• 제목/요약/키워드: atomic force microscopy(AFM)

검색결과 782건 처리시간 0.033초

Piezoelectric PZT Cantilever Array Integrated with Piezoresistor for High Speed Operation and Calibration of Atomic Force Microscopy

  • Nam, Hyo-Jin;Kim, Young-Sik;Cho, Seong-Moon;Lee, Caroline-Sunyong;Bu, Jong-Uk;Hong, Jae-Wan
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제2권4호
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    • pp.246-252
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    • 2002
  • Two kinds of PZT cantilevers integrated with a piezoresistor have been newly designed, fabricated, and characterized for high speed AFM. In first cantilever, a piezoresistor is used to sense atomic force acting on tip, while in second cantilever, a piezoresistor is integrated to calibrate hysteresis and creep phenomena of the PZT cantilever. The fabricated PZT cantilevers provide high tip displacement of $0.55\mu\textrm{m}/V$ and high resonant frequency of 73 KHz. A new cantilever structure has been designed to prevent electrical coupling between sensor and PZT actuator and the proposed cantilever shows 5 times lower coupling voltage than that of the previous cantilever. The fabricated PZT cantilever shows a crisp scanned image at 1mm/sec, while the conventional piezo-tube scanner shows blurred image even at $180\mu\textrm{m}/sec$. The non-linear properties of the PZT actuator are also well calibrated using the piezoresistive sensor for calibration.

플라즈마 분자선 에피택시에 의해 성장 멈춤법으로 증착된 완충층에 성장된 ZnO 박막의 특성 변화

  • 임광국;김민수;김소아람;남기웅;박대홍;천민종;이동율;김진수;김종수;이주인;임재영
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.83-83
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    • 2011
  • 본 연구에서는 p-type Si (100) 위에 분자선 에피택시 성장방법으로 ZnO 완충층이 삽입된 ZnO 박막을 성장시켰다. ZnO 완충층은 Zn 셀 셔터의 열림/닫힘을 반복하는 성장 멈춤법으로 성장되었다. Zn 셀 셔터의 열림 시간은 4분, 2분, 1분이며 닫힘 시간은 2분으로 동일하게 유지하였다. 이러한 과정은 각각 5, 10, 20회로 반복되었으며 ZnO 완충층을 성장한 후 ZnO 박막은 기존의 분자선 에피택시 방법으로 성장되었다. ZnO 박막의 구조적, 광학적 특성은 field-emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM), X-ray diffraction (XRD), photoluminescence (PL)로 조사하였다. SEM 측정결과 성장 멈춤 횟수가 증가함에 따라 ZnO 박막의 표면은 섬(island) 구조에서 미로(maze) 구조로 변화하였고, XRD 측정결과 full-width at half-maximum (FWHM) 이 감소하고 결정립 크기(grain size)가 증가하였다. 그리고 PL 측정결과 성장 멈춤 횟수가 증가함에 따라 near-band-edge emission (NBE) 피크의 세기가 증가하였고 deep-level emission (DLE) 피크의 위치는 오렌지 발광에서 녹색 발광으로 청색편이(blue-shift)하였다.

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박막형 $ZnGa_2O_4:Mn$ 산화물 형광체의 음극선루미느센스와 구조적 특성에 관한 연구 (A Study on the Cathodoluminescence and Structure of Thin Film $ZnGa_2O_4:Mn$ Oxide Phosphor)

  • 김주한
    • 한국진공학회지
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    • 제15권5호
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    • pp.541-546
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    • 2006
  • 본 연구에서는 박막형 $ZnGa_2O_4:Mn$ 산화물 형광체의 음극선루미느센스 특성과 구조적 성질에 대하여 field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM), photoluminescence (PL), 그리고 cathodoluminescence (CL) 방법을 이용하여 조사하였다. $ZnGa_2O_4:Mn$ 형광체 타겟으로부터 $Mn^{2+}$ 이온의 $^4T_1{\rightarrow}^6A_1$ 전이에 의한 506nm 파장에서의 PL emission 스펙트럼이 관찰되었다. 색좌표는 x = 0.09, y = 0.67 이었다. $ZnGa_2O_4:Mn$ 박막의 여기 스펙트럼은 $Mn^{2+}$ 이온 흡수에 의한 294 nm의 피크 파장을 나타내었다. 낮은 압력에서 증착한 $ZnGa_2O_4:Mn$ 형광체 박막은 고밀도의 치밀한 단면구조를 보였고, 높은 세기의 음극선루미느센스가 505 nm 피크 파장에서 나타났다. 표면 거칠기가 음극선루미느센스의 세기에 미치는 영향은 관찰되지 않았다.

Nd:YAG 레이저에 의한 폴리테트라플루오르에틸렌 박막 증착 (Deposition of Polytetrafluoroethylene Thin Films by IR-pulsed Laser Ablation)

  • 박훈;서유석;홍진수;채희백
    • 한국산학기술학회논문지
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    • 제6권1호
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    • pp.58-63
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    • 2005
  • 레이저 용발법을 이용하여 폴리테트라플루오르에틸렌(PTFE: polytetrafluoroethylene) 박막을 증착하였다 사용한 레이저는 1064 nm Nd:YAG 레이저이고, 타겟은 그라파이트 분말이 도핑된 PTFE 펠릿(pellet) 이었다. 그라파이트는 포톤에너지를 효과적으로 흡수하여 열에너지로 전환시키고, 이 에너지를 인접한 PTFE에 전달한다. PTFE는 전달받은 열에너지에 의해서 열분해 된다. 타겟 표면에서 열분해에 의해 형성된 PTFE 단량체(monomer)들은 기판위에서 재중합반응(repolymerization)하여 필름을 형성하게 된다. 증착된 필름은 투명하고 결정화된 필름이었다. 주사전자현미경(SEM: scanning electron microscopy)과 원자현미경(AFM: atomic force microscopy)으로 분석한 결과, 필름의 표면은 박막의 두께가 증가할수록 섬유구조(fibrous structure)를 보였다. X선 광전자 분광기(XPS: X-ray photoelectron spectroscopy), 퓨리에 변화 적외선 분광기(FTIR: fouirer transform infrared spectroscopy)와 X선 회절분광기(XRD: X-ray diffraction)로 분석한 결과, 필름의 F/C 비는 1.7이고 분자축(molecular axis)은 기판과 나란했다.

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c-AFM 기술을 이용한 나노급 상변화 소자 특성 평가에 대한 연구 (The study about phase phase change material at nano-scale using c-AFM method)

  • 홍성훈;이헌
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.57-57
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    • 2010
  • In this study, nano-sized phase change materials were evaluated using nanoimprint lithography and c-AFM technique. The 200nm in diameter phase change nano-pillar device of GeSbTe, AgInSbTe, InSe, GeTe, GeSb were successfully fabricated using nanoimprint lithography. And the electrical properties of the phase change nano-pillar device were evaluated using c-AFM with pulse generator and voltage source.

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AFM팁/강유전박막/전극 시스템에서의 스위칭 영역의 형성 (Formation of Switching Zones in an AFM Tip/Ferroelectric Thin Film/BE System)

  • 김상주;신준호;김윤재
    • 대한기계학회논문집A
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    • 제27권6호
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    • pp.849-856
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    • 2003
  • A three-dimensional constitutive model for polarization switching in ferroelectric materials is used to predict the formation of switching zones in an atomic force microscopy(AFM) tip/ferroelectric thin film/bottom electrode system via finite element simulation. Initially the ferrolectric film is poled upward and the bottom electrode is grounded. A strong dc field is imposed on a fixed point of the top surface of the film through the AFM tip. A small switching zone with downward polarization is nucleated and grows with time. It is found that initially the shape of the switched zone is that of a bulgy dagger, but later turn to the shape of a reversed cup with the lower part wider than the upper part. It can also be concluded that the size of switching zones increases with the period of applied electric potential. The present results are qualitatively consistent with experimental observations.

길이 소급성을 갖는 AFM을 이용한 150nm 피치 측정 (150 nm Pitch Measurement using Metrological AFM)

  • 진종한
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.264-267
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    • 2003
  • Pitch measurements of 150 nm pitch one-dimensional grating standards were carried out using an contact mode atomic force microscopy(C-AFM) with a high resolution three-axis laser interferometer. It was called as 'Nano-metrological AFM' In Nano-metrological AFM, Three laser interferometers were aligned well to the end of AFM tip. Laser sources of the three-axis laser interferometer in the nano-metrological AFM were calibrated with an I$_2$-stablilzed He-Ne laser at a wavelength of 633 nm. So, the Abbe error was minimized and the result of the pitch measurement using the nano-metrological AFM has a traceability to the length standard directly. The uncertainty in the pitch measurement was estimated in accordance with the Guide to the Expression of Uncertainty in Measurement(GUM). The Primary source of uncertainty in the pitch-measurements was derived from repeatability of pitch-measurement, and its value was approx 0.186 nm. Expanded uncertainty(k=2) of less than 5.23 nm was obtained. It is suggested that the metrological AFM is a useful tool for the nano-metrological standard calibration.

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UV-Induced Graft Polymerization of Polypropylene-g-glycidyl methacrylate Membrane in the Vapor Phase

  • Hwang, Taek-Sung;Park, Jin-Won
    • Macromolecular Research
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    • 제11권6호
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    • pp.495-500
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    • 2003
  • UV-induced graft polymerization of glycidyl methacrylate (GMA) to a polypropylene (PP) membrane was carried out in the vapor phase with benzophenone (BP) as a photoinitiator. Attenuated total reflection Fourier transform infrared spectroscopy, atomic force microscopy (AFM), and scanning electron microscopy (SEM) were utilized to characterize the copolymer. The degree of grafting increased with increasing reaction time, increased UV irradiation source intensity, and increased immersion concentration of the BP solution. The optimum synthetic condition for the PP-g-GMA membrane was obtained with a reaction time of 2 hrs, a UV irradiation source intensity of 450 W, and an immersion concentration of the BP solution of 0.5 mol/L. The pure water flux decreased upon increasing the degree of grafting and increasing the amount of diethylamino functional group introduced. The analysis of AFM and SEM images shows that the graft chains and diethylamino groups of PP-g-GMA grew on the PP membrane surface, resulting in a change in surface morphology.

Effect of the Substrate Temperature on the Copper Oxide Thin Films

  • 박주연;강용철
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.71-71
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    • 2010
  • Copper oxide thin films were deposited on the p-type Si(100) by r.f. magnetron sputtering as a function of different substrate temperature. The deposited copper oxide thin films were investigated by atomic force microscopy (AFM), scanning electron microscopy (SEM), spectroscopic ellipsometry (SE), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS). The SEM and SE data show that the thickness of the copper oxide films was about 170 nm. AFM images show that the surface roughness of copper oxide films was increased with increasing substrate temperature. As the substrate temperature increased, monoclinic CuO (111) peak appeared and the crystal size decreased while the monoclinic CuO (-111) peak was independent on the substrate temperature. The oxidation states of Cu 2p and O 1s resulted from XPS were not affected on the substrate temperature. The contact angle measurement was also studied and indicated that the surface of copper oxide thin films deposited high temperature has more hydrophobic surface than that of deposited at low temperature.

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Effect of Dodecane on the Surface Structure and the Electronic Properties of Pentacene on Modified Si (001)

  • Kim, Beom-sik;Kang, Hee Jae;Seo, Soonjoo;Park, Nam Seok
    • Applied Science and Convergence Technology
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    • 제25권2호
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    • pp.28-31
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    • 2016
  • The structural and the electronic properties of pentacene on modified Si (001) were investigated using scanning tunneling microscopy (STM), atomic force microscopy (AFM) and ultraviolet photoelectron spectroscopy (UPS). Dodecane was used to modify Si (001) substrates and then pentacene was deposited on dodecane/Si (001). Our STM results show a uniform distribution of aggregated dodecane molecules all over the clean Si (001). The surface structure of pentacene on dodecaene/Si (001) examined by AFM is analogous to that of pentacene on $SiO_2$. The UPS data showed that the work function of pentacene on clean Si (001) and pentacene on modified Si (001) with dodecane was 6.41 and 5.57 eV, respectively. Our results prove that dodecane results in the work function difference between pentacene on clean Si (001) and pentacene on dodecane/Si (001).