• Proceedings of the KIEE Conference
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• 2003.07c
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• pp.1496-1498
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• 2003

The $(Sr_{0.85}Ca_{0.15})TiO_3$(SCT) thin films were deposited on Pt-coated electrode (Pt/TiN/$SiO_2$/Si) using RF sputtering method according to the deposition condition. The optimum conditions of RF power and Ar/$O_2$ ratio were 140[W] and 80/20, respectively. Deposition rate of SCT thin films was about 18.75[${\AA}/min$] at the optimum condition. The capacitance characteristics had a stable value within ${\pm}4[%]$. The drastic decrease of dielectric constant and increase of dielectric loss in SCT thin films were observed above 200[kHz].

• Journal of the Korean Vacuum Society
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• v.9 no.1
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• pp.36-41
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• 2000

$SnO-2$ thin films for thin film secondary battery anode were deposited n glass substrate with stain-less steel collector and charge/discharge experiments were conducted to investigate feasibility of $SnO-2$ thin film as a new anode material. The as-deposited films were pure $SnO-2$ phase which is not related to deposition condition. The grain size on the surface of as-deposited films increased with increase of oxygen partial pressure. However, the grain size did not show any change above oxygen partial pressure of 80:20. The surface roughness of the as-deposited films increased after decreasing because of resputtering effect of oxygen negative ion in plasma. All films showed typical $SnO-2$ anode characteristics which has a side effect at the first cycle, which is not related to the deposition condition. The charge/discharge experiments of 200cycles indicated that capacity of $SnO-2$ films depended on oxygen contents and surface roughness. The cycle characteristics was determined by initial charge/discharge reaction. The $SnO-2$ film with low initial capacity showed more stable cycle characteristics than film with high initial capacity.

• Journal of Korean Vacuum Science & Technology
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• v.2 no.2
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• pp.78-84
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• 1998

ZnO:Al films were prepared by an rf magnetron sputtering and targets for the experiments were fabricated by sintering the mixture of ZnO and Al2O3. The most conductive film was obtained from the target with 2.0∼2.2 wt.% of Al2O3. Optical properties studied with spectroscopic ellipsometry showed band gap widening, i.e., the Burstein-Moss shift, with aluminum doping as well as with the elevation of deposition temperature. And it is found that the optical and electrical properties were related to the density of states as well as the variation of donor level. when hydrogen atoms were introduced into the films, the activation energy for the generation of oxygen vacancy was smaller for the films showing higher conductivity. This indicates that the optimum deposition condition for highly conductive ZnO:Al film has strong relation to the optimum doping condition.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.22 no.2
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• pp.173-183
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• 1998

An optimization procedure to find the inlet concentration profile that yields the most uniform deposition rate in a cylindrical CVD chamber has been developed. Assuming that the chemical reaction time is negligibly small, a SIMPLE based finite-volume method is adopted to solve the fully elliptic equations for momentum, temperature, and concentration. The inlet concentration profile is expressed by a linear combination of Chebyshev polynomials and the coefficients of which are determined by the local random search technique. It is shown that the present method is very effective in improving the uniformity of the deposition rate, especially when Re is high and/or the wafer is placed close to the inlet. The optimal profiles have been obtained for various Re, Gr, and geometry combinations.

• Korean Journal of Materials Research
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• v.31 no.9
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• pp.488-495
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• 2021

Solid state grain growth (SSCG) is a method of growing large single crystals from seed single crystals by abnormal grain growth in a small-grained matrix. During grain growth, pores are often trapped in the matrix and remain in single crystals. Aerosol deposition (AD) is a method of manufacturing films with almost full density from nano grains by causing high energy collision between substrates and ceramic powders. AD and SSCG are used to grow single crystals with few pores. BaTiO₃ films are coated on (100) SrTiO₃ seeds by AD. To generate grain growth, BaTiO₃ films are heated to 1,300 ℃ and held for 10 h, and entire films are grown as single crystals. The condition of grain growth driving force is ∆G_max < ∆G_c ≤ ∆G_seed. On the other hand, the condition of grain growth driving force in BaTiO₃ AD films heat-treated at 1,100 and 1,200 ℃ is ∆G_c < ∆G_max, and single crystals are not grown.

• Nuclear Engineering and Technology
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• v.55 no.9
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• pp.3164-3182
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• 2023

The CRUD on the fuel cladding under the pressurized water reactor (PWR) operating condition causes several issues. The CRUD can act as thermal resistance and increases the local cladding temperature which accelerate the corrosion process. The hideout of boron inside the CRUD results in axial offset anomaly and reduces the plant's shutdown margin. Recently, there are efforts to revise the acceptance criteria of emergency core cooling systems (ECCS), and additionally require the modeling of the thermal resistance effect of the CRUD during the performance analysis. There is an urgent need for the evaluation of the effect of the CRUD deposition on the cladding heat transfer under PWR operating conditions, but the experimental database is very limited. The experimental facility called DISNY was designed and constructed to analyze the CRUD-related multi-physical phenomena, and the performance analysis of the constructed DISNY facility was conducted. The thermal-hydraulic and water chemistry conditions to simulate the CRUD growth under PWR operating conditions were established. The design characteristics and feasibility of the DISNY facility were validated by the MARS-KS code analysis and separate performance tests. In the current study, detailed design features, design validation results, and future utilization plans of the proposed DISNY facility are presented.

• Journal of the Korean Vacuum Society
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• v.13 no.1
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• pp.9-13
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• 2004

Perylene is an interesting material known to have P-type and N-type characteristics at the same time. We prepared perylene thin-films in ultrahigh vacuum with two different deposition rates of 0.1 $\AA$/s and 1.0 $\AA$/s in order to study the dependence of film characteristics on the growth condition. The smaller average grain size with larger surface coverage as well as the better crystallinity were observed on the perylene film prepared under 1.0 $\AA$/s deposition rate in x-ray diffraction (XRD) and atomic force microscopy (AFM) study. For studying electrical property of the film, perylene organic thin-film transistor (OTFT) with gold contacts was fabricated on $SiO_2$/Si surface in UHV condition. The prepared perylene OTFT device shows P-type characteristic. The obtained hole mobility in the current-voltage characteristic curve was$2.23\times10^{-5}\textrm{cm}^2$/Vs.

• Korean Journal of Materials Research
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• v.8 no.9
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• pp.783-790
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• 1998

New process development of nuclear fuel fabrication for nuclear power plant was attempted by induction plasma technology with yttria-stabilized-zirconia ($\textrm{ZrO}_{2}$-$\textrm{Y}_{2}\textrm{O}_{3}$)powder, similar to $\textrm{UO}_{2}$, in the respect of melting point and physicochemical characteristics. Extent of powder melting was affected greatly by plasma plate power and particle size. Being optimized such as, sheath gas composition, probe position, particle size and spraying distance, dense deposit of 97.91% T.D. with deposition rate 20mm/min was attained at the condition of 120/20$\ell$/min of Ar/$\textrm{H}_{2}$ flow rate, 80kw of plate power, 8cm of probe position, 200Torr of chamber pressure and 18cm of spraying distance. The pellet of 96.5% of theoretical density was formed with homogeneity and nice exterior view at the best condition of deposition experiments, and the possibility of new nuclear pellet fabrication process was confirmed. The main and interrelated effects on deposit density were assessed by ANOVA(Ana1ysis of Variance).

• Geomechanics and Engineering
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• v.23 no.1
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• pp.85-92
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• 2020

This study adopted soil test and laboratory physical model experiments to simulate the tailings impoundment accumulation process according to the principle of similarity. Relying on the practical engineering, it analyzed the tailings deposition characteristics on dry beach surface during the damming process, as well as the variation rules of dam saturation line. Results suggested that, the tailings particles gradually became finer along the dry beach surface to inside the impoundment. The particle size suddenly changed at the junction between the deposited beach and the water surface, which displayed an obvious coarsening phenomenon. Besides, the deposited beach exhibited the vertical feature of coarse upward and fine downward on the whole. Additionally, in the physical model, the saturation line elevated with the increase in dam height, and its amplitude was relatively obvious within the range of 1.0-4.5 m away from the initial dam. Under flood condition, the saturation line height was higher than that under normal condition on the whole, with the maximum height difference of 4 cm. This study could provide an important theoretical basis for further studies on dam failure experiments and the evolution rules of leaked tailings flow.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.11a
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• pp.67-67
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• 2001

The structure zone model has been used to provide an overview of the relationship between the microstructure of the films deposited by PVD and the most prominent deposition condition.s. B.AMovchan and AV.Demchishin have proposed it firstls such model. They concluded that the general features of the resulting structures could be correlated into three zones depending on $T/T_m$. Here T m is the melting point of the coating material and T is the substrate temperature in kelvines. Zone 1 ($T/Tm_) is dominated by tapered macrograins with domed tops, zone 2 ($O.3) by columnar grains with denser boundaries and zone 3 ($T/T_m>O.5$) by equiaxed grains formed by recrystallization. J.AThomton has extended this model to include the effect of the sputtering gas pressure and found a fourth zone termed zone T(transition zone) consisting of a dense array of poorly defined fibrous grains. R.Messier found that the zone I-T boundary (fourth zone of Thorton) varies in a fashion similar to the film bias potential as a function of gas pressure. However, there has not nearly enough model for explaining the change in morphology with crystal orientation of the films. The structure zone model only provide an information about the morphology of the deposited film. In general, the nucleation and growth mechanism for granular and fine structure of the deposited films are very complex in an PVD technique because the morphology and orientation depend not only on the substrate temperature but also on the energy of deposition of the atoms or ions, the kinetic mechanism between metal atoms and argon or nitrogen gas, and even on the presence of impurities. In order to clarify these relationship, AI and Mg thin films were prepared on SPCC steel substrates by PVD techniques. The influence of gas pressures and bias voltages on their crystal orientation and morphology of the prepared films were investigated by SEM and XRD, respectively. And the effect of crystal orientation and morphology of the prepared films on corrosion resistance was estimated by measuring polarization curves in 3% NaCI solution.