• 제목/요약/키워드: conventional oxide method

검색결과 321건 처리시간 0.026초

소결온도에 따른 $MgTiO_3-SrTiO_3$ 세라믹의 구조적 특성 (Structural Properties of $MgTiO_3-SrTiO_3$ Geramics with Sintering Temperature)

  • 최의선;이문기;류기원;이영희
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 추계학술대회 논문집 학회본부 C
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    • pp.953-955
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    • 1999
  • The (1-x)$MgTiO_3-SrTiO_3$ (x=0. 0.1, 0.2, 0.3) ceramics were prepared by the conventional mixed oxide method. The structural properties were investigated with sintering temperature and composition ratio by XRD, SEM and BT-TGA. Increasing the sintering temperature from $1300^{\circ}C$ to $1600^{\circ}C$, second phase was decreased and grain size was increased. The average gram size of the 0.8$MgTiO_3-SrTiO_3$ ceramics sintered at $1600^{\circ}C$ were $3.61{\mu}m$.

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저항성 단락과 개방 결함을 갖는 메모리에 대한 동작분석과 효율적인 테스트 알고리즘에 관한 연구 (A study on behavioral analysis and efficient test algorithm for memory with resistive short and open defects)

  • 김대익;배성환;이상태;이창기;전병실
    • 전자공학회논문지B
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    • 제33B권7호
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    • pp.70-79
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    • 1996
  • To increase the functionality of the memories, previous studies have deifned faults models and proposed functional testing algorithms with low complexity. Although conventional testing depended strongly on functional (voltage) testing method, it couldn't detect short and open defects caused by gate oxide short and spot defect which can afect memory reliability. Therefore, IDDQ (quiescent power supply current) testing is required to detect defects and thus can obtain high reliability. In this paper, we consider resistive shorts on gate-source, gate-drain, and drain-source as well as opens in mOS FET and observe behavior of the memory by analyzing voltage at storge nodes of the memory and IDDQ resulting from PSPICE simulation. Finally, using this behavioral analysis, we propose a linear testing algorithm of complexity O(N) which can be applicable to both functional testing and IDDQ testing simultaneously to obtain high functionality and reliability.

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하소온도에 따른 (Mg,Sr)Ti $O_3$ 세라믹의 구조적 특성 (Structural Properties of (Mg,Sr)Ti $O_3$ Ceramics with Calcining Temperature)

  • 최의선;이문기;류기원;이영희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.304-307
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    • 1999
  • The Mg($_{1-x}$ )S $r_{x}$Ti $O_3$(x=0.1,0.2,0.3) ceramics were prepared by the conventional mixed oxide method. The structural properties were investigated with calcining temperature and composition ratio by XRD and DT-TGA. Increasing the calcining temperature from 80$0^{\circ}C$ to 100$0^{\circ}C$, second phase was decreased and average particle size was increased. The SrTi $O_3$ ceramics of calcined at 100$0^{\circ}C$ had a structure of polycrystalline perovskite without the secondary phases. The average particle size of the $Mg_{0.9}$S $r_{0.1}$Ti $O_3$ ceramics calcined at 100$0^{\circ}C$ were 0.67${\mu}{\textrm}{m}$..>......

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선택적 촉매 환원법을 이용한 디젤엔진의 De-NOx 시스템 개발에 관한 연구 (A development of diesel engine De-NOx system using the selective catalytic reduction method)

  • 정경열;김재윤;오상훈;박정일;류길수
    • 한국마린엔지니어링학회:학술대회논문집
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    • 한국마린엔지니어링학회 2001년도 춘계학술대회 논문집
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    • pp.187-191
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    • 2001
  • In the paper, an approach to the development of the selective catalytic reduction process of NOx is presented. The reduction process can be efficiently controlled using a conventional combination of feed-forward and feed-back control structures. The aim of this paper is to test and verify an approach to the SCR process which is based on an industrial pilot plant of combustion and nitric oxide formation. The systems are based on measurements of a NOx removal ratio and the fuel flow rate, and NH$_3$slip which are usually available as a part of de-NOx control system.

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LPCVD 질화막 만을 이용한 새로운 LOCOS 공정에 관한 연구 (Study of a New LOCOS Process Using Only Thin LPCVD Nitride)

  • 김지범;오기영;김달수;주승기;최민성
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1987년도 전기.전자공학 학술대회 논문집(I)
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    • pp.429-432
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    • 1987
  • A new LOCOS (Local Oxidation of Silicon) process using a thin nitride film directly deposited on the silicon substrate by LPCVD has been developed in order to reduce the bird's beak length. SEM studies showed that nitride thickness of 50nm can decrease the bird's beak length down to 0.2um with 450nm field oxide. No crystalline defects are observed around the bird's beak after the Wright etch. A 30% improvement in current density was obtained when this new method was applied to MOS transistors (W/L*2.9/20.4) compared to conventional LOCOS process (bird's beak length=0.7um). Other various electrical parameters improved by this new simple LOCOS process are reported in this paper.

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(Sr.Ca)$TiO_3$ 세라믹스의 용량-전압 특성 (Capacitive-Voltage properties of (Sr.Ca)$TiO_3$ Ceramics)

  • 강재훈;최운식;김충혁;김진사;박용필;송민종
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집
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    • pp.34-37
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    • 2001
  • In this study, the capacitance-voltage properties of (Sr$_{1-x}$ .Ca$_{x}$)TiO$_3$(0.05$\leq$x$\leq$0.20)-based grain boundary layer ceramics were investigated. The ceramics were fabricated by the conventional mixed oxide method. The sintering temperature and time were 1480~150$0^{\circ}C$ and 4 hours, respectively. The 2nd phase formed by the thermal diffusion of CuO from the surface leads to very excellent dielectric properties, that is, $\varepsilon$$_{r}$>50000, tan$\delta$<0.05, $\Delta$C<$\pm$10%. The capacitance is almost unchanged below about 20[V] but it decreases slowly about 20[V]. The results of the capacitance-voltage properties indicated that the grain boundary was composed of the continuous insulating layers.ulating layers.s.

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소결온도에 따른 $Ba_{5}Ta_{4}O_{15}$ 세라믹스의 구조 밀 마이크로파 유전특성 (Structural and Microwave Dielectric Properties of the $Ba_{5}Ta_{4}O_{15}$ Ceramics with Sintering Temperature)

  • 이승준;김재식;남송민;고중혁;이영희
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
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    • pp.1355-1356
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    • 2006
  • The microwave dielectric properties of the $Ba_{5}Ta_{4}O_{15}$ ceramics with sintering temperature were investigated. All sample of the $Ba_{5}Ta_{4}O_{15}$ ceramics prepared by conventional mixed oxide method and sintered at $1450^{\circ}C{\sim}1575^{\circ}C$. Porosity of the $Ba_{5}Ta_{4}O_{15}$ ceramics was reduced with increasing sintering temperature. The bulk density, dielectric constant and Qualify factor increased with increasing sintering temperature. In the case of $Ba_{5}Ta_{4}O_{15}$ ceramics sintered at $1550^{\circ}C$, The bulk density, dielectric constant and quality factor were $7.31g/cm^2$ and 27.4, 30,635GHz, respectively.

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CuO가 첨가된 $ZnNb_2O_6$ 세라믹스의 마이크로파 유전특성 (The Microwave Dielectric Properties of $ZnNb_2O_6$ Ceramics with CuO)

  • 김정훈;김지헌;이문기;배선기;이영희
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2003년도 하계학술대회 논문집 C
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    • pp.1427-1429
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    • 2003
  • The $ZnNb_2O_6$ ceramics with 3wt% CuO were prepared by the conventional mixed oxide method. The ceramics were sintered at the temperature of $1000^{\circ}C{\sim}1075^{\circ}C$ for 3hr. in air. The structural properties were investigated with sintering temperature by XRD and SEM. Also, the microwave dielectric properties were investigated with sintering temperature. Increasing the sintering temperature, the peak of second phase($Cu_3Nb_2O_8$) was increased. In the case of $ZnNb_2O_6$+CuO(3wt%) ceramics sintered at $1025^{\circ}C$ for 3hr, the dielectric constant, quality factor were 21.73, 19.276, respectively.

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전자 사이클로트론 공명 플라즈마와 열 원자층 증착법으로 제조된 Al2O3 박막의 물리적·전기적 특성 비교 (Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods)

  • 양대규;김양수;김종헌;김형도;김현석
    • 한국재료학회지
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    • 제27권6호
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    • pp.295-300
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    • 2017
  • Aluminum-oxide($Al_2O_3$) thin films were deposited by electron cyclotron resonance plasma-enhanced atomic layer deposition at room temperature using trimethylaluminum(TMA) as the Al source and $O_2$ plasma as the oxidant. In order to compare our results with those obtained using the conventional thermal ALD method, $Al_2O_3$ films were also deposited with TMA and $H_2O$ as reactants at $280^{\circ}C$. The chemical composition and microstructure of the as-deposited $Al_2O_3$ films were characterized by X-ray diffraction(XRD), X-ray photo-electric spectroscopy(XPS), atomic force microscopy(AFM) and transmission electron microscopy(TEM). Optical properties of the $Al_2O_3$ films were characterized using UV-vis and ellipsometry measurements. Electrical properties were characterized by capacitance-frequency and current-voltage measurements. Using the ECR method, a growth rate of 0.18 nm/cycle was achieved, which is much higher than the growth rate of 0.14 nm/cycle obtained using thermal ALD. Excellent dielectric and insulating properties were demonstrated for both $Al_2O_3$ films.

LTCC 보호층 형성에 따른 박막 전극패턴에 관한 연구 (Effect of Protective layer on LTCC Substrate for Thin Metal Film Patterns)

  • 김용석;유원희;장병규;박정환;유제광;오용수
    • 한국재료학회지
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    • 제19권7호
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    • pp.349-355
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    • 2009
  • Metal thin film patterns on a LTCC substrate, which was connected through inner via and metal paste for electrical signals, were formed by a screen printing process that used electric paste, such as silver and copper, in a conventional method. This method brought about many problems, such as non uniform thickness in printing, large line spaces, and non-clearance. As a result of these problems, it was very difficult to perform fine and high resolution for high frequency signals. In this study, the electric signal patterns were formed with the sputtered metal thin films (Ti, Cu) on an LTCC substrate that was coated with protective oxide layers, such as $TiO_2$ and $SiO_2$. These electric signal patterns' morphology, surface bonding strength, and effect on electro plating were also investigated. After putting a sold ball on the sputtered metal thin films, their adhesion strength on the LTCC substrate was also evaluated. The protective oxide layers were found to play important roles in creating a strong design for electric components and integrating circuit modules in high frequency ranges.