• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.05b
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• pp.327-330
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• 2000

The scanning Maxwell-stress microscopy (SMM) is a dynamic noncontact electric force microscopy that allows simultaneous access to the electrical properties of molecular system such as surface potential, surface charge, dielectric constant and conductivity along with the topography. The Scanning near-field optical / atomic force microscopy (SNOAM) is a new tool for surface imaging which was introduced as one application of the atomic force microscope (AFM). Operated with non-contact forces between the optical fiber and sample as well as equipped with the piezoscanners, the instrument reports on surface topology without damaging or modifying the surface for measuring of optical characteristic in the films. We report our recent results of its application to nanoscopic study of domain structures and electrical functionality in organic thin films by SMM. Furthermore, we have illustrated the SNOAM image in obtaining the merocyanine dye films as well as the optical image.

• Rapid Communication in Photoscience
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• v.1 no.2
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• pp.62-62
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• 2012

• Journal of the Korean Society for Precision Engineering
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• v.20 no.3
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• pp.5-14
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• 2003

• The Journal of Korean Academy of Prosthodontics
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• v.35 no.4
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• pp.719-741
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• 1997

This study was undertaken to compare by Atomic Force Microscope the effects of various finishing and polishing instruments on surface roughness of filling and veneering composite resins. Seven composite resins were studied : Silux Plus (3M Dental Products, U.S.A.), Charisma (Heraeus Kulzer, Germany), Prisma THP (L.D.Caulk, Dentsply, U.S.A.), Photoclearfil (Kuraray, Japan), Cesead (Kuraray, Japan), Thermoresin LC (GC, Japan), Artglass (Heraeus Kulzer, Germany). Samples were placed and polymerized in holes (2mm thick and 8.5mm in diameter) machined in Teflon mold under glass plate, ensuring excess of material and moulded to shape with polyester matrix strip. Except control group (Polyester matrix strip), all experimental groups were finished and polishied under manufacturer's instructions. The finishing and polishing procedure were : carbide bur (E.T carbide set 4159, Komet, Germany), diamond bur (composite resin polishing bur set, GC, Japan), aluminum-oxide disc (Sof-Lex Pop-On, 3M Dental Products, U.S.A.), diamond-particle disc (Dia-Finish, Renfert Germany), white stone bur & rubber point( composite finishing kit, EDENTA, Swiss), respectively. Each specimens were evaluated for the surface roughness with Atomic Force Microscope (AutoProbe CP, Park Scientific Instruments, U.S.A.) under contact mode and constant height mode. The results as follows : 1. Except Thermoresin LC, all experimental composite resin groups showed more rougher than control group after finishing and polishing(p<0.1). 2. A surface as smooth as control group was obtained by $Al_{2}O_{3}$ disc all filling composite resin groups except Charisma and all veneering composite resin groups except Thermoresin LC(p<0.05). 3. In case of Thermoresin LC, there were no statistically significant differences before and after finishing and polishing(p>0.1). 4. Carbide bur, diamond bur showed rough surfaces in all composite resin groups, so these were inappropriate for the final polishing instruments.

• ETRI Journal
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• v.26 no.3
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• pp.189-194
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• 2004

We demonstrate a high-speed recording based on field-induced manipulation in combination with an optical reading of recorded bits on Au cluster films using the atomic force microscope (AFM) and the near-field scanning optical microscope (NSOM). We reproduced 50 nm-sized mounds by applying short electrical pulses to conducting tips in a non-contact mode as a writing process. The recorded marks were then optically read using bent fiber probes in a transmission mode. A strong enhancement of light transmission is attributed to the local surface plasmon excitation on the protruded dots.

• Proceedings of the Korean Society of Machine Tool Engineers Conference
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• 2005.05a
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• pp.54-59
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• 2005

Recently, the ultra-precision stage is widely used in the fields of the nano-technology, specially in AFMs(Atomic Force Microscope) and STMs(Scanning Tunneling Microscope). In this paper, the ultra-precision stage which consists of flexure hinges, piezoelectric actuator, and ultra-precision linear encoder, is designed and developed. The guide mechanism which consisted of flexure hinges is analyzed by Finite Element Method. And we derived the transfer function of the system in 1st order system from step responses according to the magnitude. We performed simulation for the model to tune the control gain and applied the gains to the developed system. Experimental results found that the stage can be controlled in 5 nm resolution by PID controller.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.12 no.1
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• pp.27-34
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• 1999

We investigated the effect of mechanical back side damage in viewpoint of electrical and surface morphological characteristics in Czochralski silicon wafer. The intensity of mechanical damage was evaluated by minority carrier recombination lifetime by laser excitation/microwave reflection photoconductance decay technique, atomic force microscope, optical microscope, wet oxidation/preferential etching methods. The data indicate that the higher the mechanical damage degree, the lower the minority carrier lifetime, and surface roughness, damage depth and density of oxidation induced stacking fault increased proportionally.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.36 no.9
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• pp.961-964
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• 2012

This paper presents a sensing system to measure the deflection of a microcantilever in an atomic force microscope. In general, the optical lever method and interferometry are used for the sensing system; however, their size and cost leaves considerable room for improvement. Therefore, we used an optical pickup head whose operating principle is based on the astigmatism of the commercial optical disk drives. The developed sensing system was applied to a laboratory atomic force microscope, and satisfactory results were obtained.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 2002.10b
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• pp.57-58
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• 2002

Asperity arrays and Independent asperities were fabricated on a silicon plate. Then pull-off and friction forces were measured on each asperity pattern by using AFM (atomic force microscope) in humid air and high vacuum of $2{\times}10^{-5}$ Pa. The probe of AFM cantilever has a flat square of about $1\;{\mu}m^2$ on its tip. The results showed that the pull-off force was proportional to the curvature radius of asperity peak in each ambient condition. The friction force was proportional to the pull-off force and was slightly higher in the humid air than in the high vacuum.

• Polymer(Korea)
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• v.30 no.3
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• pp.187-195
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• 2006

Atomic force microscope (AFM)-based anodic oxidation lithography has gained great in forests in fabricating nanometer scale features on semiconductor or metal substrates beyond the limitation of optical lithography. In this article AFM anodic oxidation lithography and its organic resist layers are introduced based on our previous works. Organic resist layers of self-assembled monolayers, Langmuir-Blodgett films and polymer films aye suggested to play a key role in enhancing the aspect ratio of producing features, the lithographic speed, and spatial precision in AFM anodic oxidation lithography.