• 제목/요약/키워드: d.c field

검색결과 1,752건 처리시간 0.034초

치환리터럴에 의한 Quaternary Galois Field Sum-Of-Product(QGFSOP)형 1-변수 함수의 합성과 실현 (Syntheses and realization of Quaternary Galois Field Sum-Of-Product(QGFSOP) expressed 1-variable functions Permutational Literals)

  • 박동영;김백기;성현경
    • 한국항행학회논문지
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    • 제14권5호
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    • pp.710-717
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    • 2010
  • Quaternary 논리에서 생성 가능한 1-qudit(1-variable quantum digit) 함수는 총 256개가 존재하지만 이들 중에서 가장 유용한 것은 "0,1,2,3"의 치환에 의해 $Ax^C$+D(GF4)형의 QGFSOP 표현이 가능한 24개이다. 본 논문에서는 24개 1-qudit 함수들의 $Ax^C$+D(GF4) 연산에서 피연산자인 피승수 A와 피기수 D를 다단 종속된 치환리터럴의 제어인자로 사용하는 치환리터럴(Permutational Literals, PL) 표현과 QPL(Quaternary PL) gate를 제안하였다. 그리고 상호치환 'ab', 가산 '+D', 그리고 승산 'xA'과 같은 세 개의 PL 연산자를 사용하여 QGFSOP 표현된 24개 (1-qudit) 함수를 합성하기 위한 PL 합성법을 제안하였다. 끝으로 PL 합성법을 실현하기 위한 $Ax^C$+D(GF4) 구조와 연산회로 및 CMOS 실현 방법을 제시하였다.

Atomic Force Microscopy을 이용한 4H-SiC의 Local Oxidation (Local oxidation of 4H-SiC using an atomic force microscopy)

  • 조영득;방욱;김상철;김남균;구상모
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 춘계학술대회 논문집
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    • pp.79-80
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    • 2009
  • The local oxidation using an atomic force microscopy (AFM) is useful for Si-base fabrication of nanoscale structures and devices. SiC is a wide band-gap material that has advantages such as high-power, high-temperature and high-frequency in applications, and among several SiC poly types, 4H-SiC is the most attractive poly type due to the high electron mobility. However, the AFM local oxidation of 4H-SiC for fabrication is still difficult, mainly due to the physical hardness and chemical inactivity of SiC. In this paper, we investigated the local oxidation of 4H-SiC surface using an AFM. We fabricated oxide patterns using a contact mode AFM with a Pt/Ir-coated Si tip (N-type, $0.01{\sim}0.025\;{\Omega}cm$) at room temperature, and the relative humidity ranged from 40 to 50%. The height of the fabricated oxide pattern ($1{\sim}3\;nm$) on SiC is similar to that of typically obtained on Si ($10^{15}{\sim}10^{17}\;cm^{-3}$). We perform the 2-D simulation to further analyze the electric field between the tip and the surface. Whereas the simulated electric field on Si surface is constant ($5\;{\times}\;10^7\;V/m$), the electric field on SiC surface increases with increasing the doping concentration from ${\sim}10^{15}$ to ${\sim}10^{17}\;cm^{-3}$. We demonstrated that a specific electric field ($4\;{\times}\;10^7\;V/m$) and a doping concentration (${\sim}10^{17}\;cm^{-3}$) is sufficient to switch on/off the growth of the local oxide on SiC.

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ON CHARACTERIZATIONS OF PRÜFER v-MULTIPLICATION DOMAINS

  • Chang, Gyu Whan
    • Korean Journal of Mathematics
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    • 제18권4호
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    • pp.335-342
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    • 2010
  • Let D be an integral domain with quotient field K,$\mathcal{I}(D)$ be the set of nonzero ideals of D, and $w$ be the star-operation on D defined by $I_w=\{x{\in}K{\mid}xJ{\subseteq}I$ for some $J{\in}\mathcal{I}(D)$ such that J is finitely generated and $J^{-1}=D\}$. The D is called a Pr$\ddot{u}$fer $v$-multiplication domain if $(II^{-1})_w=D$ for all nonzero finitely generated ideals I of D. In this paper, we show that D is a Pr$\ddot{u}$fer $v$-multiplication domain if and only if $(A{\cap}(B+C))_w=((A{\cap}B)+(A{\cap}C))_w$ for all $A,B,C{\in}\mathcal{I}(D)$, if and only if $(A(B{\cap}C))_w=(AB{\cap}AC)_w$ for all $A,B,C{\in}\mathcal{I}(D)$, if and only if $((A+B)(A{\cap}B))_w=(AB)_w$ for all $A,B{\in}\mathcal{I}(D)$, if and only if $((A+B):C)_w=((A:C)+(B:C))_w$ for all $A,B,C{\in}\mathcal{I}(D)$ with C finitely generated, if and only if $((a:b)+(b:a))_w=D$ for all nonzero $a,b{\in}D$, if and only if $(A:(B{\cap}C))_w=((A:B)+(A:C))_w$ for all $A,B,C{\in}\mathcal{I}(D)$ with B, C finitely generated.

전외 액츄에이터용 PBZT 세라믹스의 $WO_3$ 첨가에 따른 특성 (Characteristics of PBZT Ceramics for Electrostrictive Actuator according to $WO_3$)

  • 김규수;윤광희;윤현상;박창엽;홍재일;류주현
    • E2M - 전기 전자와 첨단 소재
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    • 제10권9호
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    • pp.909-915
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    • 1997
  • To improve the electro-induced strain and to decease the hysteresis of that W $O_3$dopant of which amount is 0~0.8wt% was added to (P $b_{0.73}$/B $a_{0.27}$)(Z $r_{0.75}$/ $Ti_{0.25}$) $O_3$+0.1wt% $Y_{2}$/ $O_3$ceramics. At the specimen with 0.4 wt% W $O_3$the electromechanical coupling coefficient( $K_{31}$ ) showed the maximum value of 23.6% at D.C 10 kV/cm electric field. At the same W $O_3$addition amount the piezoelectric constant( $d_{31}$ ) and the electro-induced strain($\Delta$$\ell$/$\ell$)showed the highest values of 182$\times$10$^{-12}$ [C/N] 210$\times$10$^{-6}$ $\Delta$$\ell$/$\ell$at D.C. 10 kV/cm electric field. respectively0 kV/cm electric field. respectivelyvely.

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PZN-BT-PT 세라믹스를 이용한 전왜 BUZZER의 음향 특성 (Acoustic Properties of Electrostrictive Buzzer Using PZN-BT-PT Ceramics)

  • 유준현;김현재;박창엽
    • 대한전기학회논문지
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    • 제41권1호
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    • pp.50-55
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    • 1992
  • Piezoelectric Buzzer which has been generally used requires about 30kV/cm poling process and has the aging effects. In this study, 0.85 PZN - 0.10 BT - 0.05 PT system ceramics with additives of 0 - 2 wt% YS12TOS13T were fabricated and investigated on electromechanical coupling coefficient(kS1pT), electric field induced charge coefficient(dS131T), and sound level. As the results, in the 0.4 wt% YS12TOS13T added composition ceramics compared with the basic, kS1pT was increased from 0.355 to 0.39 and induced piezoelectric d constant increased from 204 to 220 x 10S0-12T (C/N) and sound level of electrostrictive Buzzer has the highest value of 71.5 dB under 8kV/cm bias electric field.

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Exchange Coupling in NiFe/Ni Bilayer Fabricated By Electrodeposition

  • Kim, D.Y.;Jeon, S.J.;Kim, K.W.;Yoon, S.S.
    • Journal of Magnetics
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    • 제16권2호
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    • pp.97-100
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    • 2011
  • Bilayers of soft NiFe (150 nm-420 nm) on hard Ni (150 nm) were prepared by electrodeposition. The process of magnetization reversal in the NiFe/Ni bilayers was then investigated. The hysteresis loop generated by a magnetization reversal of soft NiFe under a positive saturation state of a hard Ni layer shows a shift along the negative field axis, which is clear evidence for the exchange spring effect in the NiFe/Ni bilayers. The dependence of the coercive field $H_c$ and exchange bias field Hex on the thickness of the NiFe layer was also investigated. As the NiFe thickness increases from 150 nm to 420 nm, both $H_c$ and $H_{ex}$ decrease rapidly from $H_c$= 51.7 Oe and $H_{ex}$ = 12.2 Oe, and saturate to $H_c$ = 5.8 Oe and $H_{ex}$ = 3.5 Oe.

보조전계를 이용한 전기영동 초전도 막의 제작 (Superconducting film fabrication using field Assisted Electrophoresis)

  • 소대화;전용우
    • 한국전기전자재료학회논문지
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    • 제16권2호
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    • pp.157-162
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    • 2003
  • For fabricating high T$\sub$c/ superconducting deposition film, novel electrophoretic deposition (EPD) technique applied to deposit surface charged particles on metal substrate with only d.c field has been studied. However, the electric properties of superconducting film could not be improved easily by this way, because the particles of EPD film were usually deposited randomly on metal substrate without any directional orientation affected to its critical current density. For the purpose of obtaining partcle orientation on the EPD films, the new method modified by a.c. assisted field to the conventional electrophoresis system was investigated to improve the particle deposition density and to increase the contacting area among the particles with highly oriented particle deposition of BSCCO superconducting film.

산화막 형성 방법에 따른 전계판 구조 탄화규소 쇼트키 다이오드의 역전압 특성 (Reverse Characteristics of Field Plate Edge Terminated SiC Schottky Diode with $SiO_2$ formed Various Methods)

  • 방욱;정희종;김남균;김상철;서길수;김형우;청콴유;김은동
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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    • pp.409-412
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    • 2004
  • Edge termination technique is essential fer the fabrication of high volage devices. A proper edge termination technique is also needed in the fabrication of Silicon Carbide power devices for obtaining a stable high blocking voltage properties. Among the many techniques, the field plate formation is the easiest one that can utilize it for commercial usage. The growth of thick thermal oxide is difficult for SiC, however. In this paper, 6A grade SiC schottky barrier diodes(SBD) were fabricated with field plate edge termination. The oxides which is field plate were formed various methods such as dry oxidation, 10% $N_2O$ nitrided oxidation and PECVD deposition. The reverse characteristics of the SiC SBD with various oxide field plate were investigated.

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수직보조전계 인가방식에 의한 전기영동 전착막의 제작 (Fabrication of EPD Films by Applying a.c Field Assisted Method)

  • 전용우;박성범;소대화
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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    • pp.107-110
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    • 2002
  • The electrophoretic deposition (EPD) technique have been applied to fabricating superconducting films and wires in former researches of our Lab. However, the particles of EPD films were usually deposited random1y on the metal substrate, the vertically combined a.c and d.c fields were applied to the EPD electrodes for orienting and densifying the particles of high $T_{c}$ superconducting deposition film on the substrate metal. Therefore, the surface states of EPD films by this combined fields could be oriented and affect to the electric properties increasing of superconducting films. The proposed method modified by a.c. assisted field to the conventional electrophoresis system was suitable to obtain improved properties with particle oriented deposition and densification.

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