• Title/Summary/Keyword: ballistic current transport

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Electromagnetic Resonant Tunneling System: Double-Magnetic Barriers

  • Kim, Nammee
    • Applied Science and Convergence Technology
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    • v.23 no.3
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    • pp.128-133
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    • 2014
  • We study the ballistic spin transport properties in a two-dimensional electron gas system in the presence of magnetic barriers using a transfer matrix method. We concentrate on the size-effect of the magnetic barriers parallel to a two-dimensional electron gas plane. We calculate the transmission probability of the ballistic spin transport in the magnetic barrier structure while varying the width of the magnetic barriers. It is shown that resonant tunneling oscillation is affected by the width and height of the magnetic barriers sensitively as well as by the inter-spacing of the barriers. We also consider the effect of additional electrostatic modulation on the top of the magnetic barriers, which could enhance the current spin polarization. Because all-semiconductor-based devices are free from the resistance mismatch problem, a resonant tunneling structure using the two-dimensional electron gas system with electric-magnetic modulation would play an important role in future spintronics applications. From the results here, we provide information on the physical parameters of a device to produce well-defined spin-polarized current.

2D Quantum Effect Analysis of Nanoscale Double-Gate MOSFET (이차원 양자 효과를 고려한 극미세 Double-Gate MOSFET)

  • Kim, Ji-Hyun;Son, Ae-Ri;Jeong, Na-Rae;Shin, Hyung-Soon
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.45 no.10
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    • pp.15-22
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    • 2008
  • The bulk-planer MOSFET has a scaling limitation due to the short channel effect (SCE). The Double-Gate MOSFET (DG-MOSFET) is a next generation device for nanoscale with excellent control of SCE. The quantum effect in lateral direction is important for subthreshold characteristics when the effective channel length of DG-MOSFET is less than 10nm, Also, ballistic transport is setting important. This study shows modeling and design issues of nanoscale DG-MOSFET considering the 2D quantum effect and ballistic transport. We have optimized device characteristics of DG-MOSFET using a proper value of $t_{si}$ underlap and lateral doping gradient.

Low-dimensional modelling of n-type doped silicene and its carrier transport properties for nanoelectronic applications

  • Chuan, M.W.;Lau, J.Y.;Wong, K.L.;Hamzah, A.;Alias, N.E.;Lim, C.S.;Tan, M.L.P
    • Advances in nano research
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    • v.10 no.5
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    • pp.415-422
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    • 2021
  • Silicene, a 2D allotrope of silicon, is predicted to be a potential material for future transistor that might be compatible with present silicon fabrication technology. Similar to graphene, silicene exhibits the honeycomb lattice structure. Consequently, silicene is a semimetallic material, preventing its application as a field-effect transistor. Therefore, this work proposes the uniform doping bandgap engineering technique to obtain the n-type silicene nanosheet. By applying nearest neighbour tight-binding approach and parabolic band assumption, the analytical modelling equations for band structure, density of states, electrons and holes concentrations, intrinsic electrons velocity, and ideal ballistic current transport characteristics are computed. All simulations are done by using MATLAB. The results show that a bandgap of 0.66 eV has been induced in uniformly doped silicene with phosphorus (PSi3NW) in the zigzag direction. Moreover, the relationships between intrinsic velocity to different temperatures and carrier concentration are further studied in this paper. The results show that the ballistic carrier velocity of PSi3NW is independent on temperature within the degenerate regime. In addition, an ideal room temperature subthreshold swing of 60 mV/dec is extracted from ballistic current-voltage transfer characteristics. In conclusion, the PSi3NW is a potential nanomaterial for future electronics applications, particularly in the digital switching applications.

Device modelling and performance analysis of two-dimensional AlSi3 ballistic nanotransistor

  • Chuan, M.W.;Wong, K.L.;Hamzah, A.;Rusli, S.;Alias, N.E.;Lim, C.S.;Tan, M.L.P.
    • Advances in nano research
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    • v.10 no.1
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    • pp.91-99
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    • 2021
  • Silicene is an emerging two-dimensional (2D) semiconductor material which has been envisaged to be compatible with conventional silicon technology. This paper presents a theoretical study of uniformly doped silicene with aluminium (AlSi3) Field-Effect Transistor (FET) along with the benchmark of device performance metrics with other 2D materials. The simulations are carried out by employing nearest neighbour tight-binding approach and top-of-the-barrier ballistic nanotransistor model. Further investigations on the effects of the operating temperature and oxide thickness to the device performance metrics of AlSi3 FET are also discussed. The simulation results demonstrate that the proposed AlSi3 FET can achieve on-to-off current ratio up to the order of seven and subthreshold swing of 67.6 mV/dec within the ballistic performance limit at room temperature. The simulation results of AlSi3 FET are benchmarked with FETs based on other competitive 2D materials such as silicene, graphene, phosphorene and molybdenum disulphide.

Analytical Formula of the Excess Noise in Homogeneous Semiconductors (균질 반도체의 과잉 잡음에 관한 해석적 식)

  • Park, Chan-Hyeong;Hong, Sung-Min;Min, Hong-Shick;Park, Young-June
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.45 no.9
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    • pp.8-13
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    • 2008
  • Noise in homogeneous extrinsic semiconductor samples is calculated due to distributed diffusion noise sources. As the length of the device shrinks at a fixed bias voltage, the ac-wise short-circuit noise current shows excess noise as well as thermal noise spectra. This excess noise behaves like a full shot noise when the channel length becomes very small compared with the extrinsic Debye length. For the first time, the analytic formula of the excess noise in extrinsic semiconductors from velocity-fluctuation noise sources is given for finite frequencies. This formula shows the interplay between transit time, dielectric relaxation time, and velocity relaxation time in determining the terminal noise current as well as the carrier density fluctuation. As frequency increases, the power spectral density of the excess noise rolls off. This formula sheds light on noise in nanoscale MOSFETs where quasi-ballistic transport plays an important role in carrier transport and noise.

Simulation, design optimization, and experimental validation of a silver SPND for neutron flux mapping in the Tehran MTR

  • Saghafi, Mahdi;Ayyoubzadeh, Seyed Mohsen;Terman, Mohammad Sadegh
    • Nuclear Engineering and Technology
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    • v.52 no.12
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    • pp.2852-2859
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    • 2020
  • This paper deals with the simulation-based design optimization and experimental validation of the characteristics of an in-core silver Self-Powered Neutron Detector (SPND). Optimized dimensions of the SPND are determined by combining Monte Carlo simulations and analytical methods. As a first step, the Monte Carlo transport code MCNPX is used to follow the trajectory and fate of the neutrons emitted from an external source. This simulation is able to seamlessly integrate various phenomena, including neutron slowing-down and shielding effects. Then, the expected number of beta particles and their energy spectrum following a neutron capture reaction in the silver emitter are fetched from the TENDEL database using the JANIS software interface and integrated with the data from the first step to yield the origin and spectrum of the source electrons. Eventually, the MCNPX transport code is used for the Monte Carlo calculation of the ballistic current of beta particles in the various regions of the SPND. Then, the output current and the maximum insulator thickness to avoid breakdown are determined. The optimum design of the SPND is then manufactured and experimental tests are conducted. The calculated design parameters of this detector have been found in good agreement with the obtained experimental results.

<100>, <110>, <111>방향 Si, InAs Nanowire nMOSFETs 의 성능 연구

  • Jeong, Seong-U;Park, Sang-Cheon
    • Proceeding of EDISON Challenge
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    • 2016.03a
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    • pp.357-361
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    • 2016
  • Si와 InAs 두 가지 채널 물질을 가지고 3가지 수송 방향 <100>, <110>, <111>으로 변화시키며 각각의 Nanowire nMOSFETs을 가지고 ballistic quantum transport simulation을 진행하였다. 각각의 경우에 대해 E-k curve를 구한 다음에 band curvature로 캐리어의 유효질량을 계산하고, 이를 통해 MOSFET의 전류 세기를 결정짓는 DOS와 carrier injection velocity를 구하여 어떤 경우에 가장 높은 ON-current를 흐르게 하는지 확인해 보았다. 하지만 예상과 달리 나노와이어의 직경이 1.4nm으로 매우 작기 때문에 valley-splitting이 일어나 Si<110>의 경우에 가장 작은 캐리어 유효 질량을 갖고 있는 사실을 확인할 수 있었다. 결론적으로 Si<100>의 경우에 trade-off 관계에 있는 DOS와 carrier injection velocity가 6가지 경우 중 최적의 조합을 가짐으로써 가장 높은 ON-current를 흐르게 하였다.

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SI-BASED MAGNETIC TUNNELING TRANSISTOR WITH HIGH TRANSFER RATIO

  • S. H. Jang;Lee, J. H.;T. Kang;Kim, K. Y.
    • Proceedings of the Korean Magnestics Society Conference
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    • 2003.06a
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    • pp.24-24
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    • 2003
  • Metallic magnetoelectronic devices have studied intensively and extensively for last decade because of the scientific interest as well as great technological importance. Recently, the scientific activity in spintronics field is extending to the hybrid devices using ferromagnetic/semiconductor heterostructures and to new ferromagnetic semiconductor materials for future devices. In case of the hybrid device, conductivity mismatch problem for metal/semiconductor interface will be able to circumvent when the device operates in ballistic regime. In this respect, spin-valve transistor, first reported by Monsma, is based on spin dependent transport of hot electrons rather than electron near the Fermi energy. Although the spin-valve transistor showed large magnetocurrent ratio more than 300%, but low transfer ratio of the order of 10$\^$-5/ prevents the potential applications. In order to enhance the collector current, we have prepared magnetic tunneling transistor (MTT) with single ferromagnetic base on Si(100) collector by magnetron sputtering process. We have changed the resistance of tunneling emitter and the thickness of baser layer in the MTT structure to increase collector current. The high transfer ratio of 10$\^$-4/ range at bias voltage of more than 1.8 V, collector current of near l ${\mu}$A, and magnetocurrent ratio or 55% in Si-based MTT are obtained at 77K. These results suggest a promising candidate for future spintronic applications.

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A Study on the Effect of Carbon Nanotube Directional Shrinking Transfer Method for the Performance of CNTFET-based Circuit (탄소나노튜브 방향성 수축 전송 방법이 CNTFET 기반 회로 성능에 미치는 영향에 관한 연구)

  • Cho, Geunho
    • The Journal of the Convergence on Culture Technology
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    • v.4 no.3
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    • pp.287-291
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    • 2018
  • The CNTFET, which is attracting attention as a next-generation semiconductor device, can obtain ballistic or near-ballistic transport at a lower voltage than that of conventional MOSFETs by depositing CNTs between the source and drain of the device. In order to increase the performance of the CNTFET, a large number of CNTs must be deposited at a high density in the CNTFET. Thus, various manufacturing processes to increase the density of the CNTs have been developed. Recently, the Directional Shrinking Transfer Method was developed and showed that the current density of the CNTFET device could be increased up to 150 uA/um. So, this method enhances the possibility of implementing a CNTFET-based integrated circuit. In this paper, we will discuss how to evaluate the performance of the CNTFET device compared to a MOSFET at the circuit level when the CNTFET is fabricated by the Directional Shrinkage Transfer Method.

An Accuracy Improvement Method for the Analysis of Process Variation Effect on CNTFET-based Circuit Performance (CNTFET 기반 회로 성능의 공정 편차 영향 분석을 위한 정확도 향상 방법)

  • Cho, Geunho
    • Journal of IKEEE
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    • v.22 no.2
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    • pp.420-426
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    • 2018
  • In the near future, CNTFET(Carbon NanoTube Field Effect Transistor) is considered as one of the most promising candidate for the replacement of modern silicon-based transistors by utilizing the ballistic or near-ballistic transport capability of CNT(Carbon NanoTube). For the large-scale fabrication of high performance CNTFET, semiconducting CNTs have to be well-aligned with a fixed pitch and high densities in the each CNTFET. However, due to the immaturity of the CNTFET fabrication process, CNTs can be unevenly positioned in a CNTFET and existing HSPICE library file cannot support the circuit level evaluation of performance variation caused by the unevenly positioned CNTs. To evaluate the performance variation, linear programming methodology was suggested previously, but the errors can be made during the calculation of the current and the gate capacitance of a CNTFET. In this paper, the reasons causing errors will be discussed in detail and the new methodology to reduce the errors will be also suggested. Simulation results shows that the errors can be reduced from 7.096% to 3.15%.