• Title/Summary/Keyword: bonding material

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The Study on Anodic Bonding (양극접합에 관한 연구)

  • 정철안;박정도;정귀상
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1996.11a
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    • pp.338-341
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    • 1996
  • Anodic bonding is a key technology for micromechanical components. The main advantages of this method can be formed in a batch process, over large areas, and is permanent and irreversible. In this paper, the bonding was performed at temperatures ranging from 300 to 450 $^{\circ}C$, voltages 400 to 1000 V, and times 10 to 30 minutes. The sizes of the Si and the Pyrex #7740 glass were 6 mm $\times$6 mm, respectively. Bonding processes and voids were observed by the optical microscope, and the composition of the anodic bonding interface was analyzed by the SIMS. Optimum condition of the anodic bonding was at temperature above 40$0^{\circ}C$ without regard to voltage.

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An Experimental study on the Effect of Bonding Conditions on Bonding Strength of Ceramic Tiles: Substrate, Setting Material and Curing Condition (도기질 타일 부착조건(바탕면, 붙임재료 및 양생조건)이 부착강도에 미치는 영향에 관한 실험적 평가)

  • Ki, Jun-Do;Lee, Sang-Hyun;Cho, Hong-Bum;Kim, Young-Sun;Kwak, Dong-Young
    • Proceedings of the Korean Institute of Building Construction Conference
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    • 2020.11a
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    • pp.153-154
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    • 2020
  • This study aims to find out the reason that tile adhesive(type III) for ceramic tile does not harden under some conditions especially high humidity even though long curing time. Bonding strength of adhesive between substrate and ceramic tile is evaluated depending on bonding conditions such as substrate kind(concrete, board), bonding material (tile adhesive, tile cement) and curing condition(humidity 50, 70%). Based on the results, this study aimed to establish the quality of tile adhesion strength under the relevant conditions.

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Direct Bonding Characteristics of 2 inch 3C-SiC Wafers for MEMS in Hash Environments (극한환경 MEMS용 2 inch 3C-SiC 기판의 직접접합 특성)

  • Chung, Yun-Sik;Ryu, Ji-Goo;Kim, Kyu-Hyun;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.11a
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    • pp.387-390
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    • 2002
  • SiC direct bonding technology is very attractive for both SiCOI(SiC-on-insulator) electric devices and SiC-MEMS(micro electro mechanical system) fields because of its application possibility in harsh environments. This paper presents pre-bonding techniques with variation of HF pre-treatment conditions for 2 inch SiC wafer direct bonding using PECVD(plasma enhanced chemical vapor deposition) oxide. The PECVD oxide was characterized by XPS(X-ray photoelectron spectrometer) and AFM(atomic force microscopy). The characteristics of the bonded sample were measured under different bonding conditions of HF concentration and an applied pressure. The bonding strength was evaluated by the tensile strength method. The bonded interface was analyzed by using IR camera and SEM(scanning electron microscope). Components existed in the interlayer were analyzed by using FT-IR(fourier transform infrared spectroscopy). The bonding strength was varied with HF pre-treatment conditions before the pre-bonding in the range of $5.3 kgf/cm^2$ to $15.5 kgf/cm^2$

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Chemical compatibility of interim material and bonding agent on shear bond strength (임시수복 재료와 본딩제의 화학적 호환성이 전단결합강도에 미치는 영향)

  • Lee, Jonghyuk
    • Journal of Dental Rehabilitation and Applied Science
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    • v.32 no.4
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    • pp.293-300
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    • 2016
  • Purpose: The purpose of this study is finding proper bonding agents to be used when adding bis-acryl composite provisional materials. Materials and Methods: Three bonding agents with different chemical compositions were included in this study. Forty disk shaped specimens of bis-acryl composite provisional material were prepared and divided into 4 groups according to the bonding agents. Control group didn't have bonding agent. Through the Teflon mould with 4.0 mm diameter hole with 4.0 mm thickness the same bis-acryl composite provisional material was added on the disks after the surface of each specimen was treated with designated bonding agent according to the manufacturer's instructions. Shear bond test was performed and the fractured surfaces were inspected with a microscope. One-way analysis of variance was conducted and the result was further analysed with Turkey post hoc test at the significance level of 0.05. Results: The highest strength was acquired from the specimens bonded with chemical cure system and it was statistically significant (P < 0.05). This group showed 100% cohesive failures. The lowest bonding strength was recorded from the specimens used conventional light cure bonding agent, and this group's result was similar with the control group. The group used a light cure bonding agent claiming improved compatibility revealed significantly higher bond strength to the traditional light cure bonding agent group in a statistically significant way (P = 0.043). Conclusion: According to the bonding agent used the shear bond strength was significantly affected. Therefore the choice of proper bonding agent is important when hiring a bonding agent to add bis-acryl composite provisional materials.

Effect of phenoxy resin content on Properties of Epoxy Bonding Film (Epoxy bonding film의 phenoxy resin 함량에 따른 특성 변화)

  • Kim, Sang-Hyun;Lee, Woo-Sung;Kang, Nam-Kee;Yoo, Myong-Jae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.228-228
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    • 2008
  • 본 논문에서는 epoxy bonding film의 phenoxy resin의 함량변화에 따른 특성 변화에 대하여 연구하였다. epoxy bonding film은 미세패턴 구현을 위해서 사용되는 기판재료로써 epoxy, hardener, silica, phenoxy resin 등이 첨가되어진다. phenoxy resin 함량을 변화를 주면서 tape casting 방법을 통해서 flim 형성을 한 후, 제작된 film의 phenoxy resin 함량변화에 따른 조도 특성의 연구를 위해서 sweller, desmear 공정을 후 RA(Roughness Average)를 측정하고, SEM으로 표면을 관찰하였다. 또한 제작된 bonding film을 가열 가압 후 구리 도금공정을 거쳐 peel strength를 측정하였다. phenoxy resin 함량이 증가 할수록 RA가 증가되어지는 것이 관찰되어졌고, 또 한 peel strength 증가하였다.

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Bonding Property of Silicon Wafer Pairs with Annealing Method (열처리 방법에 따른 실리콘 기판쌍의 접합 특성)

  • 민홍석;이상현;송오성;주영창
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.5
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    • pp.365-371
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    • 2003
  • We prepared silicon on insulator(SOI) wafer pairs of Si/1800${\AA}$ -SiO$_2$ ∥ 1800${\AA}$ -SiO$_2$/Si using water direct bonding method. Wafer pairs bonded at room-temperature were annealed by a normal furnace system or a fast linear annealing(FLA) equipment, and the micro-structure of bonding interfaces for each annealing method was investigated. Upper wafer of bonded pairs was polished to be 50 $\mu\textrm{m}$ by chemical mechanical polishing(CMP) process to confirm the real application. Defects and bonding area of bonded water pairs were observed by optical images. Electrical and mechanical properties were characterized by measuring leakage current for sweeping to 120 V, and by observing the change of wafer curvature with annealing process, respectively. FLA process was superior to normal furnace process in aspects of bonding area, I-V property, and stress generation.

A Study on Pre-bonding of 3C-SiC Wafers using CVD Oxide (CVD 절연막을 이용한 3C-SiC 기판의 초기직접접합에 관한 연구)

  • ;;Shigehiro Nishino
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.10
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    • pp.883-888
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    • 2002
  • SiC direct bonding technology is very attractive for both SiCOI(SiC-on-insulator) electric devices and SiC-MEMS(micro electro mechanical system) fields because of its application possibility in harsh environments. This paper presents pre-bonding techniques with variation of HF pre-treatment conditions for SiC wafer direct bonding using PECVD(plasma enhanced chemical vapor deposition) oxide. The PECYD oxide was characterized by XPS(X-ray photoelectron spectrometer) and AFM(atomic force microscopy). The characteristics of the bonded sample were measured under different bonding conditions of HF concentration and an applied pressure. The bonding strength was evaluated by the tensile strength method. The bonded interface was analyzed by using SEM(scanning electron microscope). Components existed in the interlayer were analyzed by using FT-IR(fourier transform infrared spectroscopy). The bonding strength was varied with HF pre-treatment conditions before the pre-bonding in the range of 5.3 kgf/cm$^2$to 15.5 kgf/cm$^2$.

A Study on Characterization of P-N Junction Using Silicon Direct Bonding (실리콘 직접 본딩에 의한 P-N 접합의 특성에 관한 연구)

  • Jung, Won-Chae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.10
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    • pp.615-624
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    • 2017
  • This study investigated the various physical and electrical effects of silicon direct bonding. Direct bonding means the joining of two wafers together without an intermediate layer. If the surfaces are flat, and made clean and smooth using HF treatment to remove the native oxide layer, they can stick together when brought into contact and form a weak bond depending on the physical forces at room temperature. An IR camera and acoustic systems were used to analyze the voids and bonding conditions in an interface layer during bonding experiments. The I-V and C-V characteristics are also reported herein. The capacitance values for a range of frequencies were measured using a LCR meter. Direct wafer bonding of silicon is a simple method to fuse two wafers together; however, it is difficult to achieve perfect bonding of the two wafers. The direct bonding technology can be used for MEMS and other applications in three-dimensional integrated circuits and special devices.

The Characteristics of Thermal Resistance for Fluxless Eutectic Die Bonding in High Power LED Package (Fluxless eutectic die bonding을 적용한 high power LED 패키지의 열저항 특성)

  • Shin, Sang-Hyun;Choi, Sang-Hyun;Kim, Hyun-Ho;Lee, Young-Gi;Choi, Suk-Moon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.303-304
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    • 2005
  • In this paper, we report a fluxless eutectic die bonding process which uses 80Au-20Sn eutectic alloy. The chip LEDs are picked and placed on silicon substrate wafers. The bonding process temperatures and force are $305\sim345^{\circ}C$ and 10$\sim$100gf, respectively. The bonding process was performed on graphite heater with nitrogen atmosphere. The quality of bonding are evaluated by shear test and thermal resistance. Results of fluxless eutectic die bonding show that shear strength is Max. 3.85kgf at 345$^{\circ}C$ /100gf and thermal resistance of junction to die bonding is Min. 3.09K/W at 325$^{\circ}C$/100gf.

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An analysis of the Wi-Ni Carbide Alloy Diffusion Bonding technique in its application for DME Engine Fuel Pump

  • Chun, Dong-Joon
    • International Journal of Advanced Culture Technology
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    • v.8 no.2
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    • pp.246-251
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    • 2020
  • Dimethyl Ether(DME) engine use a highly efficient alternative fuel having a great quantity of oxygen and has a advantage no polluting PM gas. The existing DME fuel cam material is a highly expensive carbide alloy, and it is difficult to take a price advantage. Therefore the study of replacing body area with inexpensive steel material excluding piston shoe and contact area which demands high characteristics is needed. The development of WC-Ni base carbide alloy optimal bonding composition technique was accomplished in this study. To check out the influence of bonding temperature and time, bonding characteristics of sintering temperature was experimented. The hardness of specimen and bonding rate were measured using ultrasound equipment. The bonding state of each condition was excellent, and the thickness of mid-layer, temperature and maintaining time were measured. The mid-layer thickness according to bonding temperature and maintaining time were observed with optical microscope. We analyzed the micro-structural analysis, formation of bonding specimen, wafer fabrication and fuel cam abrasion test. Throughout this study, we confirmed that the fuel cam for DME engine which demands high durability against velocity and pressure is excellent.