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Electronics and Telecommunications Research Institute (한국전자통신연구원)
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The Characteristics of $Cu_2O$ Thin Films Deposited Using RF-Magnetron Sputtering Method with Nitrogen-Ambient

  • Lee, Seong Hyun (Components & Materials Research Laboratory, ETRI, Department of Advanced Device Engineering, University of Science and Technology) ;
  • Yun, Sun Jin (Components & Materials Research Laboratory, ETRI) ;
  • Lim, Jung Wook (Components & Materials Research Laboratory, ETRI)
  • Received : 2013.05.22
  • Accepted : 2013.07.23
  • Published : 2013.12.31
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Abstract

We investigate the characteristics of $Cu_2O$ thin films deposited through the addition of $N_2$ gas. The addition of $N_2$ gas has remarkable effects on the phase changes, resulting in improved electrical and optical properties. An intermediate phase ($6CuO{\cdot}Cu_2O$) appears at a $N_2$ flow rate of 1 sccm, and a $Cu_2O$ (200) phase is then preferentially grown at a higher feeding amount of $N_2$. The optical and electrical properties of $Cu_2O$ thin films are improved with a sufficient $N_2$ flow rate of more than 15 sccm, as confirmed through various analyses. Under this condition, a high bandgap energy of 2.58 eV and a conductivity of $1.5{\times}10^{-2}$ S/cm are obtained. These high-quality $Cu_2O$ thin films are expected to be applied to $Cu_2O$-based heterojunction solar cells and optical functional films.

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References

  1. S. Ishizuka et al., "Passivation of Defects in Polycrystalline $Cu_2O$ Thin Films by Hydrogen or Cyanide Treatment," Appl. Surf. Sci., vol. 216, 2003, pp. 94-97. https://doi.org/10.1016/S0169-4332(03)00485-9
  2. T. Mahalingam et al., "Preparation and Microstructural Studies of Electrodeposited $Cu_2O$ Thin Films," Mater. Lett., vol. 58, 2004, pp. 1802-1807. https://doi.org/10.1016/j.matlet.2003.10.055
  3. H. Zhu et al., "$Cu_2O$ Thin Films Deposited by Reactive Direct Current Magnetron Sputtering," Thin Solid Films, vol. 517, 2009, pp. 5700-5704. https://doi.org/10.1016/j.tsf.2009.02.127
  4. J.F. Pierson, A. Thobor-Keck, and A. Billard, "Cuprite, Paramelaconite and Tenorite Films Deposited by Reactive Magnetron Sputtering," Appl. Surface Sci., vol. 210, 2003, pp. 359-367. https://doi.org/10.1016/S0169-4332(03)00108-9
  5. S. Ishizuka, T. Maruyama, and K. Akimoto, "Thin-Film Deposition of $Cu_2O$ by Reactive Radio-Frequency Magnetron Sputtering," Jpn. J. Appl. Phys., vol. 39, 2000, pp. 786-788. https://doi.org/10.1143/JJAP.39.L786
  6. N. Haraki et al., "Oxygen Radical Density Measurement in $O_2-N_2$ Gas Mixture Plasma by Means of a Thin Platinum Wire," Electrical Eng. Jpn, vol. 149, 2004, pp. 1075-1080.
  7. S. Ishizuka et al., "Nitrogen Doping into $Cu_2O$ Thin Films Deposited by Reactive Radio-Frequency Magnetron Sputtering," Jpn. J. Appl., vol. 40, 2001, pp. 2765-2768. https://doi.org/10.1143/JJAP.40.2765
  8. M.F. Al-Kuhaili, "Characterization of Copper Oxide Thin Films Deposited by the Thermal Evaporation of Cuprous Oxide ($Cu_2O$)," Vacuum, vol. 82, 2008, pp. 623-629. https://doi.org/10.1016/j.vacuum.2007.10.004
  9. Y. Nakano, S. Saeki, and T. Morikawab, "Optical Bandgap Widening of p-Type $Cu_2O$ Films by Nitrogen Doping," Appl. Physics Lett., vol. 94, 2009, 022111. https://doi.org/10.1063/1.3072804
  10. M. Nolan and S.D. Elliott, "The p-Type Conduction Mechanism in $Cu_2O$: A First Principles Study," Phys. Chem., vol. 8, 2006, pp. 5350-5358.

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