• Title/Summary/Keyword: beam quality

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Utilization of Electron Beam-Radiated Cotton Waste for Agaric Mushroom Cultivation Bed (전자빔으로 처리한 폐면의 버섯배지효과)

  • Shon, Hyo-Jung;Chung, Sun-Young;Lee, Jong-Shin;Seo, Yung-Bum
    • Journal of Korea Technical Association of The Pulp and Paper Industry
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    • v.41 no.3
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    • pp.71-75
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    • 2009
  • Cotton waste is usually used for cultivating agaric mushroom after outdoor fermentation for a few months. Electron beam was used to break down the polymer chaims of cotton waste for increasing low molecular weight soluble sugars, which may enhance the agaric mushroom cultivation. By increasing electron beam radiation, alpha cellulose content of the cotton waste was decreased while beta cellulose content and hot water solubles were increased. Electron beam radiation over 240 kGy on cotton waste caused significant increase of mushroom yield without lowering mushroom quality.

The domestic development of 60kw Electron Beam Welding System (고정밀 60kW급 전자빔 용접시스템 국산화 개발)

  • 정원희;엄기원;정인철
    • Proceedings of the KWS Conference
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    • 2001.10a
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    • pp.121-124
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    • 2001
  • The main characteristic of the Electron Beam Welding technique is its high energy density which produces thin and deep welds with very little distortion. High accelerated electrons, focused in a beam of 0.5 ∼ 2mm diameter, produce narrow welds with deep penetration. The result is a small HAZ as well as a low and uniform distortion which is predictible within very narrow limits. But the small diameter of the EB increases the requirements for the equipment control system for centering the beam on the welding joint in order to avoid any lack of fusion. Therefore, in this paper, we introduce the system developed at our company and the quality of welding zone, the detail function of system.

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The Prevention of the Longitudinal Deformation on the Built­Up Beam by using Induction Heating

  • Park, J.U.;Lee, C.H.;Chang, K.H.
    • International Journal of Korean Welding Society
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    • v.3 no.2
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    • pp.7-14
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    • 2003
  • During the manufacture of a ship, longitudinal deformation is produced by fillet welding on the Built­Up beam used to improve the longitudinal strength of a ship. This deformation needs a correcting process separate from a manufacture process and decreases productivity and quality. This deformation is caused by welding moment, which is the value multiplied the shrinking force due to welding by the distance from the neutral axis on a cross section of Built­Up beam. This deformation can be offset by generating a moment which is the same magnitude with and is located in an opposite direction to the welding moment on web plate by induction heating. Accordingly, this study clarifies the creation mechanism of the longitudinal deformation on Built­Up beam with FEM analysis and presents the preventative method of this deformation by induction heating basing the mechanism and verifies its validity through analysis and experiments. The induction heating used here is performed by deciding its location and quantity with experiments and simple equations and by applying them to a real structure.

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Fabrication technology of the focusing grating coupler using single-step electron beam lithography (Single-step 전자빔 묘화 장치를 이용한 Focusing Grating Coupler 제작 연구)

  • Kim, Tae-Youb;Kim, Yark-Yeon;Sohn, Yeung-Joon;Han, Gee-Pyeong;Paek, Mun-Cheol;Kim, Hae-Sung;Shin, Dong-Hoon;Rhee, Jin-Koo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07b
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    • pp.976-979
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    • 2002
  • A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control' writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm), To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and $0.5{\times}0.5mm^2$ area, respectively, This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolpution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

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How Image Quality Affects Determination of Target Displacement When Using kV Cone-beam Computed Tomography (CBCT) (kV Cone-beam CT를 사용한 치료준비에서 재구성 영상의 품질이 표적 위치 결정에 미치는 영향)

  • Oh, Seung-Jong;Kim, Si-Yong;Suh, Tae-Suk
    • Progress in Medical Physics
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    • v.17 no.4
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    • pp.207-211
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    • 2006
  • The advent of kV cone-beam computed tomography (CBCT) integrated with a linear accelerator allows for more accurate Image-guided radiotherapy (IGRT). IGRT is the technique that corrects target displacement based on internal body information. To do this, the CBCT Image set is acquired just before the beam is delivered and registered with the simulation CT Image set. In this study, we compare the registration results according to the CBCT's reconstruction quality (either high or medium). A total of 56 CBCT projection data from 6 patients were analyzed. The translation vector differences were within 1 mm in all but 3 cases. For rotation displacement difference, components of all three axes were considered and 3 out of 168 ($56{\times}3$ axes) cases showed more than lo of rotation differences.

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Fabrication Technology of the Focusing Grating Coupler using Single-step Electron Beam Lithography

  • Kim, Tae-Youb;Kim, Yark-Yeon;Han, Gee-Pyeong;Paek, Mun-Cheol;Kim, Hae-Sung;Lim, Byeong-Ok;Kim, Sung-Chan;Shin, Dong-Hoon;Rhee, Jin-Koo
    • Transactions on Electrical and Electronic Materials
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    • v.3 no.1
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    • pp.30-37
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    • 2002
  • A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control'writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm). To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and 0.5 $\times$ 0.5 mm$^2$area, respectively. This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

The Research Relating to QA of the Absorbed Dose in the 10 MeV E-beam Facility in Accordance with the International Standards (국제표준에 따른 10 MeV급 전자빔 조사시설의 흡수선량 품질보증에 관한 연구)

  • Ha, Tae-Sung;Ahn, Cheol;Jung, Pyeong-Hwan;Cho, Jeong-Hee;Lee, Jong-Seok;Lee, Hye-Nam;Yoo, Beong-Gyu
    • Journal of radiological science and technology
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    • v.33 no.4
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    • pp.387-394
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    • 2010
  • In the field of healthcare, the conventional sterilization treatments have been replaced by irradiation methods which are in accordance with internationally well established quality standards. The quality control in radiation sterilization assures that the absorbed dose of the irradiated material is in agreement with its requirements and standards. The electron beam irradiation requires technical assessments of more process parameters than gamma irradiation does. Korea has witnessed wide uses of electron accelerators since early 2000 but there hasn't been research experiences relating to quality system in accordance with international standards. The new large scale e-beam irradiation system with the specification of 10 MeV, 8 kW was installed and operated in 2008 by Seoul Radiology Services Co. It consists of the electron accelerator, product handling system, safety, documentation and control subsystems into an integrated system to meet the requirement of the Good Manufacturing Practice such as process quality assurance and management of product tracking records. To implement the international standard such as EN ISO11137, it is necessary to understand the purposes aimed in the standard and carry out the tests following the procedures required. This study presented the specification of the e-beam facility and showed what its design requirements and features are. The test results on a variety of process parameters were presented and validated it they are within the required limits.

On Feasibility Study of the Charged Particle Beam Pretreatment Process for Non-conducting Metal Coating (무전도 금속 증착을 위한 하전 입자빔 전처리 공정의 타당성 연구)

  • Na, Myung Hwan;Park, Young Sik;Shim, Ha-Mong;Chun, Young Ho
    • Journal of Korean Society for Quality Management
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    • v.42 no.2
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    • pp.179-187
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    • 2014
  • Purpose: Since several problems were found when present non-conducting metal coating process was applied to mass production, we study and develop to improve those problems. Methods: In this paper, a couple of analysis methods such as surface hardness, XPS spectrum analysis, morphology, and reflection ratio were used. Results: This paper suggest a new possibility of Non-conducting thin metal coating method that has quality of mass production phase without UV coating process. Conclusion: By the result of analysis, we can set optimized process conditions of the electro deposition coating using electron beam.

Process Monitoring in Laser Beam Cutting by Photo Diode (레이저 절단에서 광소자를 이용한 가공공정 모니터링)

  • 김봉채;장욱진;김재도
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 1994.10a
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    • pp.354-359
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    • 1994
  • On-line process control equipment for CO $_{2}$ laser cutting is unavailable for industrial application. The major part of the industrial cutting machines are regulated off-line by highly educated engineers. The quality inspection of the sample is visual and referred to different quality scales. Due to lack of automation potential laser users hesitate to implement the cutting method. The first step toward an automation of the process is development of a process monitoring system and the research is concentrated on the area of on-line quality detection during CO $_{2}$ laser cutting. The method bases on the detection of the emitted light from the cut front by photo diode. the signal from photo diode has been undertaken from Fourier analysis and statistical analysis. As a result, it is possible to estimate striation pattern according to beam travel speed.

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Epitaxial Growth of $Y_2O_3$ films by Ion Beam Assisted Deposition

  • Whang, C.N.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2000.02a
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    • pp.26-26
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    • 2000
  • High quality epitaxial Y2O3 thin films were prepared on Si(111) and (001) substaretes by using ion beam assisted deposition. As a substrate, clean and chemically oxidized Si wafers were used and the effects of surface state on the film crystallinity were investigated. The crystalline quality of the films were estimated by x-ray scattering, rutherford backscattering spectroscopy/channeling, and high-resolution transmission electron microscopy (HRTEM). The interaction between Y and Si atoms interfere the nucleation of Y2O3 at the initial growth stage, it could be suppressed by the interface SiO2 layer. Therefore, SiO2 layer of the 4-6 layers, which have been known for hindering the crystal growth, could rather enhance the nucleation of the Y2O3 , and the high quality epitaxial film could be grown successfully. Electrical properties of Y2O3 films on Si(001) were measured by C-V and I-V, which revealed that the oxide trap charge density of the film was 1.8$\times$10-8C/$\textrm{cm}^2$ and the breakdown field strength was about 10MV/cm.

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