• Journal of Korea Water Resources Association
• /
• v.46 no.5
• /
• pp.531-545
• /
• 2013

This paper was considered on the applicability of EFDC KUNSAN_SEDTRAN MODEL (2012) to calculate Gunsan Port sediment deposition height efficiently and to use for grasping its aspects quantitatively and providing its prevention measures reasonably based on well-known 3-dimensional EFDC sediment transport module. This model was calibrated and verified with various measured field data of A Report of Hydrological Variation on Kum River Estuary (2004). Due to the model calibration and relevant literature investigation for cohesive sediment parameters, settling velocity (WS), critical deposition stress (TD), reference surface erosion rate (RSE), critical erosion stress (TE) were identified as 2.2E-04m/s, 0.20 $N/m^2$, 0.003 $g/s{\cdot}m^2$, 0.40 $N/m^2$ respectivly on this model. In order to examine the applicability and precision of the model computation, the calculated model data of sediment deposition height at 13 stations for 71 days and suspended-sediment concentration at 2 stations, inner port and outer port for 15 days were compared and analyzed with the measured field data. As a result, the model applicability for sediment deposition height simulation was evaluated as NSE coefficient 0.86 and the precision for suspended-sediment concentration computation was evaluated as time averaged relative error (RE) 23%.

• Journal of the Korean Society for Heat Treatment
• /
• v.5 no.1
• /
• pp.1-12
• /
• 1992

In order to improve adhesive force of TiN film, we sputtered titanium as interlayer before TiN deposition by Plasma Enhanced Chemical Vapour Deposition. We observed changes of hardness and adhesion at a various thickness of titanium interlayer and also examined analysis. At the critical thickness of the titanium interlayer(about $0.2{\mu}$), adhesive force of TiN films were promoted mostly. But over the critical thickness, a marked reduction of adhesive force was showed, because of the internal stress of titanium interlayer. From AES analysis, the adhesion improvement of TiN films was mainly caused by nitrogen diffusion into titanium interlayer during TiN deposition process which relieved stress concentration at TiN coating-substrate interface.

• Journal of Korean Society of Coastal and Ocean Engineers
• /
• v.1 no.1
• /
• pp.44-49
• /
• 1989

Cohesive sedimentation mechanism is affected by various physico-chemical factors. Thus, the field observations and the laboratory experiments for cohesive sediment have been reported for decades. Erosion and deposition test was carried out with cohesive sediment material sampled in the Keum River Estuary in this study. The change of the suspended cohesive sediment concentration was measured for various flow conditions, which have the purpose to determine the critical shear stress and the coefficients for erosion and deposition . The critical shear stress and the coefficient for erosion were determined in the flume test. The equilibrium concentration was determined for each shear stress and the relationship between the normalized equilibrium cocentration with the initial cocentration (Ceq/co) and the equivalent shear stress was obtained. The experimental results were compared with the other results and showed fairly well agreements with them.

• Journal of Korea Water Resources Association
• /
• v.41 no.9
• /
• pp.863-872
• /
• 2008

In this study, a series of deposition tests have been conducted on saltwater condition(salinity 32 %o) using an annular flume, in order to estimate depositional properties of kaolinite sediments and to analyze the effect of the initial concentration on them. Total 37 deposition tests have been carried out in three different initial concentrations (1000, 5000, 15000 ppm) with varying the bed shear stress. From these test results, minimum shear stress (or critical shear stress for deposition; ${\tau}_{bmin}$) and the deposition rate parameters (${\sigma}_1,\;({\tau}^*_b-1)_{50},\;{\sigma}_2,\;t_{50}$) for kaolinite sediments have been quantified, and the effects of the initial concentration and salinity on depositional properties of cohesive sediments have been analyzed qualitatively. As the results, ${\tau}_{bmin},\;{\sigma}_1\;and\;({\tau}^*_b-1)_{50}$ are found to be 0.147, 0.74 and $0.65N/m^2$ respectively. Through comparing with results from previous studies, the performance of this study and tests results are shown to be good enough to verify.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2001.11b
• /
• pp.73-76
• /
• 2001

We deposited epitaxial $Ba_{0.6}Sr_{0.4}TiO_{3}(BST)$ films having thickness of 400 nm on MgO(001) substrates, where a 10 nm thick $Ba_{1-x}Sr_{x}TiO_{3}$ (x = 0.1 - 0.7) interlayer was inserted between BST and MgO to manipulate the stress of the BST films. Since the main difference of those epitaxial BST films was the lattice constant of the interlayers, we were very successful in controlling the stress of the BST films. BST films under small tensile stress showed larger dielectric constant than that without stress as well as those under compressive stress. Stress relaxation was investigated using epitaxial BST films with various thicknesses grown on different interlayers. For BST films grown on $Ba_{0.7}Sr_{0.3}TiO_{3}$ interlayers, the critical thickness was about 600 nm. On the other hand, the critical thickness of single-layer BST film was less than 100 nm.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2001.11a
• /
• pp.73-76
• /
• 2001

We deposited epitaxial $Ba_{0.6}$S $r_{0.4}$Ti $O_3$(BST) films having thickness of 400 nm on MgO(001) substrates, where a 10 nm thick $Ba_{1-x}$S $r_{x}$Ti $O_3$(x=0.1-0.7) interlayer was inserted between BST and MgO to manipulate the stress of the BST films. Since the main difference of those epitaxial BST films was the lattice constant of the interlayers, we were very successful in controlling the stress of the BST films. BST films under small tensile stress showed larger dielectric constant than that without stress as well as those under compressive stress. Stress relaxation was investigated using epitaxial BST films with various thicknesses grown on different interlayers. For BST films grown on $Ba_{0.7}$S $r_{0.3}$Ti $O_3$ interlayers, the critical thickness was about 600 nm. On the other hand, the critical thickness of single-layer BST film was less than 100 nm.00 nm.m.m.m.

• Proceedings of the KIEE Conference
• /
• 1998.07g
• /
• pp.2521-2523
• /
• 1998

Freestanding flexible microstructures fabricated from deposited thin films become mechanically unstable when internal stresses exceed critical values. The residual stress and stress gradient of aluminum thin film were examined to make sure of fabricating the reproduceable aluminium structure. For good shape of micro mirror array and microstructures, the experiment was done varying thickness and deposition rate. As the aluminium film thickness increased from 0.8${\mu}m$ to 1.6${\mu}m$, the stress gradient decreased from 11.62MPa/${\mu}m$ to 2.62MPa/${\mu}m$. The residual stress values are from 42.4MPa to 62.24MPa of tensile stresses.

• Progress in Superconductivity and Cryogenics
• /
• v.23 no.4
• /
• pp.1-5
• /
• 2021

Among elemental metals, niobium (Nb) has the highest superconducting transition temperature (T_c) at ambient pressure. Thus, Nb films have been used in superconducting electronics and radio frequency cavity applications. In this study, the depositional factors determining the crystallinity and T_c of Nb films were investigated. An Nb film grown at a sputtering temperature of 240℃ exhibited the maximum crystallinity of Nb and the minimum crystallinity of niobium oxide. X-ray photoelectron spectroscopy confirmed a maximum atomic percent of niobium and a minimum atomic percent of oxygen. A sputtering power of 210 W and a sputtering time of 50 min were the optimal conditions for Nb deposition, and the T_c of the optimized film (9.08 K) was close to that of bulk Nb (9.25 K). Transmission electron microscopy images of the thick film directly confirmed the removal of the typical in-plane compressive strain in the (110) plane caused by residual stress.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.34 no.1
• /
• pp.33-38
• /
• 2021

Using facing target magnetron sputtering (FTMS) with a graphite target source, carbon nitride thin films were deposited on silicon and glass substrates at different substrate temperatures to confirm the tribological, electrical, and structural properties of thin films. The substrate temperatures were room temperature, 150℃, and 300℃. The tribology and electrical properties of the carbon nitride thin films were measured as the substrate temperature increased, and a study on the relation between these results and structural properties was conducted. The results show that the increase in the substrate temperature during the fabrication of the carbon nitride thin films increased the hardness and elastic modulus values, the critical load value was increased, and the residual stress value was reduced. Moreover, the increase in the substrate temperature during thin-film deposition was attributed to the improvement in the electrical properties of carbon nitride thin film.

• Journal of the Korean Geotechnical Society
• /
• v.20 no.6
• /
• pp.137-150
• /
• 2004

Aging effect of sands showed insignificant result in comparison with that of clay, so that it has not been studied so far. But, as penetration resistance increase has been observed with the lapse of time after deposition and disturbance, aging effect of sands has been actively investigated by field tests, and recently many researchers are performing not oかy field tests but also laboratory tests on sands, so aging effects of sands have been also examined by laboratory tests. In this study, to observe the aging effect of undrained static shear behavior for Nak-Dong River sand, undrained static triaxial tests were performed with changing relative density$(D_r)$, consolidation stress ratio$(K_c)$, and consolidation time. These tests showed that modulus within elastic section increased as consolidation time increased, and in addition, phase transformation point strength$(S_{PT})$ and critical stress ratio point strength $(S_{CSR})$ also increased. But pore water pressure ratio$(u/{p_c}')$ decreased as consolidation time increased, so with this various result, aging effect of static shear for sands can be observed as well.