• Title/Summary/Keyword: bonding surface

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Effects of various CLEAN-UP techniques on enamel surface roughness (수종의 CLEAN-UP technique이 법랑질 표면거칠기에 미치는 영향)

  • CHO, Sang-Wan;KWON, Oh-Won
    • The korean journal of orthodontics
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    • v.27 no.5 s.64
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    • pp.791-800
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    • 1997
  • Sixty premolars extracted for orthodontic treatment were divided into four groups, and the residual resin was removed with four different rotary finishing instruments at a fixed speed of $18,500{\pm}300 rpm$ on the low speed handpiece. The instruments were G1; No.169L carbide fissure bur, G2: No.2 round bur, G3; No.4 round bur, G4: No.8 round bur. Then, the enamel received a S-second polishing with a rubber cup and a pumice. To find the extent of loss on the enamel at this point, prophylaxis was done with the rubber cup and pumice prior to bonding of the bracket(P1) and removal of residual resin by means of appropriate procedure applicable to each respective group(P2) followed. The final polishing was done with the rubber cup and pumice(P3), and the enamel surface roughness was measured each by the surface measuring instrument. The whole process was observed under a scanning electron microscope to gain the following results: At P2, the enamel surface roughness in G1 showed most smoothly with $2.60{\pm}0.55{\mu}m;\;in\;G2,\;3.24{\pm}0.80{\mu}m;\;in\;G3,\;3.44{\pm}0.94{\mu}m;\;in\;G4,\;3.89{\pm}0.54{\mu}m$, the roughest. G2 and G3 showed no statistical significance(P>0.05). At P3, the enamel surface roughness in G1 showed most smoothly with $2.29{\pm}0.47{\mu}m;\;in\;G2,\;2.44{\pm}0.56{\mu}m;\;in\;G3,\;2.44{\pm}0.56{\mu}m;\;in\;G4,\;2.92{\pm}0.43{\mu}m$, the roughest. G1 vs G2, G3, and G2 vs G3 had no statistical significances(p>0.05). In all groups, P2 and P3 showed rougher in surface roughness than P1, and P2 rougher than P3(p<0.01). In a case of 5-second prophylaxis with the rubber cup and the pumice on a virgin, normal enamel, fine scratches were found under the scanning electron microscope. In all four groups, unremovable gouges remained even after polishing with the ubber and pumice; residual resin was not observed with naked eye when finished with the rubber and pumice, but the resin debris was observed under the scanning electron microscope.

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The micro-tensile bond strength of two-step self-etch adhesive to ground enamel with and without prior acid-etching (산부식 전처리에 따른 2단계 자가부식 접착제의 연마 법랑질에 대한 미세인장결합강도)

  • Kim, You-Lee;Kim, Jee-Hwan;Shim, June-Sung;Kim, Kwang-Mahn;Lee, Keun-Woo
    • The Journal of Korean Academy of Prosthodontics
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    • v.46 no.2
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    • pp.148-156
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    • 2008
  • Statement of problems: Self-etch adhesives exhibit some clinical benefits such as ease of manipulation and reduced technique-sensitivity. Nevertheless, some concern remains regarding the bonding effectiveness of self-etch adhesives to enamel, in particular when so-called 'mild' self-etch adhesives are employed. This study compared the microtensile bond strengths to ground enamel of the two-step self-etch adhesive Clearfil SE Bond (Kuraray) to the three-step etch-and- rinse adhesive Scotchbond Multi-Purpose (3M ESPE) and the one-step self-etch adhesive iBond (Heraeus Kulzer). Purpose: The purpose of this study was to determine the effect of a preceding phosphoric acid conditioning step on the bonding effectiveness of a two-step self-etch adhesive to ground enamel. Material and methods: The two-step self-etch adhesive Clearfil SE Bond non-etch group, Clearfil SE Bond etch group with prior 35% phosphoric acid etching, and the one-step self-etch adhesive iBond group were used as experimental groups. The three-step etch-and-rinse adhesive Scotchbond Multi-Purpose was used as a control group. The facial surfaces of bovine incisors were divided in four equal parts cruciformly, and randomly distributed into each group. The facial surface of each incisor was ground with 800-grit silicon carbide paper. Each adhesive group was applied according to the manufacturer's instructions to ground enamel, after which the surface was built up using Light-Core (Bisco). After storage in distilled water at $37^{\circ}C$ for 1 week, the restored teeth were sectioned into enamel beams approximately 0.8*0.8mm in cross section using a low speed precision diamond saw (TOPMET Metsaw-LS). After storage in distilled water at $37^{\circ}C$ for 1 month, 3 months, microtensile bond strength evaluations were performed using microspecimens. The microtensile bond strength (MPa) was derived by dividing the imposed force (N) at time of fracture by the bond area ($mm^2$). The mode of failure at the interface was determined with a microscope (Microscope-B nocular, Nikon). The data of microtensile bond strength were statistically analyzed using a one-way ANOVA, followed by Least Significant Difference Post Hoc Test at a significance level of 5%. Results: The mean microtensile bond strength after 1 month of storage showed no statistically significant difference between all adhesive groups (P>0.05). After 3 months of storage, adhesion to ground enamel of iBond was not significantly different from Clearfil SE Bond etch (P>>0.05), while Clearfil SE Bond non-etch and Scotchbond Multi-Purpose demonstrated significantly lower bond strengths (P<0.05), with no significant differences between the two adhesives. Conclusion: In this study the microtensile bond strength to ground enamel of two-step self-etch adhesive Clearfil SE Bond was not significantly different from three-step etch-and-rinse adhesive Scotchbond Multi-Purpose, and prior etching with 35% phosphoric acid significantly increased the bonding effectiveness of Clearfil SE Bond to enamel at 3 months.

Adsorption of Water on Cation Supported Layer Silicates (陽이온이 支持된 Layer Silicate 上에서의 水分의 吸着)

  • Jong Taik Kim;Shon, Jong Rack
    • Journal of the Korean Chemical Society
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    • v.19 no.5
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    • pp.317-324
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    • 1975
  • The adsorptions of gaseous $H_2O\;and\;D_2O\;on\;Na^+-,\;Ca^{2+}-,\;and\;Al^{3+}$ montmorillonites at various temperatures were undertaken. Break down of ir hydroxyl stretching bands into four Gaussian components was made by means of manual technique. Resonance theory of water to form silanol hydroxyl group was supported by $3625cm^{-1}$ band for OH and $2680cm^{-1}$ band for OD which depend on amounts of water adsorbed. The broad bands at about $3400 cm^{-1}\;and\;2475cm^{-1}$ were assigned to stretching band of silanol OH hydrogen bonded to adsorbed water. The prominent $3230 cm^{-1}$ band together with component around $2345 cm^{-1}$ were attributed to adsorbed $H_2O\;and\;D_2O$ respectively. The chemical nature of the hydrogen bonding between adsorbed water and neighboring surface OH was explained adequately in terms of electrostatic interaction.

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Effect of the Tapered Angle on the Ultimate Load Factors of PPWS Sockets in Main Cables of Suspension Bridges (현수교 PPWS용 소켓의 내벽 경사각이 소켓의 극한 하중계수에 미치는 영향)

  • Yoo, Hoon;Lee, Sung-Hyung;Seo, Ju-Won
    • KSCE Journal of Civil and Environmental Engineering Research
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    • v.33 no.1
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    • pp.47-59
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    • 2013
  • Ultimate load factors of PPWS(Prefabricated Parallel Wire Strand) sockets in main cables of suspension bridges are studied with respect to the tapered angles of the inner surface of sockets. After briefly reviewing the current design method, 15 numbers of finite element models of sockets are prepared by varying the number of wires in a strand and the tapered angles. The finite element models are updated by comparing experimental and numerical results, so that the models can reflect the real behavior of sockets. The stress distributions at the first yielding and ultimate states are analyzed by performing the incremental load analysis using ABAQUS. It is concluded that the optimized tapered angle of sockets should be determined at the specific angle between the results of verification equations of the required bonding length and stress resistance length.

Influence of 10-MDP concentration on the adhesion and physical properties of self-adhesive resin cements

  • Shibuya, Kazuhiko;Ohara, Naoko;Ono, Serina;Matsuzaki, Kumiko;Yoshiyama, Masahiro
    • Restorative Dentistry and Endodontics
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    • v.44 no.4
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    • pp.45.1-45.10
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    • 2019
  • Objectives: Self-adhesive resin cements contain functional monomers that enable them to adhere to the tooth structure without a separate adhesive or etchant. One of the most stable functional monomers used for chemical bonding to calcium in hydroxyapatite is 10-methacryloyloxydecyl dihydrogen phosphate (10-MDP). The aim of this study was to evaluate the influence of the10-MDP concentration on the bond strength and physical properties of self-adhesive resin cements. Materials and Methods: We used experimental resin cements containing 3 different concentrations of 10-MDP: 3.3 wt% (RC1), 6.6 wt% (RC2), or 9.9 wt% (RC3). The micro-tensile bond strength of each resin cement to dentin and a hybrid resin block (Estenia C&B, Kuraray Noritake Dental) was measured, and the fractured surface morphology was analyzed. Further, the flexural strength of the resin cements was measured using the three-point bending test. The water sorption and solubility of the cements following 30 days of immersion in water were measured. Results: The bond strength of RC2 was significantly higher than that of RC1. There was no significant difference between the bond strength of RC2 and that of RC3. The water sorption of RC3 was higher than that of any other cement. There were no significant differences in the three-point bending strength or water solubility among all three types of cements. Conclusions: Within the limitations of this study, it is suggested that 6.6 wt% 10-MDP showed superior properties than 3.3 wt% or 9.9 wt% 10-MDP in self-adhesive resin cement.

Process effects on morphology, electrical and optical properties of a-InGaZnO thin films by Magnetic Field Shielded Sputtering

  • Lee, Dong-Hyeok;Kim, Gyeong-Deok;Hong, Mun-Pyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.217-217
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    • 2016
  • The amorphous InGaZnO (a-IGZO) is widely accepted as a promising channel material for thin-film transistor (TFT) applications owing to their outstanding electrical properties [1, 2]. However, a-IGZO TFTs have still suffered from their bias instability with illumination [1-4]. Up to now, many researchers have studied the sub-gap density of states (DOS) as the root cause of instability. It is well known that defect states can influence on the performances and stabilities of a-IGZO TFTs. The defects states should be closely related with the deposition condition, including sputtering power, and pressure. Nevertheless, it has not been reported how these defects are created during conventional RF magnetron sputtering. In general, during conventional RF magnetron sputtering process, negative oxygen ions (NOIs) can be generated by electron attachment in oxygen atom near target surface and then accelerated up to few hundreds eV by a self-bias; at this time, the high energy bombardment of NOIs induce defects in oxide thin films. Recently, we have reported that the properties of IGZO thin films are strongly related with effects of NOIs which are generated during the sputtering process [5]. From our previous results, the electrical characteristics and the chemical bonding states of a-IGZO thin films were depended with the bombardment energy of NOIs. And also, we suggest that the deep sub-gap states in a-IGZO as well as thin film properties would be influenced by the bombardment of high energetic NOIs during the sputtering process.In this study, we will introduce our novel technology named as Magnetic Field Shielded Sputtering (MFSS) process to prevent the NOIs bombardment effects and present how much to be improved the properties of a-IGZO thin film by this new deposition method. We deposited a-IGZO thin films by MFSS on SiO2/p-Si and glass substrate at various process conditions, after which we investigated the morphology, optical and electrical properties of the a-IGZO thin films.

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Correlating the hydraulic conductivities of GCLs with some properties of bentonites

  • Oren, A. Hakan;Aksoy, Yeliz Yukselen;Onal, Okan;Demirkiran, Havva
    • Geomechanics and Engineering
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    • v.15 no.5
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    • pp.1091-1100
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    • 2018
  • In this study, the relationships between hydraulic conductivity of GCLs and physico-chemical properties of bentonites were assessed. In addition to four factory manufactured GCLs, six artificially prepared GCLs (AP-GCLs) were tested. AP-GCLs were prepared in the laboratory without bonding or stitching. A total of 20 hydraulic conductivity tests were conducted using flexible wall permeameters ten of which were permeated with distilled deionized water (DIW) and the rest were permeated with tap water (TW). The hydraulic conductivity of GCLs and AP-GCLs were between $5.2{\times}10^{-10}cm/s$ and $3.0{\times}10^{-9}cm/s$. The hydraulic conductivities of all GCLs to DIW were very similar to that of GCLs to TW. Then, simple regression analyses were conducted between hydraulic conductivity and physicochemical properties of bentonite. The best correlation coefficient was achieved when hydraulic conductivity was related with clay content (R=0.85). Liquid limit and plasticity index were other independent variables that have good correlation coefficients with hydraulic conductivity (R~0.80). The correlation coefficient with swell index is less than other parameters, but still fairly good (R~0.70). In contrast, hydraulic conductivity had poor correlation coefficients with specific surface area (SSA), smectite content and cation exchange capacity (CEC) (i.e., R < 0.5). Furthermore, some post-test properties of bentonite such as final height and final water content were correlated with the hydraulic conductivity as well. The hydraulic conductivity of GCLs had fairly good correlation coefficients with either final height or final water content. However, those of AP-GCLs had poor correlations with these variables on account of fiber free characteristics.

The biocompatibility and mechanical properties of plasma sprayed zirconia coated abutment

  • Huang, Zhengfei;Wang, Zhifeng;Yin, Kaifeng;Li, Chuanhua;Guo, Meihua;Lan, Jing
    • The Journal of Advanced Prosthodontics
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    • v.12 no.3
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    • pp.157-166
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    • 2020
  • PURPOSE. The aim of this study was to evaluate the clinical performance and reliability of plasma sprayed nanostructured zirconia (NSZ) coating. MATERIALS AND METHODS. This study consisted of three areas of analysis: (1) Mechanical property: surface roughness of NSZ coating and bond strength between NSZ coating and titanium specimens were measured, and the microstructure of bonding interface was also observed by scanning election microscope (SEM). (2) Biocompatibility: hemolysis tests, cell proliferation tests, and rat subcutaneous implant test were conducted to evaluate the biocompatibility of NSZ coating. (3) Mechanical compatibility: fracture and artificial aging tests were performed to measure the mechanical compatibility of NSZ-coated titanium abutments. RESULTS. In the mechanical study, 400 ㎛ thick NSZ coatings had the highest bond strength (71.22 ± 1.02 MPa), and a compact transition layer could be observed. In addition, NSZ coating showed excellent biocompatibility in both hemolysis tests and cell proliferation tests. In subcutaneous implant test, NSZ-coated plates showed similar inflammation elimination and fibrous tissue formation processes with that of titanium specimens. Regarding fatigue tests, all NSZ-coated abutments survived in the five-year fatigue test and showed sufficient fracture strength (407.65-663.7 N) for incisor teeth. CONCLUSION. In this study, the plasmasprayed NSZ-coated titanium abutments presented sufficient fracture strength and biocompatibility, and it was demonstrated that plasma spray was a reliable method to prepare high-quality zirconia coating.

Proton implantation mechanism involved in the fabrication of SOI wafer by ion-cut process (Ion-cut에 의한 SOI웨이퍼 제조에서의 양성자조사기구)

  • 우형주;최한우;김준곤;지영용
    • Journal of the Korean Vacuum Society
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    • v.13 no.1
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    • pp.1-8
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    • 2004
  • The SOI wafer fabrication technique has been developed by using ion-cut process, based on proton implantation and wafer bonding techniques. It has been shown by TRIM simulation that 65 keV proton implantation is required for the standard SOI wafer (200 nm SOI, 400 nm BOX) fabrication. In order to investigate the optimum proton dose and primary annealing condition for wafer splitting, the surface morphologic change has been observed such as blistering and flaking. As a result, effective dose is found to be in the 6∼$9\times10^{16}$ $H^{+}/\textrm{cm}^2$ range, and the annealing at $550^{\circ}C$ for 30 minutes is expected to be optimum for wafer splitting. The depth distribution of implanted hydrogen has been experimentally confirmed by ERD and SIMS measurements. The microstructure evolution in the damaged layer was also studied by X-TEM analysis.

Study on the design of LEO Satellite System in Space Plasma Environment (우주 플라즈마 환경에서 저궤도 위성 시스템 설계에 관한 고찰)

  • Lim, S.B.;Hong, S.P.;Kim, T.Y.;Jang, J.W.;Choi, S.W.
    • Aerospace Engineering and Technology
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    • v.7 no.2
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    • pp.67-75
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    • 2008
  • The electrostatic charging/discharging mechanism and its effects, and the system design considerations in the space plasma environment are studied in this paper. The electrostatic discharge (ESD) effects are carefully taken into account for a design of the satellite system at the early stage of the development. Generally, the electrical design requirements are specified to protect the satellite system from the ESD effects in the electromagnetic compatibility specifications. Those requirements are included the grounding, the bonding, the shielding, the conductive coating, the electric interfacing and so on. The space charging is caused by the increasing of the voltage difference between the each locations on the satellite surface. If the space charging is continued up to threshold, it may be occurred the system failure. This phenomenon is depended on the mission of system, electrical and mechanical configuration, system operation, and orbit condition. Therefore the related requirements are properly tailored and concentrated into the safety design.

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