and Raman spectroscope. As a result, $O_{2}$ plasma etching has been useful to observe microscopic structure of diamond films by SEM. The cross section of diamond films deposited on Si(100)substrate with 4% concentration of methane to hydrogen was a polycrystal like a pillar. The diamond crystal like a pillar has been oriented to (110)surface and the high quality diamond film with FWHM of Raman spectra being 3.8 $cm^{-1}$ / has been grown. As time goes by deposition time, the preferred orientation increases

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PLD법을 이용한 Ni과 NiW기판위에 Ce$O_{2}$YSZ/$Y_{2}$$O_{3}$완충층 증착 (Deposition of Ce$O_{2}$YSZ/$Y_{2}$$O_{3}$ buffer layers on Ni and NiW substrate by PLD)

  • D. Q. Shi;R. K. Ko;K. J. Song;J. K. Chung;Park, S. J.;J. Yang;S. I. Yoo;Park, C.
    • 한국초전도저온공학회:학술대회논문집
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    • 한국초전도저온공학회 2003년도 추계학술대회 논문집
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    • pp.139-141
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    • 2003
  • Multiple CeO$_2$/YSZ/Y$_2$O$_3$buffer layers, and subsequent YBCO films were deposited on the biaxially textured pure Ni and Ni + 3at%W substrates using pulsed laser deposition. The deposition conditions of buffer layers on Ni and NiW were studied and compared. Good biaxial textures of buffer layers have been obtained on both substrates. The Jc's of YBCO films on these metal substrates were greater than 1$\times$10$^{6}$ A/$\textrm{cm}^2$ at 77K, 0T.

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