Properties of the Pt Thin Etching in $BCI_3/CI_2$ gas by Inductive Coupled Plasma
(ICP에 의한 $BCI_3/CI_2$ 플라즈마 내에서 Pt 박막의 식각 특성)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.11 no.10
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- pp.804-808
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- 1998