• Title/Summary/Keyword: beam growth

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Laser Patterning of Vertically Grown Carbon Nanotubes (수직성장된 탄소나노튜브의 선택적 패터닝)

  • Chang, Won Seok
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.36 no.12
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    • pp.1171-1176
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    • 2012
  • The selective patterning of a carbon nanotube (CNT) forest on a Si substrate has been performed using a femtosecond laser. The high shock wave generated by the femtosecond laser effectively removed the CNTs without damage to the Si substrate. This process has many advantages because it is performed without chemicals and can be easily applied to large-area patterning. The CNTs grown by plasma-enhanced chemical vapor deposition (PECVD) have a catalyst cap at the end of the nanotube owing to the tip-growth mode mechanism. For the application of an electron emission and biosensor probe, the catalyst cap is usually removed chemically, which damages the surface of the CNT wall. Precise control of the femtosecond laser power and focal position could solve this problem. Furthermore, selective CNT cutting using a femtosecond laser is also possible without any phase change in the CNTs, which is usually observed in the focused ion beam irradiation of CNTs.

Characterization of Basal Plane Dislocations in PVT-Grown SiC by Transmission Electron Microscopy

  • Jeong, Myoungho;Kim, Dong-Yeob;Hong, Soon-Ku;Lee, Jeong Yong;Yeo, Im Gyu;Eun, Tai-Hee;Chun, Myoung-Chuel
    • Korean Journal of Materials Research
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    • v.26 no.11
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    • pp.656-661
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    • 2016
  • 4H- and 6H-SiC grown by physical vapor transport method were investigated by transmission electron microscopy (TEM). From the TEM diffraction patterns observed along the [11-20] zone axis, 4H- and 6H-SiC were identified due to their additional diffraction spots, indicating atomic stacking sequences. However, identification was not possible in the [10-10] zone axis due to the absence of additional diffraction spots. Basal plane dislocations (BPDs) were investigated in the TEM specimen prepared along the [10-10] zone axis using the two-beam technique. BPDs were two Shockley partial dislocations with a stacking fault (SF) between them. Shockley partial BPDs arrayed along the [0001] growth direction were observed in the investigated 4H-SiC. This arrayed configuration of Shockley partial BPDs cannot be recognized from the plan view TEM with the [0001] zone axis. The evaluated distances between the two Shockley partial dislocations for the investigated samples were similar to the equilibrium distance, with values of several hundreds of nanometers or even values as large as over a few micrometers.

A Study on Fatigue Crack at Coped Stringers of the Plate Girder Subway-Bridge (플레이트거더 지하철교량 세로보의 피로 균열에 관한 연구)

  • Jo, Jae Byung
    • Journal of Korean Society of Steel Construction
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    • v.16 no.5 s.72
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    • pp.713-724
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    • 2004
  • A fatigue crack found at the coped stringer of the old dismantled Dangsan Subway Bridge was numerically simulated. A model of a single span of the plate girder bridge with its beam elements was created and analyzed in order to obtain the nominal stress history caused by trains. A detailed FEM analysis of the coped stringer was conducted using a shell element model. A fracture mechanical model was used to estimate crack propagation. The stress intensity factors were calculated using the J-Integral method. The simulation with some reasonable assumptions showed that the calculated crack lengths were comparable to those found on the site.

Comparison of Growth Mode between GaAs and InAs Self Assembled Nanowire on Si(111) by Molecular Beam Epitaxy

  • Ha, Jae-Du;Park, Dong-U;Kim, Yeong-Heon;Kim, Jong-Su;Kim, Jin-Su;No, Sam-Gyu;Lee, Sang-Jun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.325-325
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    • 2012
  • 1차원구속 반도체인 nanowires (NWs)는 전기적, 광학적으로 일반 bulk구조와 다른 특성을 가지고 있어서 현재 많은 연구가 되고 있다. 일반적으로 NWs는 Au 등의 금속 촉매를 이용하여 성장을 하게 되는데 이때 촉매가 오염물로 작용을 해서 결함을 만들어서 bandgap내에 defect level을 형성하게 된다. 본 연구는 Si (111) 기판 위에 GaAs NWs 와 InAs NWs를 촉매를 이용하지 않고 성장 하였다. vapour-liquid-solid (VLS)방법으로 성장하는 GaAs NWs는 Ga의 droplet을 이용하게 되는데 Ga이 Si 기판위에 자연 산화막에 존재하는 핀홀(pinhole)로 이동하여 1차적으로 Ga droplet 형성하고 이후 공급되는 Ga과 As은 SiO2 보다 GaAs와 sticking coefficient 가 좋기 때문에 Ga drolept을 중심으로 빠른 선택적 성장을 하게 되면서 NWs로 성장을 하게 된다. 반면에 InAs NWs를 성장 할 시에 droplet 방법으로 성장을 하게 되면 NWs가 아닌 박막 형태로 성장을 하게 되는데 이것으로 InAs과 GaAs의 $SiO_2$와의 sticking coefficient 의 차이를 추측을 할 수 있다. InAs NWs는 GaAs NWs는 달리 native oxide를 이용하지 않고 InAs 과 Si 사이의 11.5%의 큰 lattice mismatch를 이용한다. 이종의 epitaxy 방법에는 크게 3종류 (Frank-van der Merwe mode, Stranski-Krastanov mode, Volmer-Weber mode)가 있는데 각기 다른 adatom 과 surface의 adhesive force로 나누어지게 된다. 이 중 Volmer-Weber mode epitaxy는 adatom 의 cohesive force가 surface와의 adhesive force보다 큰 경우 성장 되는 방식으로 InAs NWs 는 이 방식을 이용한다. 즉 droplet을 이용하지 않는 vapour-solid (VS) 방법으로 성장을 하였다. 이 때 In 의 migration을 억제하기 위해서 VLS mode 의 GaAs NWs 보다 As의 공급을 10배 이상 하였다. FE-SEM 분석 결과 GaAs NWs는 Ga droplet을 확인 할 수 있었고 InAs NWs는 droplet이 존재하지 않았다. GaAs와 InAs NW는 density와 length가 V/III가 높을수록 증가 하였다.

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Growth of 2dimensional Hole Gas (2DHG) with GaSb Channel Using III-V Materials on InP Substrate

  • Sin, Sang-Hun;Song, Jin-Dong;Han, Seok-Hui;Kim, Tae-Geun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.152-152
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    • 2011
  • Silicon 기반의 환경에서 연구 및 제조되는 전자소자는 반도체의 기술이 발전함에 따라 chip 선폭의 크기가 30 nm에서 20 nm, 그리고 그 이하의 크기로 점점 더 작아지는 요구에 직면하고 있다. 탄소나노 구조와 나노와이어 기술이 Silicon을 대신할 다음세대 기술로 주목받고 있다. 많은 연구결과들 중에서 III-V CMOS가 가장 빠른 접근 방법이라 예상한다. III-V족 물질을 이용하면 electron 보다 수십 배 이상의 이동도를 얻을 수 있으나 p-type의 구조를 구현하는 것이 해결해야 할 문제이다. p-type 3-5 족 화합물을 이용하여 에너지 밴드 갭의 변화를 가능하게 한다면 hole의 이동도를 크게 향상시킬 수 있어 silicon 기반의 p-type 소자보다 2~3배 더 빠른 소자의 구현이 가능하다. 3-5족 화합물 반도체의 성장 기술이 많이 진보되어 이를 이용하여 고속 소자를 구현한다면 시기적으로 더욱 빨리 다가올 것이라 예측한다. 에너지 밴드갭의 변화와 격자 부정합을 고려하여 SI InP 기판에 GaSb 물질을 채널로 사용한 p-type 2-dimensional hole gas (2DHG) 소자를 구현하였다. 관찰된 소자 구조의 박막 상태의 특징을 보이며 10 um ${\times}$ 10 um AFM 측정결과 1 nm 이하의 표면 거칠기를 가지며 상온에서의 hole 이동도는 약 650 cm2/Vs이고 sheet carrier density는 $5{\times}1012$ /cm2의 결과를 확인하였다. 실험결과 InP 기판위에 채널로 사용된 GaSb 박막을 올리는데 있어 가장 중요한 것은 Phosphorus, Arsenic, 그리고 Antimony 물질의 양과 이들의 변화시간의 조절이다. 본 발표에서 Semi-insulating InP 기판위에 electron이 아닌 hole을 반송자로 이용한 차세대 고속 전자소자를 구현하고자 하여 MBE (Molecular Beam Epitaxy)로 p-type 소자를 구현하여 실험하였다. 아울러 더욱 빠른 소자의 구현을 위하여 세계의 유수 그룹들의 연구 결과들과 앞으로 예상되는 고속 소자에 대해서 비교와 함께 많은 기술에 대해 논의하고자 한다.

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Analysis of the Change in Microstructures of Nano Copper Powders During the Hydrogen Reduction using X-ray Diffraction Patterns and Transmission Electron Microscope, and the Mechanical Property of Compacted Powders (X-선 회절 패턴 측정과 투과 전자 현미경을 이용한 구리 나노분말의 수소 환원 처리 시 발생하는 미세조직 변화 및 치밀화 시편의 물성 분석)

  • Ahn, Dong-Hyun;Lee, Dong Jun;Kim, Wooyeol;Park, Lee Ju;Kim, Hyoung Seop
    • Journal of Powder Materials
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    • v.21 no.3
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    • pp.207-214
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    • 2014
  • In this study, nano-scale copper powders were reduction treated in a hydrogen atmosphere at the relatively high temperature of $350^{\circ}C$ in order to eliminate surface oxide layers, which are the main obstacles for fabricating a nano/ultrafine grained bulk parts from the nano-scale powders. The changes in composition and microstructure before and after the hydrogen reduction treatment were evaluated by analyzing X-ray diffraction (XRD) line profile patterns using the convolutional multiple whole profile (CMWP) procedure. In order to confirm the result from the XRD line profile analysis, transmitted electron microscope observations were performed on the specimen of the hydrogen reduction treated powders fabricated using a focused ion beam process. A quasi-statically compacted specimen from the nano-scale powders was produced and Vickers micro-hardness was measured to verify the potential of the powders as the basis for a bulk nano/ultrafine grained material. Although the bonding between particles and the growth in size of the particles occurred, crystallites retained their nano-scale size evaluated using the XRD results. The hardness results demonstrate the usefulness of the powders for a nano/ultrafine grained material, once a good consolidation of powders is achieved.

Formation and Intergrowth of the Superconducting Phase in the Bi2Sr2Can-1CunOx (n=2~4) System

  • Cheon, Min-Woo;Park, Yong-Pil
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.5
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    • pp.199-203
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    • 2004
  • Superconducting B $i_2$S $r_2$C $a_{n-l}$C $u_{n}$ $O_{x}$(n=2~4) thin films were prepared by single target DC-magnetron sputtering. And, that was compared with the B $i_2$S $r_2$C $a_{n-l}$C $u_{n}$ $O_{x}$(n=1~3) thin film fabricated by using the ion beam sputtering. Phase intergrowth among n=2-3, 3-4 and 4-5 phases was observed. The molar fraction of each phase in the mixed crystal of the deposited films was determined by x-ray diffraction analyses and investigated as a function of $O_2$ gas pressure during sputtering. We investigated the changes of the superconducting properties by molar fraction of each phase. Also, the thin film surface observation was carried out by atomic force microscope. The images show the average particle size decreases, and the distribution density of particles on the film surface was to increase with lower gas pressures. The fabrication conditions for selective growth of the single n=2, 3 and 4 phases in BiSrC $a_{n-l}$C $u_{n}$ $O_{x}$(n=2~4) thin film are discussed.e discussed.ussed.

Eutectic Temperature Effect on Au Thin Film for the Formation of Si Nanostructures by Hot Wire Chemical Vapor Deposition

  • Ji, Hyung Yong;Parida, Bhaskar;Park, Seungil;Kim, MyeongJun;Peck, Jong Hyeon;Kim, Keunjoo
    • Current Photovoltaic Research
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    • v.1 no.1
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    • pp.63-68
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    • 2013
  • We investigated the effects of Au eutectic reaction on Si thin film growth by hot wire chemical vapor deposition. Small SiC and Si nano-particles fabricated through a wet etching process were coated and biased at 50 V on micro-textured Si p-n junction solar cells. Au thin film of 10 nm and a Si thin film of 100 nm were then deposited by an electron beam evaporator and hot wire chemical vapor deposition, respectively. The Si and SiC nano-particles and the Au thin film were structurally embedded in Si thin films. However, the Au thin film grew and eventually protruded from the Si thin film in the form of Au silicide nano-balls. This is attributed to the low eutectic bonding temperature ($363^{\circ}C$) of Au with Si, and the process was performed with a substrate that was pre-heated at a temperature of $450^{\circ}C$ during HWCVD. The nano-balls and structures showed various formations depending on the deposited metals and Si surface. Furthermore, the samples of Au nano-balls showed low reflectance due to surface plasmon and quantum confinement effects in a spectra range of short wavelength spectra range.

Flexural Fatigue Bechavior of Steel Fiber Reinforced Concrete Structures (강섬유보강 콘크리트의 휨 피로거동에 관한 연구)

  • 장동일;채원규;손영현
    • Magazine of the Korea Concrete Institute
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    • v.4 no.1
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    • pp.81-87
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    • 1992
  • In this thesis, the fatigue tests were performed on a series of SFRC(steel fiber reinforced concrete) to investigate the fatigue behavior of SFRC varying with the steel fiber contents and the steel fiber aspect ratios. The three point loading system is used in the fatigue tests. In tl1ese tests, relations between the repeated loading cycles and the mid-span deflections, number of repeated loadmg cycles when specimen was fractured were observed. On this basis, the mid-span deflections, the elastic strain energy and inelastic strain energy of SFRC were studied. A S - N curve \vas drawn to present the fatigue strength of SFRC beam. From che test results, by increasing the steel fiber content the energy lost on the permanent deformation decreases and the energy spent on crack growth increases. But in case of SFRC with the same steel fiber content the higher the steel fiber aspect ratio is, the less the elastic strain energy is. According to S - N curve drawn by the regression analysis on the fatugue test results, the fatigue strength with 2,000,000 repeated loading cycles in SFRC with the steel fiber content is 1.0% shows about 70% on the first crack static flexural strength.

Growth and characterization of oxide buffer layer on IBAD_MgO template for HTS coated conductors (박막형 고온초전도 선재를 위한 산화물 완충층의 IBAD_MgO 기판에서의 성장과 특성)

  • Ko, Rock-Kil;Jang, Se-Hoon;Ha, Hong-Soo;Kim, Ho-Sup;Song, Kyu-Jeong;Ha, Dong-Woo;Oh, Sang-Soo;Park, Chan;Moon, Seung-Hyun;Kim, Young-Cheol
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.297-297
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    • 2008
  • Buffer layers play an important role in the development of high critical current density coated conductor. $LaMnO_3$, $SrTiO_3$ and $BaZrO_3$ buffer layers were compatible with MgO surfaces and also provide a good template for growing high current density REBCO(RE=Rare earth) films. Systematic studies on the influences of pulsed laser deposition parameters (deposition temperature, deposition pressure, processing gas, laser energy density, etc.) on microstructure and texture properties of $LaMnO_3$, $SrTiO_3$ and $BaZrO_3$ films as buffer layer deposited on ion-beam assisted deposition MgO (IBAD_MgO) template by pulse laser deposition method, were carried out. These results will be presented together with the discussion on the possible use of this material in HTS coated conductor as buffer.

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