• 제목/요약/키워드: current-voltage measurements (I-V)

검색결과 94건 처리시간 0.026초

Simultaneous Measurements of Drain-to-Source Current and Carrier Injection Properties of Organic Thin-Film Transistors

  • Majima, Yutaka
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.271-272
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    • 2007
  • Displacement current $(I_{dis})$ and drain-to-source current $(I_{DS})$ are evaluated using the simultaneous measurements of source $(I_S)$ and drain $(I_D)$ currents during the application of a constant drain voltage and a triangular-wave gate voltage $(V_{GS})$ to top-contact pentacene thin-film transistors.

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The Pulsed Id-Vg methodology and Its Application to the Electron Trapping Characterization of High-κ gate Dielectrics

  • Young, Chadwin D.;Heh, Dawei;Choi, Ri-No;Lee, Byoung-Hun;Bersuker, Gennadi
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제10권2호
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    • pp.79-99
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    • 2010
  • Pulsed current-voltage (I-V) methods are introduced to evaluate the impact of fast transient charge trapping on the performance of high-k dielectric transistors. Several pulsed I-V measurement configurations and measurement requirements are critically reviewed. Properly configured pulsed I-V measurements are shown to be capable of extracting such device characteristics as trap-free mobility, trap-induced threshold voltage shift (${\Delta}V_t$), as well as effective fast transient trap density. The results demonstrate that the pulsed I-V measurements are an essential technique for evaluating high-$\kappa$ gate dielectric devices.

Comparison of Electrical Properties between Sputter Deposited Au and Cu Schottky Contacts to n-type Ge

  • Kim, Hogyoung;Kim, Min Kyung;Kim, Yeon Jin
    • 한국재료학회지
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    • 제26권10호
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    • pp.556-560
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    • 2016
  • Using current-voltage (I-V) and capacitance-voltage (C-V) measurements, the electrical properties of Au and Cu Schottky contacts to n-Ge were comparatively investigated. Lower values of barrier height, ideality factor and series resistance were obtained for the Au contact as compared to the Cu contact. The values of capacitance showed strong dependence on the bias voltage and the frequency. The presence of an inversion layer at the interface might reduce the intercept voltage at the voltage axis, lowering the barrier height for C-V measurements, especially at lower frequencies. In addition, a higher interface state density was observed for the Au contact. The generation of sputter deposition-induced defects might occur more severely for the Au contact; these defects affected both the I-V and C-V characteristics.

Schottdy Barrier Height의 온도의존성에 관한 연구 (Study on the Temperature Dependence of Schottky Barrier Height)

  • 심성엽;이동건;김동렬;김인수;김말문;배인호;한병국;이상윤
    • 한국재료학회지
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    • 제5권8호
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    • pp.1020-1025
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    • 1995
  • Au/Si(100) Schotty diode를 l00k~300k 온도범위에서 current voltage(I-V), capacitance-voltage(C-V)측정을 하였다. 얻어진 Schottky barrier height(SBH)갑은 실온에서 두측정값 모두 (0.79$\pm$0.02)eV 이다. 그러나 온도가 감소할수록 I-V측정에서 SBH는 선형적으로 감소하고 C-V측정에서 SBH는 온도에 따른 변화가 관찰되지 않았다. 이것은 낮은 온도에서 열이온 방출 이론을 따르지 않는다는 것을 나타낸다. 이것으로 재결합 전류를 고려하여 계산해 본 결과 I-V에서도 SBH의 변화가 관찰되지 않으므로 C-V측정과 일치됨을 보았다. 이런 상반된 결과를 가져오는 이유는 전류수송현상이 온도에 따라 변화하므로 생긴 것임을 알 수 있었다.

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복합 하전 모자이크 막과 이온교환 막의 전기적화학적 특성 (Electrochemical Characteristics of Ion-Exchange Membrane and Charged Mosaic Membrane)

  • 양원강;송명관;조영석
    • 멤브레인
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    • 제17권1호
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    • pp.37-43
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    • 2007
  • 크로노포텐시오미터(CP)와 전류-전압곡선(I-V)을 사용하여 음/양 이온 교환 층의 영향을 하전 모자이크 막에서 조사하였다. 역시 전해질과 음/양이온의 계면에서 이온수송을 실험하였다. 결과 음/양이온 교환 막은 전류범위에서 점점 전압강하가 나타났고, 특히 저 농도의 KCl 전위는 일정하였다. 한편 복합 하전 모자이크 막은 여러 전해질 수용액의 종류와 농도에 관계없이 전위의 변화는 없었다. CP와 I-V의 측정은 이온교환 막 계면에서 일어나는 이온수송에 대한 기초해석으로 대단히 유효하였다.

Characteristics of Insulation Diagnosis and Failure in Gas Turbine Generator Stator Windings

  • Kim, Hee-Dong
    • Journal of Electrical Engineering and Technology
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    • 제9권1호
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    • pp.280-285
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    • 2014
  • In order to evaluate the insulation deterioration in the stator windings of five gas turbine generators(137 MVA, 13.8 kV) which has been operated for more than 13 years, diagnostic test and AC dielectric breakdown test were performed at phases A, B and C. These tests included measurements of AC current, dissipation factor, partial discharge (PD) magnitude and capacitance. ${\Delta}I$ and ${\Delta}tan{\delta}$ in all three phases (A, B and C) of No. 1 generator stator windings showed that they were in good condition but PD magnitude indicated marginally serviceable and bad level to the insulation condition. Overall analysis of the results suggested that the generator stator windings were indicated serious insulation deterioration and patterns of the PD in all three phases were analyzed to be internal, slot and spark discharges. After the diagnostic test, an AC overvoltage test was performed by gradually increasing the voltage applied to the generator stator windings until electrical insulation failure occurred, in order to determine the breakdown voltage. The breakdown voltage at phases A, B and C of No. 1 generator stator windings failed at 28.0 kV, 17.9 kV, and 21.3 kV, respectively. The breakdown voltage was lower than that expected for good-quality windings (28.6 kV) in a 13.8kV class generator. In the AC dielectric breakdown and diagnostic tests, there was a strong correlation between the breakdown voltage and the voltage at which charging current increases abruptly ($P_{i1}$, $P_{i2}$).

Electrical Properties of Metal-Ferroelectric-Insulator-Semiconductor Field-Effect Transistor Using an Au/$(Bi,La)_4Ti_3O_{12}/LaZrO_x$/Si Structure

  • Jeon, Ho-Seung;Lee, Gwang-Geun;Kim, Joo-Nam;Park, Byung-Eun;Choi, Yun-Soo
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.171-172
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    • 2007
  • We fabricated the metal-ferroelectric-insulator-semiconductor filed-effect transistors (MFIS-FETs) using the $(Bi,La)_4Ti_3O_{12}\;and\;LaZrO_x$ thin films. The $LaZrO_x$ thin film had a equivalent oxide thickness (EOT) value of 8.7 nm. From the capacitance-voltage (C-V) measurements for an Au/$(Bi,La)_4Ti_3O_{12}/LaZrO_x$/Si MFIS capacitor, a hysteric shift with a clockwise direction was observed and the memory window width was about 1.4 V for the bias voltage sweeping of ${\pm}9V$. From drain current-gate voltage $(I_D-V_G)$ characteristics of the fabricated Fe-FETs, the obtained threshold voltage shift (memory window) was about 1 V due to ferroelectric nature of BLT film. The drain current-drain voltage $(I_D-V_D)$ characteristics of the fabricated Fe-FETs showed typical n-channel FETs current-voltage characteristics.

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A nuclear battery based on silicon p-i-n structures with electroplating 63Ni layer

  • Krasnov, Andrey;Legotin, Sergey;Kuzmina, Ksenia;Ershova, Nadezhda;Rogozev, Boris
    • Nuclear Engineering and Technology
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    • 제51권8호
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    • pp.1978-1982
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    • 2019
  • The paper presents the electrical performance measurements of a prototype nuclear battery and two types of betavoltaic cells. The electrical performance was assessed by measuring current-voltage properties (I-V) and determining the short-circuit current and the open-circuit voltage. With 63Ni as an irradiation source, the open-circuit voltage and the short-circuit current were determined as 1 V and 64 nA, respectively. The prototype consisted of 10 betavoltaic cells that were prepared using radioactive 63Ni. Electroplating of the radioactive 63Ni on an ohmic contact (Ti-Ni) was carried out at a current density of 20 mA/㎠. Two types of betavoltaic cells were studied: with an external 63Ni source and a 63Ni-covered source. Under irradiation of the 63Ni source with an activity of 10 mCi, the open-circuit voltage Voc of the fabricated cells reached 151 mV and 109 mV; the short-circuit current density Jsc was measured to be 72.9 nA/cm2 and 64.6 nA/㎠, respectively. The betavoltaic cells had the fill factor of 55% and 50%, respectively.

Current-voltage Characteristics of Water-adsorbed Imogolite Film

  • Park, Jae-Hong;Lee, Jung-Woo;Chang, Sun-Young;Park, Tae-Hee;Han, Bong-Woo;Han, Jin-Wook;Yi, Whi-Kun
    • Bulletin of the Korean Chemical Society
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    • 제29권5호
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    • pp.1048-1050
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    • 2008
  • Electric current flow was observed through imogolite film when imogolite ($(HO)_3Al_2O_3SiOH$) was exposed to water molecules and connected to external electrodes. Current flow was due to the bound water on the surface of imogolite. Current flow increased as the pH of the water decreased. The current-voltage (I-V) measurements from a field effective transistor (FET) using $H_2O$/imogolite film revealed that the current carrier in $H_2O$/ imogolite had p-type characteristics, i.e. the carrier was probably $H^+$. The possible mechanism for current transportation in imogolite/water was also suggested in this paper.

A Study on the Electrical Characteristic Analysis of c-Si Solar Cell Diodes

  • Choi, Pyung-Ho;Kim, Hyo-Jung;Baek, Do-Hyun;Choi, Byoung-Deog
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제12권1호
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    • pp.59-65
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    • 2012
  • A study on the electrical characteristic analysis of solar cell diodes under experimental conditions of varying temperature and frequency has been conducted. From the current-voltage (I-V) measurements, at the room temperature, we obtained the ideality factor (n) for Space Charge Region (SCR) and Quasi-Neutral Region (QNR) of 3.02 and 1.76, respectively. Characteristics showed that the value of n (at SCR) decreases with rising temperature and n (at QNR) increases with the same conditions. These are due to not only the sharply increased SCR current flow but the activated carrier recombination in the bulk region caused by defects such as contamination, dangling bonds. In addition, from the I-V measurements implemented to confirm the junction uniformity of cells, the average current dispersion was 40.87% and 10.59% at the region of SCR and QNR, respectively. These phenomena were caused by the pyramidal textured junction structure formed to improve the light absorption on the device's front surface, and these affect to the total diode current flow. These defect and textured junction structure will be causes that solar cell diodes have non-ideal electrical characteristics compared with general p-n junction diodes. Also, through the capacitance-voltage (C-V) measurements under the frequency of 180 kHz, we confirmed that the value of built-in potential is 0.63 V.