• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.22 no.3
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• pp.248-251
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• 2009

We have investigated the effect of the quality of 1.3 um distributed feed back laser diode (DFB-LD) on the design of anti-reflection (AR) coatings. Optimal condition of AR coating to prevent internal feedback from both facets and reduce the reflection-induced intensity noise of laser diode was simulated with Macleod Simulator. Coating materials used in this work were ${Ti_3}{O_5}$ and $SiO_2$, of which design thickness were 105 nm and 165 nm, respectively. AR coating films were deposited by Ion-Assisted Deposition system. The electrical and optical properties of 1.3 um laser diode were characterized by Bar tester and Chip tester. Threshold current and slop-efficiency of DFB-LD were 27.56 mA 0.302 W/A. Far field pattern and wavelength of DFB-LD were $22.3^{\circ}(Horizontal){\times}24.4^{\circ}$ (Vertical), 1313.8 nm, respectively.

• Current Photovoltaic Research
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• v.10 no.4
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• pp.95-100
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• 2022

Solar cell is a device that converts photon energy into electrical energy. Therefore, absorption of solar spectrum light is one of the most important characteristics to design the solar cell structures. Various methods have emerged to reduce optical losses, such as textured surfaces, back contact solar cells, anti-reflection layers. Here, the anti-reflection coating (ARC) layer is typically utilized whose refractive index value is between air (~1) and silicon (~4) such as SiN_x layer (~1.9). This research is to print a material called polydimethylsiloxane (PDMS) to form a double anti-reflection layer. Light with wavelength in the range of 0.3 to 1.2 micrometers does not share a wavelength with solar cells. It is confirmed that the refractive index of PDMS (~1.4) is an ARC layer which decreases the reflectance of light absorption region on typical p-type solar cells with SiN_x layer surface. Optimized PDMS printing with analyzing optical property for cell structure can be the effective way against outer effects by encapsulation.

• Transactions on Electrical and Electronic Materials
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• v.4 no.6
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• pp.1-4
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• 2003

Anti-reflection properties of post diffusion doped spin-on source (in-situ AR coating) have been investigated in some detail. A simple experiment for reflectivity study using oblique incidence of light and necessary modification of the theory of minimum reflectivity at oblique incidence has been established. The comparative study of the in-situ AR coating with available spin-on AR film on silicon Solar Cell Surface have been investigated.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.18 no.1
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• pp.216-221
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• 2017

Reducing optical reflection in the visible light range, in order to increase the share of transmitted light and avoid the formation of ghost images in imaging, is important for polymer lens applications. In this study, polymer lenses with refractive indices of n=1.56, 1.60, and 1.67 were fabricated by the injection-molding method with a polymer lens monomer, dibutyltin dichloride as the catalyst and an alkyl phosphoric ester as the release agent. To investigate their anti-reflection (AR) effects, various AR coating structures, viz. a multi-layer AR coating structure, tri-layer AR coating structure with a discrete approximation Gaussian gradient-index profile, and tri-layer AR coating structure with a quarter-wavelength approximation, were designed and coated on the polymer lens by an E-beam evaporation system. The optical properties of the polymer lenses were characterized by UV-visible spectrometry. The material properties of the thin films, refractive index and surface roughness, were analyzed by ellipsometry and AFM, respectively. The most effective AR coating structure of the polymer lens with low refractive index, n=1.56, was the both side coating of multi-layer AR coating structure. However, both side coating of the tri-layered discrete approximation Gaussian gradient-index profile AR coating structure gave comparable results to the both side coating of the multi-layer AR coating structure for the polymer lens with a high refractive index of n=1.67.

• Proceedings of the Optical Society of Korea Conference
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• 1999.08a
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• pp.224-225
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• 1999

• Journal of the Korea Academia-Industrial cooperation Society
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• v.18 no.10
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• pp.771-776
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• 2017

The cover glass of mobile displays and photovoltaic cells needs a functional coating, such as an anti-reflection and self-cleaning coating. Numerous studies have been conducted on the engineering application of biomimetic functional surfaces, such as moth eye and lotus leaf Anti-reflection coantings of silica nanoparticles could enhance the light transmittance. $TiO_2$ photocatalyst coatings have been applied to self-cleaning functional films. In this study, transparent hydrophobic anti-reflective coatings consisting of thin layers of $SiO_2/TiO_2$ nanoparticles were fabricated on a slide glass substrate by the sol-gel process and dip-coating process. The dependence of the surface morphology of the functional coatings was investigated by the atomic force microscopy (AFM), contact angle measurement, and UV-visible spectroscopy. It was found that the coating of $TiO_2$ nanoparticles exhibited a high average transmittance comparable to that of the bare slide glass substrate in the visible light range. The bi-layered functional coating of 7 nm $SiO_2$/7nm $TiO_2$ nanoparticles exhibits a transparent hydrophobic surface with a contact angle of $110^{\circ}$ and an improvement of the average transmittance of 2.3% compared to the bare slide glass substrate in the visible light range.

• Korean Journal of Materials Research
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• v.15 no.5
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• pp.285-292
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• 2005

Anti-reflection film was coated by using spherical silica nano colloids. Silica colloid sol was reserved between two inclined slide glasses by capillary force, and particles were convectively stacked to form a film onto the substrate as the water evaporates. As the sliding speed increased, the thickness of the film decreased and the wavelength at the maximum transmittance decreased. The microstructure observed by SEM showed that silica particles were nearly close packed, which enabled the calculation of the effective refractive index of the film. The film thickness was measured by proffer and calculated from the wavelength of maximum transmittance and the effective refractive index. The effective refractive index of the film could be controlled by a subtle controlling of the coating speed and by mixing two different sized silica particles. When the 100 nm and 50 m particles were mixed at 4:1-5:1 volume ratio, the maximum transmittance of $95.2\%$ for one-sided coating was obtained. This is the one that has increased by $3.8\%$ compared to bare glass substrate, and shows that $99.0\%$ of transmittance or $1.0\%$ of reflectance can be achieved by the simple process if both sides of the substrate are coated.

• Transactions on Electrical and Electronic Materials
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• v.15 no.3
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• pp.159-163
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• 2014

More accurate CD (Critical Dimension) control is required for the nanometer-scaled devices. However, since the reflectivity between substrate and PR (Photoresist) becomes higher, the CD (Critical Dimension) swing curve was intensified. The higher reflectivity also causes PR notching due to the pattern of sub-layer. For this device requirement, it was optimized for the thickness, refractive index(n) and absorption coefficient(k) in the bottom anti-reflective coating(BARC; SiON) and photoresist with the minimum reflectivity. The computational simulated conditions, which were determined with the thickness of 33 nm, n of 1.89 and k of 0.369 as the optimum condition, were successfully applied to the experiments with no standing wave for the 0.13um-device. At this condition, the lowest reflectivity was 0.44%. This optimum condition for BARC SiON film was applied to the process for 0.13um-device. The optimum SiON film as BARC to PR and sub-layer could be formed with the accurate CD control and no standing waver for the nanometer-scaled semiconductor manufacturing process.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.28 no.12
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• pp.821-825
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• 2015

Anti-reflective (AR) thin film was fabricated on a glass substrate by sol-gel method. The coating solution was synthesized with TEOS (tetraethlyorthosilicate) and poly ethylene glycol (PEG, 4.0 wt%). As the withdrawal speed of coating was changed from 0.1 mm/sec to 0.3 mm/sec, the thickness and refractive index of prepared thin films were changed. The reflectance and transmittance of coating glass fabricated by the withdrawal speed of 0.1 mm/sec were 0.62% and 95.0% in visible light range. The refractive index and thickness of single layer thin film were n= 1.29 and ca. 99.0 nm.

• Korean Journal of Optics and Photonics
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• v.13 no.5
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• pp.396-399
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• 2002

Using a bi-layer anti-reflection coating of $TiO_2$and $SiO_2,$ we have achieved a minimum facet reflectivity of $~10^{-5}$ and a band width of 27 nm for a reflectivity of $~10^{-4}$ or less for 1.3 $\mu\textrm{m}$ spot size converter integrated semiconductor lasers. This coating is applicable to external-cavity-tuned laser sources and semiconductor optical amplifiers.