• 제목/요약/키워드: crystalline solar cell

검색결과 388건 처리시간 0.028초

박형 태양전지모듈 제작을 위한 저온 CP 공정 최적화에 관한 연구 (A Study on the Optimization of CP Based Low-temperature Tabbing Process for Fabrication of Thin c-Si Solar Cell Module)

  • 진가언;송형준;고석환;주영철;송희은;장효식;강기환
    • 한국태양에너지학회 논문집
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    • 제37권2호
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    • pp.77-85
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    • 2017
  • Thin crystalline silicon (C-Si) solar cell is expected to be a low price energy source by decreasing the consumption of Si. However, thin c-Si solar cell entails the bowing and crack issues in high temperature manufacturing process. Thus, the conventional tabbing process, based on high temperature soldering (> $250^{\circ}C$), has difficulties for applying to thin c-Si solar cell modules. In this paper, a conductive paste (CP) based interconnection process has been proposed to fabricate thin c-Si solar cell modules with high production yield, instead of existing soldering materials. To optimize the process condition for CP based interconnection, we compared the performance and stability of modules fabricated under various lamination temperature (120, 150, and $175^{\circ}C$). The power from CP based module is similar to that with conventional tabbing process, as modules are fabricated. However, the output of CP based module laminated at $120^{\circ}C$ decreases significantly (14.1% for Damp heat and 6.1% for thermal cycle) in harsh condition, while the output drops only in 3% in the samples process at $150^{\circ}C$, $175^{\circ}C$. The peel test indicates that the unstable performance of sample laminated at $120^{\circ}C$ is attributed to weak adhesion strength (1.7 N) between cell and ribbon compared to other cases (2.7 N). As a result, optimized lamination temperature for CP based module process is $150^{\circ}C$, considering stability and energy consumption during the fabrication.

Characterization and Optimization of the Contact Formation for High-Performance Silicon Solar Cells

  • Lee, Sung-Joon;Jung, Won-Cheol;Han, Seung-Soo;Hong, Sang-Jeen
    • 동굴
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    • 제82호
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    • pp.5-7
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    • 2007
  • In this paper, p-n junction formation using screen-printed metalization and co-firing is used to fabricate high-efficiency solar cells on single- crystalline silicon substrates. In order to form high-quality contacts, co-firing of a screen-printed Ag grid on the front and Al on the back surface field is implemented. These contacts require low contact resistance, high conductivity, and good adhesion to achieve high efficiency. Before co-firing, a statistically designed experiment is conducted. After the experiment, a neural network (NN) trained by the error back-propagation algorithm is employed to model the crucial relationships between several input factors and solar cell efficiency. The trained NN model is also used to optimize the beltline furnace process through genetic algorithms.

탄산나트륨용액을 이용한 실리콘 태양전지의 이방성 텍스쳐링에 관한 연구 (Investigation of anisotropic texturing for silicon solar cells with sodium carbonate solutions)

  • 이은주;김도완;이현우;이수홍
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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    • pp.177-178
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    • 2006
  • We investigate anisotropic texturing method for crystalline silicon solar cells with sodium carbonate solutions. Texturing temperature have a large effect on the density of pyramid. The dependence of the surface reflectance on solution temperature and the etching time was investigated. The surface morphology was observed by scanning electron microscope and the surface reflectance was evaluated. The reflection from the silicon surface in the wavelength range 400 to 1000nm is reduced to about 12%.

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Low-cost Contact formation of High-Efficiency Crystalline Silicon Solar Cells by Plating

  • 김동섭;이은주;김정;이수홍
    • 신재생에너지
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    • 제1권1호
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    • pp.37-43
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    • 2005
  • High-efficiency silicon solar cells have potential applications on mobile electronics and electrical vehicles. The fabrication processes of the high efficiency cells necessitate com placated fabrication precesses and expensive materials. Ti/Pd/Ag metal contact has been used only for limited area In spite of good stability and low contact resistance because of Its expensive material cost and precesses. Screen printed contact formed by Ag paste causes a low fill factor and a high shading loss of commercial solar cells because of high contact resistance and a low aspect ratio. Low cost Ni/Cu metal contact has been formed by using a low cost electroless and electroplating. Nickel silicide formation at the interface enhances stability and reduces the contact resistance resulting In an energy conversion efficiency of $20.2\%\;on\;0.50{\Omega}cm$ FZ wafer. Tapered contact structure has been applied to large area solar cells with $6.7\times6.7cm^2$ in order to reduce power losses by the front contact The tapered front metal contact Is easily formed by the electroplating technique producing $45cm^2$ solar cells with an efficiency of $21.4\%$ on $21.4\%\;on\;2{\Omega}cm$ FZ wafer.

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Metal Surface Treatment Effects on Screen Printed Silicon Solar Cells

  • Chakrabarty K.;Mangalaraj D.;Kim K. H.;Dhungel S. K.;Park J. H.;Singh S. N.
    • Transactions on Electrical and Electronic Materials
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    • 제4권4호
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    • pp.22-25
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    • 2003
  • High series resistance due to the presence of glass frit is one of the major problems for screen printed silicon solar cells. Cells having electrical parameters below the prescribed values are usually rejected during solar module fabrication. Therefore, it is highly desirable to improve the electrical parameters of the silicon solar cells and thereby to increase the overall production yield. It was observed that, the performance of low quality mono-crystalline silicon solar cells made by standard screen printing technology could be improved remarkably by novel surface treatment. We have chemically treated the surface using sodium hydroxide (NaOH) and silver nitrate ($AgNO_3$) solutions. NaOH treatment helps to reduce the series resistance by decreasing the presence of excess glass frit on the top silver grid contact. The $AgNO_3$ treatment is used to reduce the series resistance comes from the deposition of silver on the grids by filling the holes present (if any) within the grid pattern.

Observation of Carrier Multiplication via Internal Quantum Efficiency Exceeding 100% in PbS QDs Monolayer Solar Cells

  • Park, So Yeon;Chung, Hyun Suk;Han, Gill Sang;Su, Jang Ji;Jung, Hyun Suk
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.467.1-467.1
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    • 2014
  • Quantum dots (QD) solar cells has received considerable attention due to their potential of improving the overall conversion efficiency by harvesting excess energy via multiple excitons generation (MEG). Although there have been many reports which show MEG phenomena by using optical measurement of quantum dots themselves, carrier multiplication in real QD photovoltaic devices has been sparsely reported due to difficulty in dissociation of excitons and charge collection. In this reports, heterojunction QD solar cells composed of PbS QD monolayer on highly crystalline $TiO_2$ thin films were fabricated by using Langmuir-Blodgett deposition technique to significantly reduce charge recombination at the interfaces between each QD. The PbS CQDs monolayer was characterized by using UV-vis, transmission electron microscopy (TEM) and atomic force microscopy (AFM). The internal quantum efficiency (IQE) for the monolayer QD solar cells was obtained by measurement of external quantum efficiency and determining light absorption efficiency of active layer. Carrier multiplication was observed by measuring IQE greater than 100% over threshold photon energy. Our findings demonstrate that monolayer QD solar cell structure is potentially capable of realizing highly efficient solar cells based on carrier multiplication.

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Enhancement in solar cell efficiency by luminescent down-shifting layers

  • Ahmed, Hind A.;Walshe, James;Kennedy, Manus;Confrey, Thomas;Doran, John;McCormack, Sarah.J.
    • Advances in Energy Research
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    • 제1권2호
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    • pp.117-126
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    • 2013
  • In this paper, core-shell semiconductor quantum dots (QDs) CdSeS/ZnS with emission at 490 nm and 450 nm were investigated for their use in luminescent down-shifting (LDS) layers. Luminescent quantum yield (LQY) of the QDs measurements in solution proposed that they were suitable candidates for inclusion in LDS layers. QDs were encapsulated in poly(methyl,methacrylate) (PMMA) polymer matrix and films were fabricated of $134{\pm}0.05$ microns. Selections of organic dyes from BASF Lumogen F range were also investigated for their use as LDS layers; Violet 570 and Yellow 083. The addition of LDS layers containing Violet 570 dye demonstrated a unity LQY when encapsulated within a PMMA matrix. A PV device of an LDS layer of Lumogen Violet 570 deposited on top of a crystalline silicon cell was fabricated where it was demonstrated to increase the efficiency of the cell by 34.5% relative.

A Novel Atomic Layer Deposited Al2O3 Film with Diluted NH4OH for High-Efficient c-Si Solar Cell

  • Oh, Sung-Kwen;Shin, Hong-Sik;Jeong, Kwang-Seok;Li, Meng;Lee, Horyeong;Han, Kyumin;Lee, Yongwoo;Lee, Ga-Won;Lee, Hi-Deok
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제14권1호
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    • pp.40-47
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    • 2014
  • In this paper, $Al_2O_3$ film deposited by thermal atomic layer deposition (ALD) with diluted $NH_4OH$ instead of $H_2O$ was suggested for passivation layer and anti-reflection (AR) coating of the p-type crystalline Si (c-Si) solar cell application. It was confirmed that the deposition rate and refractive index of $Al_2O_3$ film was proportional to the $NH_4OH$ concentration. $Al_2O_3$ film deposited with 5 % $NH_4OH$ has the greatest negative fixed oxide charge density ($Q_f$), which can be explained by aluminum vacancies ($V_{Al}$) or oxygen interstitials ($O_i$) under O-rich condition. $Al_2O_3$ film deposited with $NH_4OH$ 5 % condition also shows lower interface trap density ($D_{it}$) distribution than those of other conditions. At $NH_4OH$ 5 % condition, moreover, $Al_2O_3$ film shows the highest excess carrier lifetime (${\tau}_{PCD}$) and the lowest surface recombination velocity ($S_{eff}$), which are linked with its passivation properties. The proposed $Al_2O_3$ film deposited with diluted $NH_4OH$ is very promising for passivation layer and AR coating of the p-type c-Si solar cell.

Bias-Dependent Photoluminescence Analysis on InGaN/GaN MQW Solar Cells

  • Shim, Jae-Phil;Jeong, Hoonil;Choi, Sang-Bae;Song, Young Ho;Jho, Young-Dahl;Lee, Dong-Seon
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.347-348
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    • 2013
  • To obtain high conversion efficiency in InGaN-based solar cells, it is critical to grow high indium (In) composed InGaN layer for increasing sun light absorption wavelength rage. At present, most InGaN-based solar cells adopt InGaN/GaN multi-quantum-well (MQW) structure for high crystalline quality of InGaN with high In composition. In this study, we fabricated and compared the performances of two types of InGaN/GaN MQW solar cells which have the 15% (SC 15) and 25% (SC 25) of In composition at quantum well layer. Although both devices showed similar dark current density and leakage current, SC 15 showed better performance under AM 1.5G illumination as shown in Fig. 1. It is interesting to note that SC 25 showed severe current density decrease as increasing voltages. As a result, it lowered short circuit current density and fill factor of the device. However, SC 15 showed steady current density and over 75 % of fill factor. To investigate these differencesmore clearly, we analyzed their photoluminescence (PL) spectra under various applied voltages as shown in Fig. 2. At the same time, photocurrent, which was generated by PL excitation, was also measured as shown in Fig. 3. Further, we investigated the relationship between piezoelectric field and performance of InGaN based solar cell varying indium composition.

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광유도 전해 도금법을 이용한 결정질 실리콘 태양전지용 Ni/Cu 전극 형성 (Formation of Ni / Cu Electrode for Crystalline Si Solar Cell Using Light Induced Electrode Plating)

  • 홍혜권;박정은;조영호;김동식;임동건;송우창
    • 융복합기술연구소 논문집
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    • 제8권1호
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    • pp.33-39
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    • 2018
  • The screen printing method for forming the electrode by applying the existing pressure is difficult to apply to thin wafers, and since expensive Ag paste is used, it is difficult to solve the problem of cost reduction. This can solve both of the problems by forming the front electrode using a plating method applicable to a thin wafer. In this paper, the process conditions of electrode formation are optimized by using LIEP (Light-Induced Electrode Plating). Experiments were conducted by varying the Ni plating bath temperature $40{\sim}70^{\circ}C$, the applied current 5 ~ 15 mA, and the plating process time 5 ~ 20 min. As a result of the experiment, it was confirmed that the optimal condition of the structural characteristics was obtained at the plating bath temperature of $60^{\circ}C$, 15 mA, and the process time of 20 min. The Cu LIEP process conditions, experiments were conducted with Cu plating bath temperature $40{\sim}70^{\circ}C$, applied voltage 5 ~ 15 V, plating process time 2 ~ 15 min. As a result of the experiment, it was confirmed that the optimum conditions were obtained as a result of electrical and structural characteristics at the plating bath temperature of $60^{\circ}C$ and applied current of 15 V and process time of 15 min. In order to form Ni silicide, the firing process time was fixed to 2 min and the temperature was changed to $310^{\circ}C$, $330^{\circ}C$, $350^{\circ}C$, and post contact annealing was performed. As a result, the lowest contact resistance value of $2.76{\Omega}$ was obtained at the firing temperature of $310^{\circ}C$. The contact resistivity of $1.07m{\Omega}cm^2$ can be calculated from the conditionally optimized sample. With the plating method using Ni / Cu, the efficiency of the solar cell can be expected to increase due to the increase of the electric conductivity and the decrease of the resistance component in the production of the solar cell, and the application to the thin wafer can be expected.