• 전자공학회논문지A
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• 제30A권10호
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• pp.20-26
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• 1993

The base-collector capacitance of an npn bipolar transistor in bipolar or BiCMOS technology has significant influence on the switching performances, and comprises pnjunction component and MOS component. Both components have complicated dependences on the isolation oxide structure, epitaxial doping density, and bias voltage. Analytical/empirical formulas for both components are derived in this paper for a generic isolation structure as a function of epitaxial doping density and bias voltage based on some theoretical understanding and two-dimensional device simulations. These formulas are useful in estimating the effect of device isoation schemes on the switching speed of bipolar transistors.

• Transactions on Electrical and Electronic Materials
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• 제5권3호
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• pp.122-125
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• 2004

ITO films were deposited on polyethylene terephthalate substrate by a dc reactive magnetron sputtering using rf bias without substrate heater and post-deposition thermal treatment. The dependency of rf substrate bias on plasma sputter processing was investigated to control energetic particles and improve ITO film properties. The substrate was applied negative rf bias voltage from 0 to -80 V. The composition of indium, tin, and oxygen atoms is strongly depended on the rf substrate bias. Oxygen deficiency is the highest at rf bias of -20 V. The electrical and optical properties of ITO films also are dominated obviously by negative rf bias.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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• pp.408-411
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• 2003

Al doped Zinc Oxide(ZnO:Al) films, which is widely used as a transparent conductor in optoelectronic devices such as solar cell, liquid crystal display, plasma display panel, thermal heater, and other sensors, were prepared by using the capacitively coupled DC magnetron sputtering method. The influence of the substrate temperature, working gas pressure, discharge power and doping amounts of Al on the electrical, optical and morphological properties were investigated experimentally. The effect of bias voltage on the electrical properties of ZnO thin film were also studied. Films with lowest resistivity of $5.4{\times}10^{-4}\;{\Omega}-cm$ have been achieved in case of films deposited at 1mtorr, $400^{\circ}C$ with a substrate bias of +10V for 840nm in film thickness.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 1998년도 추계종합학술대회 논문집
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• pp.703-706
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• 1998

This paper presents an efficient substrate-bias generator(SBG)for low-power, high-density DRAM's The proposed SBG can supply stable voltage with switching the supply voltage of driving circuit, and it can substitude the small capacitance for the large capacitance. The charge pumping circuit of the SBG suffere no VT loss and is to be applicable to low-voltage DRAM's. Also it can reduce the power consumption to make VBB because of it's high pumping efficiency. Using biasing voltage with positive temperature coefficient, VBB level detecting circuit can detect constant value of VBB against temperature variation. VBB level during VBB maintaining period varies 0.19% and the power dissipation during this period is 0.16mw. Charge pumping circuit can make VBB level up to -1.47V using VCC-1.5V, and do charge pumping operation one and half faster than the conventional ones. The temperature dependency of the VBB level detecting circuit is 0.34%. Therefore the proposed SBG is expected to supply a stable VBB with less power consumption when it is used in low power DRAM's.

• Journal of Information Display
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• 제3권4호
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• pp.13-18
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• 2002

In general, the background light that is produced during the reset period deteriorates the dark room contrast ratio in AC PDP. In this paper, we propose a modified ramp reset pulse that can reduce the background light to an imperceptible level. In the new reset waveform, the discharges between the scan and sustain electrodes are minimized by applying a positive bias voltage to the sustain electrode and only the weak discharges between the scan and address electrodes are found to occur during the reset period. We also adopted the MgO coated phosphor layer to improve the address voltage margin that was reduced when the bias voltage in the modified ramp reset waveform was applied. As a result, the address voltage margin of 45 V which is the same level of the conventional method was ortained and the dark room contrast ratio was improved up to 7500 : 1.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1995년도 추계학술대회 논문집
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• pp.67-70
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• 1995

Amorpous As$\sub$10/Ge$\sub$15/Te$\sub$75/ device shows the memory switching characterisite under d.c. bias. In bulk material, a-As$\sub$10/Ge/sub15/Te$\sub$75/s switching voltage range is above 100 volts. Our purposes in this gaudy are decreasing a switching threshold voltage, finding the properties of d.c., a.c. conduction, and the characterisitics of switching threshold voltage fur a-As$\sub$10/Ge$\sub$15/Te$\sub$75/. As the results, the d.c.and a.c. conductivities increase with temperature. From the data of conductivity, various electrical and physical properties are obtained experimentally. The switching threshold voltages decrease with increasing annealing temperature and time, but increase with increasing film thickness and distance of electrode for d.c. bias.

• Journal of Power Electronics
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• 제13권5호
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• pp.779-786
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• 2013

A highly efficient sustaining driver is proposed for plasma display panels (PDPs). When the PDP is charged and discharged, the proposed sustaining driver employs an address voltage source used in an addressing period. A voltage source is used for fully charging the panel to the sustaining voltage, and an initial inductor current helps the panel discharge to 0 V. The resonance between the panel and an inductor is made by shifting the voltage and current bias level when charging and discharging the panel. As a result, the proposed circuit can reduce power consumption, switching loss, heat dissipation, and production cost. Experimental results of a 42-inch PDP are provided to verify the operation and features of the proposed circuit.

• Journal of the Optical Society of Korea
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• 제18권5호
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• pp.594-597
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• 2014

We propose a novel approach to measure the residual phase noise (RPN) of a photodiode (PD) based on a two-tone correlation method. Compared with the previous measurements of the RPNs of PDs, this method is more convenient in practical application. In this method, two microwave sources and other components were placed in two isolated links sharing the same PD, so the noises of them were uncorrelated. With an FFT analyzer, the uncorrelated noises could be mostly suppressed while only the RPN of the PD was preserved. Voltage-dependent nonlinearities of PDs were studied previously. In this letter, we investigate the relationship between the RPN of the PD and the bias voltage on the PD. By changing the bias voltage, the difference of the RPN can be up to 10 dB.

• JSTS:Journal of Semiconductor Technology and Science
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• 제14권1호
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• pp.117-123
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• 2014

The fabrication and characterization of a Si/ZnO thin film heterojunction ultraviolet photodiode has been presented in this paper. ZnO thin film of ~100 nm thick was deposited on <100> Silicon (Si) wafer by atomic layer deposition (ALD) technique. The Photoluminescence spectroscopy confirms that as-deposited ZnO thin film has excellent visible-blind UV response with almost no defects in the visible region. The room temperature current-voltage characteristics of the n-ZnO thin film/p-Si photodiodes are measured under an UV illumination of $650{\mu}W$ at 365 nm in the applied voltage range of ${\pm}2V$. The current-voltage characteristics demonstrate an excellent UV photoresponse of the device in its reverse bias operation with a contrast ratio of ~ 1115 and responsivity of ~0.075 A/W at 2 V reverse bias voltage.

• 전기학회논문지
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• 제56권8호
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• pp.1445-1449
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• 2007

This paper presents the DOD (Drop-On-Demand) characteristic using the electrostatic field induced inkjet printing system. In order to achieve the DOD characteristic of electrostatic field induced inkjet printing, applied the bias voltage of 1.4 kV and the pulse voltage of $2.0\;kV\;{\sim}\;2.7\;kV$ using high voltage pulse generator. Electrostatic field induced droplet ejection is directly observed using a high-speed camera and for investigated DOD characteristic, CNT ink used. The electrostatic field induced inkjet head system has DOD characteristic using pulse generator which can be applied pulse voltage. The bias voltage has a good condition which form meniscus and has micro dripping mode for small size micro droplet. Also, the droplet size decreases with increasing the applied pulse voltage. This paper shows DOD characteristic at electrostatic field induced inkjet head system, Therefore. electrostatic DOD inkjet head system will be applied industrial area comparing conventional electrostatic inkjet head system.