• Title/Summary/Keyword: bandgap characteristics

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The Characteristics of $Cu_2O$ Thin Films Deposited Using RF-Magnetron Sputtering Method with Nitrogen-Ambient

  • Lee, Seong Hyun;Yun, Sun Jin;Lim, Jung Wook
    • ETRI Journal
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    • v.35 no.6
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    • pp.1156-1159
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    • 2013
  • We investigate the characteristics of $Cu_2O$ thin films deposited through the addition of $N_2$ gas. The addition of $N_2$ gas has remarkable effects on the phase changes, resulting in improved electrical and optical properties. An intermediate phase ($6CuO{\cdot}Cu_2O$) appears at a $N_2$ flow rate of 1 sccm, and a $Cu_2O$ (200) phase is then preferentially grown at a higher feeding amount of $N_2$. The optical and electrical properties of $Cu_2O$ thin films are improved with a sufficient $N_2$ flow rate of more than 15 sccm, as confirmed through various analyses. Under this condition, a high bandgap energy of 2.58 eV and a conductivity of $1.5{\times}10^{-2}$ S/cm are obtained. These high-quality $Cu_2O$ thin films are expected to be applied to $Cu_2O$-based heterojunction solar cells and optical functional films.

A study of interfacial characteristics for $In_{0.1}Ga_{0.9}As/GaAs$ by photoreflectance measurement (Photoreflectance 측정에 의한 $In_{0.1}Ga_{0.9}As/GaAs$ 계면의 특성 조사)

  • 이철욱;김인수;손정식;김동렬;임재영;배인호
    • Journal of the Korean Vacuum Society
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    • v.6 no.3
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    • pp.263-266
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    • 1997
  • We studied an interfacial characteristics of $In_{0.1}Ga_{0.9}As$/ GaAs by photoreflectance (PR) measurement at room temperature. With increasing thickness of epitaxial layer, Franz-Keldysh oscillation (FKO) periods of PR signals were decreased, and interfacial electric field was decreased. This can be explained by the increases of defects due to lattice mismatch near the heterointerface between InGaAs and GaAs. For the thickness of epitaxial layer thinner than the 300$\AA$, InGaAs epitazial layer closed to critical thickness and increased strain, and then the bandgap energy shifted high greatly.

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DC Characteristics of P-Channel Metal-Oxide-Semiconductor Field Effect Transistors with $Si_{0.88}Ge_{0.12}(C)$ Heterostructure Channel

  • Choi, Sang-Sik;Yang, Hyun-Duk;Han, Tae-Hyun;Cho, Deok-Ho;Kim, Jea-Yeon;Shim, Kyu-Hwan
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.6 no.2
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    • pp.106-113
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    • 2006
  • Electrical properties of $Si_{0.88}Ge_{0.12}(C)$ p-MOSFETs have been exploited in an effort to investigate $Si_{0.88}Ge_{0.12}(C)$ channel structures designed especially to suppress diffusion of dopants during epitaxial growth and subsequent fabrication processes. The incorporation of 0.1 percent of carbon in $Si_{0.88}Ge_{0.12}$ channel layer could accomodate stress due to lattice mismatch and adjust bandgap energy slightly, but resulted in deteriorated current-voltage properties in a broad range of operation conditions with depressed gain, high subthreshold current level and many weak breakdown electric field in gateoxide. $Si_{0.88}Ge_{0.12}(C)$ channel structures with boron delta-doping represented increased conductance and feasible use of modulation doped device of $Si_{0.88}Ge_{0.12}(C)$ heterostructures.

Optical Properties and Structural Characteristics of Gallium Nitride Thin Films Prepared by Radio Frequency Magnetron Sputtering

  • Cho, Yeon Ki;Kim, Joo Han
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.248.2-248.2
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    • 2014
  • In this study, the optical properties and structural characteristics of gallium nitride (GaN) thin films prepared by radio frequency (RF) magnetron sputtering were investigated. Auger electron and X-ray photoelectron spectra showed that the deposited films consisted mainly of gallium and nitrogen. The presence of oxygen was also observed. The optical bandgap of the GaN films was measured to be approximately 3.31 eV. The value of the refractive index of the GaN films was found to be 2.36 at a wavelength of 633 nm. X-ray diffraction data revealed that the crystalline phase of the deposited GaN films changed from wurtzite to zinc-blende phase upon decreasing the sputtering gas pressure. Along with the phase change, a strong dependence of the microstructure of the GaN films on the sputtering gas pressure was also observed. The microstructure of the GaN films changed from a voided columnar structure having a rough surface to an extremely condensed structure with a very smooth surface morphology as the sputtering gas pressure was reduced. The relationship between the phase and microstructure changes in the GaN films will be discussed.

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The Characteristics Study of Photoreflectance of $\textrm{In}_{0.1}\textrm{Ga}_{0.1}\textrm{As}$ Epi-layer Grwon by Molecular BEAM Epitaxy (MBE로 성장시킨 $\textrm{In}_{0.1}\textrm{Ga}_{0.1}\textrm{As}$에피층의 Photoreflectance 특성 연구)

  • Lee, Dong-Yul;Yu, Jae-In;Son, Jeong-Sik;Kim, Gi-Hong;Lee, Dong-Geon;Lee, Jeong-Yeol;Bae, In-Ho;Son, Yeong-Ho;Hwang, Do-Eon
    • Korean Journal of Materials Research
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    • v.9 no.5
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    • pp.515-519
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    • 1999
  • We have investigated the photoreflectance characteristics for In\ulcornerGaAs/GaAs heterojunction structure grown by molecular beam epitaxy (MBE). The E\ulcorner bandgap energy of In\ulcornerGa\ulcornerAs at room temperature was observed at about 1.3 eV. From this result, the indium composition x value was calculated. The shoulder peaks were observed higher than E\ulcorner peaks, and peak positions were shifted toward 12 meV to 70 meV higher energy with increasing doping concentrations. The shoulder peaks can be observed by In segregation and re-evaporation. However, we think that indium re-evaporation cause th shift of shoulder peaks after epilayer growth.

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Structural and Optical Characteristics of ZnS:Mn Thin Film Prepared by EBE Method (전자빔 증착법으로 제작된 ZnS:Mn 박막의 구조 및 광학적 특성)

  • 정해덕;박계춘;이기식
    • Electrical & Electronic Materials
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    • v.10 no.10
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    • pp.1005-1010
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    • 1997
  • ZnS:Mn thin film was made by coevaporation with Electron Beam Evaparation(EBE) method. And structural and optical characteristics of ZnS:Mn thin films were investigated by substrate temperature annealing temperature and dopant Mn. When ZnS:Mn thin film was well deposited with cubic crystalline at substrate temperature of 30$0^{\circ}C$ its surface index was [111] and its lattice constant of a was 5.41$\AA$. Also When ZnA:Mn thin film was well made with hexagonal crystalline at substrate temperature of 30$0^{\circ}C$annealing temperature of 50$0^{\circ}C$and annealing time of 60min its miller indices were (0002) (1011), (1012) and (1120). And its lattice constant of a and c was 3.88$\AA$and 12.41$\AA$ respectively. Finally hexagonal ZnS:Mn thin film with dopant Mn of 0.5wt% had fundamental absorption wavelength of 342nm. And so its energy bandgap was about 3.62eV.

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Investigation of Photoluminescence and Annealing Effect of PS Layers

  • Han, Chang-Suk;Park, Kyoung-Woo;Kim, Sang-Wook
    • Korean Journal of Materials Research
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    • v.28 no.2
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    • pp.124-128
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    • 2018
  • N-type porous silicon (PS) layers and thermally oxidized PS layers have been characterized by various measuring techniques such as photoluminescence (PL), Raman spectroscopy, IR, HRSEM and transmittance measurements. The top surface of PS layer shows a stronger photoluminescence peak than its bottom part, and this is ascribed to the difference in number of fine silicon particles of 2~3 nm in diameter. Observed characteristics of PL spectra are explained in terms of microstructures in the n-type PS layers. Common features for both p-type and n-type PS layers are as follows: the parts which can emit visible photoluminescence are not amorphous, but crystalline, and such parts are composed of nanocrystallites of several nm's whose orientations are slightly different from Si substrate, and such fine silicon particles absorb much hydrogen atoms near the surfaces. Light emission is strongly dependent on such fine silicon particles. Photoluminescence is due to charge carrier confinement in such three dimensional structure (sponge-like structure). Characteristics of visible light emission from n-type PS can be explained in terms of modification of band structure accompanied by bandgap widening and localized levels in bandstructure. It is also shown that hydrogen and oxygen atoms existing on residual silicon parts play an important role on emission stability.

High Power and Single Mode Lasing Characteristics in Vertical Cavity Surface Emitting Laser by Varying Photonic Bandgap Structures (광 결정 구조 변수에 따른 고출력 단일모드 수직공진 표면발광 레이저의 발진 특성)

  • Lee, Jin-Woong;Hyun, Kyung-Sook;Shin, Hyun-Ee;Kim, Hee-Dae
    • Korean Journal of Optics and Photonics
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    • v.20 no.6
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    • pp.339-345
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    • 2009
  • The high power and single mode vertical cavity surface emitting laser(VCSEL)s with photonic crystal structures have been proposed and fabricated by reducing substantially the hole numbers used in the photonic crystal structures. It is found that only six holes enable VCSELs to operate a single mode and the reliability can be enhanced by filling the holes with polyimide. The single mode lasing characteristics were analyzed by varying the oxide aperture and the hole diameter in photonic crystal structures. As a result, the single mode lasing can be stably obtained in the photonic crystal vertical cavity surface emitting lasers.

Structural, morphological, optical, and photosensing properties of Cs2TeI6 thin film synthesized by two-step dry process

  • Hoat, Phung Dinh;Van Khoe, Vo;Bae, Sung-Hoon;Lim, Hyo-Jun;Hung, Pham Tien;Heo, Young-Woo
    • Journal of Sensor Science and Technology
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    • v.30 no.5
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    • pp.279-285
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    • 2021
  • Recently, cesium tellurium iodine (Cs2TeI6) has emerged as an inorganic halide perovskite material with potential application in optoelectronic devices due to its high absorption coefficient, suitable bandgap and because it consists of nontoxic and earth-abundant elements. However, studies on its fabrication process as well as photoresponse characteristics are limited. In this study, a simple and effective method is introduced for the synthesis of Cs2TeI6 thin films by a two-step dry process. A Cs2TeI6-based lateral photosensor was fabricated, and its photoresponse characteristics were explored under laser illuminations of four different wavelengths in the visible range: 405, 450, 520, and 655 nm. The initial photosensing results suggest potential application and can lead to more promising studies of Cs2TeI6 film in optoelectronics.

Theoretical Studies on the Electrical Characteristics of the Anthocyanin Derivatives (안토시아닌 유도체의 전기적 특성에 대한 이론적 연구)

  • Lee, Chul Jae;Choi, Jeong-Won;Jang, WoonGeun
    • The Journal of the Convergence on Culture Technology
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    • v.4 no.4
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    • pp.343-348
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    • 2018
  • Anthocyanin derivatives are an important of natural compounds responsible for the red, purple and blue colors in a large number of plants. This molecules are polymethoxy-derivatives of 2-phenylbenzopyrylium salts. Despite the beneficial properties of anthocyanins, the effectiveness of preventing or treating various diseases depends on bioavailability. Therefore, In this study, in order to investigate the electrical characteristics of anthocyanin derivatives, we investigated the electrochemical properties of derivatives by calculating the total energy, bandgap, net charge of anthocyanin derivatives using HyperChem8.0's PM3 method.