• 제목/요약/키워드: candidate materials

검색결과 807건 처리시간 0.036초

Reduced Graphene Oxide Field-effect Transistor as a Transducer for Ion Sensing Application

  • Nguyen, T.N.T.;Tien, Nguyen Thanh;Trung, Tran Quang;Lee, N.E.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.562-562
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    • 2012
  • Recently, graphene and graphene-based materials such as graphene oxide (GO) or reduced graphene oxide (R-GO) draws a great attention for electronic devices due to their structures of one atomic layer of carbon hexagon that have excellent mechanical, electrical, thermal, optical properties and very high specific surface area that can be high potential for chemical functionalization. R-GO is a promising candidate because it can be prepared with low-cost from solution process by chemical oxidation and exfoliation using strong acids and oxidants to produce graphene oxide (GO) and its subsequent reduction. R-GO has been used as semiconductor or conductor materials as well as sensing layer for bio-molecules or ions. In this work, reduced graphene oxide field-effect transistor (R-GO FET) has been fabricated with ITO extended gate structure that has sensing area on ITO extended gate part. R-GO FET device was encapsulated by tetratetracontane (TTC) layer using thermal evaporation. A thermal annealing process was carried out at $140^{\circ}C$ for 4 hours in the same thermal vacuum chamber to remove defects in R-GO film before deposition of TTC at $50^{\circ}C$ with thickness of 200 nm. As a result of this process, R-GO FET device has a very high stability and durability for months to serve as a transducer for sensing applications.

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Reduced Graphene Oxide Field Effect Transistor for Detection of H+ Ions and Their Bio-sensing Application

  • Sohn, Il-Yung;Kim, Duck-Jin;Yoon, Ok-Ja;Tien, N.T.;Trung, T.Q.;Lee, N.E.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.195-195
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    • 2012
  • Recently, graphene based solution-gated field-effect transistors (SGFETs) have been received a great attention in biochemical sensing applications. Graphene and reduced graphene oxide (RGO) possess various advantages such as high sensitivity, low detection limit, label-free electrical detection, and ease of fabrication due to their 2D nature and large sensing area compared to 1D nanomaterials- based nanobiosensors. Therefore, graphene or RGO -based SGFET is a good potential candidate for sensitive detection of protons (H+ ions) which can be applied as the transducer in various enzymatic or cell-based biosensing applications. However, reports on detection of H+ ions using graphene or RGO based SGFETs have been still limited. According to recent reports, clean graphene grown by CVD or exfoliation is electrochemically insensitive to changes of H+ concentration in solution because its surface does not have terminal functional groups that can sense the chemical potential change induced by varying surface charges of H+ on CVD graphene surface. In this work, we used RGO -SGFETs having oxygen-containing functional groups such as hydroxyl (OH) groups that effectively interact with H+ ions for expectation of increasing pH sensitivity. Additionally, we also investigate RGO based SGFETs for bio-sensing applications. Hydroloytic enzymes were introduced for sensing of biomolecular interaction on the surface of RGO -SGFET in which enzyme and substrate are acetylcholinesterase (AchE) and acetylcholine (Ach), respectively. The increase in H+ generated through enzymatic reaction of hydrolysis of Ach by AchE immobilized on RGO channel in SGFET could be monitored by the change in the drain-source current (Ids).

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Ag 완충박막 두께에 따른 IGZO/Ag 적층박막의 특성 변화 (Effect of Ag Underlayer Thickness on the Electrical and Optical Properties of IGZO/Ag Layered Films)

  • 김소영;김선경;김승홍;전재현;공태경;최동혁;손동일;김대일
    • 열처리공학회지
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    • 제27권5호
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    • pp.230-234
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    • 2014
  • IGZO/Ag bi-layered films were deposited on glass substrate at room temperature with radio frequency and direct current magnetron sputtering, respectively to consider the effect of Ag buffer layer on the electrical, optical and structural properties. For all deposition, while the thickness of Ag buffer layer was varied as 10, 15, and 20 nm, The thickness of IGZO films were kept at 100 nm, In a comparison of figure of merit, IGZO films with 15 nm thick Ag buffer layer show the higher figure of merit ($1.1{\times}10^{-2}{\Omega}^{-1}$) than that of the IGZO single layer films ($3.7{\times}10^{-4}{\Omega}^{-1}$). From the observed results, it is supposed that the IGZO 100 nm/Ag 15 nm bi-layered films may be an alternative candidate for transparent electrode in a transparent thin film transistor device.

Reduced graphene oxide field-effect transistor for biomolecule detection and study of sensing mechanism

  • Kim, D.J.;Sohn, I.Y.;Kim, D.I.;Yoon, O.J.;Yang, C.W.;Lee, N.E.;Park, J.S.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.431-431
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    • 2011
  • Graphene, two dimensional sheet of sp2-hybridized carbon, has attracted an enormous amount of interest due to excellent electrical, chemical and mechanical properties for the application of transparent conducting films, clean energy devices, field-effect transistors, optoelectronic devices and chemical sensors. Especially, graphene is promising candidate to detect the gas molecules and biomolecules due to the large specific surface area and signal-to-noise ratios. Despite of importance to the disease diagnosis, there are a few reports to demonstrate the graphene- and rGO-FET for biological sensors and the sensing mechanism are not fully understood. Here we describe scalable and facile fabrication of rGO-FET with the capability of label-free, ultrasensitive electrical detection of a cancer biomarker, prostate specific antigen/${\alpha}1$-antichymotrypsin (PSA-ACT) complex, in which the ultrathin rGO sensing channel was simply formed by a uniform self-assembly of two-dimensional rGO nanosheets on aminated pattern generated by inkjet printing. Sensing characteristics of rGO-FET immunosensor showed the highly precise, reliable, and linear shift in the Dirac point with the analyte concentration of PSA-ACT complex and extremely low detection limit as low as 1 fg/ml. We further analyzed the charge doping mechanism, which is the change in the charge carrier in the rGO channel varying by the concentration of biomolecules. Amenability of solution-based scalable fabrication and extremely high performance may enable rGO-FET device as a versatile multiplexed diagnostic biosensor for disease biomarkers.

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다결정 실리콘 웨이퍼 직접제조에 대한 공정변수 영향 (Effect of Processing Parameters on Direct Fabrication of Polycrystalline Silicon Wafer)

  • 위성민;이진석;장보윤;김준수;안영수;윤우영
    • 한국주조공학회지
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    • 제33권4호
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    • pp.157-161
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    • 2013
  • A ribbon-type polycrystalline silicon wafer was directly fabricated from liquid silicon via a novel technique for both a fast growth rate and large grain size by exploiting gas pressure. Effects of processing parameters such as moving speed of a dummy bar and the length of the solidification zone on continuous casting of the silicon wafer were investigated. Silicon melt extruded from the growth region in the case of a solidification zone with a length of 1cm due to incomplete solidification. In case of a solidification zone wieh a length of 2 cm, on the other hand, continuous casting of the wafer was impossible due to the volume expansion of silicon derived from the liquid-solid transformation in solidification zone. Consequently, the optimal length of the solidification zone was 1.5 cm for maintaining the position of the solid-liquid interface in the solidification zone. The silicon wafer could be continuously casted when the moving speed of the dummy bar was 6 cm/min, but liquid silicon extruded from the growth region without solidification when the moving speed of the dummy bar was ${\geq}$ 9 cm/min. This was due to a shift of the position of the solid-liquid interface from the solidification zone to the moving area. The present study reports experimental findings on a new direct growth system for obtaining silicon wafers with both high quality and productivity, as a candidate for an alternate route for the fabrication of ribbon-type silicon wafers.

W-1.5 ZrO2 복합재료 합성과 급속소결 (Synthesis and Rapid Consolidation of W-1.5 ZrO2 Composite)

  • 김성은;손인진
    • 한국재료학회지
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    • 제28권11호
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    • pp.653-658
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    • 2018
  • $ZrO_2$ is a candidate material for hip and knee joint replacements because of its excellent combination of biocompatibility, corrosion resistance and low density. However, the drawback of pure $ZrO_2$ is a low fracture toughness at room temperature. One of the most obvious tactics to cope with this problem is to fabricate a nanostructured composite material. Nanomaterials can be produced with improved mechanical properties(hardness and fracture toughness). The high-frequency induction heated sintering method takes advantage of simultaneously applying induced current and mechanical pressure during sintering. As a result, nanostructured materials can be achieved within very short time. In this study, W and $ZrO_2$ nanopowders are mechanochemically synthesized from $WO_3$ and Zr powders according to the reaction($WO_3+3/2Zr{\rightarrow}W+3/2ZrO_2$). The milled powders are then sintered using high-frequency induction heating within two minutes under the uniaxial pressure of 80MPa. The average fracture toughness and hardness of the nanostructured W-3/2 $ZrO_2$ composite sintered at $1300^{\circ}C$ are $540kg/mm^2$ and $5MPa{\cdot}m^{1/2}$, respectively. The fracture toughness of the composite is higher than that of monolithic $ZrO_2$. The phase and microstructure of the composite is also investigated by XRD and FE-SEM.

핵연료 피복관용 다중층 SiC 복합체 튜브의 Hoop Stress 전산모사 연구 (FEA Study on Hoop Stress of Multilayered SiC Composite Tube for Nuclear Fuel Cladding)

  • 이현근;김대종;박지연;김원주
    • 한국세라믹학회지
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    • 제51권5호
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    • pp.435-441
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    • 2014
  • Silicon carbide-based ceramics and their composites have been studied for application to fusion and advanced fission energy systems. For fission reactors, $SiC_f$/SiC composites can be applied to core structural materials. Multilayered SiC composite fuel cladding, owing to its superior high temperature strength and low hydrogen generation under severe accident conditions, is a candidate for the replacement of zirconium alloy cladding. The SiC composite cladding has to retain its mechanical properties and original structure under the inner pressure caused by fission products; as such it can be applied as a cladding in fission reactor. A hoop strength test using an expandable polyurethane plug was designed in order to evaluate the mechanical properties of the fuel cladding. In this paper, a hoop strength test of the multilayered SiC composite tube for nuclear fuel cladding was simulated using FEA. The stress caused by the plug was distributed nonuniformly because of the friction coefficient difference between the inner surface of the tube and the plug. Hoop stress and shear stress at the tube was evaluated and the relationship between the concentrated stress at the inner layer of the tube and the fracture behavior of the tube was investigated.

분말야금법으로 제조한 새로운 Co10Fe10Mn35Ni35Zn10 고엔트로피 합금 (New Co10Fe10Mn35Ni35Zn10 high-entropy alloy Fabricated by Powder Metallurgy)

  • 임다미;박형근;;이병주;김형섭
    • 한국분말재료학회지
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    • 제25권3호
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    • pp.208-212
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    • 2018
  • In this paper, a new $Co_{10}Fe_{10}Mn_{35}Ni_{35}Zn_{10}$ high entropy alloy (HEA) is identified as a strong candidate for the single face-centered cubic (FCC) structure screened using the upgraded TCFE2000 thermodynamic CALPHAD database. The $Co_{10}Fe_{10}Mn_{35}Ni_{35}Zn_{10}$ HEA is fabricated using the mechanical (MA) procedure and pressure-less sintering method. The $Co_{10}Fe_{10}Mn_{35}Ni_{35}Zn_{10}$ HEA, which consists of elements with a large difference in melting point and atomic size, is successfully fabricated using powder metallurgy techniques. The MA behavior, microstructure, and mechanical properties of the $Co_{10}Fe_{10}Mn_{35}Ni_{35}Zn_{10}$ HEA are systematically studied to understand the MA behavior and develop advanced techniques for fabricating HEA products. After MA, a single FCC phase is found. After sintering at $900^{\circ}C$, the microstructure has an FCC single phase with an average grain size of $18{\mu}m$. Finally, the $Co_{10}Fe_{10}Mn_{35}Ni_{35}Zn_{10}$ HEA has a compressive yield strength of 302 MPa.

DBD 반응기에서 플라즈마 방전형태에 따른 PFCs 가스의 분해 특성 (Decomposition Characteristics of PFCs for Various Plasma Discharge Methods in Dielectric Barrier Discharge)

  • 김관태;김용호;차민석;송영훈;김석준;류정인
    • 한국대기환경학회지
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    • 제20권5호
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    • pp.625-632
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    • 2004
  • Perfluorocompounds ($PFC_s$), such as tetrafluoromethane ($CF_4$) and hexafluoroethane ($C_2F_6$), have been widely used as plasma etching and chemical vapor deposition (CVD) gases for semiconductor manufacturing processes. Since these $PFC_s$ are known to cause a greenhouse effect intensively, there has been a growing interest in reducing $PFC_s$ emissions. Among various $CF_4$ decomposing techniques, a dielectric barrier discharge (DBD) is considered as one of a promising candidate because it has been successfully used for generating ozone ($O_3$) and decomposing nitrogen oxide (NO). Firstly, optimal concentration of oxygen for $CF_4$ decomposition was found to figure out how many primary and secondary reactions are associated with DBD process. Secondary, to find effective discharge method for $CF_4$ decomposition, a streamer and a glow mode in DBD are experimentally compared, which includes (i) coaxialcylinder DBD, (ii) DBD reactor packed with glass beads. and (iii) a glow mode operation with a helium gas. The test results showed that optimal concentration of oxygen was ranged 500 ppm~1% for treating 500 ppm of $CF_4$ and helium glow discharge was the most efficient one to decompose $CF_4$.

전하 포획 플래시 소자를 위한 Al2O3/La2O3/SiO2 다층 박막 구조의 메모리 특성 (Memory Characteristics of Al2O3/La2O3/SiO2 Multi-Layer Structures for Charge Trap Flash Devices)

  • 차승용;김효준;최두진
    • 한국재료학회지
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    • 제19권9호
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    • pp.462-467
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    • 2009
  • The Charge Trap Flash (CTF) memory device is a replacement candidate for the NAND Flash device. In this study, Pt/$Al_2O_3/La_2O_3/SiO_2$/Si multilayer structures with lanthanum oxide charge trap layers were fabricated for nonvolatile memory device applications. Aluminum oxide films were used as blocking oxides for low power consumption in program/erase operations and reduced charge transports through blocking oxide layers. The thicknesses of $SiO_2$ were from 30 $\AA$ to 50 $\AA$. From the C-V measurement, the largest memory window of 1.3V was obtained in the 40 $\AA$ tunnel oxide specimen, and the 50 $\AA$ tunnel oxide specimen showed the smallest memory window. In the cycling test for reliability, the 30 $\AA$ tunnel oxide sample showed an abrupt memory window reduction due to a high electric field of 9$\sim$10MV/cm through the tunnel oxide while the other samples showed less than a 10% loss of memory window for $10^4$ cycles of program/erase operation. The I-V measurement data of the capacitor structures indicated leakage current values in the order of $10^{-4}A/cm^2$ at 1V. These values are small enough to be used in nonvolatile memory devices, and the sample with tunnel oxide formed at $850^{\circ}C$ showed superior memory characteristics compared to the sample with $750^{\circ}C$ tunnel oxide due to higher concentration of trap sites at the interface region originating from the rough interface.