• Journal of the Korean Vacuum Society
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• v.10 no.2
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• pp.201-206
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• 2001

The evolution of textures in Fe-Ni alloy thin films fabricated by PVD using a sputtering method was investigated with parameters such as deposition time and chemical composition. The textures of the as-deposited films were characterized by fibre-type. In Invar alloy(Fe-36.5 wt%Ni) thin film, the <110>//ND fibre texture as a starting component changed to the <210>//ND fibre texture with increasing deposition time. In Permalloy(Fe-81 wt%Ni) thin film, a mixture of the <221>//ND and <311>//ND fibres developed at the early stage of deposition, and then transformed to the <210>//ND fibre with increasing deposition time. These texture changes were discussed in terms of relationship with the microstructural evolution of the films.

• Journal of the Korea Convergence Society
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• v.7 no.6
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• pp.193-198
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• 2016

The texture of electrodeposits varies with deposition conditions. Texture of electrodeposits is also related to microstructure, surface morphology and mechanical properties. When the electrodeposits annealed, the recrystallization texture may be different from the original deposition texture. The surface morphology, the microstructure and the initial and recrystallization textures of copper electrodeposits vary with deposition conditions. The texture, microstructure, surface morphology and mechanical properties of electrodeposits are known to vary with electrolysis conditions, such as bath composition, over potential, pH, current density, bath temperature, etc. The (111) and (110) textures of copper electrodeposits can be obtained from copper sulfate bath. In this study, copper electrodeposits with (111) and (110) textures are obtained from a copper sulfate bath, and the change from (111) to (110) textures of copper electrodeposits can be explained.

• Progress in Superconductivity and Cryogenics
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• v.4 no.2
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• pp.5-10
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• 2002

Deposition condition of NiO that is one of Possible buffer layers for YBCO coated conductors was studied. NiO was deposited on textured Ni substrates by a MOCVD (metal-organic chemical vapor deposition) method. The degree of texture, and the surface roughness were analyzed by X-ray Pole figure, atomic force microscope and scanning electron microscope. The (111) and (200) textures were competitively developed , depending on an oxygen partial Pressure(PO2) and deposition temperature (Tp). The (200) textured NiO layer was deposited at Tp=450~47$0^{\circ}C$ and PO2= 1.67 Torr Out-of-Plane ($\omega$-scan) and in-plane ($\Phi$-scan) textures of the (200) NiO films were as good as 10.34$^{\circ}$ and 10.00$^{\circ}$ respectively The AFM surface roughness of NiO was in the range of 3~4.5 nm at PO2=0.91~3.34 Torr and at Tp=47$0^{\circ}C$ , and in the range of 3~13 nm at TP=450~53$0^{\circ}C$ and at PO2=1.67 Torr.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 1999.03b
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• pp.184-187
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• 1999

The texture of electrodeposits is related to microstructure surface morphology and mechanical properties. When the electrodeposits annealed the recrystallization texture many be different from the original deposition texture. the <100> and <110> textures of nickel electrodeposits changed to the <100> and <{{{{ SQRT {310 } }}}}> textures when recrystallized The <100> and <{{{{ SQRT {310 } }}}}> mixed texture is changed to the <100> texture. The <002> texture of Zn electrodeposits didn't changed even after recrystallization.

• Journal of the Korean institute of surface engineering
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• v.32 no.3
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• pp.317-330
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• 1999

The texture of electrodeposits changes from the orientation that places the lowest energy crystal facets parallel to the substrate under a condition of low ion concentration adjacent to the deposit, to the orientation that places the higher energy crystal facets parallel to the substrate as the ion concentration adjacent to the deposit increases. The electrodeposits have peculiar surface morphologies and microstructures depending on their textures, which in turn may affect their mechanical properties even when they are obtained in a similar electrolysis condition. The electrodeposits undergo recrystallization, when annealed. The recrystallization texture may be different from the deposition texture. These phenomena have been discussed.

• Progress in Superconductivity
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• v.8 no.1
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• pp.75-80
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• 2006

[ $Yb_2O_3$ ] films were successfully deposited on a cube-textured Ni and(100) $SrTiO_3$(STO) single crystal substrates by metal organic chemical vapor deposition(MOCVD) method using $H_2O$ vapor as an oxidant. $H_2O$ vapor was used in order to avoid the oxidation of Ni substrate. The working pressure and Ar flow rate were 10 Ton and 600 sccm, respectively. $Yb_2O_3$ films on STO were formed at high temperatures above $900^{\circ}C$. While XRD peaks from $Yb_2O_3$ were hardly detected at $900^{\circ}C$, the $Yb_2O_3$(400) texture was developed fur the films grown at deposition temperatures above $950^{\circ}C$. The AEM surface roughness of $Yb_2O_3$ film, grown on STO, was in the range of $6{\sim}10nm$ for the film deposited at $950^{\circ}C$ with a $H_2O$ vapor partial pressure of 5.5 Ton and deposition times of 3 and 5 mins. For cube-textured Ni substrate, both $Yb_2O_3$(222) and $Yb_2O_3$ (400) textures were developed textures at deposition temperatures above $850^{\circ}C$.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07a
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• pp.98-104
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• 2002

CeO$_2$ and NiO buffers for YBCO coated conductors were deposited on biaxially textured Ni substrate by metalorganic chemical vapor deposition(MOCVD) and the deposition behavior were investigated. The degree of texture of deposited CeO$_2$ and NiO films was strongly dependent on the deposition temperature(T$\sub$d/) and oxygen partial pressure(P$\sub$O$_2$/). ($\ell$00) textured films were well deposited at specific deposition temperatures and oxygen partial pressures. The in-plane and out of plane textures estimated form the full width half maximum of the pole figure peaks were less than 10$^{\circ}$. The surface morphology showed that the CeO$_2$ films consisted of columnar grains grown normal to the Ni substrates, while NiO films were slate and clean like a mirror. The surface roughness of both films estimated by atomic force microscopy(AFM) were as smooth as 3-10 m. The growth rate of the films is much faster than that of other physical deposition methods.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1995.11a
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• pp.269-272
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• 1995

As methane concentration was varietal, the textures of diamond films deposited on Si(100)substrate could be observed by XRD, SEM and Raman spectroscope. As a result, O$_2$plasma etching has been useful to observe microscopic structure of diamond films by SEM. The cross section of diamond films deposited on Si(100) substrate with 4% concentration of methane to hydrogen was a polycrystal like a pillar. The diamond crystal like a pillar has been oriented to (110) surface and the high quality diamond with FWHM of Raman spectra being 3.8cm$\^$-1/ has been grown. As time goes by deposition time, the preferred orientation increases.

• Electrical & Electronic Materials
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• v.9 no.3
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• pp.270-276
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• 1996

As methane concentration was varied, the textures of diamond films deposited on Si(100)substrate were observed by XRD,SEM and Raman spectroscope. As a result, $O_{2}$ plasma etching has been useful to observe microscopic structure of diamond films by SEM. The cross section of diamond films deposited on Si(100)substrate with 4% concentration of methane to hydrogen was a polycrystal like a pillar. The diamond crystal like a pillar has been oriented to (110)surface and the high quality diamond film with FWHM of Raman spectra being 3.8 $cm^{-1}$ / has been grown. As time goes by deposition time, the preferred orientation increases

• Proceedings of the Korea Institute of Applied Superconductivity and Cryogenics Conference
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• 2003.10a
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• pp.139-141
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• 2003

Multiple CeO$_2$/YSZ/Y$_2$O$_3$buffer layers, and subsequent YBCO films were deposited on the biaxially textured pure Ni and Ni ＋ 3at％W substrates using pulsed laser deposition. The deposition conditions of buffer layers on Ni and NiW were studied and compared. Good biaxial textures of buffer layers have been obtained on both substrates. The Jc's of YBCO films on these metal substrates were greater than 1$\times$10$^{6}$ A/$\textrm{cm}^2$ at 77K, 0T.